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1. 发明申请

US20120085906A1 CROSS-SECTION SYSTEMS AND METHODS 有权
标题翻译：交叉系统和方法
公开(公告)号：US20120085906A1
公开(公告)日：2012-04-12
申请号：US12994344
申请日：2009-06-16
申请人： Rainer Knippelmeyer , Lawrence Scipioni , Christoph Riedesel , John Morgan , Ulrich Mantz , Ulrich Wagemann
发明人： Rainer Knippelmeyer , Lawrence Scipioni , Christoph Riedesel , John Morgan , Ulrich Mantz , Ulrich Wagemann
IPC分类号： G01N23/00 , G21K5/00 , G01N1/28
CPC分类号： G01N1/286 , H01J2237/0807 , H01J2237/304 , H01J2237/31745 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A first instrument (230) is used to image a first semiconductor article having a trench (110) of defined cross-section, while a second instrument (220) is used to simultaneously prepare a second semiconductor article with a trench of defined cross-section. Furthermore, a method is disclosed to prepare a trench (110) of defined cross-section in a semiconductor article by rough milling and subsequent fine milling.
摘要翻译：第一仪器（230）用于对具有限定横截面的沟槽（110）的第一半导体产品成像，而第二器械（220）用于同时制备具有限定横截面的沟槽的第二半导体产品。此外，公开了一种通过粗铣和随后的精细铣削在半导体制品中制备具有限定横截面的沟槽（110）的方法。

2. 发明授权

US06891168B2 Particle-optical apparatus and method for operating the same 失效
标题翻译：粒子光学装置及其操作方法
公开(公告)号：US06891168B2
公开(公告)日：2005-05-10
申请号：US10639741
申请日：2003-08-13
申请人： Rainer Knippelmeyer
发明人： Rainer Knippelmeyer
IPC分类号： H01J37/12 , G21K1/08 , H01J37/14 , H01J37/141 , H01J37/147 , H01J37/28 , H01J37/305
CPC分类号： H01J37/141 , G21K1/08 , H01J37/12 , H01J37/14 , H01J37/1475 , H01J37/1477 , H01J2237/121 , H01J2237/1504
摘要： An apparatus and a method to manipulate at least one beam of charged particles are provided. The apparatus comprises two rows of field source members 13 which are disposed periodically at a distance from each other such that there exist planes of symmetry S, S′ with respect to which the field source members 13 are symmetrically disposed. The field has a component which is displaceable in the x-direction. To provide such field, a pattern of source strengths according to the formula F1(x)=Fm(x)+Fc(x) is applied to the field source members, wherein Fm is a component which is substantially independent of the displacement x0 and Fc is a correction component which is dependent on x0.
摘要翻译：提供了一种操纵至少一个带电粒子束的装置和方法。该装置包括两排场源元件13，它们周期性地彼此间隔设置，使得存在对称S，S'的平面，场源元件13对称地设置对准面。该场具有可在x方向上移位的分量。为了提供这样的场，根据公式F 1（x）= F m（x）+ F c（x） x）被施加到场源成员，其中F m是基本上独立于位移x 0和F C 1的分量取决于x <0>的校正分量。

3. 发明授权

US08334701B2 Repairing defects 有权
标题翻译：修复缺陷
公开(公告)号：US08334701B2
公开(公告)日：2012-12-18
申请号：US12549759
申请日：2009-08-28
申请人： Rainer Knippelmeyer , Christoph Riedesel , John Morgan , Lawrence Scipioni
发明人： Rainer Knippelmeyer , Christoph Riedesel , John Morgan , Lawrence Scipioni
IPC分类号： G01R31/02
CPC分类号： H01L21/76892 , H01L22/20 , H05K3/0017 , H05K3/225 , H05K2203/09 , H05K2203/1344 , H05K2203/173
摘要： Methods and systems for defect repair are disclosed. The methods include: (a) identifying a defect causing an absence of an electrical connection between a first circuit element and a second circuit element, the first and second circuit elements being positioned in or on a substrate and the defect being positioned in the substrate; (b) removing a portion of the substrate to expose the defect, and depositing a conductive material to electrically connect the first and second circuit elements; and (c) verifying that the defect caused the absence of an electrical connection between the first and second circuit elements.
摘要翻译：公开了用于缺陷修复的方法和系统。所述方法包括：（a）识别导致在第一电路元件和第二电路元件之间不存在电连接的缺陷，所述第一和第二电路元件位于基板中或基板上，并且所述缺陷位于所述基板中; （b）去除所述衬底的一部分以暴露所述缺陷，以及沉积导电材料以电连接所述第一和第二电路元件; 和（c）验证该缺陷导致在第一和第二电路元件之间不存在电连接。

4. 发明申请

US20100052697A1 REPAIRING DEFECTS 有权
标题翻译：修复缺陷
公开(公告)号：US20100052697A1
公开(公告)日：2010-03-04
申请号：US12549759
申请日：2009-08-28
申请人： Rainer Knippelmeyer , Christoph Riedesel , John Morgan , Lawrence Scipioni
发明人： Rainer Knippelmeyer , Christoph Riedesel , John Morgan , Lawrence Scipioni
IPC分类号： G01R31/02
CPC分类号： H01L21/76892 , H01L22/20 , H05K3/0017 , H05K3/225 , H05K2203/09 , H05K2203/1344 , H05K2203/173
摘要： Methods and systems for defect repair are disclosed. The methods include: (a) identifying a defect causing an absence of an electrical connection between a first circuit element and a second circuit element, the first and second circuit elements being positioned in or on a substrate and the defect being positioned in the substrate; (b) removing a portion of the substrate to expose the defect, and depositing a conductive material to electrically connect the first and second circuit elements; and (c) verifying that the defect caused the absence of an electrical connection between the first and second circuit elements.
摘要翻译：公开了用于缺陷修复的方法和系统。所述方法包括：（a）识别导致在第一电路元件和第二电路元件之间不存在电连接的缺陷，所述第一和第二电路元件位于基板中或基板上，并且所述缺陷位于所述基板中; （b）去除所述衬底的一部分以暴露所述缺陷，以及沉积导电材料以电连接所述第一和第二电路元件; 和（c）验证该缺陷导致在第一和第二电路元件之间不存在电连接。

5. 发明授权

US07244949B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US07244949B2
公开(公告)日：2007-07-17
申请号：US11366533
申请日：2006-03-03
申请人： Rainer Knippelmeyer , Oliver Kienzle
发明人： Rainer Knippelmeyer , Oliver Kienzle
IPC分类号： G21K5/10 , G21K7/00 , H01J37/28
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.
摘要翻译：电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。第一磁场区域被主光束路径和次光束路径穿过。第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。第一和第二磁场区域以基本上相反的方向偏转主光束路径。第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

6. 发明授权

US07105814B2 Electron microscopy system and electron microscopy method 有权
标题翻译：电子显微镜系统和电子显微镜法
公开(公告)号：US07105814B2
公开(公告)日：2006-09-12
申请号：US10636626
申请日：2003-08-08
申请人： Rainer Knippelmeyer
发明人： Rainer Knippelmeyer
IPC分类号： H01J37/28
CPC分类号： H01J37/147 , H01J37/244 , H01J37/28
摘要： A probe-forming electron microscopy system 1 (SEM) is proposed which comprises a position-sensitive detector 15. As a result, position-dependent secondary electron intensities in the object plane 7 or angle-dependent secondary electron intensities in the object plane 7 may be observed.
摘要翻译：提出了一种探针形成电子显微镜系统1（SEM），其包括位置敏感检测器15。结果，可以观察到物平面7中的位置相关二次电子强度或物平面7中的角度依赖的二次电子强度。

7. 发明授权

US07084406B2 Detector arrangement and detection method 有权
标题翻译：检测器布置和检测方法
公开(公告)号：US07084406B2
公开(公告)日：2006-08-01
申请号：US10294609
申请日：2002-11-15
申请人： Rainer Knippelmeyer
发明人： Rainer Knippelmeyer
IPC分类号： G01K1/08
CPC分类号： H01J37/244
摘要： A detector arrangement for detecting position information contained in a beam (5) of charged particles is provided, comprising a plurality of position-sensitive detectors (17), each for supplying an image containing the position information of a position-dependent distribution of intensity, integrated in terms of time, of charged particles impinging on a detection area (19) of the detector (17), a control system (47) configured to receive the image supplied by the detectors (17), and a deflector (3) configured to direct the beam (5) of charged particles to the detection area (19) of a first detector (17) selectable from the plurality of detectors (17), the deflector (3) being controllable by the control system (47) to select the detector (17) from the plurality of detectors (17) to which the beam (5) is to be directed.
摘要翻译：提供一种用于检测包含在带电粒子束（5）中的位置信息的检测器装置，包括多个位置敏感检测器（17），每个位置敏感检测器用于提供包含强度位置相关分布的位置信息的图像，在时间上集成了撞击在检测器（17）的检测区域（19）上的带电粒子，配置成接收由检测器（17）提供的图像的控制系统（47）和配置成将带电粒子束（5）引导到可从多个检测器（17）中选择的第一检测器（17）的检测区域（19），偏转器（3）由控制系统（47）控制以选择来自多个检测器（17）的检测器（17），梁（5）将被引导到该检测器。

8. 发明授权

US06903337B2 Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same 有权
标题翻译：用于物体的粒子光学成像，带电粒子的偏转器及其操作方法的检查系统
公开(公告)号：US06903337B2
公开(公告)日：2005-06-07
申请号：US10185729
申请日：2002-07-01
申请人： Oliver Kienzle , Dirk Stenkamp , Michael Steigerwald , Rainer Knippelmeyer , Max Haider , Heiko Müller , Stephan Uhlemann
发明人： Oliver Kienzle , Dirk Stenkamp , Michael Steigerwald , Rainer Knippelmeyer , Max Haider , Heiko Müller , Stephan Uhlemann
IPC分类号： G03F7/20 , H01J31/00 , H01J37/09 , H01J37/12 , H01J37/147 , H01J37/244 , H01J37/28 , H01J37/285
CPC分类号： H01J37/28 , H01J2237/082 , H01J2237/2446
摘要： An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.
摘要翻译：一种用于对物体平面中定位的物体进行成像的检查系统，包括用于向物体的界定场提供能量的照明装置，使得带电粒子从场的位置出现，该场可在物体的平面中移动，第一偏转器，用于提供可变偏转场，用于引导通过固定的预定光束横截面从物体的可选择区域的位置出射的带电粒子，以及设置在光束路径中的位置敏感检测器，使得带电粒子在已经穿过第一偏转器，撞击位置敏感检测器，其中从该区域的不同位置出现的颗粒被成像在位置敏感检测器的分配到出现位置的不同位置上。

9. 发明申请

US20130032729A1 Charged Particle Detection System and Multi-Beamlet Inspection System 有权
标题翻译：带电粒子检测系统和多光束检测系统
公开(公告)号：US20130032729A1
公开(公告)日：2013-02-07
申请号：US13639491
申请日：2011-03-31
申请人： Rainer Knippelmeyer
发明人： Rainer Knippelmeyer
IPC分类号： G01T1/00 , H01J3/18
CPC分类号： H01J37/244 , H01J37/09 , H01J2237/0437 , H01J2237/0453 , H01J2237/2446 , H01J2237/24592 , H01J2237/2817
摘要： A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.
摘要翻译：带电粒子检测系统包括检测元件附近的多个检测元件和多孔板。带电粒子子束可穿过多孔板的入射到检测元件上的孔。可以提供多于一个的多孔板以在检测器附近形成多孔板的堆叠。提供给多孔板的合适电位可以对穿过板的孔的多个带电粒子子束具有能量过滤特性。

10. 发明授权

US08039813B2 Charged particle-optical systems, methods and components 有权
标题翻译：带电粒子光学系统，方法和组件
公开(公告)号：US08039813B2
公开(公告)日：2011-10-18
申请号：US11991546
申请日：2006-09-06
申请人： Antonio Casares , Thomas Kemen , Rainer Knippelmeyer , Thomas Bayer , Georg Fritz , Johann Greschner , Samuel Kalt
发明人： Antonio Casares , Thomas Kemen , Rainer Knippelmeyer , Thomas Bayer , Georg Fritz , Johann Greschner , Samuel Kalt
IPC分类号： G21K5/02
CPC分类号： H01J37/04 , H01J37/045 , H01J37/09 , H01J37/145 , H01J37/147 , H01J37/244 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/04922 , H01J2237/04924 , H01J2237/04926 , H01J2237/15 , H01J2237/2446 , H01J2237/2448 , H01J2237/2561 , H01J2237/2817 , H01J2237/31774
摘要： The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.
摘要翻译：本发明涉及一种包括第一多孔板和在其间形成间隙的第二多孔板的颗粒光学部件; 其中所述第一多孔板的多个孔被布置成使得所述第一多孔板的所述多个孔中的每个孔与所述第二多孔板的多个孔的对应孔对齐; 并且其中所述间隙在第一位置处具有第一宽度，在第二位置处具有第二宽度，并且其中所述第二宽度比所述第一宽度大至少5％。此外，本发明涉及包含这些部件的带电粒子系统和布置以及制造具有弯曲表面的多孔板的方法。

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