专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080073526A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20080073526A1
公开(公告)日：2008-03-27
申请号：US11699065
申请日：2007-01-29
申请人： Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
摘要翻译：一种带电粒子束装置，用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息，测量从样本和比较与不平坦表面的边缘部分相对应的轮廓波形。

2. 发明授权

US07652249B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US07652249B2
公开(公告)日：2010-01-26
申请号：US11699065
申请日：2007-01-29
申请人： Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/225 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
摘要翻译：一种带电粒子束装置，用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息，测量从样本和比较与不平坦表面的边缘部分相对应的轮廓波形。

3. 发明授权

US08263935B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08263935B2
公开(公告)日：2012-09-11
申请号：US12651209
申请日：2009-12-31
申请人： Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/225 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
摘要翻译：一种带电粒子束装置，用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息，测量从样本和比较与不平坦表面的边缘部分相对应的轮廓波形。

4. 发明授权

US07235782B2 Semiconductor inspection system 有权
标题翻译：半导体检测系统
公开(公告)号：US07235782B2
公开(公告)日：2007-06-26
申请号：US10082286
申请日：2002-02-26
申请人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
发明人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
IPC分类号： H01J37/28
CPC分类号： H01J37/28
摘要： An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.
摘要翻译：实现了高吞吐量的无操作员和全自动半导体检测系统。捕获和检查所需的所有条件都是从CAD数据等设计信息生成的。为了在条件下进行实际检查，半导体检查系统由用于从设计信息产生捕获和检查所需的所有条件的导航系统和用于实际执行捕获和检查的扫描电子显微镜系统组成。此外，在进行设计数据和SEM图像之间的匹配处理的情况下，通过使用根据多个方向的边缘信息和平滑来校正变形部分。此外，将与检测位置对应的SEM图像重新登记为模板，由此进行匹配处理。

5. 发明授权

US07026615B2 Semiconductor inspection system 有权
公开(公告)号：US07026615B2
公开(公告)日：2006-04-11
申请号：US10365383
申请日：2003-02-13
申请人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
发明人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
IPC分类号： G21K7/00
CPC分类号： H01J37/28
摘要： An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.

6. 发明申请

US20070194236A1 Semiconductor inspection system 审中-公开
公开(公告)号：US20070194236A1
公开(公告)日：2007-08-23
申请号：US11790224
申请日：2007-04-24
申请人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
发明人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
IPC分类号： G21K7/00
CPC分类号： H01J37/28
摘要： An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.

7. 发明授权

US07166840B2 Method for determining depression/protrusion of sample and charged particle beam apparatus therefor 有权
标题翻译：用于确定样品和带电粒子束装置的凹陷/突起的方法
公开(公告)号：US07166840B2
公开(公告)日：2007-01-23
申请号：US11056191
申请日：2005-02-14
申请人： Atsushi Takane , Satoru Yamaguchi , Osamu Komuro , Yasuhiko Ozawa , Hideo Todokoro
发明人： Atsushi Takane , Satoru Yamaguchi , Osamu Komuro , Yasuhiko Ozawa , Hideo Todokoro
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J2237/2815
摘要： A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being inclined to the original optical axis of the charged particle beam or a sample stage is inclined, broadening of a detected signal in a line scanning direction of the charged particle beam is measured, the broadening is compared with that when the charged particle beam is scanned with its direction being parallel to the original optical axis of the charged particle beam, and a depression/protrusion of the scanned portion is determined on the basis of increase/decrease of the broadening.
摘要翻译：用于确定凹陷/突起的方法，特别是用于形成在样本上的线和空间图案及其装置。扫描带电粒子束的方向与带电粒子束的原始光轴倾斜，或者样品台倾斜，测量带电粒子束的扫描方向上的检测信号的变宽，比较加宽其中当带电粒子束的扫描方向平行于带电粒子束的原始光轴时，并且基于增宽的增加/减小来确定扫描部分的凹陷/突起。

8. 发明申请

US20100006755A1 CHARGED PARTICLE BEAM ALIGNMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS 审中-公开
标题翻译：充电颗粒光束对准方法和充电颗粒光束装置
公开(公告)号：US20100006755A1
公开(公告)日：2010-01-14
申请号：US12564511
申请日：2009-09-22
申请人： Mitsugo Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Mitsugo Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： G01N23/22
CPC分类号： H01J37/1471 , H01J37/28 , H01J2237/1501 , H01J2237/153
摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.
摘要翻译：本发明的目的是提供一种带电粒子束装置和带电粒子束装置的对准方法，即使当带电粒子束的状态发生变化时，也能够容易地使带电粒子束的光轴对准。本发明包括用于计算对物镜执行轴对准的对准偏转器的偏转量的计算装置，用于计算偏转量的多种计算方法被存储在计算装置中，以及选择装置，用于至少选择提供了一种计算方法。

9. 发明申请

US20050151078A1 Method for determining depression/protrusion of sample and charged particle beam apparatus therefor 有权
标题翻译：用于确定样品和带电粒子束装置的凹陷/突起的方法
公开(公告)号：US20050151078A1
公开(公告)日：2005-07-14
申请号：US11056191
申请日：2005-02-14
申请人： Atsushi Takane , Satoru Yamaguchi , Osamu Komuro , Yasuhiko Ozawa , Hideo Todokoro
发明人： Atsushi Takane , Satoru Yamaguchi , Osamu Komuro , Yasuhiko Ozawa , Hideo Todokoro
IPC分类号： G01B15/04 , G01B15/08 , H01J37/28 , H01L21/66 , G01N23/00
CPC分类号： H01J37/28 , H01J2237/2815
摘要： A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being inclined to the original optical axis of the charged particle beam or a sample stage is inclined, broadening of a detected signal in a line scanning direction of the charged particle beam is measured, the broadening is compared with that when the charged particle beam is scanned with its direction being parallel to the original optical axis of the charged particle beam, and a depression/protrusion of the scanned portion is determined on the basis of increase/decrease of the broadening.
摘要翻译：用于确定凹陷/突起的方法，特别是用于形成在样本上的线和空间图案及其装置。扫描带电粒子束的方向与带电粒子束的原始光轴倾斜，或者样品台倾斜，测量带电粒子束的扫描方向上的检测信号的变宽，比较加宽其中当带电粒子束的扫描方向平行于带电粒子束的原始光轴时，并且基于增宽的增加/减小来确定扫描部分的凹陷/突起。

10. 发明授权

US07605381B2 Charged particle beam alignment method and charged particle beam apparatus 有权
公开(公告)号：US07605381B2
公开(公告)日：2009-10-20
申请号：US10734261
申请日：2003-12-15
申请人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： H01L21/027
CPC分类号： H01J37/1471 , H01J37/28 , H01J2237/1501 , H01J2237/153
摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式