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1. 发明申请

US20060187430A1 Microlithographic projection exposure apparatus 有权
公开(公告)号：US20060187430A1
公开(公告)日：2006-08-24
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

2. 发明授权

US07570343B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07570343B2
公开(公告)日：2009-08-04
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜在投影透镜的图像平面中。投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。

3. 发明授权

US07532306B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07532306B2
公开(公告)日：2009-05-12
申请号：US10917371
申请日：2004-08-13
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12）能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光敏感层。

4. 发明申请

US20100045952A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：US20100045952A1
公开(公告)日：2010-02-25
申请号：US12611999
申请日：2009-11-04
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G03B27/42 , G03B27/54
摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12）能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光敏感层。

5. 发明申请

US20080316452A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：US20080316452A1
公开(公告)日：2008-12-25
申请号：US12199998
申请日：2008-08-28
申请人： Aurelian Dodoc , Karl-Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Karl-Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G03G15/08
摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12）能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光敏感层。

6. 发明申请

US20080174858A1 PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
标题翻译：投影目标的图像
公开(公告)号：US20080174858A1
公开(公告)日：2008-07-24
申请号：US12014496
申请日：2008-01-15
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B27/18
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

7. 发明申请

US20110026110A1 PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
标题翻译：投影目标的图像
公开(公告)号：US20110026110A1
公开(公告)日：2011-02-03
申请号：US12899297
申请日：2010-10-06
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B3/00
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

8. 发明授权

US08068276B2 Projection objective for lithography 有权
标题翻译：光刻投影目标
公开(公告)号：US08068276B2
公开(公告)日：2011-11-29
申请号：US12899297
申请日：2010-10-06
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

9. 发明授权

US07835073B2 Projection objective for lithography 有权
标题翻译：光刻投影目标
公开(公告)号：US07835073B2
公开(公告)日：2010-11-16
申请号：US12014496
申请日：2008-01-15
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

10. 发明授权

US07969663B2 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US07969663B2
公开(公告)日：2011-06-28
申请号：US12819861
申请日：2010-06-21
申请人： Aurelian Dodoc , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G02B9/60
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译：适用于浸没微光刻的投影物镜被设计为具有五个透镜组的单腰系统，并且具有负折光力的第一透镜组，正屈光力的第二透镜组，负折射光焦度的第三透镜组，正屈光力的第四透镜组和正屈光力的第五透镜组。第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。

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