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    • 5. 发明授权
    • Surface acoustic wave device and method of manufacturing the same
    • 表面声波装置及其制造方法
    • US06348754B1
    • 2002-02-19
    • US09606170
    • 2000-06-29
    • Ayako YoshidaAtsushi OnoeKiyofumi Chikuma
    • Ayako YoshidaAtsushi OnoeKiyofumi Chikuma
    • H03H308
    • H03H9/02574H03H3/08Y10T29/42
    • A surface acoustic wave device includes a crystalline substrate with a structure selected from the group consisting of the perovskite structure, the spinel structure, and the rock salt structure. The device also includes a thin piezoelectric crystalline film having the perovskite structure and deposited on the crystalline substrate by chemical vapor deposition, and an electrode means for generating a surface acoustic wave on the thin piezoelectric crystalline film. In the device, a surface of the crystalline substrate on which the thin piezoelectric crystalline film is deposited is a mirror surface inclined at an offset angle &thgr; from the (001) plane of the crystalline substrate, and the electrode means have electrode fingers arranged in parallel to each other so that a surface acoustic wave propagates along one direction of crystalline axes of the thin piezoelectric crystalline film.
    • 表面声波装置包括具有选自钙钛矿结构,尖晶石结构和岩盐结构的结构的结晶基板。 该器件还包括具有钙钛矿结构并通过化学气相沉积沉积在晶体衬底上的薄压电晶体膜,以及用于在薄压电晶体膜上产生表面声波的电极装置。 在该器件中,其上沉积有薄压电晶体膜的晶体衬底的表面是与晶体衬底的(001)平面倾斜偏离角度θ的反射镜表面,并且电极装置具有并联布置的电极指 使得表面声波沿着薄压电晶体膜的晶轴的一个方向传播。
    • 7. 发明授权
    • Device for feeding raw material for chemical vapor phase deposition and method therefor
    • 用于进行化学气相沉积原料的装置及其方法
    • US06270839B1
    • 2001-08-07
    • US09621739
    • 2000-07-21
    • Atsushi OnoeAyako YoshidaKiyofumi Chikuma
    • Atsushi OnoeAyako YoshidaKiyofumi Chikuma
    • C23C1600
    • C23C16/4481
    • A raw material feeding apparatus is provided for a film-forming apparatus in which a thin film is formed from a solid matter as a raw material during chemical vapor-phase deposition. The apparatus includes sub-containers each having an opening for introduction of a gas, an opening for discharge of a gas, a bottom, on which a solid raw material is spread between the inlet opening and the outlet opening, and a wall defining a gap, in which a gas being introduced and discharged is made to contact the solid raw material spread on the bottom while the gas is moved on the surfaces of the material. The apparatus also includes a raw material container for receiving and holding the sub-containers. The apparatus also includes a heating device for heating the raw material container, and carrier gas conveying tubes for introducing a carrier gas into the raw material container and including a passage communicated to the outlet openings of the sub-containers.
    • 本发明提供一种原料输送装置,用于在化学气相沉积期间以固体物质作为原料形成薄膜的成膜装置。 该装置包括各自具有用于引入气体的开口,用于排出气体的开口,底部,其上固体原料在其上在入口和出口之间铺展的子容器,以及限定间隙的壁 其中引入和排出的气体在气体在材料的表面上移动时与扩散在底部上的固体原料接触。 该设备还包括用于接收和保持子容器的原料容器。 该装置还包括用于加热原料容器的加热装置和用于将载气引入原料容器中的载气输送管,并且包括连通到子容器的出口的通道。