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1. 发明申请

US20100156198A1 SHIELD LAYER PLUS REFRIGERATED BACKSIDE COOLING FOR PLANAR MOTORS 审中-公开
标题翻译：平板电机的屏蔽层加热后备冷却
公开(公告)号：US20100156198A1
公开(公告)日：2010-06-24
申请号：US12643888
申请日：2009-12-21
申请人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
发明人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
IPC分类号： H02K9/20 , H02K41/03
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/19 , H02K9/20 , H02K41/031 , H02K2201/18
摘要： According to one aspect of the present invention, a motor arrangement includes at least one coil, a cover plate, and a shield layer. The at least one coil has a first side and a second side. The cover plate is positioned substantially over the first side of the at least one coil at a distance from the at least one coil. The shield layer is positioned between the first side of the at least one coil and the cover plate, and has a top surface. The top surface contacts the cover plate, and includes a liquid and a gas that form a mixture and cause the top surface to have a substantially constant temperature.
摘要翻译：根据本发明的一个方面，电动机装置包括至少一个线圈，盖板和屏蔽层。该至少一个线圈具有第一侧和第二侧。覆盖板基本上位于距离至少一个线圈一定距离的至少一个线圈的第一侧上方。屏蔽层位于至少一个线圈的第一侧和盖板之间，并具有顶面。顶表面接触盖板，并且包括形成混合物的液体和气体，并使顶表面具有基本恒定的温度。

2. 发明申请

US20120062866A1 MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开
标题翻译：电磁致动器的微通道冷却线圈展示减少的EDDY-CURRENT DRAG
公开(公告)号：US20120062866A1
公开(公告)日：2012-03-15
申请号：US13225235
申请日：2011-09-02
申请人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
发明人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
IPC分类号： G03B27/58 , H02K41/02
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70875 , H02K9/19 , H02K41/031 , H02K2201/18
摘要： Electromagnetic actuators are disclosed having at least one actively cooled coil assembly. Exemplary actuators are linear and planar motors of which the cooled coil assembly has a coil having first and second main surfaces. A respective thermally conductive cooling plate is in thermal contact with at least one main surface of the coil. Defined in or on each cooling plate is a coolant passageway that conducts a liquid coolant. A primary pattern of the coolant passageway is coextensive with at least part of the main surface of the coil. The primary pattern can have a secondary pattern through which coolant flows in a manner reducing eddy-current losses. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices exhibit reduced eddy-current drag.
摘要翻译：公开了具有至少一个主动冷却的线圈组件的电磁致动器。示例性致动器是线性和平面电动机，其中冷却的线圈组件具有具有第一和第二主表面的线圈。相应的导热冷却板与线圈的至少一个主表面热接触。在每个冷却板中或每个冷却板上定义的是冷却剂通道，其导通液体冷却剂。冷却剂通道的主要图案与线圈的主表面的至少一部分共同延伸。初级图案可以具有二次图案，冷却剂通过该图案以减少涡流损耗的方式流动。示例性的次要图案是蛇纹石。示例性的主要图案是径向的或具有径向方面，例如X形图案。该装置表现出减小的涡流阻力。

3. 发明申请

US20070091289A1 Apparatus and method for recovering liquid droplets in immersion lithography 有权
标题翻译：浸没式光刻液液滴回收装置及方法
公开(公告)号：US20070091289A1
公开(公告)日：2007-04-26
申请号：US11583069
申请日：2006-10-19
申请人： Alex Poon , Leonard Kho , Gaurav Keswani
发明人： Alex Poon , Leonard Kho , Gaurav Keswani
IPC分类号： G03B27/42
CPC分类号： G03F7/70925 , G03B27/42 , G03F7/70341 , G03F7/70725
摘要： Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.
摘要翻译：通过移动衬底相对于浸入式喷嘴使基板的剩余部分已经通过浸入式喷嘴的方式残留在衬底的一部分上的浸入流体，使得残留有浸没流体的衬底部分再次被浸入式喷嘴通过。确定要移动衬底以移除剩余浸没流体的路径。该路径可以基于先前的基底移动来确定，包括先前移动的速度和/或长度等因素。或者，可以检测浸入液体残留的基板的部分，然后基于检测结果，移动基板以使浸没流体保留的基板的部分通过浸渍喷嘴。浸没流体也可以从位于基底之外的载物台表面除去。

4. 发明申请

US20070046910A1 Apparatus and method for recovering fluid for immersion lithography 有权
标题翻译：用于浸没式光刻的液体回收装置及方法
公开(公告)号：US20070046910A1
公开(公告)日：2007-03-01
申请号：US11443361
申请日：2006-05-31
申请人： Alex Poon , Leonard Kho , Gaurav Keswani
发明人： Alex Poon , Leonard Kho , Gaurav Keswani
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. A porous member is disposed adjacent to the immersion area. A pressure control system provides a first low pressure to a first portion of the porous member to remove immersion fluid that escapes from the immersion area, and provides a second low pressure to a second portion of the porous member to remove immersion fluid that escapes from the immersion area. The second low pressure is different from the first low pressure.
摘要翻译：一种设备和方法从浸没式光刻系统中的投影系统和曝光对象之间的间隙中形成的浸没区域中回收流体。多孔构件邻近浸入区域设置。压力控制系统向多孔构件的第一部分提供第一低压以去除从浸没区域逸出的浸没流体，并且向多孔构件的第二部分提供第二低压以除去从该多孔构件逸出的浸没流体沉浸区域。第二低压与第一低压不同。

5. 发明申请

US20120262687A1 APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 有权
标题翻译：用于在浸没式切割机中的波形交换期间保持与光学组件相关的流体流体的装置和方法
公开(公告)号：US20120262687A1
公开(公告)日：2012-10-18
申请号：US13532195
申请日：2012-06-25
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译：装置和方法将浸没液体保持在与光学组件相邻的空间中。光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间，第二部分设置在插入构件和衬底之间，衬底台或两者。当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。

6. 发明授权

US08237911B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权
标题翻译：在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法
公开(公告)号：US08237911B2
公开(公告)日：2012-08-07
申请号：US11976898
申请日：2007-10-29
申请人： Alex Poon , Leonard Kho , Gaurav Keswani , Derek Coon
发明人： Alex Poon , Leonard Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/32 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译：装置和方法将浸没液体保持在与光学组件相邻的空间中。光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间，第二部分设置在插入构件和衬底之间，衬底台或两者。当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。

7. 发明申请

US20100271159A1 Electromagnetic Coil Design for Improved Thermal Performance 审中-公开
标题翻译：用于提高热性能的电磁线圈设计
公开(公告)号：US20100271159A1
公开(公告)日：2010-10-28
申请号：US12718600
申请日：2010-03-05
申请人： Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
发明人： Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
IPC分类号： H01F5/00
CPC分类号： H01F7/08 , G03F7/70858 , G03F7/709 , H01F5/00 , H01F27/2876
摘要： Methods and apparatus for improving the thermal performance of electromagnetic coils are disclosed. According to one aspect of the present invention, an electromagnetic actuator includes a core and a coil. The coil is formed form a conductor wire that includes a plurality of windings. The windings are arranged around the core, and include at least a first set of windings and a second set of windings. The first set of windings has a different geometry from the second set of windings.
摘要翻译：公开了用于改善电磁线圈的热性能的方法和装置。根据本发明的一个方面，电磁致动器包括芯和线圈。线圈形成为包括多个绕组的导线。绕组围绕芯布置，并且包括至少第一组绕组和第二组绕组。第一组绕组具有与第二组绕组不同的几何形状。

8. 发明授权

US07751026B2 Apparatus and method for recovering fluid for immersion lithography 有权
标题翻译：用于浸没式光刻的液体回收装置及方法
公开(公告)号：US07751026B2
公开(公告)日：2010-07-06
申请号：US11443361
申请日：2006-05-31
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. A porous member is disposed adjacent to the immersion area. A pressure control system provides a first low pressure to a first portion of the porous member to remove immersion fluid that escapes from the immersion area, and provides a second low pressure to a second portion of the porous member to remove immersion fluid that escapes from the immersion area. The second low pressure is different from the first low pressure.
摘要翻译：一种设备和方法从浸没式光刻系统中的投影系统和曝光对象之间的间隙中形成的浸没区域中回收流体。多孔构件邻近浸没区域设置。压力控制系统向多孔构件的第一部分提供第一低压以去除从浸没区域逸出的浸没流体，并且向多孔构件的第二部分提供第二低压以除去从该多孔构件逸出的浸没流体沉浸区域。第二低压与第一低压不同。

9. 发明授权

US07576833B2 Gas curtain type immersion lithography tool using porous material for fluid removal 有权
标题翻译：使用多孔材料进行流体清除的气帘式浸没式光刻工具
公开(公告)号：US07576833B2
公开(公告)日：2009-08-18
申请号：US11987788
申请日：2007-12-04
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through an immersion fluid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. Gas is provided through an inlet into the gap. A porous region is provided adjacent the gas inlet. Immersion fluid that collects near the gas inlet is removed by the porous region.
摘要翻译：气帘式浸没式光刻装置具有与气体入口相邻的流体去除多孔区域，以防止蒸发冷却。该装置包括保持具有成像表面的基板和具有最后光学元件的投影光学系统的基板保持器。投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸没流体将图像投影到基板上的目标成像区域上。浸没元件将浸没液保持在间隙中。通过进入间隙的入口提供气体。在气体入口附近设置多孔区域。通过多孔区域去除在气体入口附近收集的浸液。

10. 发明申请

US20080231823A1 Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus 审中-公开
标题翻译：用于减少浸没式光刻设备浸没液体逸出的装置和方法
公开(公告)号：US20080231823A1
公开(公告)日：2008-09-25
申请号：US12076501
申请日：2008-03-19
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Yasufumi Nishii
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Yasufumi Nishii
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A stage assembly includes a workpiece table that supports the workpiece adjacent to an optical assembly. An environmental system supplies and removes immersion liquid to and from a space between the workpiece and the optical assembly to form an immersion area. The environmental system has a lower surface disposed opposite from an upper surface of the workpiece and/or the workpiece table. The lower surface is spaced a first distance from the workpiece and/or the workpiece table to form a meniscus at a periphery of the immersion area. An edge member is provided on the environmental system and extends past the lower surface of the environmental system so that a lower portion of the edge member is spaced a second distance, smaller than the first distance, from the upper surface of the workpiece and/or the workpiece table at a position beyond the periphery of the immersion area.
摘要翻译：台架组件包括支撑邻近光学组件的工件的工件台。环境系统将浸入液体从工件和光学组件之间的空间提供并移除，以形成浸入区域。环境系统具有与工件的上表面和/或工件台相对设置的下表面。下表面与工件和/或工件台间隔开第一距离，以在浸没区域的周边形成弯液面。边缘构件设置在环境系统上并且延伸越过环境系统的下表面，使得边缘构件的下部与工件的上表面间距第二距离小于第一距离，并且/ 工件台在超过浸没区域周边的位置。

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