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1. 发明申请

US20080182379A1 Semiconductor Wafer With Low-K Dielectric Layer and Process For Fabrication Thereof 有权
标题翻译：具有低K电介质层的半导体晶片及其制造方法
公开(公告)号：US20080182379A1
公开(公告)日：2008-07-31
申请号：US11910054
申请日：2005-03-31
申请人： Brad Smith , Cindy Goldberg , Robert E. Jones
发明人： Brad Smith , Cindy Goldberg , Robert E. Jones
IPC分类号： H01L21/76
CPC分类号： H01L21/31695 , H01L21/02126 , H01L21/02203 , H01L21/02304 , H01L21/02348 , H01L21/02362 , H01L21/26 , H01L21/7682 , H01L21/76825 , H01L21/76829 , H01L23/5329 , H01L23/53295 , H01L2221/1047 , H01L2924/0002 , H01L2924/00
摘要： To improve the mechanical strength of a wafer comprising a low-k dielectric layer, the low-k dielectric layer is formed so as to have certain regions of low dielectric constant and the remainder having a higher mechanical strength. The higher-strength regions may have a relatively-higher value of dielectric constant. Selective ultraviolet curing of a dielectric material can be performed so as to expel a porogen from the region(s) desired to have low dielectric constant. A photomask, hardmask, or opaque resist, patterned so as to define the region(s) to have lower dielectric constant, is used to shield the remainder of the dielectric material from the ultraviolet radiation. Alternatively, a layer of dielectric material can be blanket cured to lower its dielectric constant, then non-critical regions thereof can be selectively over-cured whereby to produce regions of increased mechanical strength.
摘要翻译：为了提高包含低k电介质层的晶片的机械强度，形成低k电介质层以具有低介电常数的某些区域，其余部分具有较高的机械强度。较高强度的区域可以具有相对较高的介电常数值。可以进行介电材料的选择性紫外线固化，以便从期望具有低介电常数的区域排出致孔剂。使用图案化以限定具有较低介电常数的区域的光掩模，硬掩模或不透明抗蚀剂来屏蔽电介质材料的剩余部分与紫外线辐射。或者，电介质材料层可以被覆盖固化以降低其介电常数，然后其非临界区域可以选择性地过度固化，从而产生增加的机械强度的区域。

2. 发明授权

US07994069B2 Semiconductor wafer with low-K dielectric layer and process for fabrication thereof 有权
标题翻译：具有低K电介质层的半导体晶片及其制造方法
公开(公告)号：US07994069B2
公开(公告)日：2011-08-09
申请号：US11910054
申请日：2005-03-31
申请人： Brad Smith , Cindy Goldberg , Robert E. Jones
发明人： Brad Smith , Cindy Goldberg , Robert E. Jones
IPC分类号： H01L21/31
CPC分类号： H01L21/31695 , H01L21/02126 , H01L21/02203 , H01L21/02304 , H01L21/02348 , H01L21/02362 , H01L21/26 , H01L21/7682 , H01L21/76825 , H01L21/76829 , H01L23/5329 , H01L23/53295 , H01L2221/1047 , H01L2924/0002 , H01L2924/00
摘要： To improve the mechanical strength of a wafer comprising a low-k dielectric layer, the low-k dielectric layer is formed so as to have certain regions of low dielectric constant and the remainder having a higher mechanical strength. The higher-strength regions may have a relatively-higher value of dielectric constant. Selective ultraviolet curing of a dielectric material can be performed so as to expel a porogen from the region(s) desired to have low dielectric constant. A photomask, hardmask, or opaque resist, patterned so as to define the region(s) to have lower dielectric constant, is used to shield the remainder of the dielectric material from the ultraviolet radiation. Alternatively, a layer of dielectric material can be blanket cured to lower its dielectric constant, then non-critical regions thereof can be selectively over-cured whereby to produce regions of increased mechanical strength.
摘要翻译：为了提高包含低k电介质层的晶片的机械强度，形成低k电介质层以具有低介电常数的某些区域，其余部分具有较高的机械强度。较高强度的区域可以具有相对较高的介电常数值。可以进行介电材料的选择性紫外线固化，以便从期望具有低介电常数的区域排出致孔剂。使用图案化以限定具有较低介电常数的区域的光掩模，硬掩模或不透明抗蚀剂来屏蔽电介质材料的剩余部分与紫外线辐射。或者，电介质材料层可以被覆盖固化以降低其介电常数，然后其非临界区域可以选择性地过度固化，从而产生增加的机械强度的区域。

3. 发明申请

US20090134496A1 WAFER AND METHOD OF FORMING ALIGNMENT MARKERS 审中-公开
标题翻译：形成对齐标记的波形和方法
公开(公告)号：US20090134496A1
公开(公告)日：2009-05-28
申请号：US12305109
申请日：2006-07-06
申请人： Scott Warrick , Clyde Browning , Kevin Cooper , Cindy Goldberg , Brad Smith
发明人： Scott Warrick , Clyde Browning , Kevin Cooper , Cindy Goldberg , Brad Smith
IPC分类号： H01L23/544 , H01L21/76
CPC分类号： H01L23/544 , G03F9/7076 , G03F9/708 , G03F9/7084 , H01L2223/5442 , H01L2223/54426 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A wafer comprises a multi-layer structure. The multi-layer structure includes a first device structure neighbouring an area for receiving alignment markers. A plurality of alignment markers extend into the multi-layer structure and are located within the area for receiving alignment markers. The plurality of alignment markers is arranged to prevent propagation of a crack, when occurring, beyond a material-dependent critical length in a part of the multi-layer structure corresponding to the area for receiving the alignment structure. The material-dependent critical length is associated with the part of the multi-layer structure.
摘要翻译：晶片包括多层结构。多层结构包括邻近用于接收对准标记的区域的第一装置结构。多个对准标记延伸到多层结构中并且位于用于接收对准标记的区域内。多个对准标记被布置成防止裂纹在发生时超过材料相关的临界长度在对应于用于接收对准结构的区域的多层结构的一部分中的传播。材料依赖的临界长度与多层结构的一部分相关联。

4. 发明授权

US08757758B2 Multiple sided media pattern registration system 有权
标题翻译：多面媒体格式注册系统
公开(公告)号：US08757758B2
公开(公告)日：2014-06-24
申请号：US13217631
申请日：2011-08-25
申请人： Ronald J. Duke , Brad Smith , Thomas F. Powers , Morgan A. Smith
发明人： Ronald J. Duke , Brad Smith , Thomas F. Powers , Morgan A. Smith
IPC分类号： B41J29/38 , B41J3/44 , B41J3/60 , B41J11/00 , B41F17/00 , B41F33/00
CPC分类号： B41J3/445 , B41F17/00 , B41F33/0081 , B41J3/60 , B41J11/009 , H04N1/00015 , H04N1/00031 , H04N1/00045 , H04N1/0005 , H04N1/00063 , H04N1/00087 , H04N1/047 , H04N2201/0006 , H04N2201/0471 , H04N2201/04717 , H04N2201/04751 , H04N2201/04758 , H04N2201/04793
摘要： An image registration system for determining a relative location of a first pattern and a second pattern includes a fiducial having a fiducial origin, a first side, and a second side. A first camera captures a first fiducial image of the first side of the fiducial and the fiducial origin and a first pattern image of the first printed pattern. A second camera captures a second fiducial image of the second side of the fiducial and a second pattern image of the second printed pattern. An image registration controller processes the first fiducial image, the first pattern image, the second pattern image, and the second fiducial image to determine the relative location of the first pattern and the second pattern.
摘要翻译：用于确定第一图案和第二图案的相对位置的图像配准系统包括具有基准原点的基准，第一侧和第二侧。第一相机捕获基准的第一侧和基准原点的第一基准图像以及第一印刷图案的第一图案图像。第二相机捕获基准的第二侧的第二基准图像和第二印刷图案的第二图案图像。图像配准控制器处理第一基准图像，第一图案图像，第二图案图像和第二基准图像，以确定第一图案和第二图案的相对位置。

5. 发明申请

US20140118433A1 WEB SKEW COMPENSATION IN A PRINTING SYSTEM 有权
公开(公告)号：US20140118433A1
公开(公告)日：2014-05-01
申请号：US13663839
申请日：2012-10-30
申请人： Christopher M. Muir , Randy E. Armbruster , Thomas Niertit , Brad Smith , Timothy J. Hawryschuk , James M. Enge , Daniel J. DeVivo
发明人： Christopher M. Muir , Randy E. Armbruster , Thomas Niertit , Brad Smith , Timothy J. Hawryschuk , James M. Enge , Daniel J. DeVivo
IPC分类号： B41J13/26
CPC分类号： B41J13/26 , B41J13/025 , B41J2029/3935
摘要： A printing system includes one or more lineheads that jet ink onto a first side of a print media. At least one roller supports a second side of the print media as the print media is transported through the printing system. A roller deformation adjustment mechanism abuts at least one roller and is configured to apply a force to the roller to deform the roller. The deformation of the roller compensates for web skew by changing the relative timing of ink flight times from the linehead to the first side of the print media. The linehead can be disposed on a movable support. The printing system can also include one or more linehead skew adjustment mechanisms configured to move the movable support to adjust a skew of the linehead.

6. 发明授权

US08662623B2 Printing registered patterns on multiple media sides 有权
标题翻译：在多个媒体侧打印注册的图案
公开(公告)号：US08662623B2
公开(公告)日：2014-03-04
申请号：US13217665
申请日：2011-08-25
申请人： Ronald J. Duke , Brad Smith , Thomas F. Powers , Morgan A. Smith
发明人： Ronald J. Duke , Brad Smith , Thomas F. Powers , Morgan A. Smith
IPC分类号： B41J29/393 , B41J3/60
CPC分类号： B41J3/60
摘要： A method of printing includes printing first and second patterns at first and second locations on first and second sides of a media using first and second printheads, respectively. First and second fiducial images including a fiducial origin are captured using first and second cameras, respectively. First and second pattern images of the first and second patterns are captured using the first and second cameras, respectively. The locations of the first and second patterns relative to the fiducial origin are determined using an image registration controller. A relative printed location of the first pattern and the second pattern is determined. A deviation is determined by comparing the determined relative location of the first and second printed patterns with an intended relative location of the first and second printed patterns. The determined deviation is compensated for by adjusting at least one of the first and second printheads so that subsequently printed first and second pattern have the intended relative print locations.
摘要翻译：一种打印方法包括：使用第一和第二打印头分别在介质的第一和第二侧上的第一和第二位置处印刷第一和第二图案。使用第一和第二相机分别捕获包括基准来源的第一和第二基准图像。使用第一和第二相机分别捕获第一和第二图案的第一和第二图案图像。使用图像配准控制器确定第一和第二图案相对于基准原点的位置。确定第一图案和第二图案的相对印刷位置。通过将确定的第一和第二印刷图案的相对位置与第一和第二印刷图案的预期相对位置进行比较来确定偏差。所确定的偏差通过调节第一和第二打印头中的至少一个来补偿，使得随后打印的第一和第二图案具有预期的相对打印位置。

7. 发明申请

US20140002529A1 CORRECTING WEB SKEW IN A PRINTING SYSTEM 审中-公开
标题翻译：校正打印系统中的网页
公开(公告)号：US20140002529A1
公开(公告)日：2014-01-02
申请号：US13536189
申请日：2012-06-28
申请人： Christopher M. Muir , Randy E. Armbruster , Thomas Niertit , Brad Smith , Timothy J. Hawryschuk , James M. Enge , Daniel J. DeVivo
发明人： Christopher M. Muir , Randy E. Armbruster , Thomas Niertit , Brad Smith , Timothy J. Hawryschuk , James M. Enge , Daniel J. DeVivo
IPC分类号： B41J29/38
CPC分类号： B41J15/046
摘要： A printing system includes a linehead that jets ink onto a surface of the print media, an imaging system that captures images of the surface of the print media, and one or more linehead skew adjustment mechanisms adapted to adjust the skew of the linehead. A method for correcting for skew in a print media in the printing system includes capturing images of one or more test marks printed or formed on the print media and analyzing the images to determine whether the print media is skewed with respect to a transport direction of the print media. If the print media is skewed, one or more linehead skew adjustment values is determined to adjust a skew of the linehead. The skew of the linehead is adjusted based on the one or more linehead skew adjustment values.
摘要翻译：打印系统包括将墨水喷射到打印介质的表面上的线头，捕获打印介质的表面的图像的成像系统以及适于调节线头的偏斜的一个或多个线头倾斜调节机构。用于校正打印系统中的打印介质中的歪斜的方法包括捕获打印或形成在打印介质上的一个或多个测试标记的图像，并分析图像以确定打印介质是否相对于传送方向倾斜印刷媒体。如果打印介质偏斜，则确定一个或多个行头偏移调整值以调整线头的偏斜度。基于一个或多个线头偏移调整值来调整线头的偏斜。

8. 发明申请

US20130215165A1 AUTOMATED PRINT AND IMAGE CAPTURE POSITION ADJUSTMENT 有权
标题翻译：自动打印和图像捕获位置调整
公开(公告)号：US20130215165A1
公开(公告)日：2013-08-22
申请号：US13400164
申请日：2012-02-20
申请人： Ronald J. Duke , Brad Smith
发明人： Ronald J. Duke , Brad Smith
IPC分类号： B41J29/38
CPC分类号： B41J11/46 , B41J3/543 , B41J29/393
摘要： A first registration mark is printed by a first printhead on print media at a first initial encoder value. A second registration mark is printed by a second printhead on print media at a second initial encoder value. The second registration mark is spaced apart from the first registration mark. The first and second registration marks are detected using the mark detection system as each is transported past the mark detection system. The displacement signal is used to measure a displacement of the print media between the detection of the second and first registration marks by the mark detection system. A cue delay value is determined for the second printhead so that a subsequently printed first image plane and a second image plane are registered relative to each other using the displacement, the first initial encoder value, and the second initial encoder value.
摘要翻译：在打印介质上以第一初始编码器值由第一打印头打印第一对准标记。在打印介质上以第二初始编码器值由第二打印头打印第二对准标记。第二注册标记与第一注册标记间隔开。使用标记检测系统检测第一和第二登记标记，因为每个都被传送通过标记检测系统。位移信号用于通过标记检测系统测量在第二和第一对准标记的检测之间的打印介质的位移。针对第二打印头确定提示延迟值，使得随后打印的第一图像平面和第二图像平面相对于彼此使用位移，第一初始编码器值和第二初始编码器值进行登记。

9. 发明授权

US07956400B2 MIM capacitor integration 有权
标题翻译： MIM电容集成
公开(公告)号：US07956400B2
公开(公告)日：2011-06-07
申请号：US12304194
申请日：2006-06-15
申请人： Brad Smith
发明人： Brad Smith
IPC分类号： H01L27/108 , H01L29/94
CPC分类号： H01L21/76816 , H01L28/40
摘要： An integrated metal-insulator-metal capacitor is formed so that there is an extension portion of its top plate that does not face any portion of the bottom plate, and an extension portion of its bottom plate that does not face any portion of the top plate. Vias connecting the MIM capacitor plates to conductors in an overlying metallization layer are formed so as to contact the extension portions of the top and bottom plates. Etching of the via holes is simplified because it is permissible for the via holes to punch through the extension portions of the capacitor plates. The bottom plate of the MIM capacitor is inlaid. The top plate of the MIM capacitor may be inlaid.
摘要翻译：形成集成的金属 - 绝缘体 - 金属电容器，使得其顶板的延伸部分不面向底板的任何部分，并且其底板的不面向顶板的任何部分的延伸部分。将MIM电容器板与上覆金属化层中的导体连接的通孔形成为与顶板和底板的延伸部分接触。通孔的蚀刻被简化，因为通孔允许穿过电容器板的延伸部分。 MIM电容器的底板被嵌入。可以镶嵌MIM电容器的顶板。

10. 发明申请

US20090200638A1 MIM CAPACITOR INTEGRATION 有权
标题翻译： MIM电容器集成
公开(公告)号：US20090200638A1
公开(公告)日：2009-08-13
申请号：US12304194
申请日：2006-06-15
申请人： Brad Smith
发明人： Brad Smith
IPC分类号： H01L27/06 , H01L21/82
CPC分类号： H01L21/76816 , H01L28/40
摘要： An integrated metal-insulator-metal capacitor is formed so that there is an extension portion of its top plate that does not face any portion of the bottom plate, and an extension portion of its bottom plate that does not face any portion of the top plate. Vias connecting the MIM capacitor plates to conductors in an overlying metallization layer are formed so as to contact the extension portions of the top and bottom plates. Etching of the via holes is simplified because it is permissible for the via holes to punch through the extension portions of the capacitor plates. The bottom plate of the MIM capacitor is inlaid. The top plate of the MIM capacitor may be inlaid.
摘要翻译：形成集成的金属 - 绝缘体 - 金属电容器，使得其顶板的延伸部分不面向底板的任何部分，并且其底板的不面向顶板的任何部分的延伸部分。将MIM电容器板与上覆金属化层中的导体连接的通孔形成为与顶板和底板的延伸部分接触。通孔的蚀刻被简化，因为通孔允许穿过电容器板的延伸部分。 MIM电容器的底板被嵌入。可以镶嵌MIM电容器的顶板。

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