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    • 1. 发明申请
    • Multi-featured arrays with reflective coating
    • 具有反光涂层的多功能阵列
    • US20070059760A1
    • 2007-03-15
    • US11599523
    • 2006-11-13
    • Andreas DorselDavid KingNicholas Sampas
    • Andreas DorselDavid KingNicholas Sampas
    • C12Q1/68C12M1/34
    • G01N21/6452G01N21/6428
    • A method and apparatus of interrogating an addressable array unit, which includes a substrate, a light reflecting layer on a front side of the substrate, and a plurality of features on a front side of the array. The method may include, for each of multiple features, illuminating the feature simultaneously with reflected and non-reflected interrogating light. A light emitted from respective features is detected. Either or both, constructive interference of interrogating light at the features, or constructive interference of light emitted from the features, can be obtained to allow lowering of light power from the source, enhanced signal, or reduced noise, or combinations of the foregoing. High depth discrimination may also be obtained without the need for a confocal detection system with conventional pinhole.
    • 一种询问可寻址阵列单元的方法和装置,其包括基板,在基板的前侧上的光反射层,以及阵列的前侧上的多个特征。 对于多个特征中的每一个,该方法可以包括与反射和未反射的询问光同时照亮特征。 检测从各个特征发射的光。 可以获得在特征中询问光的建构性干扰或从特征发射的光的建构性干扰,以允许降低源的光功率,增强的信号或降低的噪声或前述的组合。 也可以获得高深度鉴别,而不需要具有常规针孔的共焦检测系统。
    • 2. 发明授权
    • Optical scanning apparatus
    • 光学扫描装置
    • US5585639A
    • 1996-12-17
    • US508021
    • 1995-07-27
    • Andreas DorselNicholas Sampas
    • Andreas DorselNicholas Sampas
    • G01N21/64
    • G01N21/6452B01J2219/00707
    • An optical scanning apparatus for scanning an array of sample regions carried on the surface of a substrate is disclosed. The apparatus includes a beam generator for generating a light beam effective to produce detectable light from such sample regions, and scanning optics for scanning the beam in one direction corresponding to a linear array of such sample regions. Light emitted from the linear array is imaged through an imaging system whose optical axis is angularly offset from the optical axis of the illumination beam, onto a photodetector. The optical configuration achieves high performance with relatively simple optics.
    • 公开了一种用于扫描载体在衬底表面上的样品区域阵列的光学扫描装置。 该装置包括用于产生有效产生来自这些样品区域的可检测光的光束的光束发生器,以及扫描光学元件,用于沿对应于这种样品区域的线性阵列的一个方向扫描光束。 从线性阵列发射的光通过成像系统成像,该成像系统的光轴与照明光束的光轴成角度地偏移到光电检测器上。 光学配置通过相对简单的光学器件实现高性能。
    • 4. 发明授权
    • Imaging system for a microlithographical projection light system
    • 微光刻投影系统成像系统
    • US07719658B2
    • 2010-05-18
    • US10597776
    • 2005-01-13
    • Andreas DorselToralf GrunerBernhard KneerSusanne BederAlexander EppleNorbert Wabra
    • Andreas DorselToralf GrunerBernhard KneerSusanne BederAlexander EppleNorbert Wabra
    • G03B27/52G03B27/42G03B27/54G03B27/32
    • G03F7/70225G03F7/70241G03F7/70341G03F7/70958G03F7/70966
    • Imaging system of a microlithographic projection exposure apparatus, with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element (201, 309, 506) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid (202, 310, 507, 601) is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating (401) between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating (401) lies on a substrate surface that faces in the direction of gravity.
    • 一种具有投影物镜(200,300,500,600)的投影物镜(200,300,500,600)的成像系统,该投影物镜用于投影能够将物镜平面中的位置的掩模图像投影到感光涂层上,该光敏涂层可以 被设置在图像平面中的位置,并且具有用于将浸没液体(202,310,507a)填充到图像平面和最后光学元件(201,309,506)之间的间隙空间中的液体输送装置(205) )在投影物镜的像平面侧; 其特征在于,所述投影物镜的像面侧的最后一个光学元件被布置为使得从重力方向看,所述光学元件遵循所述图像平面; 并且其中所述投影物镜被配置成使得当所述系统在浸没时操作时,所述浸没液体至少在一些区域中具有面向远离所述图像平面的方向的凸曲面。 还提出将投影物镜的像面侧上的最后一个光学元件(201,309,506)布置在图像平面下方,使浸液(202,310,507,601) 至少部分地保持在图像平面侧的最后一个光学元件上的基本上为盆形的区域中。 此外,可以提供一种旋转器,其用于使承载感光涂层(401)的基板在其中感光涂层位于与重力方向相对的基板表面上的传送方向和曝光方向之间旋转, 感光涂层(401)位于面向重力方向的基板表面上。
    • 8. 发明申请
    • Imaging System for a Microlithographical Projection Light System
    • 微光刻投影光系统成像系统
    • US20070285637A1
    • 2007-12-13
    • US10597776
    • 2005-01-13
    • Andreas DorselToralf GrunerBernhard KneerSusanne BederAlexander EppleNorbert Wabra
    • Andreas DorselToralf GrunerBernhard KneerSusanne BederAlexander EppleNorbert Wabra
    • G03B27/42
    • G03F7/70225G03F7/70241G03F7/70341G03F7/70958G03F7/70966
    • Imaging system of a microlithographic projection exposure apparatus with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element (201, 309, 506) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid (202, 310, 507, 601) is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating (401) between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating (401) lies on a substrate surface that faces in the direction of gravity.
    • 具有投影物镜(200,300,500,600)的微光刻投影曝光装置的成像系统,其用于投射能够被设置在物平面内的掩模的图像到感光涂层上,该感光涂层可以是 设置在图像平面中的位置,以及用于将浸没液体(202,310,507)填充到图像平面和最后光学元件(201,309,506)之间的间隙空间中的液体输送装置(205) 在投影物镜的像平面侧; 其特征在于,所述投影物镜的像面侧的最后一个光学元件被布置为使得从重力方向看,所述光学元件遵循所述图像平面; 并且其中所述投影物镜被配置成使得当所述系统在浸没时操作时,所述浸没液体至少在一些区域中具有面向远离所述图像平面的方向的凸曲面。 还提出将投影物镜的像面侧上的最后一个光学元件(201,309,506)布置在图像平面下方,使浸液(202,310,507,601) 至少部分地保持在图像平面侧上的最后一个光学元件上的大致桶形区域中。 此外,可以提供旋转器,其用于使承载感光涂层(401)的基板在传感方向之间旋转,其中感光涂层位于与重力方向相对的基板表面上,并且曝光取向 感光涂层(401)位于面向重力方向的基板表面上。