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1. 发明授权

US06741383B2 Deflectable micromirrors with stopping mechanisms 有权
标题翻译：具有停止机构的偏转微镜
公开(公告)号：US06741383B2
公开(公告)日：2004-05-25
申请号：US10155744
申请日：2002-05-24
申请人： Andrew G. Huibers , Peter J. Heureux , Satyadev R. Patel
发明人： Andrew G. Huibers , Peter J. Heureux , Satyadev R. Patel
IPC分类号： G02B2000
CPC分类号： G02B26/0841
摘要： A spatial light modulator having a micromirror and one or more deflection limiting mechanisms, and a process for fabrication therefor. In one embodiment, the mirror support structure has a deflection stopping mechanism that limits the tilt angle of the reflective plate. Alternatively, a deflection stopping mechanism can be provided separate from the mirror support structure. The deflection stopping mechanism can be used in conjunction with one or more additional stopping mechanisms such as the abutment of a portion of the reflective plate against the substrate upon which it was constructed and/or abutment of the micromirror on a surface or structure of the circuit substrate.
摘要翻译：具有微反射镜和一个或多个偏转限制机构的空间光调制器及其制造方法。在一个实施例中，反射镜支撑结构具有限制反射板的倾斜角度的偏转停止机构。或者，偏转止动机构可以与镜支撑结构分开设置。偏转止动机构可以与一个或多个附加止动机构结合使用，例如反射板的一部分抵靠其上构造的基板和/或微镜在电路的表面或结构上的邻接基质。

2. 发明授权

US06800210B2 Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants 有权
标题翻译：通过用多个顺序蚀刻剂去除牺牲层来制造微机械装置的方法
公开(公告)号：US06800210B2
公开(公告)日：2004-10-05
申请号：US10154150
申请日：2002-05-22
申请人： Satyadev R. Patel , Andrew G. Huibers , Gregory P. Schaadt , Peter J. Heureux
发明人： Satyadev R. Patel , Andrew G. Huibers , Gregory P. Schaadt , Peter J. Heureux
IPC分类号： H01L21306
CPC分类号： B81C1/00476 , B81C1/00547 , B81C2201/0109 , B81C2201/0132 , B81C2201/0133 , B81C2201/112 , B82Y30/00
摘要： An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.
摘要翻译：公开了一种诸如用于形成微机械装置的蚀刻方法。该方法的一个实施例是用于释放微机械结构，包括：提供衬底; 在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上移除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

3. 发明授权

US06970280B2 High angle micro-mirrors and processes 有权
标题翻译：大角度微镜和工艺
公开(公告)号：US06970280B2
公开(公告)日：2005-11-29
申请号：US10990835
申请日：2004-11-16
申请人： Satyadev R. Patel , Andrew G. Huibers , Peter J. Heureux
发明人： Satyadev R. Patel , Andrew G. Huibers , Peter J. Heureux
IPC分类号： G02B26/08 , G02B26/00 , G02F1/00
CPC分类号： G02B26/0841
摘要： A micro-mirror that comprises a substrate, a hinge structure formed on the substrate and a mirror plate attached to the hinge structure is provided for use in display systems. The mirror plate is capable of rotating from a non-deflected resting state to a state that is at least 14° degrees. In operation, the micro-mirror switches between an “ON”-state and “OFF”-state, which are defined in accordance with a rotational position of the mirror plate. The OFF state can be a non-deflected position of the micro-mirror (generally parallel to the substrate), the same angle (though opposite direction) as the ON state, or an angle less than the ON state (though in the opposite direction). Reflected light from the “ON” and “OFF” states are thus separated and the contrast ratio is improved.
摘要翻译：提供了一种微镜，其包括基底，形成在基底上的铰链结构和附接到铰链结构的镜板，用于显示系统。镜板能够从非偏转的静止状态旋转到至少14度的状态。在操作中，微反射镜在根据镜板的旋转位置限定的“ON”状态和“OFF”状态之间切换。关闭状态可以是微反射镜（大体上平行于基板）的非偏转位置，与ON状态相同的角度（尽管相反的方向），或者小于ON状态的角度（尽管在相反方向）。因此，从“ON”和“OFF”状态的反射光被分离，并且对比度提高。

4. 发明授权

US06885494B2 High angle micro-mirrors and processes 有权
标题翻译：大角度微镜和工艺
公开(公告)号：US06885494B2
公开(公告)日：2005-04-26
申请号：US10366296
申请日：2003-02-12
申请人： Satyadev R. Patel , Andrew G. Huibers , Peter J. Heureux
发明人： Satyadev R. Patel , Andrew G. Huibers , Peter J. Heureux
IPC分类号： G02B26/08 , G02B26/00 , G02F1/29
CPC分类号： G02B26/0841
摘要： A micro-mirror that comprises a substrate, a hinge structure formed on the substrate and a mirror plate attached to the hinge structure is provided for use in display systems. The mirror plate is capable of rotating from a non-deflected resting state to a state that is at least 14°, and preferably from 15° to 27° from the non-deflected resting state. In operation, the micro-mirror switches between an “ON”-state and “OFF”-state, which are defined in accordance with a rotational position of the mirror plate. The OFF state can be a non-deflected position of the micro-mirror (generally parallel to the substrate), the same angle (though opposite direction) as the ON state, or an angle less than the ON state (though in the opposite direction). Reflected light from the “ON” and “OFF” states are thus separated and the contrast ratio is improved.
摘要翻译：提供了一种微镜，其包括基底，形成在基底上的铰链结构和附接到铰链结构的镜板，用于显示系统。镜板能够从非偏转静止状态旋转到从非偏转静止状态至少为14°，优选为15°至27°的状态。在操作中，微反射镜在根据镜板的旋转位置限定的“ON”状态和“OFF”状态之间切换。关闭状态可以是微反射镜（大体上平行于基板）的非偏转位置，与ON状态相同的角度（尽管相反的方向），或者小于ON状态的角度（尽管在相反方向）。因此，从“ON”和“OFF”状态的反射光被分离，并且对比度提高。

5. 发明授权

US07671428B2 Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates 有权
公开(公告)号：US07671428B2
公开(公告)日：2010-03-02
申请号：US11102186
申请日：2005-04-07
申请人： Satyadev R. Patel , Andrew G. Huibers , Steve S. Chiang
发明人： Satyadev R. Patel , Andrew G. Huibers , Steve S. Chiang
IPC分类号： H01L21/50
CPC分类号： B81C1/00214 , B81B7/0077 , B81B2201/042 , B81C1/00333 , B81C1/00896 , B81C1/00904 , B81C2203/0118 , B82Y30/00 , G02B26/0833 , H01L24/97 , H01L2224/48091 , H01L2224/97 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01039 , H01L2924/01049 , H01L2924/01054 , H01L2924/01058 , H01L2924/01072 , H01L2924/01074 , H01L2924/01077 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/04953 , H01L2924/09701 , H01L2924/10253 , H01L2924/10329 , H01L2924/12036 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H01L2924/1433 , H01L2924/15787 , H01L2924/19041 , H01L2924/19042 , H01L2924/3025 , H01L2924/00014 , H01L2224/85 , H01L2924/00
摘要： A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

6. 发明授权

US07002726B2 Micromirror having reduced space between hinge and mirror plate of the micromirror 有权
标题翻译：微镜具有减小微镜的铰链和镜板之间的空间
公开(公告)号：US07002726B2
公开(公告)日：2006-02-21
申请号：US11034294
申请日：2005-01-11
申请人： Satyadev R. Patel , Andrew G. Huibers
发明人： Satyadev R. Patel , Andrew G. Huibers
IPC分类号： G02B26/00
CPC分类号： B82Y30/00 , G02B26/0841 , H04N5/7458
摘要： A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.
摘要翻译：公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件以及用于选择性地致动阵列中的微镜的控制器。

7. 发明授权

US06995040B2 Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates 有权
公开(公告)号：US06995040B2
公开(公告)日：2006-02-07
申请号：US11093943
申请日：2005-03-29
申请人： Satyadev R. Patel , Andrew G. Huibers , Steve S. Chiang
发明人： Satyadev R. Patel , Andrew G. Huibers , Steve S. Chiang
IPC分类号： H01L21/44
CPC分类号： B81C1/00214 , B81B7/0077 , B81B2201/042 , B81C1/00333 , B81C1/00896 , B81C1/00904 , B81C2203/0118 , B82Y30/00 , G02B26/0833 , H01L24/97 , H01L2224/48091 , H01L2224/97 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01039 , H01L2924/01049 , H01L2924/01054 , H01L2924/01058 , H01L2924/01072 , H01L2924/01074 , H01L2924/01077 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/04953 , H01L2924/09701 , H01L2924/10253 , H01L2924/10329 , H01L2924/12036 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H01L2924/1433 , H01L2924/15787 , H01L2924/19041 , H01L2924/19042 , H01L2924/3025 , H01L2924/00014 , H01L2224/85 , H01L2924/00
摘要： A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

8. 发明授权

US07422920B2 Method and forming a micromirror array device with a small pitch size 有权
标题翻译：形成具有小间距尺寸的微镜阵列器件的方法
公开(公告)号：US07422920B2
公开(公告)日：2008-09-09
申请号：US11388116
申请日：2006-03-23
申请人： Satyadev R. Patel , Andrew G. Huibers
发明人： Satyadev R. Patel , Andrew G. Huibers
IPC分类号： H01L21/00
CPC分类号： B82Y30/00 , G02B26/0841 , H04N5/7458
摘要： A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant.
摘要翻译：公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。

9. 发明授权

US07405860B2 Spatial light modulators with light blocking/absorbing areas 有权
标题翻译：具有遮光/吸收区域的空间光调制器
公开(公告)号：US07405860B2
公开(公告)日：2008-07-29
申请号：US11076640
申请日：2005-03-09
申请人： Andrew G. Huibers , Satyadev R. Patel
发明人： Andrew G. Huibers , Satyadev R. Patel
IPC分类号： G02B26/00 , G09G3/34
CPC分类号： B82Y30/00 , G02B26/0833 , H01L2924/01006 , H01L2924/01013 , H01L2924/0102 , H01L2924/01024 , H01L2924/01074
摘要： A projection system, a spatial light modulator, and a method for forming a micromirror array such as for a projection display are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light absorbing layer can form a pattern, such as a frame around an array of micro-mirrors.
摘要翻译：公开了投影系统，空间光调制器和用于形成诸如投影显示器的微镜阵列的方法。空间光调制器可以具有与包括微镜阵列的基板之一粘合在一起的两个基板。如果需要，在沉积吸气剂材料和/或固体或液体润滑剂在一个或两个晶片上之后，两个基底可以在晶片层上结合。在本发明的一个实施例中，一个基板是透光基板，并且在透光基板上设置光吸收层，以选择性地阻挡光通过基板。光吸收层可以形成图案，例如围绕微镜阵列的框架。

10. 发明授权

US07019376B2 Micromirror array device with a small pitch size 有权
标题翻译：具有小间距尺寸的微镜阵列器件
公开(公告)号：US07019376B2
公开(公告)日：2006-03-28
申请号：US10627155
申请日：2003-07-24
申请人： Satyadev R. Patel , Andrew G. Huibers
发明人： Satyadev R. Patel , Andrew G. Huibers
IPC分类号： H01L31/0232 , G02B26/00
CPC分类号： B82Y30/00 , G02B26/0841 , H04N5/7458
摘要： A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.
摘要翻译：公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件以及用于选择性地致动阵列中的微镜的控制器。

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