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1. 发明授权

US07419891B1 Method and system for providing a smaller critical dimension magnetic element utilizing a single layer mask 失效
标题翻译：用于使用单层掩模提供较小临界尺寸的磁性元件的方法和系统
公开(公告)号：US07419891B1
公开(公告)日：2008-09-02
申请号：US11352652
申请日：2006-02-13
申请人： Benjamin Chen , Hongping Yuan , Danning Yang , Wei Zhang , Hugh C. Hiner , Lei Wang , Yingjian Chen , Brant Nease
发明人： Benjamin Chen , Hongping Yuan , Danning Yang , Wei Zhang , Hugh C. Hiner , Lei Wang , Yingjian Chen , Brant Nease
IPC分类号： H01L21/20
CPC分类号： H01L43/12 , B82Y10/00 , B82Y25/00 , G11B5/3906 , G11B5/3909
摘要： The method and system for providing a magnetic element are disclosed. The method and system include providing a magnetic element stack that includes a plurality of layers and depositing a stop layer on the magnetic element stack. The method and system also include providing a dielectric antireflective coating (DARC) layer on the stop layer, forming a single layer mask for defining the magnetic element on a portion of the DARC layer, and removing a remaining portion of the DARC layer not covered by the single layer mask. The portion of the DARC layer covers a portion of the stop layer. The method further includes removing a remaining portion of the stop layer and defining the magnetic element using at least the portion of stop layer as a mask.
摘要翻译：公开了用于提供磁性元件的方法和系统。该方法和系统包括提供包括多个层的磁性元件堆叠并在磁性元件堆叠上沉积停止层。该方法和系统还包括在停止层上提供介电抗反射涂层（DARC）层，形成用于在DARC层的一部分上限定磁性元件的单层掩模，以及去除DARC层未覆盖的DARC层的剩余部分单层面膜。 DARC层的一部分覆盖停止层的一部分。该方法还包括使用停止层的至少一部分作为掩模去除停止层的剩余部分并限定磁性元件。

2. 发明授权

US08081403B1 Magnetic element having a smaller critical dimension of the free layer 有权
标题翻译：具有较小临界尺寸的自由层的磁性元件
公开(公告)号：US08081403B1
公开(公告)日：2011-12-20
申请号：US12170619
申请日：2008-07-10
申请人： Benjamin Chen , Hongping Yuan , Danning Yang , Wei Zhang , Hugh C. Hiner , Lei Wang , Yingjian Chen , Brant Nease
发明人： Benjamin Chen , Hongping Yuan , Danning Yang , Wei Zhang , Hugh C. Hiner , Lei Wang , Yingjian Chen , Brant Nease
IPC分类号： G11B5/39
CPC分类号： H01L43/12 , B82Y10/00 , B82Y25/00 , G11B5/3906 , G11B5/3909
摘要： A magnetic element includes a pinned layer, a nonferromagnetic spacer layer, and a free layer. The nonferromagnetic spacer layer resides between the pinned layer and the free layer. The free layer has a track width of not more than 0.08 micron.
摘要翻译：磁性元件包括钉扎层，非铁磁隔离层和自由层。非铁磁间隔层位于被钉扎层和自由层之间。自由层的轨道宽度不大于0.08微米。

3. 发明授权

US08424192B1 Method for manufacturing a pole for a magnetic recording head 失效
标题翻译：磁记录头用磁极制造方法
公开(公告)号：US08424192B1
公开(公告)日：2013-04-23
申请号：US11199281
申请日：2005-08-08
申请人： Danning Yang , Lei Wang , Yingjian Chen , Brant Nease , Kyusik Sin
发明人： Danning Yang , Lei Wang , Yingjian Chen , Brant Nease , Kyusik Sin
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163 , G11B5/3169 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method and system for manufacturing a pole on a recording head is disclosed. The method and system include sputtering at least one ferromagnetic layer and fabricating a hard mask on the ferromagnetic layer. The method and system also include defining the pole and depositing a write gap on the pole. A portion of the pole is encapsulated in an insulator.
摘要翻译：公开了一种在记录头上制造磁极的方法和系统。该方法和系统包括溅射至少一个铁磁层并在铁磁层上制造硬掩模。该方法和系统还包括限定极点并在极上沉积写入间隙。极的一部分被封装在绝缘体中。

4. 发明授权

US07296339B1 Method for manufacturing a perpendicular magnetic recording head 失效
标题翻译：垂直磁记录头的制造方法
公开(公告)号：US07296339B1
公开(公告)日：2007-11-20
申请号：US10936921
申请日：2004-09-08
申请人： Danning Yang , Yingjian Chen , Brant Nease , Kyusik Sin
发明人： Danning Yang , Yingjian Chen , Brant Nease , Kyusik Sin
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , G11B5/3169 , Y10T29/49039 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method and system for manufacturing a perpendicular magnetic recording head is disclosed. The method and system include providing a chemical mechanical planarization (CMP) uniformity structure having an aperture therein and forming a perpendicular magnetic recording pole within the aperture. The CMP uniformity structure may include a CMP barrier layer. The method and system further include fabricating an insulator after formation of the perpendicular magnetic recording pole and performing a CMP to remove a portion of the insulator, expose a portion of the perpendicular magnetic recording pole and planarize an exposed surface of the perpendicular magnetic recording head.
摘要翻译：公开了用于制造垂直磁记录头的方法和系统。该方法和系统包括提供其中具有孔的化学机械平面化（CMP）均匀性结构，并在孔内形成垂直的磁记录极。 CMP均匀性结构可以包括CMP阻挡层。所述方法和系统还包括在形成垂直磁记录极之后制造绝缘体，并执行CMP以去除绝缘体的一部分，暴露垂直磁记录极的一部分并平面化垂直磁记录头的暴露表面。

5. 发明授权

US08149536B1 Perpendicular magnetic recording head having a pole tip formed with a CMP uniformity structure 有权
标题翻译：具有形成有CMP均匀结构的极尖的垂直磁记录头
公开(公告)号：US08149536B1
公开(公告)日：2012-04-03
申请号：US11871672
申请日：2007-10-12
申请人： Danning Yang , Yingjian Chen , Brant Nease , Kyusik Sin
发明人： Danning Yang , Yingjian Chen , Brant Nease , Kyusik Sin
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , G11B5/3169 , Y10T29/49039 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method and system for manufacturing a perpendicular magnetic recording head is disclosed. The method and system include providing a chemical mechanical planarization (CMP) uniformity structure having an aperture therein and forming a perpendicular magnetic recording pole within the aperture. The CMP uniformity structure may include a CMP barrier layer. The method and system further include fabricating an insulator after formation of the perpendicular magnetic recording pole and performing a CMP to remove a portion of the insulator, expose a portion of the perpendicular magnetic recording pole and planarize an exposed surface of the perpendicular magnetic recording head.
摘要翻译：公开了用于制造垂直磁记录头的方法和系统。该方法和系统包括提供其中具有孔的化学机械平面化（CMP）均匀性结构，并在孔内形成垂直的磁记录极。 CMP均匀性结构可以包括CMP阻挡层。所述方法和系统还包括在形成垂直磁记录极之后制造绝缘体，并执行CMP以去除绝缘体的一部分，暴露垂直磁记录极的一部分并平面化垂直磁记录头的暴露表面。

6. 发明授权

US08018677B1 Magnetic recording head formed by damascene process 有权
标题翻译：磁记录头由镶嵌工艺形成
公开(公告)号：US08018677B1
公开(公告)日：2011-09-13
申请号：US11923043
申请日：2007-10-24
申请人： Ki Sup Chung , Kyusik Sin , Danning Yang , Yingjian Chen , Brant Nease
发明人： Ki Sup Chung , Kyusik Sin , Danning Yang , Yingjian Chen , Brant Nease
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method and system for manufacturing a pole for a magnetic recording head. The method and system include providing an insulator and fabricating at least one hard mask on the insulator. The at least one hard mask has an aperture therein. The method and system also include removing a portion of the insulator to form a trench within the insulator. The trench is formed under the aperture. The method and system further include depositing at least one ferromagnetic material. The pole includes a portion of the ferromagnetic material within the trench.
摘要翻译：一种用于制造用于磁记录头的磁极的方法和系统。该方法和系统包括提供绝缘体并在绝缘体上制造至少一个硬掩模。至少一个硬掩模在其中具有孔。该方法和系统还包括去除绝缘体的一部分以在绝缘体内形成沟槽。沟槽形成在孔下面。所述方法和系统还包括沉积至少一种铁磁材料。极包括沟槽内的铁磁材料的一部分。

7. 发明授权

US07444740B1 Damascene process for fabricating poles in recording heads 有权
标题翻译：用于在记录头中制造磁极的镶嵌工艺
公开(公告)号：US07444740B1
公开(公告)日：2008-11-04
申请号：US11047401
申请日：2005-01-31
申请人： Ki Sup Chung , Kyusik Sin , Danning Yang , Yingjian Chen , Brant Nease
发明人： Ki Sup Chung , Kyusik Sin , Danning Yang , Yingjian Chen , Brant Nease
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method and system for manufacturing a pole for a magnetic recording head. The method and system include providing an insulator and fabricating at least one hard mask on the insulator. The at least one hard mask has an aperture therein. The method and system also include removing a portion of the insulator to form a trench within the insulator. The trench is formed under the aperture. The method and system further include depositing at least one ferromagnetic material. The pole includes a portion of the ferromagnetic material within the trench.
摘要翻译：一种用于制造用于磁记录头的磁极的方法和系统。该方法和系统包括提供绝缘体并在绝缘体上制造至少一个硬掩模。至少一个硬掩模在其中具有孔。该方法和系统还包括去除绝缘体的一部分以在绝缘体内形成沟槽。沟槽形成在孔下面。所述方法和系统还包括沉积至少一种铁磁材料。极包括沟槽内的铁磁材料的一部分。

8. 发明授权

US07120989B2 Process of manufacturing a perpendicular magnetic pole structure 有权
标题翻译：制造垂直磁极结构的工艺
公开(公告)号：US07120989B2
公开(公告)日：2006-10-17
申请号：US10781168
申请日：2004-02-18
申请人： Danning Yang , Cherng-Chyi Han
发明人： Danning Yang , Cherng-Chyi Han
IPC分类号： G11B5/127 , B05D1/32 , B44C1/22
CPC分类号： G11B5/1278 , Y10T29/49039 , Y10T29/49041 , Y10T29/49048 , Y10T29/49052
摘要： For PMR (Perpendicular Magnetic Recording) design, one of the major technology problems is the use of CMP to fabricate the pole structure. If the device is under-polished there is a danger of leaving behind a magnetic shorting layer while if it is over-polished there may be damage to the main pole. This problem has been overcome by surrounding the main pole, write gap, stitched write head pillar with a layer of CMP etch stop material which, using optical inspection alone, allows CMP (performed under a first set of conditions) to be terminated just as the stitched write head gets exposed. This is followed by a second CMP step (performed under a second set of conditions) for further fine trimming of the stitched head, as needed.
摘要翻译：对于PMR（垂直磁记录）设计，主要的技术问题之一是使用CMP制造极结构。如果设备磨光不良，则会有留下磁性短路层的危险，而如果超磨光，则可能会损坏主极。通过使用CMP蚀刻停止材料层围绕主极，写入间隙，缝合写头柱来克服这个问题，其使用光学检查单独允许CMP（在第一组条件下执行）被终止，就像拼接写头被曝光。接下来是第二CMP步骤（在第二组条件下执行），以根据需要进一步精细修剪缝合的头部。

9. 发明授权

US09196270B1 Method for providing a magnetoresistive element having small critical dimensions 有权
标题翻译：提供具有小临界尺寸的磁阻元件的方法
公开(公告)号：US09196270B1
公开(公告)日：2015-11-24
申请号：US11635830
申请日：2006-12-07
申请人： Danning Yang , Guanghong Luo , Yun-Fei Li
发明人： Danning Yang , Guanghong Luo , Yun-Fei Li
IPC分类号： G11B5/31 , G11B5/39 , H01L21/311 , H01L21/314
CPC分类号： G11B5/398 , G11B5/3163 , G11B5/39 , G11B5/3903 , G11B5/3932 , H01L21/31138 , H01L21/3144 , H01L43/08 , Y10T29/49041 , Y10T29/49048 , Y10T29/49052
摘要： The method and system for providing a magnetoresistive device are described. The method and system include depositing a plurality of magnetoresistive element layers which cover at least one device area and at least one field area. The method and system also include providing a single layer mask. The single layer mask covers a first portion of the magnetoresistive element layers in the device area(s) and exposes the magnetoresistive element layers in the field area(s). The method and system include defining the magnetoresistive element(s) using the single layer mask and depositing a hard bias layer on the device area(s) and the field area(s) after the magnetic element(s) are defined. The method and system further include performing a planarization after the hard bias layer is deposited.
摘要翻译：描述了用于提供磁阻器件的方法和系统。该方法和系统包括沉积多个覆盖至少一个器件区域和至少一个场区域的磁阻元件层。该方法和系统还包括提供单层掩模。单层掩模覆盖器件区域中的磁阻元件层的第一部分并且暴露场区域中的磁阻元件层。该方法和系统包括使用单层掩模限定磁阻元件，并且在限定了磁性元件之后，在器件区域和场区域上沉积硬偏置层。所述方法和系统还包括在沉积硬偏压层之后执行平面化。

10. 发明授权

US08404129B1 Method and system for providing a curved surface in a magnetic recording head 有权
标题翻译：用于在磁记录头中提供弯曲表面的方法和系统
公开(公告)号：US08404129B1
公开(公告)日：2013-03-26
申请号：US12751815
申请日：2010-03-31
申请人： Guanghong Luo , Danning Yang , Ming Jiang
发明人： Guanghong Luo , Danning Yang , Ming Jiang
IPC分类号： B44C1/22
CPC分类号： G11B5/3163 , G11B2005/0021
摘要： A method and system for fabricating an optical component are described. The method and system include providing a first planarization stopping and a second planarization stopping structure. The first planarization stopping structure has a first height and a first edge. The second planarization stopping structure has a second height different from the first height and a second edge. The first edge is separated from the second edge by a distance. The method and system also include providing an optical material. The optical material resides at least between the first edge of the first planarization stopping structure and the second edge of the second planarization stopping structure. The method and system also include planarizing the optical components. The planarization removes a portion of the optical material to form a surface between the first planarization stopping structure and the second planarization stopping structure. This surface has a curvature.
摘要翻译：描述了用于制造光学部件的方法和系统。该方法和系统包括提供第一平坦化停止和第二平坦化停止结构。第一平面化停止结构具有第一高度和第一边缘。第二平坦化停止结构具有与第一高度不同的第二高度和第二边缘。第一边缘与第二边缘分开一段距离。该方法和系统还包括提供光学材料。光学材料至少位于第一平坦化停止结构的第一边缘和第二平坦化停止结构的第二边缘之间。该方法和系统还包括平面化光学部件。平坦化除去光学材料的一部分以在第一平坦化停止结构和第二平坦化停止结构之间形成表面。该表面具有曲率。

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