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1. 发明申请

US20120255618A1 Method for Using Generator for Foam to Clean Substrate 有权
标题翻译：使用发生器泡沫清洗基材的方法
公开(公告)号：US20120255618A1
公开(公告)日：2012-10-11
申请号：US13445868
申请日：2012-04-12
申请人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Chen-Yu (Sean) Lin
发明人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Chen-Yu (Sean) Lin
IPC分类号： B01F5/04
CPC分类号： H01L21/67051 , B01F3/04446 , B01F5/0473 , B01F5/0475 , B01F5/0485 , B01F5/0656 , B01F5/0657 , Y10T137/0318
摘要： A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.
摘要翻译：用泡沫清洁基材的系统执行产生清洁泡沫的方法。在该方法的第一操作中，系统将流体泵送到预混合室中。预混合室是配合在系统中的阴壳体中的阳插头的部件。然后系统将气体注入到预混合室中以引发从流体产生泡沫。泡沫从预混合室流入密封的螺旋通道，该密封螺旋通道由阳螺栓的外表面上的螺旋形凹陷和阴壳体的内表面形成，以允许泡沫沿着密封的螺旋通道的长度达到期望的状态。在该方法的最后操作中，泡沫从螺旋通道的出口端通过公插头输出到系统的部件。

2. 发明授权

US08161984B2 Generator for foam to clean substrate 有权
标题翻译：发泡机用于泡沫清洁基材
公开(公告)号：US08161984B2
公开(公告)日：2012-04-24
申请号：US12185780
申请日：2008-08-04
申请人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
发明人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
IPC分类号： B08B3/00 , B05B7/04
CPC分类号： H01L21/67051 , B01F3/04446 , B01F5/0473 , B01F5/0475 , B01F5/0485 , B01F5/0656 , B01F5/0657 , Y10T137/0318
摘要： In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system.
摘要翻译：在示例性实施例中，用于产生清洁泡沫的装置包括阴壳体和阳插头。塞子包括孔，流体从清洁系统的另一部件流入流体。塞子包括预混合室，其接收来自孔的流体并注入气体以形成泡沫。在一个示例性实施例中，腔室是中空圆柱体，并且气体通过与气缸相切的通道注入气缸。塞子还包括在实心圆柱体的外侧上具有连续的螺旋形凹陷的实心圆柱体。当公插头插入阴壳体中时，连续的螺旋形凹口和壳体的内表面形成螺旋通道，泡沫流过该通道，并进一步在返回到清洁系统中的混合物中混合。

3. 发明授权

US08584613B2 Single substrate processing head for particle removal using low viscosity fluid 有权
标题翻译：用于使用低粘度流体进行颗粒去除的单基板加工头
公开(公告)号：US08584613B2
公开(公告)日：2013-11-19
申请号：US12165577
申请日：2008-06-30
申请人： Arnold Kholodenko , Cheng-yu Lin , Leon Ginzburg , Mark Mandelboym , Gregory A. Tomasch , Anwar Husain
发明人： Arnold Kholodenko , Cheng-yu Lin , Leon Ginzburg , Mark Mandelboym , Gregory A. Tomasch , Anwar Husain
IPC分类号： B05C5/02
CPC分类号： H01L21/67023 , H01L21/67051 , H01L21/67173 , H01L21/67748 , Y10T137/85938
摘要： A head for dispensing a thin film over a substrate is disclosed. The head includes a body assembly that extends between a first and a second end that is at least a width of the substrate. The body includes a main bore that is defined between the first and the second ends, the main bore connected to an upper side of a reservoir through a plurality of feeds that are defined between the main bore and the reservoir. The body also includes a plurality of outlets connected to a lower side of the reservoir and extend to an output slot. The plurality of feeds have a larger cross-sectional area than the plurality of outlets and the plurality of feeds are fewer than the plurality of outlets. Wherein fluid is configured to flow through the main bore, through the plurality of feeds along the bore and fill the reservoir up to at least the threshold level before fluid is evenly output as a film out of the output slot onto the substrate.
摘要翻译：公开了一种用于在衬底上分配薄膜的头部。头部包括主体组件，其在至少基板的宽度的第一端和第二端之间延伸。主体包括限定在第一和第二端之间的主孔，主孔通过限定在主孔和储存器之间的多个进料连接到储存器的上侧。主体还包括连接到储存器的下侧并延伸到输出槽的多个出口。多个进料具有比多个出口更大的横截面积，并且多个进料少于多个出口。其中流体构造成流过主孔，通过沿着孔的多个进料，并且在流体均匀地输出为输出槽之外的流体到基板上之前将储存器填充到至少阈值水平。

4. 发明授权

US08557051B2 Method for using generator for foam to clean substrate 有权
标题翻译：使用发泡机清洗基材的方法
公开(公告)号：US08557051B2
公开(公告)日：2013-10-15
申请号：US13445868
申请日：2012-04-12
申请人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
发明人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
IPC分类号： B08B3/00 , B05B7/04
CPC分类号： H01L21/67051 , B01F3/04446 , B01F5/0473 , B01F5/0475 , B01F5/0485 , B01F5/0656 , B01F5/0657 , Y10T137/0318
摘要： A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.
摘要翻译：用泡沫清洁基材的系统执行产生清洁泡沫的方法。在该方法的第一操作中，系统将流体泵送到预混合室中。预混合室是配合在系统中的阴壳体中的阳插头的部件。然后系统将气体注入到预混合室中以引发从流体产生泡沫。泡沫从预混合室流入密封的螺旋通道，该密封螺旋通道由阳螺栓的外表面上的螺旋形凹陷和阴壳体的内表面形成，以允许泡沫沿着密封的螺旋通道的长度达到期望的状态。在该方法的最后操作中，泡沫从螺旋通道的出口端通过公插头输出到系统的部件。

5. 发明申请

US20090320942A1 SINGLE SUBSTRATE PROCESSING HEAD FOR PARTICLE REMOVAL USING LOW VISCOSITY FLUID 有权
标题翻译：使用低粘度流体进行颗粒去除的单基板加工头
公开(公告)号：US20090320942A1
公开(公告)日：2009-12-31
申请号：US12165577
申请日：2008-06-30
申请人： Arnold Kholodenko , Cheng-yu Lin , Leon Ginzburg , Mark Mandelboym , Gregory A. Tomasch , Anwar Husain
发明人： Arnold Kholodenko , Cheng-yu Lin , Leon Ginzburg , Mark Mandelboym , Gregory A. Tomasch , Anwar Husain
IPC分类号： F16L41/00
CPC分类号： H01L21/67023 , H01L21/67051 , H01L21/67173 , H01L21/67748 , Y10T137/85938
摘要： A head for dispensing a thin film over a substrate is disclosed. The head includes a body assembly that extends between a first and a second end that is at least a width of the substrate. The body includes a main bore that is defined between the first and the second ends, the main bore connected to an upper side of a reservoir through a plurality of feeds that are defined between the main bore and the reservoir. The body also includes a plurality of outlets connected to a lower side of the reservoir and extend to an output slot. The plurality of feeds have a larger cross-sectional area than the plurality of outlets and the plurality of feeds are fewer than the plurality of outlets. Wherein fluid is configured to flow through the main bore, through the plurality of feeds along the bore and fill the reservoir up to at least the threshold level before fluid is evenly output as a film out of the output slot onto the substrate.
摘要翻译：公开了一种用于在衬底上分配薄膜的头部。头部包括主体组件，其在至少基板的宽度的第一端和第二端之间延伸。主体包括限定在第一和第二端之间的主孔，主孔通过限定在主孔和储存器之间的多个进料连接到储存器的上侧。主体还包括连接到储存器的下侧并延伸到输出槽的多个出口。多个进料具有比多个出口更大的横截面积，并且多个进料少于多个出口。其中流体构造成流过主孔，通过沿着孔的多个进料，并且在流体均匀地输出为输出槽之外的流体到基板上之前将储存器填充到至少阈值水平。

6. 发明申请

US20100024842A1 GENERATOR FOR FOAM TO CLEAN SUBSTRATE 有权
标题翻译：泡沫发电机清洁基板
公开(公告)号：US20100024842A1
公开(公告)日：2010-02-04
申请号：US12185780
申请日：2008-08-04
申请人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
发明人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
IPC分类号： B08B5/00 , B08B3/00 , C23G1/00
CPC分类号： H01L21/67051 , B01F3/04446 , B01F5/0473 , B01F5/0475 , B01F5/0485 , B01F5/0656 , B01F5/0657 , Y10T137/0318
摘要： In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system.
摘要翻译：在示例性实施例中，用于产生清洁泡沫的装置包括阴壳体和阳插头。塞子包括孔，流体从清洁系统的另一部件流入流体。塞子包括预混合室，其接收来自孔的流体并注入气体以形成泡沫。在一个示例性实施例中，腔室是中空圆柱体，并且气体通过与气缸相切的通道注入气缸。塞子还包括在实心圆柱体的外侧上具有连续的螺旋形凹陷的实心圆柱体。当公插头插入阴壳体中时，连续的螺旋形凹口和壳体的内表面形成螺旋通道，泡沫流过该通道，并进一步在返回到清洁系统中的混合物中混合。

7. 发明授权

US08739805B2 Confinement of foam delivered by a proximity head 有权
标题翻译：密封由接近头发送的泡沫
公开(公告)号：US08739805B2
公开(公告)日：2014-06-03
申请号：US12324316
申请日：2008-11-26
申请人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Leon Ginzburg , Mark Mandelboym , Gregory A. Tomasch , Anwar Husain
发明人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Leon Ginzburg , Mark Mandelboym , Gregory A. Tomasch , Anwar Husain
IPC分类号： B08B3/04
CPC分类号： H01L21/6704 , B08B3/003 , C11D11/0047 , C11D11/0058 , H01L21/67051 , H01L21/67057 , H01L21/6719 , H01L21/6776
摘要： In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under the proximity head. The second section is configured to cause a film (or meniscus) of cleaning foam which is a non-Newtonian fluid to flow onto the upper surface of the wafer. The third section is configured to cause a film of rinsing fluid to flow onto the upper surface of the wafer as the wafer is carried under the proximity head. The third section is defined partially around the second section and up to the first section, so that the third section and the first section create a confinement of the cleaning foam with respect to the chamber.
摘要翻译：在一个示例性实施例中，线性湿式系统包括载体和室中的邻近头部。接近头包括线性布置的三个部分。第一部分在半导体晶片的上表面吸附液体，因为晶片由邻近头部下方的载体输送。第二部分被配置为使得作为非牛顿流体的清洁泡沫的膜（或弯液面）流动到晶片的上表面上。第三部分构造成当晶片被携带在邻近头部下方时，使冲洗流体膜流到晶片的上表面。第三部分围绕第二部分和第一部分部分地限定，使得第三部分和第一部分产生相对于室的清洁泡沫的限制。

8. 发明授权

US07743730B2 Apparatus for an optimized plasma chamber grounded electrode assembly 有权
标题翻译：用于优化等离子体室接地电极组件的装置
公开(公告)号：US07743730B2
公开(公告)日：2010-06-29
申请号：US11316054
申请日：2005-12-21
申请人： Arnold Kholodenko , Anwar Husain
发明人： Arnold Kholodenko , Anwar Husain
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32532 , H01J37/32055 , H01J37/32082 , H01J37/32091 , H01J37/32174 , H01J37/32458 , H01J37/32559 , H01J37/32577 , H01J37/32651 , H01J37/32724 , H01L21/67069
摘要： An electrode assembly configured to provide a ground path for a plasma processing chamber of a plasma processing system is disclosed. The apparatus includes an electrode configured to be exposed to a plasma. The apparatus also includes a heater plate disposed above the electrode, wherein the heater plate is configured to heat the electrode. The apparatus further includes a cooling plate disposed above the heater plate, wherein the cooling plate is configured to cool the electrode. The apparatus also includes a plasma chamber lid configured to confine the plasma in the plasma chamber, wherein the plasma chamber lid includes a ground. The apparatus further includes a clamp ring configured to secure the electrode, the heater plate, and the cooling plate to the plasma chamber lid, the clamp ring is further configured to provide the ground path from the electrode to the chamber lid.
摘要翻译：公开了一种构造成为等离子体处理系统的等离子体处理室提供接地路径的电极组件。该装置包括被配置为暴露于等离子体的电极。该设备还包括设置在电极上方的加热板，其中加热板被配置为加热电极。该装置还包括设置在加热板上方的冷却板，其中冷却板构造成冷却电极。所述装置还包括构造成将等离子体限制在等离子体室中的等离子体室盖，其中等离子体室盖包括地面。该装置还包括夹紧环，其构造成将电极，加热器板和冷却板固定到等离子体室盖上，夹紧环进一步构造成提供从电极到室盖的接地路径。

9. 发明申请

US20100230243A1 Wafer Carrier Drive Apparatus and Method for Operating the Same 有权
标题翻译：晶圆载体驱动装置及其操作方法
公开(公告)号：US20100230243A1
公开(公告)日：2010-09-16
申请号：US12786868
申请日：2010-05-25
申请人： Arnold Kholodenko , Anwar Husain , George Khait
发明人： Arnold Kholodenko , Anwar Husain , George Khait
IPC分类号： H01L21/677 , B65G35/00 , B65G47/00
CPC分类号： H01L21/67748 , H01L21/67706 , H01L21/67709
摘要： A drive rail includes a sealed interior cavity and an exterior drive surface that extends along a length of the drive rail. A first magnetic member is disposed within the interior cavity and adjacent to a surface of the interior cavity that is immediately opposite the exterior drive surface. A drive mechanism is disposed within the interior cavity and in connection with the first magnetic member, and is configured to move the first magnetic member within the interior cavity along the length of the drive rail, such that the first magnetic member remains immediately opposite the exterior drive surface. The first magnetic member is configured to magnetically couple through the exterior drive surface to a wafer carrier disposed adjacent to the exterior drive surface. Movement of the first magnetic member within the interior cavity along the drive rail causes corresponding movement of the wafer carrier along the exterior drive surface.
摘要翻译：驱动轨道包括密封的内部空腔和沿驱动轨道的长度延伸的外部驱动表面。第一磁性构件设置在内部空腔内并且邻近内部空腔的与外部驱动表面相对的表面。驱动机构设置在内部空腔内并与第一磁性构件连接，并且构造成沿着驱动轨道的长度移动内部空腔内的第一磁性构件，使得第一磁性构件保持与外部的立即相对驱动面。第一磁性构件被配置为通过外部驱动表面磁耦合到邻近外部驱动表面设置的晶片载体。第一磁性构件沿着驱动轨道在内腔内的移动导致晶片载体沿着外部驱动表面的相应移动。

10. 发明申请

US20100126528A1 Confinement of Foam Delivered by a Proximity Head 有权
标题翻译：泡沫的限制由接近头部交付
公开(公告)号：US20100126528A1
公开(公告)日：2010-05-27
申请号：US12324316
申请日：2008-11-26
申请人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Leon Ginzburg , Mark Mandelboym , Gregogry A. Tomasch , Anwar Husain
发明人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Leon Ginzburg , Mark Mandelboym , Gregogry A. Tomasch , Anwar Husain
IPC分类号： B08B3/04 , B08B5/04
CPC分类号： H01L21/6704 , B08B3/003 , C11D11/0047 , C11D11/0058 , H01L21/67051 , H01L21/67057 , H01L21/6719 , H01L21/6776
摘要： In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under the proximity head. The second section is configured to cause a film (or meniscus) of cleaning foam which is a non-Newtonian fluid to flow onto the upper surface of the wafer. The third section is configured to cause a film of rinsing fluid to flow onto the upper surface of the wafer as the wafer is carried under the proximity head. The third section is defined partially around the second section and up to the first section, so that the third section and the first section create a confinement of the cleaning foam with respect to the chamber.
摘要翻译：在一个示例性实施例中，线性湿式系统包括载体和室中的邻近头部。接近头包括线性布置的三个部分。第一部分在半导体晶片的上表面吸附液体，因为晶片由邻近头部下方的载体输送。第二部分被配置为使得作为非牛顿流体的清洁泡沫的膜（或弯液面）流动到晶片的上表面上。第三部分构造成当晶片被携带在邻近头部下方时，使冲洗流体膜流到晶片的上表面。第三部分围绕第二部分和第一部分部分地限定，使得第三部分和第一部分产生相对于室的清洁泡沫的限制。

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