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1. 发明申请

US20140107350A1 Process for Preparing Episulfide Compounds 有权
标题翻译：制备二硫化锡化合物的方法
公开(公告)号：US20140107350A1
公开(公告)日：2014-04-17
申请号：US14112795
申请日：2012-04-20
申请人： Akitake Nakamura , Takeshi Endo
发明人： Akitake Nakamura , Takeshi Endo
IPC分类号： C07D331/02
CPC分类号： C07D331/02
摘要： Provided is a method for producing an episulfide compound, the method including a step of thiating epoxy groups of (B) an epoxy compound by a reaction with (C) a thiating agent in the presence of (A) a polyhydric hydroxyl compound having two or more hydroxyl groups.
摘要翻译：提供了一种环硫化合物的制备方法，该方法包括在（A）具有两个或多个羟基化合物的多羟基化合物的存在下，通过与（C）硫化剂的反应，将（B）环氧化合物的环氧基更多的羟基。

2. 发明授权

US09051293B2 Process for preparing episulfide compounds 有权
标题翻译：制备环硫化合物的方法
公开(公告)号：US09051293B2
公开(公告)日：2015-06-09
申请号：US14112795
申请日：2012-04-20
申请人： Akitake Nakamura , Takeshi Endo
发明人： Akitake Nakamura , Takeshi Endo
IPC分类号： C07D331/02
CPC分类号： C07D331/02
摘要： Provided is a method for producing an episulfide compound, the method including a step of thiating epoxy groups of (B) an epoxy compound by a reaction with (C) a thiating agent in the presence of (A) a polyhydric hydroxyl compound having two or more hydroxyl groups.
摘要翻译：提供了一种环硫化合物的制备方法，该方法包括在（A）具有两个或多个羟基化合物的多羟基化合物的存在下，通过与（C）硫化剂的反应，将（B）环氧化合物的环氧基更多的羟基。

3. 发明申请

US20140121293A1 Composition and Polymer 有权
标题翻译：组合物和聚合物
公开(公告)号：US20140121293A1
公开(公告)日：2014-05-01
申请号：US14117291
申请日：2012-07-18
申请人： Akitake Nakamura , Takeshi Endo
发明人： Akitake Nakamura , Takeshi Endo
IPC分类号： C08G75/08
CPC分类号： C08G75/08
摘要： Disclosed is a composition comprising (A) at least one compound selected from the group consisting of an ether compound having two or more ether groups, a trivalent phosphorus compound, and a ketone compound, (B) a boron trihalide, and (C) an episulfide compound.
摘要翻译：公开了一种组合物，其包含（A）至少一种选自具有两个以上醚基的醚化合物，三价磷化合物和酮化合物的化合物，（B）三卤化硼，和（C）环硫化合物。

4. 发明授权

US09334371B2 Composition and polymer 有权
标题翻译：组合物和聚合物
公开(公告)号：US09334371B2
公开(公告)日：2016-05-10
申请号：US14117291
申请日：2012-07-18
申请人： Akitake Nakamura , Takeshi Endo
发明人： Akitake Nakamura , Takeshi Endo
IPC分类号： C08F2/46 , C08G61/04 , C08G75/08
CPC分类号： C08G75/08
摘要： Disclosed is a composition comprising (A) at least one compound selected from the group consisting of an ether compound having two or more ether groups, a trivalent phosphorus compound, and a ketone compound, (B) a boron trihalide, and (C) an episulfide compound.
摘要翻译：公开了一种组合物，其包含（A）至少一种选自具有两个以上醚基的醚化合物，三价磷化合物和酮化合物的化合物，（B）三卤化硼，和（C）环硫化合物。

5. 发明申请

US20130266737A1 CATALYTIC LOW TEMPERATURE POLYMERIZATION 审中-公开
标题翻译：催化低温聚合
公开(公告)号：US20130266737A1
公开(公告)日：2013-10-10
申请号：US13557769
申请日：2012-07-25
申请人： Atsushi SUDO , Ryoichi Kudoh , Kazuya Arima , Hiroshi Nakayama , Takeshi Endo , Andreas Taden , Thomas Huver
发明人： Atsushi SUDO , Ryoichi Kudoh , Kazuya Arima , Hiroshi Nakayama , Takeshi Endo , Andreas Taden , Thomas Huver
IPC分类号： C08F4/00 , C08L79/04 , B05D3/02 , C08G73/06
CPC分类号： C08G61/122 , C08G59/686 , C08G61/123 , C08G73/0677 , C08L65/00 , C08L79/04 , C09D165/00 , C09D179/04
摘要： The present invention relates to a polymerization catalyst, comprising at least two components, wherein at least one or more of said at least two components are selected from the group of nitrogen containing heterocycles and/or their derivatives and at least one or more of said at least two components is selected from the group of organic sulfur containing acids and/or derivatives of organic sulfur containing acids.
摘要翻译：本发明涉及一种包含至少两种组分的聚合催化剂，其中所述至少两种组分中的至少一种或多种选自含氮杂环和/或其衍生物的组，以及至少一种或多种所述的至少两种组分选自有机含硫酸和/或有机含硫酸的衍生物。

6. 发明授权

US08440524B2 Semiconductor device manufacturing method 有权
标题翻译：半导体器件制造方法
公开(公告)号：US08440524B2
公开(公告)日：2013-05-14
申请号：US13030790
申请日：2011-02-18
申请人： Hirokazu Fujiwara , Masaki Konishi , Jun Kawai , Takeo Yamamoto , Takeshi Endo , Takashi Katsuno , Yukihiko Watanabe , Narumasa Soejima
发明人： Hirokazu Fujiwara , Masaki Konishi , Jun Kawai , Takeo Yamamoto , Takeshi Endo , Takashi Katsuno , Yukihiko Watanabe , Narumasa Soejima
IPC分类号： H01L21/00
CPC分类号： H01L29/7811 , C21D1/09 , C22F1/10 , H01L21/0485 , H01L21/0495 , H01L21/268 , H01L21/324 , H01L21/67115 , H01L29/0615 , H01L29/0619 , H01L29/1095 , H01L29/1608 , H01L29/45 , H01L29/47 , H01L29/6606 , H01L29/66068 , H01L29/7813 , H01L29/872
摘要： A method for manufacturing a semiconductor device including a semiconductor substrate composed of silicon carbide, an upper surface electrode which contacts an upper surface of the substrate, and a lower surface electrode which contacts a lower surface of the substrate, the method including steps of: (a) forming an upper surface structure on the upper surface side of the substrate, and (b) forming a lower surface structure on the lower surface side of the substrate. The step (a) comprises steps of: (a1) depositing an upper surface electrode material layer on the upper surface of the substrate, the upper surface electrode material layer being a raw material layer of the upper surface electrode, and (a2) annealing the upper surface electrode material layer. The step (b) comprises steps of: (b1) depositing a lower surface electrode material layer on the lower surface of the substrate, the lower surface electrode material layer being a raw material layer of the lower surface electrode, and (b2) annealing the lower surface electrode material layer with a laser to make an ohmic contact between the lower surface electrode and the substrate.
摘要翻译：一种半导体器件的制造方法，该半导体器件包括由碳化硅构成的半导体衬底，与衬底的上表面接触的上表面电极和与衬底的下表面接触的下表面电极，该方法包括以下步骤：（ a）在基板的上表面侧上形成上表面结构，（b）在基板的下表面侧形成下表面结构。步骤（a）包括以下步骤：（a1）在基板的上表面上沉积上表面电极材料层，上表面电极材料层是上表面电极的原料层，（a2）使上表面电极材料层。步骤（b）包括以下步骤：（b1）在基板的下表面上沉积下表面电极材料层，下表面电极材料层是下表面电极的原料层，（b2）使下表面电极材料层用激光器在下表面电极和衬底之间形成欧姆接触。

7. 发明申请

US20120238653A1 LATENT CURING AGENT AND EPOXY COMPOSITIONS CONTAINING THE SAME 审中-公开
标题翻译：专利固化剂和含有该固化剂的环氧组合物
公开(公告)号：US20120238653A1
公开(公告)日：2012-09-20
申请号：US13442327
申请日：2012-04-09
申请人： Masashi Horikiri , Atsushi Sudo , Takeshi Endo
发明人： Masashi Horikiri , Atsushi Sudo , Takeshi Endo
IPC分类号： C07C237/20 , C07C231/02 , C08L63/02
CPC分类号： C09J11/06 , C08G59/44 , C08G59/50 , C08K5/05 , C08K5/07 , C08K5/13 , C08K5/20 , C09J163/00
摘要： A latent curing agent obtained by the reaction of a coumarin compound with an amine.
摘要翻译：通过香豆素化合物与胺的反应获得的潜在性固化剂。

8. 发明申请

US20120194651A1 Shape measuring apparatus 审中-公开
标题翻译：形状测量仪
公开(公告)号：US20120194651A1
公开(公告)日：2012-08-02
申请号：US13200652
申请日：2011-09-28
申请人： Kenta Kanto , Seiho Yamashita , Takeshi Endo
发明人： Kenta Kanto , Seiho Yamashita , Takeshi Endo
IPC分类号： H04N13/02
CPC分类号： G01B11/24 , G01B11/00 , G06T7/571
摘要： [PROBLEMS] To provide a shape measuring apparatus having a configuration which enables the operation for aligning a measuring probe and a candidate object to be simplified when the shape of the candidate object is measured.[MEANS TO SOLVE THE PROBLEMS] A shape measuring apparatus is configured so that an optical probe 20 moves relative to a candidate object, and the three-dimensional shape of the candidate object is measured without contact from information obtained by the optical probe 20. The shape measuring apparatus includes a gantry structure 10 allowing the optical probe 20 to be moved to a predetermined position relative to the candidate object, and a support device 30 allowing the candidate object to be rotated around at least two rotational axes.
摘要翻译：本发明提供一种形状测量装置，其具有能够在测量候选物体的形状时使测量探针和候选物体对准的操作简化的构造。解决问题的手段形状测量装置被配置为使得光学探针20相对于候选物体移动，并且测量候选物体的三维形状而不与光学探针20获得的信息接触。形状测量装置包括允许光学探头20相对于候选物体移动到预定位置的台架结构10，以及允许候选物体围绕至少两个旋转轴线旋转的支撑装置30。

9. 发明申请

US20110262185A1 EXPOSURE DEVICE, IMAGE FORMING APPARATUS AND MIRROR ADJUSTING METHOD 有权
标题翻译：曝光装置，图像形成装置和镜像调整方法
公开(公告)号：US20110262185A1
公开(公告)日：2011-10-27
申请号：US13090977
申请日：2011-04-20
申请人： Takeshi Endo
发明人： Takeshi Endo
IPC分类号： G03G15/04
CPC分类号： G03G15/04072 , G03G15/0435 , G03G21/1666 , G03G2215/0404 , G03G2221/1636
摘要： An exposure device includes a mirror to reflect light used for exposure of an object, a holder to hold the mirror, an adhesive that bonds the mirror to the holder and elastically deforms, and an adjusting tool that pushes the mirror to change a direction of the mirror.
摘要翻译：曝光装置包括用于反射用于物体曝光的光的反射镜，用于保持反射镜的保持器，将反射镜粘合到保持器并弹性变形的粘合剂，以及调节工具，其推动反射镜以改变方向镜子。

10. 发明授权

US07825017B2 Method of making silicon carbide semiconductor device having multi-layered passivation film with uneven surfaces 有权
标题翻译：制造具有不平坦表面的多层钝化膜的碳化硅半导体器件的方法
公开(公告)号：US07825017B2
公开(公告)日：2010-11-02
申请号：US12406578
申请日：2009-03-18
申请人： Takeo Yamamoto , Takeshi Endo , Eiichi Okuno , Masaki Konishi
发明人： Takeo Yamamoto , Takeshi Endo , Eiichi Okuno , Masaki Konishi
IPC分类号： H01L21/28 , H01L21/283 , H01L21/44 , H01L21/441 , H01L31/0312 , H01L29/47
CPC分类号： H01L29/872 , H01L21/0495 , H01L29/0611 , H01L29/063 , H01L29/1608 , H01L29/6606 , H01L29/7395 , H01L29/8083 , H01L2224/02166 , H01L2224/04042 , H01L2224/05552 , H01L2224/05567 , H01L2924/0002 , H01L2924/12032 , H01L2924/1305 , H01L2924/13055 , H01L2924/13062 , H01L2924/13091 , H01L2924/00
摘要： A silicon carbide semiconductor device provided as a semiconductor chip includes a substrate, a drift layer on the substrate, an insulation film on the drift layer, a semiconductor element formed in a cell region of the drift layer, a surface electrode formed on the drift layer and electrically coupled to the semiconductor element through an opening of the insulation film, and a passivation film formed above the drift layer around the periphery of the cell region to cover an outer edge of the surface electrode. The passivation film has an opening through which the surface electrode is exposed outside. A surface of the passivation film is made uneven to increase a length from an inner edge of the opening of the passivation film to a chip edge measured along the surface of the passivation film.
摘要翻译：设置为半导体芯片的碳化硅半导体器件包括衬底，衬底上的漂移层，漂移层上的绝缘膜，形成在漂移层的单元区域中的半导体元件，形成在漂移层上的表面电极并且通过所述绝缘膜的开口电耦合到所述半导体元件，以及钝化膜，所述钝化膜形成在所述电池区周围的漂移层上方以覆盖所述表面电极的外边缘。钝化膜具有开口，表面电极通过该开口暴露在外部。钝化膜的表面被制成不均匀以增加从钝化膜的开口的内边缘到沿着钝化膜的表面测量的芯片边缘的长度。

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