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    • 4. 发明申请
    • Chemical-mechanical polishing composition and method for using the same
    • 化学机械抛光组合物及其使用方法
    • US20050211950A1
    • 2005-09-29
    • US10807944
    • 2004-03-24
    • Francesco de Rege ThesauroKevin MoeggenborgVlasta BrusicBenjamin Bayer
    • Francesco de Rege ThesauroKevin MoeggenborgVlasta BrusicBenjamin Bayer
    • C09G1/02H01L21/321C09K13/00B44C1/22H01L21/302
    • C09G1/02
    • The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive comprising α-alumina, (b) about 0.05 to about 50 mmol/kg of ions of at least one metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, and (c) a liquid carrier comprising water. The invention also provides a chemical-mechanical polishing composition comprising: (a) an abrasive selected from the group consisting of α-alumina, γ-alumina, δ-alumina, θ-alumina, diamond, boron carbide, silicon carbide, tungsten carbide, titanium nitride, and mixtures thereof, (b) about 0.05 to about 3.5 mmol/kg of ions of at least one metal selected from the group consisting of calcium, strontium, barium, magnesium, zinc, and mixtures thereof, based on the total weight of the polishing composition, and (c) a liquid carrier comprising water. The invention further provides methods of polishing a substrate using each of the above-described chemical-mechanical polishing compositions.
    • 本发明提供一种化学机械抛光组合物,其包括:(a)包含α-氧化铝的磨料,(b)约0.05至约50mmol / kg的选自钙,锶,钡中的至少一种金属的离子 ,及其混合物,基于抛光组合物的总重量,和(c)包含水的液体载体。 本发明还提供一种化学机械抛光组合物,其包含:(a)选自α-氧化铝,γ-氧化铝,δ-氧化铝,θ-氧化铝,金刚石,碳化硼,碳化硅,碳化钨, 氮化钛及其混合物,(b)基于总重量,约0.05至约3.5mmol / kg的选自钙,锶,钡,镁,锌及其混合物的至少一种金属的离子 的抛光组合物,和(c)包含水的液体载体。 本发明还提供了使用上述每种化学 - 机械抛光组合物抛光基材的方法。