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1. 发明授权

US06241588B1 Cavitational polishing pad conditioner 失效
标题翻译：海洋抛光垫调理剂
公开(公告)号：US06241588B1
公开(公告)日：2001-06-05
申请号：US09643384
申请日：2000-08-21
申请人： Kyle A. Brown , Boris Fishkin
发明人： Kyle A. Brown , Boris Fishkin
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B1/04
摘要： A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.
摘要翻译：一种化学机械抛光系统，包括移动的抛光垫和超声波调节头。头部以与衬垫表面紧密相对的关系定位，以适当的频率和足够的幅度搅动旋转焊盘表面上的液体，以在焊盘表面附近产生浆料的空化。气蚀的作用大大地调节了垫子，排除污染物并重新组织了垫子。

2. 发明授权

US6149505A Cavitational polishing pad conditioner 失效
标题翻译：海洋抛光垫调理剂
公开(公告)号：US6149505A
公开(公告)日：2000-11-21
申请号：US368395
申请日：1999-08-04
申请人： Kyle A. Brown , Boris Fishkin
发明人： Kyle A. Brown , Boris Fishkin
IPC分类号： B24B1/04 , B24B53/007 , B24B53/017 , H01L21/304 , B24B1/00
CPC分类号： B24B53/017 , B24B1/04
摘要： A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.
摘要翻译：一种化学机械抛光系统，包括移动的抛光垫和超声波调节头。头部以与衬垫表面紧密相对的关系定位，以适当的频率和足够的幅度搅动旋转焊盘表面上的液体，以在焊盘表面附近产生浆料的空化。气蚀的作用大大地调节了垫子，排除污染物并重新组织了垫子。

3. 发明授权

US5957754A Cavitational polishing pad conditioner 失效
公开(公告)号：US5957754A
公开(公告)日：1999-09-28
申请号：US927113
申请日：1997-08-29
申请人： Kyle A. Brown , Boris Fishkin
发明人： Kyle A. Brown , Boris Fishkin
IPC分类号： B24B1/04 , B24B53/007 , B24B53/017 , H01L21/304 , B24B1/00
CPC分类号： B24B53/017 , B24B1/04
摘要： A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.

4. 发明授权

US06332470B1 Aerosol substrate cleaner 失效
标题翻译：气溶胶基材清洁剂
公开(公告)号：US06332470B1
公开(公告)日：2001-12-25
申请号：US09000518
申请日：1997-12-30
申请人： Boris Fishkin , Kyle A. Brown
发明人： Boris Fishkin , Kyle A. Brown
IPC分类号： B08B302
CPC分类号： H01L21/02052 , B08B3/00 , B08B5/00 , H01L21/67051 , Y10S134/902
摘要： An apparatus for cleaning a substrate includes a source of pressurized carrier gas and a body of cleaning agent in liquid form. A first conduit directs the pressurized carrier gas from the carrier gas source to the body of cleaning agent. A second conduit carries a flow of the carrier gas away from the body of the cleaning agent. The carrier gas flow carried by the second conduit includes cleaning agent in vapor form acquired from the body of cleaning agent. A nozzle is coupled to the second conduit to cause droplets of the cleaning agent to impinge upon a first face of the substrate to be cleaned.
摘要翻译：用于清洁衬底的装置包括加压载气源和液体形式的清洁剂体。第一导管将来自载气源的加压载气引导至清洁剂主体。第二导管将载气的流动远离清洁剂的主体。由第二导管承载的载气流包括从清洁剂主体获得的蒸汽形式的清洁剂。喷嘴连接到第二导管以使清洁剂的液滴撞击待清洁的基底的第一面。

5. 发明授权

US08979356B2 Dual agitator mixer with sanitary tank 有权
标题翻译：双搅拌机带卫生水箱
公开(公告)号：US08979356B2
公开(公告)日：2015-03-17
申请号：US13718433
申请日：2012-12-18
申请人： Kyle A. Brown
发明人： Kyle A. Brown
IPC分类号： B01F15/00 , B01F7/16
CPC分类号： B01F15/00025 , B01F7/00208 , B01F7/00633 , B01F7/166 , B01F15/00032 , B08B3/02 , B08B9/00 , B08B9/032 , B08B9/0813
摘要： Coaxial, dual agitator top-entering mixer has coaxial vertical drive shafts penetrating the center of the head of the vessel, driving a lower-speed outer scraper agitator and a higher-speed inner agitator. An inner rotary seal closes the upper end of an annular space between the inner and outer shafts. An outer rotary seal closes the opening around the outer drive shaft in the head of the vessel. A central bore along the inner drive shaft axis extends from its upper end down to a position just below the inner seal, with one or more cross-bored radial passages to the annular space between the drive shafts. A rotary fitting at the upper end of the inner drive shaft permits the introduction of a cleaning fluid into the central bore. The cleaning fluid passes through the bore and the radial passage into the annular space to clean accumulations from within the annular space. The cleaning fluid exits the annular space into the interior of vessel. A single-agitator mixer may also employ this through-the-shaft cleaning feature.
摘要翻译：同轴双搅拌器顶部进入混合器具有穿过容器头部中心的同轴垂直驱动轴，驱动低速外刮板搅拌器和较高速内搅拌器。内旋转密封件封闭内轴和外轴之间的环形空间的上端。外旋转密封件封闭容器头部中的外驱动轴周围的开口。沿着内部驱动轴轴线的中心孔从其上端向下延伸到刚好在内部密封件正下方的位置，其中一个或多个十字孔径向通道连接到驱动轴之间的环形空间。在内驱动轴的上端的旋转配件允许将清洁流体引入中心孔。清洁流体通过孔和径向通道进入环形空间以清洁环形空间内的积聚。清洁流体将环形空间排出到容器的内部。单搅拌机也可采用这种通过轴的清洗功能。

6. 发明申请

US20130039460A1 METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLAY OF A SPECIMEN 有权
标题翻译：确定标本的关键尺寸和覆盖物的方法和系统
公开(公告)号：US20130039460A1
公开(公告)日：2013-02-14
申请号：US13467042
申请日：2012-05-09
申请人： Ady Levy , Kyle A. Brown , Rodney Smedt , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden , Ibrahim Abdul-Halim
发明人： Ady Levy , Kyle A. Brown , Rodney Smedt , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden , Ibrahim Abdul-Halim
IPC分类号： G01N21/47 , G01B11/02 , G01N23/201 , G01N23/223 , G01N23/20 , G01B11/06 , G01B11/24
CPC分类号： G01N21/27 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/64 , G01N21/9501 , G01N21/956 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , G03F7/70708 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including: but not limited to, critical dimension and overlay misregistration; defects and thin film characteristics; critical dimension and defects; critical dimension and thin film characteristics; critical dimension, thin film characteristics and defects; macro defects and micro defects; flatness, thin film characteristics and defects; overlay misregistration and flatness; an implant characteristic and defects; and adhesion and thickness. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和重叠错位; 缺陷和薄膜特性; 临界尺寸和缺陷; 临界尺寸和薄膜特性; 临界尺寸，薄膜特性和缺陷; 宏观缺陷和微缺陷; 平整度，薄膜特性和缺陷; 重叠错位和平整度; 植入物特征和缺陷; 附着力和厚度。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

7. 发明授权

US06891627B1 Methods and systems for determining a critical dimension and overlay of a specimen 有权
标题翻译：用于确定试样的临界尺寸和覆盖层的方法和系统
公开(公告)号：US06891627B1
公开(公告)日：2005-05-10
申请号：US09956838
申请日：2001-09-20
申请人： Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden
发明人： Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden
IPC分类号： G01N21/21 , G01N21/47 , G01N21/63 , G01N21/64 , G01N21/95 , G03F7/20 , H01L21/66 , G01N21/88 , G01B11/04 , G01B11/14 , G01N21/00
CPC分类号： G01N21/27 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/64 , G01N21/9501 , G01N21/956 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , G03F7/70708 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and overlay misregistration. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和重叠错位。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

8. 发明授权

US06812045B1 Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation 失效
标题翻译：用于确定在离子注入之前，期间或之后的样品的特性的方法和系统
公开(公告)号：US06812045B1
公开(公告)日：2004-11-02
申请号：US09956842
申请日：2001-09-20
申请人： Mehrdad Nikoonahad , Ady Levy , Kyle A. Brown , Gary Bultman , Dan Wack , John Fielden
发明人： Mehrdad Nikoonahad , Ady Levy , Kyle A. Brown , Gary Bultman , Dan Wack , John Fielden
IPC分类号： H01L2166
CPC分类号： G03F7/70616 , G01N21/636 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/707 , G03F7/70708 , H01J2237/31701
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a characteristic of a specimen prior to, during, or subsequent to ion implantation. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，该系统可以被配置成确定样品的多个性质，包括但不限于在离子注入之前，期间或之后的样品的特性。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

9. 发明授权

US06782337B2 Methods and systems for determining a critical dimension an a presence of defects on a specimen 失效
标题翻译：用于确定临界尺寸的样品上存在缺陷的方法和系统
公开(公告)号：US06782337B2
公开(公告)日：2004-08-24
申请号：US09956848
申请日：2001-09-20
申请人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
发明人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
IPC分类号： G06F1900
CPC分类号： G03F7/70708 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/9501 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and a presence of defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和缺陷的存在。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

10. 发明申请

US20090079974A1 METHODS AND SYSTEMS FOR LITHOGRAPHY PROCESS CONTROL 有权
标题翻译： LITHOGRAPHY PROCESS CONTROL的方法和系统
公开(公告)号：US20090079974A1
公开(公告)日：2009-03-26
申请号：US12328123
申请日：2008-12-04
申请人： Suresh Lakkapragada , Kyle A. Brown , Matt Hankinson , Ady Levy
发明人： Suresh Lakkapragada , Kyle A. Brown , Matt Hankinson , Ady Levy
IPC分类号： G01N21/88
CPC分类号： G03F7/70558 , G01N21/47 , G01N21/956 , G03F7/70625 , G03F7/70641 , H01L22/20 , H01L2924/0002 , Y10S414/135 , H01L2924/00
摘要： Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.
摘要翻译：提供了用于评估和控制光刻工艺的方法和系统。例如，用于减小光刻工艺的关键度量的晶片间变化的方法可以包括在光刻工艺期间测量设置在晶片上的抗蚀剂的至少一种性质。光刻工艺的关键度量可以包括但不限于在光刻工艺期间形成的特征的临界尺寸。该方法还可以包括改变被配置为执行光刻处理步骤的处理模块的至少一个参数以减少关键度量的晶片变化。响应于抗蚀剂的至少一个测量性质，可以改变工艺模块的参数。

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