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1. 发明授权

US06605227B2 Method of manufacturing a ridge-shaped three dimensional waveguide 失效
标题翻译：制造脊形三维波导的方法
公开(公告)号：US06605227B2
公开(公告)日：2003-08-12
申请号：US09425940
申请日：1999-10-25
申请人： Ayako Yoshida , Atsushi Onoe , Kiyofumi Chikuma
发明人： Ayako Yoshida , Atsushi Onoe , Kiyofumi Chikuma
IPC分类号： C30B3300
CPC分类号： C04B35/495 , C04B2235/3201 , C04B2235/3203 , C04B2235/3241 , C04B2235/3251 , G02B6/136 , G02B2006/12176 , G02F1/377 , Y10S117/918
摘要： A method of manufacturing a ridge-shaped 3-dimensional waveguide, has the steps of: forming a crystal film made of a second ferroelectric oxide non-linear crystal having a refractive index higher than that of a substrate made of a first ferroelectric oxide non-linear crystal on the substrate; forming a metal film on the crystal film; forming a mask by etching the metal film; and forming a ridge portion by selectively removing the crystal film through the mask by a dry etching method.
摘要翻译：制造脊状三维波导的方法具有以下步骤：形成由第二铁电氧化物非线性晶体构成的晶体膜，该第二铁电氧化物非线性晶体的折射率高于由第一铁电氧化物非线性晶体构成的衬底的折射率，衬底上的直线晶体; 在晶体膜上形成金属膜; 通过蚀刻金属膜形成掩模; 并通过干蚀刻方法通过掩模选择性地除去晶体膜而形成脊部。

2. 发明授权

US06510597B2 Surface acoustic wave device and method of manufacturing the same 失效
公开(公告)号：US06510597B2
公开(公告)日：2003-01-28
申请号：US10043177
申请日：2002-01-14
申请人： Ayako Yoshida , Atsushi Onoe , Kiyofumi Chikuma
发明人： Ayako Yoshida , Atsushi Onoe , Kiyofumi Chikuma
IPC分类号： H04R1700
CPC分类号： H03H9/02574 , H03H3/08 , Y10T29/42
摘要： A surface acoustic wave device includes a crystalline substrate with a structure selected from the group consisting of the perovskite structure, the spinel structure, and the rock salt structure. The device also includes a thin piezoelectric crystalline film having the perovskite structure and deposited on the crystalline substrate by chemical vapor deposition, and an electrode means for generating a surface acoustic wave on the thin piezoelectric crystalline film. In the device, a surface of the crystalline substrate on which the thin piezoelectric crystalline film is deposited is a mirror surface inclined at an offset angle &thgr; from the (001) plane of the crystalline substrate, and the electrode means have electrode fingers arranged in parallel to each other so that a surface acoustic wave propagates along one direction of crystalline axes of the thin piezoelectric crystalline film.

3. 发明授权

US06348754B1 Surface acoustic wave device and method of manufacturing the same 失效
标题翻译：表面声波装置及其制造方法
公开(公告)号：US06348754B1
公开(公告)日：2002-02-19
申请号：US09606170
申请日：2000-06-29
申请人： Ayako Yoshida , Atsushi Onoe , Kiyofumi Chikuma
发明人： Ayako Yoshida , Atsushi Onoe , Kiyofumi Chikuma
IPC分类号： H03H308
CPC分类号： H03H9/02574 , H03H3/08 , Y10T29/42
摘要： A surface acoustic wave device includes a crystalline substrate with a structure selected from the group consisting of the perovskite structure, the spinel structure, and the rock salt structure. The device also includes a thin piezoelectric crystalline film having the perovskite structure and deposited on the crystalline substrate by chemical vapor deposition, and an electrode means for generating a surface acoustic wave on the thin piezoelectric crystalline film. In the device, a surface of the crystalline substrate on which the thin piezoelectric crystalline film is deposited is a mirror surface inclined at an offset angle &thgr; from the (001) plane of the crystalline substrate, and the electrode means have electrode fingers arranged in parallel to each other so that a surface acoustic wave propagates along one direction of crystalline axes of the thin piezoelectric crystalline film.
摘要翻译：表面声波装置包括具有选自钙钛矿结构，尖晶石结构和岩盐结构的结构的结晶基板。该器件还包括具有钙钛矿结构并通过化学气相沉积沉积在晶体衬底上的薄压电晶体膜，以及用于在薄压电晶体膜上产生表面声波的电极装置。在该器件中，其上沉积有薄压电晶体膜的晶体衬底的表面是与晶体衬底的（001）平面倾斜偏离角度θ的反射镜表面，并且电极装置具有并联布置的电极指使得表面声波沿着薄压电晶体膜的晶轴的一个方向传播。

4. 发明授权

US06204957B1 Second harmonic wave-generating element 失效
标题翻译：二次谐波发生元件
公开(公告)号：US06204957B1
公开(公告)日：2001-03-20
申请号：US09307525
申请日：1999-05-07
申请人： Takashi Yoshino , Katsuhiro Imai , Minoru Imaeda , Kiyofumi Chikuma , Atsushi Onoe , Ayako Yoshida
发明人： Takashi Yoshino , Katsuhiro Imai , Minoru Imaeda , Kiyofumi Chikuma , Atsushi Onoe , Ayako Yoshida
IPC分类号： G02F137
CPC分类号： G02F1/377 , G02F2001/3546 , G02F2201/307
摘要： A second harmonic wave-generating element for generating a second harmonic wave from a fundamental wave, having an optical waveguide layer made of first epitaxial material having a fundamental composition of K3Li2−x(Nb1−YTaY)5+XO15+Z, an underclad part made of second epitaxial material having a fundamental composition of K3Li2−X+A(Nb1−Y−BTaY+B)5+X−AO15+Z, an overclad part made of third epitaxial material having a fundamental composition of K3Li2−X+C(Nb1−Y−DTaY+D)5+X−CO15+Z and formed on and contacting the optical waveguide layer, wherein X=0.006 to 0.5, Y=0.00 to 0.05, A=0.006 to 0.12, B=0.005 to 0.5, C=0.006 to 0.12, D=0.005 to 0.5, X−A≦0, X−C≧0, |A−C|≦0.006, and |B−D|≦0.005).
摘要翻译：一种用于从基波产生二次谐波的二次谐波发生元件，具有由具有K3Li2-x（Nb1-YTaY）5 + XO15 + Z的基本组成的第一外延材料制成的光波导层，下部部分由具有K3Li2-X + A（Nb1-Y-BTaY + B）5 + X-AO15 + Z的基本组成的第二外延材料制成，由具有K 3 Li 2 -X + C的基本组成的第三外延材料制成的外包层（Nb1-Y-DTaY + D）5 + X-CO15 + Z，形成在光波导层上并与光波导层接触，其中X = 0.006〜0.5，Y = 0.00〜0.05，A = 0.006〜0.12，B = 0.005〜0.5 ，C = 0.006〜0.12，D = 0.005〜0.5，XA <= 0，XC> = 0，| AC |≤0.006，| BD |≤0.005）。

5. 发明授权

US6163397A Wavelength converting device and method of fabricating wavelength converting device 失效
标题翻译：波长转换装置及制造波长转换装置的方法
公开(公告)号：US6163397A
公开(公告)日：2000-12-19
申请号：US271914
申请日：1999-03-18
申请人： Atsushi Onoe , Ayako Yoshida , Kiyofumi Chikuma
发明人： Atsushi Onoe , Ayako Yoshida , Kiyofumi Chikuma
IPC分类号： G02F1/37 , G02F1/35 , G02F1/355 , G02F1/365 , G02F1/377
CPC分类号： G02F1/3551 , G02F1/365 , G02F1/377 , G02F2001/3546
摘要： A wavelength converting device for converting a wavelength of a light is provided. The wavelength converting device includes: a substrate comprising MgO; a waveguide membrane comprising KNbO.sub.3, for guiding the light; a buffer membrane which is disposed between the substrate and the waveguide membrane and which comprises KTa.sub.x Nb.sub.(1-x) O.sub.3. A mixing rate of Ta in the KTa.sub.x Nb.sub.(1-x) O.sub.3 in the buffer membrane is in a range of 40 atom % to 60 atom % at a surface of the buffer membrane touching the substrate, and is 0 atom % at a surface of the buffer membrane touching the waveguide membrane.
摘要翻译：提供了用于转换光的波长的波长转换装置。波长转换装置包括：包含MgO的基板; 包括用于引导光的KNbO 3的波导膜; 缓冲膜，其设置在基板和波导膜之间，并且包括KTaxNb（1-x）O 3。缓冲膜中的KTaxNb（1-x）O 3中的Ta的混合比在缓冲膜的与基材接触的表面处为40原子％〜60原子％的范围，并且在表面为0原子％缓冲膜接触波导膜。

6. 发明授权

US6149975A Potassium-containing thin film and process for producing the same 失效
标题翻译：含钾薄膜及其制造方法
公开(公告)号：US6149975A
公开(公告)日：2000-11-21
申请号：US265703
申请日：1999-03-10
申请人： Yuzo Tasaki , Mamoru Satoh , Atsushi Onoe , Ayako Yoshida , Kiyofumi Chikuma
发明人： Yuzo Tasaki , Mamoru Satoh , Atsushi Onoe , Ayako Yoshida , Kiyofumi Chikuma
IPC分类号： C30B29/30 , C23C16/40 , C23C16/448 , C30B25/02 , C30B25/00
CPC分类号： C23C16/4481 , C23C16/409 , C30B25/02 , C30B29/30
摘要： When a potassium-containing substance is formed in to a film using an organic potassium complex as a potassium source by the CVD method, it is prevented that the film formation rate is changed with the lapse of time, and the potassium content in the film thus formed is changed.As a potassium source for vaporization used for depositing the potassium-containing substance on a substrate by the CVD method, a .beta.-diketone complex of potassium that has been melted by heating to a temperature higher than its melting point and then cooled to be solidified is used.
摘要翻译：当使用有机钾络合物作为钾源通过CVD法形成含钾物质时，可以防止成膜速度随时间而改变，因此膜中的钾含量因此形成了改变。作为用于通过CVD法在基材上沉积含钾物质的钾源，通过加热至高于其熔点然后冷却固化的温度而熔化的钾的β-二酮配合物是用过的。

7. 发明授权

US06236494B1 Wavelength converting device and method of fabricating wavelength converting device 失效
标题翻译：波长转换装置及制造波长转换装置的方法
公开(公告)号：US06236494B1
公开(公告)日：2001-05-22
申请号：US09271913
申请日：1999-03-18
申请人： Atsushi Onoe , Kiyofumi Chikuma , Ayako Yoshida
发明人： Atsushi Onoe , Kiyofumi Chikuma , Ayako Yoshida
IPC分类号： G02F1365
CPC分类号： G02F1/377
摘要： A wavelength converting device for converting a wavelength of a light is provided. The wavelength control device including: a waveguide layer for guiding the light; a substrate having a lattice constant is different from a lattice constant of the waveguide layer; and a buffer layer which is disposed between the waveguide layer and the substrate and which has a lattice constant between the lattice constant of the waveguide layer and the lattice constant of the substrate.
摘要翻译：提供了用于转换光的波长的波长转换装置。该波长控制装置包括：用于引导光的波导层; 具有晶格常数的衬底与波导层的晶格常数不同; 以及缓冲层，其设置在所述波导层和所述基板之间，并且在所述波导层的晶格常数与所述基板的晶格常数之间具有格子常数。

8. 发明授权

US06270839B1 Device for feeding raw material for chemical vapor phase deposition and method therefor 有权
标题翻译：用于进行化学气相沉积原料的装置及其方法
公开(公告)号：US06270839B1
公开(公告)日：2001-08-07
申请号：US09621739
申请日：2000-07-21
申请人： Atsushi Onoe , Ayako Yoshida , Kiyofumi Chikuma
发明人： Atsushi Onoe , Ayako Yoshida , Kiyofumi Chikuma
IPC分类号： C23C1600
CPC分类号： C23C16/4481
摘要： A raw material feeding apparatus is provided for a film-forming apparatus in which a thin film is formed from a solid matter as a raw material during chemical vapor-phase deposition. The apparatus includes sub-containers each having an opening for introduction of a gas, an opening for discharge of a gas, a bottom, on which a solid raw material is spread between the inlet opening and the outlet opening, and a wall defining a gap, in which a gas being introduced and discharged is made to contact the solid raw material spread on the bottom while the gas is moved on the surfaces of the material. The apparatus also includes a raw material container for receiving and holding the sub-containers. The apparatus also includes a heating device for heating the raw material container, and carrier gas conveying tubes for introducing a carrier gas into the raw material container and including a passage communicated to the outlet openings of the sub-containers.
摘要翻译：本发明提供一种原料输送装置，用于在化学气相沉积期间以固体物质作为原料形成薄膜的成膜装置。该装置包括各自具有用于引入气体的开口，用于排出气体的开口，底部，其上固体原料在其上在入口和出口之间铺展的子容器，以及限定间隙的壁其中引入和排出的气体在气体在材料的表面上移动时与扩散在底部上的固体原料接触。该设备还包括用于接收和保持子容器的原料容器。该装置还包括用于加热原料容器的加热装置和用于将载气引入原料容器中的载气输送管，并且包括连通到子容器的出口的通道。

9. 发明授权

US5904771A Method of subliming material in CVD film preparation method 失效
标题翻译： CVD膜制备方法升华材料的方法
公开(公告)号：US5904771A
公开(公告)日：1999-05-18
申请号：US826626
申请日：1997-04-03
申请人： Yuzo Tasaki , Mamoru Sato , Shuji Yoshizawa , Atsushi Onoe , Kiyofumi Chikuma , Ayako Yoshida
发明人： Yuzo Tasaki , Mamoru Sato , Shuji Yoshizawa , Atsushi Onoe , Kiyofumi Chikuma , Ayako Yoshida
IPC分类号： C30B25/14 , C23C16/44 , C23C16/448 , C30B23/02 , C30B25/02 , C30B29/30 , H01L21/205 , H01L21/31 , C30B25/12
CPC分类号： C30B23/02 , C23C16/4481 , C30B23/002 , C30B25/02 , C30B29/30
摘要： A method of subliming material is provided for use in a CVD film preparation method wherein a CVD precursor is sublimed from its solid state by heating to a temperature not exceeding its melting point, thereby producing a vapor of the precursor, and the vapor of the precursor is transported to a reactor. The method of subliming material comprises the steps of forming the solid-state compound into a film, covering a back surface of the film with a non-reactive support and exposing a front surface of the film to an atmosphere as a sublimation surface. The method maintains the exposed surface area of the solid compound constant during processing.
摘要翻译：提供了一种升华材料的方法，用于CVD膜制备方法，其中通过加热至不超过其熔点的温度从而将CVD前体从其固态升华，从而产生前体的蒸气和前体的蒸气被运送到反应堆。升华材料的方法包括以下步骤：将固态化合物形成膜，用非反应性载体覆盖膜的后表面，并将膜的前表面暴露于作为升华表面的气氛。该方法在加工过程中保持固体化合物的暴露表面积恒定。

10. 发明授权

US09794520B2 Image capture device and method for recognizing irradiated position mark on object 有权
公开(公告)号：US09794520B2
公开(公告)日：2017-10-17
申请号：US14425275
申请日：2012-09-05
申请人： Kazuo Kuroda , Ayako Yoshida
发明人： Kazuo Kuroda , Ayako Yoshida
IPC分类号： H04N5/253 , H04N7/18 , H04N5/232 , G06K9/18 , G11B25/04 , H04N5/225 , H04N5/235 , H04N5/357 , G06K9/20 , G06K9/32 , H04N1/195
CPC分类号： H04N7/18 , G06K9/18 , G06K9/2018 , G06K9/3216 , G11B25/04 , H04N1/19594 , H04N5/2251 , H04N5/2252 , H04N5/2256 , H04N5/23296 , H04N5/2354 , H04N5/357 , H04N2201/00
摘要： A mark irradiation unit (130) irradiates an object with a mark. An image capture unit (140) captures an image of the object, and generates image data. Then, an image capture area data generation unit recognizes a position of the mark in the object, and cuts out image capture area data which is apart of the image data on the basis of the mark. For this reason, the mark irradiation unit (130) irradiates the object with the mark, and thus even when a positioning symbol is not printed on the object to be stored as the image data, only a necessary portion in the image data is cut out.

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