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1. 发明授权

US08039813B2 Charged particle-optical systems, methods and components 有权
标题翻译：带电粒子光学系统，方法和组件
公开(公告)号：US08039813B2
公开(公告)日：2011-10-18
申请号：US11991546
申请日：2006-09-06
申请人： Antonio Casares , Thomas Kemen , Rainer Knippelmeyer , Thomas Bayer , Georg Fritz , Johann Greschner , Samuel Kalt
发明人： Antonio Casares , Thomas Kemen , Rainer Knippelmeyer , Thomas Bayer , Georg Fritz , Johann Greschner , Samuel Kalt
IPC分类号： G21K5/02
CPC分类号： H01J37/04 , H01J37/045 , H01J37/09 , H01J37/145 , H01J37/147 , H01J37/244 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/04922 , H01J2237/04924 , H01J2237/04926 , H01J2237/15 , H01J2237/2446 , H01J2237/2448 , H01J2237/2561 , H01J2237/2817 , H01J2237/31774
摘要： The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.
摘要翻译：本发明涉及一种包括第一多孔板和在其间形成间隙的第二多孔板的颗粒光学部件; 其中所述第一多孔板的多个孔被布置成使得所述第一多孔板的所述多个孔中的每个孔与所述第二多孔板的多个孔的对应孔对齐; 并且其中所述间隙在第一位置处具有第一宽度，在第二位置处具有第二宽度，并且其中所述第二宽度比所述第一宽度大至少5％。此外，本发明涉及包含这些部件的带电粒子系统和布置以及制造具有弯曲表面的多孔板的方法。

2. 发明申请

US20090114818A1 Particle-Optical Component 有权
标题翻译：粒子光学部件
公开(公告)号：US20090114818A1
公开(公告)日：2009-05-07
申请号：US11991546
申请日：2006-09-06
申请人： Antonio Casares , Rainer Knippelmeyer , Thomas Kemen , Thomas Bayer , Georg Fritz , Johann Greschner , Samuel Kalt
发明人： Antonio Casares , Rainer Knippelmeyer , Thomas Kemen , Thomas Bayer , Georg Fritz , Johann Greschner , Samuel Kalt
IPC分类号： G01N23/00
CPC分类号： H01J37/04 , H01J37/045 , H01J37/09 , H01J37/145 , H01J37/147 , H01J37/244 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/04922 , H01J2237/04924 , H01J2237/04926 , H01J2237/15 , H01J2237/2446 , H01J2237/2448 , H01J2237/2561 , H01J2237/2817 , H01J2237/31774
摘要： The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.
摘要翻译：本发明涉及一种包括第一多孔板和在其间形成间隙的第二多孔板的颗粒光学部件; 其中所述第一多孔板的多个孔被布置成使得所述第一多孔板的所述多个孔中的每个孔与所述第二多孔板的多个孔的对应孔对齐; 并且其中所述间隙在第一位置处具有第一宽度，在第二位置处具有第二宽度，并且其中所述第二宽度比所述第一宽度大至少5％。此外，本发明涉及包含这些部件的带电粒子系统和布置以及制造具有弯曲表面的多孔板的方法。

3. 发明授权

US08637834B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US08637834B2
公开(公告)日：2014-01-28
申请号：US13342017
申请日：2011-12-31
申请人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximillian Haider , Antonio Casares , Steven Rogers
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximillian Haider , Antonio Casares , Steven Rogers
IPC分类号： H01J37/28 , H01J3/14 , H01J1/50
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

4. 发明授权

US08097847B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US08097847B2
公开(公告)日：2012-01-17
申请号：US12459078
申请日：2009-06-25
申请人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
IPC分类号： H01J37/30 , H01J37/26
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

5. 发明申请

US20100181479A1 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US20100181479A1
公开(公告)日：2010-07-22
申请号：US12459078
申请日：2009-06-25
申请人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
IPC分类号： H01J3/00 , H01J37/02 , H01J37/26 , H01J37/30
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

6. 发明授权

US07554094B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US07554094B2
公开(公告)日：2009-06-30
申请号：US11808845
申请日：2007-06-13
申请人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
IPC分类号： H01J1/50 , H01J37/28 , H01J37/244 , G21K5/10 , G21K7/00
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.
摘要翻译：电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。第一磁场区域被主光束路径和次光束路径穿过。第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。第一和第二磁场区域以基本上相反的方向偏转主光束路径。第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

7. 发明申请

US20080054184A1 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US20080054184A1
公开(公告)日：2008-03-06
申请号：US11808845
申请日：2007-06-13
申请人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
IPC分类号： H01J1/50
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.
摘要翻译：电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。第一磁场区域被主光束路径和次光束路径穿过。第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。第一和第二磁场区域以基本上相反的方向偏转主光束路径。第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

8. 发明申请

US20130187046A1 Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements 有权
标题翻译：这种系统和布置的粒子 - 光学系统和布置和粒子 - 光学部件
公开(公告)号：US20130187046A1
公开(公告)日：2013-07-25
申请号：US13825820
申请日：2011-09-23
申请人： Dirk Zeidler , Thomas Kemen , Pascal Anger , Antonio Casares , Christof Riedesel
发明人： Dirk Zeidler , Thomas Kemen , Pascal Anger , Antonio Casares , Christof Riedesel
IPC分类号： H01J37/09
CPC分类号： H01J37/09 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/28 , H01J37/3177 , H01J2237/0453 , H01J2237/0458 , H01J2237/0492 , H01J2237/1205
摘要： The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system down-stream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.
摘要翻译：本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在源的系统下游的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313）载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

9. 发明授权

US09384938B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US09384938B2
公开(公告)日：2016-07-05
申请号：US13825820
申请日：2011-09-23
申请人： Dirk Zeidler , Thomas Kemen , Pascal Anger , Antonio Casares , Christof Riedesel
发明人： Dirk Zeidler , Thomas Kemen , Pascal Anger , Antonio Casares , Christof Riedesel
IPC分类号： H01J37/09 , B82Y10/00 , B82Y40/00 , H01J37/28 , H01J37/317
CPC分类号： H01J37/09 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/28 , H01J37/3177 , H01J2237/0453 , H01J2237/0458 , H01J2237/0492 , H01J2237/1205
摘要： The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.
摘要翻译：本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313）载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

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