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    • 2. 发明授权
    • Liquid surface control with an applied pressure signal in acoustic ink
printing
    • 液压表面控制与应用压力信号在声学印刷中的应用
    • US5229793A
    • 1993-07-20
    • US634248
    • 1990-12-26
    • Babur B. HadimiogluCalvin F. QuateButrus T. Khuri-Yakub
    • Babur B. HadimiogluCalvin F. QuateButrus T. Khuri-Yakub
    • B41J2/015B41J2/14
    • B41J2/14008B41J2002/14322
    • This invention is an acoustic ink printer. It has a pool of ink (33) with a free surface (36). Underneath the ink is a print head (10) which has droplet ejectors (14) for irradiating the free surface (36) of the pool of ink (33) with focused acoustic radiation (44). Over the free surface (36) of the pool of ink (33) is a membrane (16), with one or more apertures (20) aligned with the droplet ejectors (14), in intimate contact with the free surface (36) of the pool of ink (33). The apertures 20 are substantially larger than the waist diameter (46) of the focused acoustic radiation (44). An external pressure source (50) maintains the meniscus (48) of the pool of ink (33) substantially in the focal plane (52) of the focused acoustic radiation (44) during operation of the droplet ejectors (14). A piezoelectric crystal (24) is in intimate contact with the pool of ink (33). An electrical signal source (32) energizes the piezoelectric crystal (24) in order to apply a pressure signal (54) on demand to the pool of ink (33) during operation of the droplet ejectors (14). The different pressure signals (54) resulting from application of different electrical signals (29) to the piezoelectric crystal (24) can be utilized to eject individual droplets (38) of ink (33) from the free surface (34) of the ink (33) on demand, or to effect finer control over the free surface (34) of the ink (33) than is possible with the external pressure source (50) by itself.
    • 6. 发明授权
    • Near field acoustic ultrasonic microscope system and method
    • 近场声超声显微镜系统及方法
    • US5319977A
    • 1994-06-14
    • US718234
    • 1991-06-20
    • Calvin F. QuateButrus T. Khuri-YakubShinya AkamineBabur B. Hadimioglu
    • Calvin F. QuateButrus T. Khuri-YakubShinya AkamineBabur B. Hadimioglu
    • G01B17/00G01N29/06G01N29/24G01N37/00G01Q10/00G01Q20/00G01Q60/04G01Q60/06G01Q60/22G01S15/89G01N29/08
    • G01N29/0681G01H3/125G01Q60/32G01S15/8945G01N2291/02827G01N2291/048Y10S977/86
    • An acoustic microscope assembly for atomic level inspection of a target object includes a cantilever arm with a sharp tip on its lower surface and a zinc oxide piezoelectric thin film on its upper surface. High frequency excitation signals, having a frequency of at least 50 Megahertz, are applied to the piezoelectric thin film so as to generate high frequency acoustic signals that are transmitted through the sharp tip so as to impact on a target object. The assembly can either receive acoustic signals reflected by the target object, or it can receive acoustic signals that have propagated through the target object. One method of using this assembly is to apply a continuous wave signal to the piezoelectric thin film while scanning the target object, and measuring characteristics of the target object at various positions thereof by measuring the resonant frequency of the transmitted high frequency acoustic signals. Other methods include pulsed operation, and combining acoustic measurements with atomic force measurements and/or tunneling current measurements to characterize a target object. The acoustic microscope assembly can also be used for storing information on a substrate, by deforming the substrate at selected positions, and for reading such stored information by determining which positions on a substrate have been deformed.
    • 用于目标物体的原子级检查的声学显微镜组件包括在其下表面具有尖锐尖端的悬臂和在其上表面上的氧化锌压电薄膜。 将具有至少50兆赫兹频率的高频激励信号施加到压电薄膜上,以便产生通过尖尖传输以便对目标物体产生影响的高频声信号。 组件可以接收由目标对象反射的声信号,或者它可以接收已传播通过目标对象的声信号。 使用该组件的一种方法是在扫描目标物体的同时向压电薄膜施加连续波信号,并且通过测量发射的高频声信号的谐振频率来测量其各个位置处的目标物体的特性。 其他方法包括脉冲操作,以及将声学测量与原子力测量和/或隧道电流测量结合以表征目标对象。 声学显微镜组件还可以用于在基板上存储信息,通过使基板在选定位置变形,并且通过确定基板上的哪些位置已经变形来读取这些存储的信息。
    • 9. 发明授权
    • Techniques for improving droplet uniformity in acoustic ink printing
    • 提高声墨印刷液滴均匀性的技术
    • US5389956A
    • 1995-02-14
    • US931804
    • 1992-08-18
    • Babur B. HadimiogluButrus T. Khuri-YakubRichard L. WeisfieldEric G. Rawson
    • Babur B. HadimiogluButrus T. Khuri-YakubRichard L. WeisfieldEric G. Rawson
    • B41J2/015B41J2/14B41J2/04
    • B41J2/14008
    • Techniques for improving droplet uniformity in acoustic ink printing. Row to row variations in an average droplet characteristic are reduced by controlling the electric power applied to the droplet ejectors of the individual rows. By applying the proper power to each row, the average droplet characteristic from the individual rows are made substantially. Another technique varies the efficiency of the individual droplet ejectors by physically trimming (such as with a laser) one or more of its components. Trimming may be performed on a droplet ejector's transducer, varactor, one or more associated resistors, or one or more capacitors. Yet another technique controls droplet ejector efficiency by electrically controlling the capacitance of a varactor associated with each droplet ejector, and thus each droplet ejector's efficiency. The voltage applied to each varactor may be controlled as a function of its column (to improve column to column uniformity), row (to improve row to row uniformity) or as a function of its column and row (to control the efficiency of the individual droplet ejector).
    • 提高声墨印刷液滴均匀性的技术。 通过控制施加到各行的液滴喷射器的电力来减小平均液滴特性中的行排列变化。 通过对每行施加适当的功率,基本上实现来自各行的平均液滴特性。 另一种技术通过物理地修整(例如用激光)其一个或多个组件来改变各个液滴喷射器的效率。 可以在液滴喷射器的换能器,变容二极管,一个或多个相关联的电阻器或一个或多个电容器上执行修整。 另一种技术通过电控制与每个液滴喷射器相关联的变容二极管的电容以及因此每个液滴喷射器的效率来控制液滴喷射器的效率。 施加到每个变容二极管的电压可以作为其列的函数来控制(以提高列到列的均匀性),行(以提高行到行均匀性)或者作为其列和行的函数(以控制个体的效率 液滴喷射器)。
    • 10. 发明授权
    • Process for manufacturing liquid level control structure
    • 液位控制结构制造工艺
    • US5277754A
    • 1994-01-11
    • US978848
    • 1992-11-19
    • Babur B. HadimiogluButrus T. Khuri-Yakub
    • Babur B. HadimiogluButrus T. Khuri-Yakub
    • B41J2/015B41J2/14B41J2/16H01L21/306B44C1/22C03C15/00C03C25/06
    • B41J2/1631B41J2/14008B41J2/1607B41J2/1626B41J2/1632B41J2002/14387
    • A liquid level control structure and a method for its production. The controller is comprised of a plate having substantially flat top and bottom surfaces and an hourglass-shaped aperture containing a marking fluid. Protruding a known amount and at a known angle from opposite sides of the aperture waist are knife-edged lips that interact with the fluid's surface tension to control the location of an unbounded surface of the fluid.The method for producing the liquid level control structure uses semiconductor fabrication techniques. The aperture is formed in a semiconductor wafer using several etching steps, some of which act along the crystalline planes of the wafer. The lips are formed from etch stop layers deposited between etching steps, while the knife-edges are formed on the ends of the lips during an etching step. Beneficially, the location of the knife-edges relative to one surface of the wafer is independent of small variations in the thickness of the water.
    • 液位控制结构及其生产方法。 控制器由具有基本上平坦的顶部和底部表面的板和包含标记流体的沙漏形孔组成。 从孔径腰部的相对侧突出已知的量并以已知的角度突出的是刀刃边缘,其与流体的表面张力相互作用以控制流体的无界表面的位置。 液位控制结构的制造方法采用半导体制造技术。 利用若干蚀刻步骤在半导体晶片中形成孔,其中一些蚀刻步骤沿着晶片的晶面起作用。 唇缘由在蚀刻步骤之间沉积的蚀刻停止层形成,而在蚀刻步骤期间刀刃形成在唇缘的端部上。 有利的是,刀刃相对于晶片的一个表面的位置是独立于水的厚度的小的变化。