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    • 1. 发明授权
    • Subpad having robust, sealed edges
    • 子板具有坚固的密封边缘
    • US07201647B2
    • 2007-04-10
    • US10273194
    • 2002-10-16
    • Brian LombardoJoseph Cianciolo
    • Brian LombardoJoseph Cianciolo
    • B24D11/00
    • B24B37/24B24B37/22H01L21/3212
    • Provided are encapsulated belts and encapsulated pads for use in a variety of polishing application, including the chemical-mechanical polishing and planarization of semiconductor wafers and other workpieces. The encapsulated belts and pads are characterized by a robust seal between a polishing layer of the pad or belt and the edges of the subpad layer of the pad or belt. The robust seal is accomplished by casting a polymer directly over the subpad layer. The edges of the subpad layer may include one or more functional features that promote the formation of a watertight and slurry-resistant seal when the subpad layer is covered with a cast polymer. Also provided is a method of producing a robust seal between the polishing layer and the edge region of the subpad by encapsulating a subpad layer with a polymeric material.
    • 提供用于各种抛光应用的封装带和封装垫,包括半导体晶片和其它工件的化学机械抛光和平坦化。 封装的带和垫的特征在于垫或带的抛光层与垫或带的子垫层的边缘之间的牢固密封。 坚固的密封通过将聚合物直接浇铸在子垫层上来实现。 子垫层的边缘可以包括一个或多个功能特征,当亚底层覆盖有铸塑聚合物时,该功能特征促进形成水密和耐浆料的密封。 还提供了一种通过用聚合物材料包封子垫层来在抛光层和子垫的边缘区域之间产生牢固密封的方法。
    • 4. 发明授权
    • Belts for polishing semiconductors
    • 皮带用于抛光半导体
    • US06213858B1
    • 2001-04-10
    • US09427108
    • 1999-10-26
    • Brian Lombardo
    • Brian Lombardo
    • B24D1100
    • B24B37/11B24B21/04B24D11/005B24D11/06
    • A seamless, composite belt that is designed to maintain a substantially flat surface in the span between two rollers. The belts typically have one or more polymer layers, including the polishing layer, and one or more supporting woven or non-woven layers. The belts have the necessary balance between down-cupping and up-cupping forces achieved by: 1) varying the relative thickness of the different polymer and supporting layers in the belt, 2) varying the relative hardness or rigidity of the different layers in the belt, 3) varying the temperatures at which the different layers are formed, 4) varying the compositions of supporting layers, and 5) prestressing one or more of the composite layers. The belts are particularly useful in chemical mechanical polishing of semiconductor wafers.
    • 一种无缝复合带,其设计用于在两个辊之间的跨度中保持基本平坦的表面。 带通常具有一个或多个聚合物层,包括抛光层和一个或多个支撑机织层或非编织层。 带子具有通过以下方式实现的下拉杯和拔罐力之间的必要平衡:1)改变带中不同聚合物和支撑层的相对厚度,2)改变带中不同层的相对硬度或刚度 ,3)改变形成不同层的温度,4)改变支撑层的组成,以及5)对一个或多个复合层进行预应力。 这些带在半导体晶片的化学机械抛光中特别有用。
    • 5. 发明授权
    • Froth and method of producing froth
    • 泡沫和生产泡沫的方法
    • US07718102B2
    • 2010-05-18
    • US10266552
    • 2002-10-07
    • Brian LombardoJeffrey P. Otto
    • Brian LombardoJeffrey P. Otto
    • B29C47/76
    • B24D11/001B24B37/24C08G18/10C08G2101/0066C08G18/3225
    • Foam for making pads and belts with controlled, reproducible microcellular structure and method of making such foam in a fast and efficient manner. Under constant pressure and temperature, a prepolymer is mixed with the nucleation surfactant in a tank in the presence of a frothing agent metered into the tank by way of a dip tube or sparge. The nitrogen gas is sheared into small bubbles and is drawn off from the headspace of the tank creating a continuous flow of nitrogen. The pressure of the tank may vary from any absolute pressure down to near complete vacuum, thereby all but eliminating the pressure requirement. The froth of the present invention has a more consistent cell structure and increased cell count.
    • 用于制造具有受控且可重现的微孔结构的垫和带的泡沫以及以快速和有效的方式制造这种泡沫的方法。 在恒定的压力和温度下,将预聚物与成核表面活性剂在槽中混合,在存在通过汲取管或喷射剂计量到罐中的发泡剂的存在下。 氮气被剪切成小气泡,并从罐的顶部空间排出,产生连续的氮气流。 罐的压力可以从任何绝对压力下降到接近完全真空,因此除了消除压力要求之外。 本发明的泡沫具有更一致的细胞结构和增加的细胞计数。
    • 6. 发明授权
    • Polishing pad with reduced moisture absorption
    • 抛光垫减少吸湿
    • US06585574B1
    • 2003-07-01
    • US09596842
    • 2000-06-19
    • Brian LombardoRajeev Bajaj
    • Brian LombardoRajeev Bajaj
    • B24B500
    • B24B37/24B24D3/26B24D3/34B24D11/001
    • A polishing pad for use in chemical mechanical polishing (CMP) is disclosed. The polishing pad has a pad surface for polishing wafer surfaces. The pad surface is composed of a polymeric matrix material. The polishing pad also contains a polymeric additive which is defined in the polymeric matrix of the pad surface and in cells of the pad surface. The polymeric additive may include one of a polyurethane, a polyamide, a polyester, a polyacrylonitrile, a polyacrylate, a polymethacrylate, a polyvinylchloride, and a polyvinylidene chloride. The polymeric additive is configured to be hydrophilic so that the pad surface is wettable to enable improved slurry distribution over the pad surface.
    • 公开了一种用于化学机械抛光(CMP)的抛光垫。 抛光垫具有用于抛光晶片表面的焊盘表面。 垫表面由聚合物基质材料组成。 抛光垫还包含聚合物添加剂,其定义在垫表面的聚合物基体中和垫表面的单元中。 聚合物添加剂可以包括聚氨酯,聚酰胺,聚酯,聚丙烯腈,聚丙烯酸酯,聚甲基丙烯酸酯,聚氯乙烯和聚偏二氯乙烯中的一种。 聚合物添加剂被配置为亲水的,使得垫表面是可润湿的,以使得能够改善焊盘表面上的浆料分布。
    • 9. 发明申请
    • FROTH AND METHOD OF PRODUCING FROTH
    • 丝袜和生产方法
    • US20100192471A1
    • 2010-08-05
    • US12752651
    • 2010-04-01
    • Brian LombardoJeffrey P. Otto
    • Brian LombardoJeffrey P. Otto
    • B24D11/00
    • B24D11/001B24B37/24C08G18/10C08G2101/0066C08G18/3225
    • Foam for making pads and belts with controlled, reproducible microcellular structure and method of making such foam in a fast and efficient manner. Under constant pressure and temperature, a prepolymer is mixed with the nucleation surfactant in a tank in the presence of a frothing agent metered into the tank by way of a dip tube or sparge. The nitrogen gas is sheared into small bubbles and is drawn off from the headspace of the tank creating a continuous flow of nitrogen. The pressure of the tank may vary from any absolute pressure down to near complete vacuum, thereby all but eliminating the pressure requirement. The froth of the present invention has a more consistent cell structure and increased cell count.
    • 用于制造具有受控且可重现的微孔结构的垫和带的泡沫以及以快速和有效的方式制造这种泡沫的方法。 在恒定的压力和温度下,将预聚物与成核表面活性剂在槽中混合,在存在通过汲取管或喷射剂计量到罐中的发泡剂的存在下。 氮气被剪切成小气泡,并从罐的顶部空间排出,产生连续的氮气流。 罐的压力可以从任何绝对压力下降到接近完全真空,因此除了消除压力要求之外。 本发明的泡沫具有更一致的细胞结构和增加的细胞计数。