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1. 发明申请

US20080231823A1 Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus 审中-公开
标题翻译：用于减少浸没式光刻设备浸没液体逸出的装置和方法
公开(公告)号：US20080231823A1
公开(公告)日：2008-09-25
申请号：US12076501
申请日：2008-03-19
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Yasufumi Nishii
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Yasufumi Nishii
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A stage assembly includes a workpiece table that supports the workpiece adjacent to an optical assembly. An environmental system supplies and removes immersion liquid to and from a space between the workpiece and the optical assembly to form an immersion area. The environmental system has a lower surface disposed opposite from an upper surface of the workpiece and/or the workpiece table. The lower surface is spaced a first distance from the workpiece and/or the workpiece table to form a meniscus at a periphery of the immersion area. An edge member is provided on the environmental system and extends past the lower surface of the environmental system so that a lower portion of the edge member is spaced a second distance, smaller than the first distance, from the upper surface of the workpiece and/or the workpiece table at a position beyond the periphery of the immersion area.
摘要翻译：台架组件包括支撑邻近光学组件的工件的工件台。环境系统将浸入液体从工件和光学组件之间的空间提供并移除，以形成浸入区域。环境系统具有与工件的上表面和/或工件台相对设置的下表面。下表面与工件和/或工件台间隔开第一距离，以在浸没区域的周边形成弯液面。边缘构件设置在环境系统上并且延伸越过环境系统的下表面，使得边缘构件的下部与工件的上表面间距第二距离小于第一距离，并且/ 工件台在超过浸没区域周边的位置。

2. 发明授权

US08634055B2 Apparatus and method to control vacuum at porous material using multiple porous materials 有权
标题翻译：使用多孔材料控制多孔材料真空的装置和方法
公开(公告)号：US08634055B2
公开(公告)日：2014-01-21
申请号：US12698565
申请日：2010-02-02
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
IPC分类号： G03B27/52 , G03B27/54 , G03B27/32 , G03B27/68 , G03B27/42
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.
摘要翻译：浸没液体限制装置从浸没式光刻系统中的浸没区域中浸没液体从浸没区域中恢复，该浸没区域包括投影系统和曝光对象之间的间隙。该装置包括限制构件，其包括出口和孔，将图案化图像投射到物体上。第一透液性构件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一室。第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室房间。在第一室和向第一室供应低压的真空系统之间提供疏水性多孔构件。

3. 发明授权

US08289497B2 Apparatus and methods for recovering fluid in immersion lithography 有权
标题翻译：用于在浸没式光刻中回收流体的装置和方法
公开(公告)号：US08289497B2
公开(公告)日：2012-10-16
申请号：US12379419
申请日：2009-02-20
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译：浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中，液体限制构件和液体分配器。液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。液体转向器位于台架和至少第一多孔部分之间。

4. 发明申请

US20120062866A1 MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开
标题翻译：电磁致动器的微通道冷却线圈展示减少的EDDY-CURRENT DRAG
公开(公告)号：US20120062866A1
公开(公告)日：2012-03-15
申请号：US13225235
申请日：2011-09-02
申请人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
发明人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
IPC分类号： G03B27/58 , H02K41/02
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70875 , H02K9/19 , H02K41/031 , H02K2201/18
摘要： Electromagnetic actuators are disclosed having at least one actively cooled coil assembly. Exemplary actuators are linear and planar motors of which the cooled coil assembly has a coil having first and second main surfaces. A respective thermally conductive cooling plate is in thermal contact with at least one main surface of the coil. Defined in or on each cooling plate is a coolant passageway that conducts a liquid coolant. A primary pattern of the coolant passageway is coextensive with at least part of the main surface of the coil. The primary pattern can have a secondary pattern through which coolant flows in a manner reducing eddy-current losses. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices exhibit reduced eddy-current drag.
摘要翻译：公开了具有至少一个主动冷却的线圈组件的电磁致动器。示例性致动器是线性和平面电动机，其中冷却的线圈组件具有具有第一和第二主表面的线圈。相应的导热冷却板与线圈的至少一个主表面热接触。在每个冷却板中或每个冷却板上定义的是冷却剂通道，其导通液体冷却剂。冷却剂通道的主要图案与线圈的主表面的至少一部分共同延伸。初级图案可以具有二次图案，冷却剂通过该图案以减少涡流损耗的方式流动。示例性的次要图案是蛇纹石。示例性的主要图案是径向的或具有径向方面，例如X形图案。该装置表现出减小的涡流阻力。

5. 发明申请

US20080198348A1 Apparatus and methods for minimizing force variation from immersion liquid in lithography systems 审中-公开
标题翻译：用于最小化光刻系统中浸入液体的力变化的装置和方法
公开(公告)号：US20080198348A1
公开(公告)日：2008-08-21
申请号：US12068737
申请日：2008-02-11
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic projection apparatus includes an optical assembly that projects an image onto a workpiece, and a containment member disposed adjacent to a lower end of the optical assembly. The containment member has an aperture through which an exposure beam passes from the optical assembly to the workpiece. The lithographic projection apparatus also includes a stage assembly including a workpiece table that supports the workpiece adjacent to the containment member. A space between the containment member and the workpiece is filled with an immersion liquid. The lithographic projection apparatus further includes a liquid collection system that has a recess in the workpiece table that receives immersion liquid that overflows the space between the containment member and the workpiece. At least part of the recess is disposed radially outward of the workpiece. The recess is partially filled with a porous material.
摘要翻译：光刻投影装置包括将图像投影到工件上的光学组件和邻近光学组件的下端设置的容纳构件。容纳构件具有孔，曝光光束通过该孔从光学组件通过工件。平版印刷投影装置还包括台架组件，其包括支撑靠近容纳构件的工件的工件台。容纳构件和工件之间的空间填充有浸没液体。光刻投影装置还包括液体收集系统，该液体收集系统在工件台中具有凹部，该凹部接收溢流在容纳构件和工件之间的空间的浸没液体。凹部的至少一部分设置在工件的径向外侧。凹部部分地填充有多孔材料。

6. 发明申请

US20070279608A1 Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权
标题翻译：浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中
公开(公告)号：US20070279608A1
公开(公告)日：2007-12-06
申请号：US11523595
申请日：2006-09-20
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithography apparatus having a fluid confinement plate, which completely submerges the imaging surface of a substrate, is disclosed. The apparatus includes an imaging element defining an image and a stage configured to support the substrate. A projection optical system is provided to project the image defined by the imaging element onto the imaging surface of the substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of the projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface. In one embodiment, the droplet control element is a porous surface formed on the first surface. A vacuum is used to pull any excess immersion fluid through the porous region to prevent the formation of droplets. In a second embodiment, the droplet control element is a sloped surface that causes any immersion fluid on the first surface to flow toward to main body of immersion fluid in the gap.
摘要翻译：公开了一种具有完全浸没衬底的成像表面的流体限制板的光刻设备。该装置包括限定图像的成像元件和被配置为支撑基板的台。提供投影光学系统以将由成像元件限定的图像投影到基板的成像表面上。在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。流体限制板包括面对间隙的第一表面并与基底的成像表面相对。第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。在一个实施例中，液滴控制元件是形成在第一表面上的多孔表面。使用真空来吸引多余的浸渍流体通过多孔区域以防止形成液滴。在第二实施例中，液滴控制元件是使第一表面上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面。

7. 发明授权

US08934080B2 Apparatus and methods for recovering fluid in immersion lithography 有权
公开(公告)号：US08934080B2
公开(公告)日：2015-01-13
申请号：US13617251
申请日：2012-09-14
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.

8. 发明申请

US20090237631A1 Apparatus and methods for recovering fluid in immersion lithography 有权
标题翻译：用于在浸没式光刻中回收流体的装置和方法
公开(公告)号：US20090237631A1
公开(公告)日：2009-09-24
申请号：US12379419
申请日：2009-02-20
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译：浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中，液体限制构件和液体分配器。液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。液体转向器位于台架和至少第一多孔部分之间。

9. 发明申请

US20090231560A1 Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate 有权
标题翻译：浸没式光刻设备和方法，在浸没液体限制构件和衬底之间具有可移动的液体转向器
公开(公告)号：US20090231560A1
公开(公告)日：2009-09-17
申请号：US12382100
申请日：2009-03-09
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani , Daishi Tanaka
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani , Daishi Tanaka
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
摘要翻译：浸没光刻设备包括具有最终光学元件的投影系统和可移动到投影系统下方的位置的台架，使得在最终光学元件与台面的表面之间存在间隙。浸没液体填充表面和最终光学元件之间的间隙。液体限制构件将浸没液体保持在间隙中。浸没液体具有弯液面，其中液体接触环境气体，弯月面限定了浸没区域的覆盖区域。可移动的液体转向器位于液体限制构件和载物台之间。可移动液体分配器在平行于载物台表面的方向上相对于液体限制构件移动，并且包括围绕浸没区域的开口，当平台静止时，开口接触或与浸没区域稍微间隔开。

10. 发明授权

US07532309B2 Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权
标题翻译：浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中
公开(公告)号：US07532309B2
公开(公告)日：2009-05-12
申请号：US11523595
申请日：2006-09-20
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： A lithography apparatus includes a fluid confinement plate which can completely submerge the imaging surface of a substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of a projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface.
摘要翻译：光刻设备包括可以完全浸没衬底的成像表面的流体限制板。在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。流体限制板包括面对间隙的第一表面并与基底的成像表面相对。第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。

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