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    • 10. 发明申请
    • Adhesive sheet roll for wafer processing
    • 用于晶片加工的粘合片卷
    • US20050191456A1
    • 2005-09-01
    • US11054826
    • 2005-02-10
    • Kouichi HashimotoKazuhiko Yamamoto
    • Kouichi HashimotoKazuhiko Yamamoto
    • C09J7/02C09J133/00C09J175/14C09J201/02H01L21/00H01L21/301H01L21/304B32B9/00
    • C09J7/22C09J7/38C09J7/403C09J2203/326C09J2205/31H01L21/67132Y10S428/906Y10T428/14Y10T428/1476Y10T428/24355
    • To present an adhesive sheet roll for wafer processing excellent in storage stability, radiation curing property, and low contamination to wafer. To present an adhesive sheet for wafer processing prepared by cutting the adhesive sheet roll for wafer processing, and an adhesive sheet with semiconductor wafer. To present a manufacturing method of semiconductor device using adhesive sheet for wafer processing or adhesive sheet with semiconductor wafer, and a semiconductor device obtained in this manufacturing method. An adhesive film for roll wafer processing which laminating multiple layers of laminated film stacking up base film, radiation curing type adhesive layer, and releasing film in this sequence, in which the arithmetic average roughness (Ra) of the other surface of the side of the base film and/or releasing film contacting with the radiation curing type adhesive layer is 1 μm or more, and the weight of the radical polymerization initiator contained in the radiation curing type adhesive layer is less than 1000 ppm.
    • 提供用于晶片处理的粘合片卷,其具有优异的储存稳定性,辐射固化性能和对晶片的低污染。 呈现通过切割用于晶片加工的粘合片卷制备的用于晶片加工的粘合片,以及具有半导体晶片的粘合片。 介绍使用晶片加工用粘合片或半导体晶片的半导体器件的制造方法以及在该制造方法中获得的半导体器件。 一种用于辊晶片处理的粘合膜,其中以层叠多层叠层膜叠层基膜,辐射固化型粘合剂层和脱模膜,其中该层的另一面的算术平均粗糙度(Ra) 与辐射固化型粘合剂层接触的基膜和/或脱模膜为1μm以上,辐射固化型粘合剂层中所含的自由基聚合引发剂的重量小于1000ppm。