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1. 发明申请

US20120036905A1 Optical Lock Systems and Methods 有权
标题翻译：光锁系统和方法
公开(公告)号：US20120036905A1
公开(公告)日：2012-02-16
申请号：US12853718
申请日：2010-08-10
申请人： Benjamin Alan Grayson , Debasish Banerjee , Minjuan Zhang , Yasuo Uehara , Masahiko Ishii
发明人： Benjamin Alan Grayson , Debasish Banerjee , Minjuan Zhang , Yasuo Uehara , Masahiko Ishii
IPC分类号： E05B51/00 , E05B65/12 , G05B15/00 , G06F19/00
CPC分类号： G02B5/0825 , G02B27/0012 , Y10T70/5889 , Y10T70/7051
摘要： In one embodiment, the optical lock system may include an electronic control unit, a lock housing including a lock chamber, and an optical key including a multilayer photonic structure. The multilayer photonic structure may produce a unique intensity profile and includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric. A light source may transmit a reference light to the multilayer photonic structure when the optical key is disposed within the lock chamber. A photo detector may receive an interaction light from the multilayer photonic structure and may transmit the unique intensity profile to the electronic control unit which may execute machine readable instructions to: compare the unique intensity profile to an electronic master; and cause the lock actuator to transition from a first state to a second state when the unique intensity profile corresponds to the electronic master.
摘要翻译：在一个实施例中，光学锁定系统可以包括电子控制单元，包括锁定室的锁定壳体和包括多层光子结构的光学键。多层光子结构可以产生独特的强度分布并且包括多个高折射率介电材料的涂层和多个低折射率电介质的涂层。当光学钥匙设置在锁定室内时，光源可以将参考光透射到多层光子结构。光检测器可以接收来自多层光子结构的交互光，并且可以将唯一的强度分布传送到电子控制单元，该电子控制单元可以执行机器可读指令，以将独特的强度分布与电子主机进行比较; 并且当独特强度分布对应于电子主机时，使锁定致动器从第一状态转变到第二状态。

2. 发明授权

US08861087B2 Multi-layer photonic structures having omni-directional reflectivity and coatings incorporating the same 有权
标题翻译：具有全向反射率的多层光子结构和包含其的涂层
公开(公告)号：US08861087B2
公开(公告)日：2014-10-14
申请号：US12389221
申请日：2009-02-19
申请人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
发明人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
IPC分类号： G02B1/10 , G02B5/28 , G02B5/08 , G02B5/26
CPC分类号： G02B5/0825 , G02B1/115 , G02B5/0833 , G02B5/26 , G02B5/28 , G02B13/14 , G02B13/143 , Y10T428/24942
摘要： A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ≧1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.
摘要翻译：多层光子结构可以包括具有[H（LH）N]形式的高折射率材料和低折射率材料的交替层，其中H是高折射率材料层，L是低折射率材料层，N是多层高指数材料和低折射率材料层。 N可以是≧1的整数。低折射率介电材料可以具有约1.3至约2.5的折射率nL。高折射率介电材料可以具有约1.8至约3.5的折射率nH，其中对于具有大约0度的入射角的光，nH> nL和多层光子结构包括大于约200nm的反射带到大约80度相对于多层光子结构。多层光子结构可以结合到涂料或涂料体系中，从而形成全向反射涂料或涂料。

3. 发明申请

US20100209593A1 Methods For Producing Omni-Directional Multi-Layer Photonic Structures 有权
标题翻译：用于生产全向多层光子结构的方法
公开(公告)号：US20100209593A1
公开(公告)日：2010-08-19
申请号：US12389256
申请日：2009-02-19
申请人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
发明人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
IPC分类号： B05D5/06
CPC分类号： G02B5/0825 , G02B27/0012
摘要： A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.
摘要翻译：一种制备具有至少一组高折射率材料和低折射率材料的交替层的多层光子结构的方法可以包括：确定多层光子结构的特性属性函数，确定至少基于特征属性函数与目标轮廓的比较，一组交替层，用所确定的厚度乘数调整特性属性函数，以及将经调整的特性属性函数与目标轮廓进行比较，其中当调节特征特性函数不近似目标分布，至少一组另外的层被添加到多层光子结构。

4. 发明申请

US20090153953A1 Multi-Layer Photonic Structures Having Omni-Directional Reflectivity and Coatings Incorporating The Same 有权
标题翻译：具有全向反射率的多层光子结构和包含其的涂层
公开(公告)号：US20090153953A1
公开(公告)日：2009-06-18
申请号：US12389221
申请日：2009-02-19
申请人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
发明人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
IPC分类号： G02B5/00 , B32B7/02
CPC分类号： G02B5/0825 , G02B1/115 , G02B5/0833 , G02B5/26 , G02B5/28 , G02B13/14 , G02B13/143 , Y10T428/24942
摘要： A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ≧1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.
摘要翻译：多层光子结构可以包括具有[H（LH）N]形式的高折射率材料和低折射率材料的交替层，其中H是高折射率材料层，L是低折射率材料层，N是多层高指数材料和低折射率材料层。 N可以是整数> = 1。低折射率介电材料可以具有约1.3至约2.5的折射率nL。高折射率介电材料可以具有约1.8至约3.5的折射率nH，其中对于具有大约0度的入射角的光，nH> nL和多层光子结构包括大于约200nm的反射带到大约80度相对于多层光子结构。多层光子结构可以结合到涂料或涂料体系中，从而形成全向反射涂料或涂料。

5. 发明申请

US20140055848A9 OMNIDIRECTIONAL REFLECTOR 有权
公开(公告)号：US20140055848A9
公开(公告)日：2014-02-27
申请号：US12793772
申请日：2010-06-04
申请人： Benjamin Alan Grayson , Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
发明人： Benjamin Alan Grayson , Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
IPC分类号： F21V9/06
CPC分类号： G02B1/005 , G02B5/0825
摘要： An omnidirectional reflector that reflects a band of electromagnetic radiation of less than 100 nanometers when viewed from angles between 0 and 45 degrees is provided. The omnidirectional reflector includes a multilayer stack having a plurality of layers of high index of refraction material and a plurality of layers of low index of refraction material. In addition, the plurality of high index of refraction material layers and low index of refraction material layers are alternately stacked on top of or across each other and provide a non-periodic layered structure.
摘要翻译：提供了从0度到45度之间的角度观察时，反射小于100纳米的电磁辐射带的全向反射器。全向反射器包括具有多层高折射率材料和多层低折射率材料层的多层叠层。此外，多个高折射率材料层和低折射率材料层折射交替堆叠在彼此的顶部或彼此之间，并提供非周期性分层结构。

6. 发明授权

US08329247B2 Methods for producing omni-directional multi-layer photonic structures 有权
标题翻译：生产全向多层光子结构的方法
公开(公告)号：US08329247B2
公开(公告)日：2012-12-11
申请号：US12389256
申请日：2009-02-19
申请人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
发明人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
IPC分类号： B05D5/06
CPC分类号： G02B5/0825 , G02B27/0012
摘要： A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.
摘要翻译：一种制备具有至少一组高折射率材料和低折射率材料的交替层的多层光子结构的方法可以包括：确定多层光子结构的特性属性函数，确定至少基于特征属性函数与目标轮廓的比较，一组交替层，用所确定的厚度乘数调整特性属性函数，以及将经调整的特性属性函数与目标轮廓进行比较，其中当调节特征特性函数不近似目标分布，至少一组另外的层被添加到多层光子结构。

7. 发明授权

US08736959B2 Omnidirectional reflector 有权
标题翻译：全向反射器
公开(公告)号：US08736959B2
公开(公告)日：2014-05-27
申请号：US12793772
申请日：2010-06-04
申请人： Benjamin Alan Grayson , Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
发明人： Benjamin Alan Grayson , Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
IPC分类号： G02B1/10
CPC分类号： G02B1/005 , G02B5/0825
摘要： An omnidirectional reflector that reflects a band of electromagnetic radiation of less than 100 nanometers when viewed from angles between 0 and 45 degrees is provided. The omnidirectional reflector includes a multilayer stack having a plurality of layers of high index of refraction material and a plurality of layers of low index of refraction material. In addition, the plurality of high index of refraction material layers and low index of refraction material layers are alternately stacked on top of or across each other and provide a non-periodic layered structure.
摘要翻译：提供了从0度到45度之间的角度观察时，反射小于100纳米的电磁辐射带的全向反射器。全向反射器包括具有多层高折射率材料和多层低折射率材料层的多层叠层。此外，多个高折射率材料层和低折射率材料层折射交替堆叠在彼此的顶部或彼此之间，并提供非周期性分层结构。

8. 发明申请

US20110299154A1 OMNIDIRECTIONAL REFLECTOR 有权
公开(公告)号：US20110299154A1
公开(公告)日：2011-12-08
申请号：US12793772
申请日：2010-06-04
申请人： Benjamin Alan Grayson , Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
发明人： Benjamin Alan Grayson , Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
IPC分类号： F21V9/06
CPC分类号： G02B1/005 , G02B5/0825
摘要： An omnidirectional reflector that reflects a band of electromagnetic radiation of less than 100 nanometers when viewed from angles between 0 and 45 degrees is provided. The omnidirectional reflector includes a multilayer stack having a plurality of layers of high index of refraction material and a plurality of layers of low index of refraction material. In addition, the plurality of high index of refraction material layers and low index of refraction material layers are alternately stacked on top of or across each other and provide a non-periodic layered structure.
摘要翻译：提供了从0度到45度之间的角度观察时，反射小于100纳米的电磁辐射带的全向反射器。全向反射器包括具有多层高折射率材料和多层低折射率材料层的多层叠层。此外，多个高折射率材料层和低折射率材料层折射交替堆叠在彼此的顶部或彼此之间，并提供非周期性分层结构。

9. 发明申请

US20100208338A1 Multilayer Photonic Structures 有权
标题翻译：多层光子结构
公开(公告)号：US20100208338A1
公开(公告)日：2010-08-19
申请号：US12686861
申请日：2010-01-13
申请人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
发明人： Debasish Banerjee , Benjamin Alan Grayson , Minjuan Zhang , Masahiko Ishii
IPC分类号： G02B5/28
CPC分类号： G02B5/208 , G02B5/281 , G02B5/283 , G02B5/285
摘要： A multilayer photonic structure may include a plurality of coating layers of high index dielectric material of index of refraction nH and a plurality of coating layers of low index dielectric material of index of refraction nL alternately arranged with a first coating layer and a last coating layer of the multi-layer photonic structure comprise low index material. An index-thickness of each coating layer of the multilayer photonic structure is different than every other coating layer of the multilayer photonic structure. The multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth.
摘要翻译：多层光子结构可以包括多个折射率nH的高折射率介电材料的涂层和多个折射率nL低折射率介电材料的涂层，其交替地布置有第一涂层和最后的涂层多层光子结构包括低折射率材料。多层光子结构的每个涂层的折射率厚度与多层光子结构的每个其它涂层不同。多层光子结构具有第一高反射率带宽，第二高反射率带宽和低反射率带宽，其中低反射率带宽位于第一高反射率带宽和第二高反射率带宽之间。

10. 发明授权

US10067265B2 Semi-transparent reflectors 有权
公开(公告)号：US10067265B2
公开(公告)日：2018-09-04
申请号：US12902763
申请日：2010-10-12
申请人： Benjamin Alan Grayson , Debasish Banerjee , Masahiko Ishii
发明人： Benjamin Alan Grayson , Debasish Banerjee , Masahiko Ishii
IPC分类号： G02B5/10 , G02B1/00 , G02B5/08 , G02B1/10
CPC分类号： G02B1/005 , G02B1/10 , G02B5/0825 , G02B5/0833
摘要： In one embodiment, a semi-transparent reflector may include a multilayered photonic structure. The multilayered photonic structure includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric material. The plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material of the multilayered photonic structure are arranged in an [LH . . . (LH)N . . . L] structure. L is one of the plurality of coating layers of low index dielectric material. H is one of the plurality of coating layers of high index dielectric material. N is a positive integer. The multilayered photonic structure has substantially constant reflectance values for wavelengths of electromagnetic radiation in a visible spectrum over a range of angles of incidence of the electromagnetic radiation.

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