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1. 发明授权

US06874515B2 Substrate dual-side processing apparatus 失效
标题翻译：基板双面处理装置
公开(公告)号：US06874515B2
公开(公告)日：2005-04-05
申请号：US10131041
申请日：2002-04-25
申请人： Akira Ishihara , Michiaki Matsushita , Yukihiko Sakata
发明人： Akira Ishihara , Michiaki Matsushita , Yukihiko Sakata
IPC分类号： H01L21/677 , B08B1/04 , B08B3/02 , B08B11/02 , H01L21/304 , H01L21/687
CPC分类号： B08B1/04 , B08B3/02 , B08B11/02 , B08B2203/0288 , G02F2001/1316 , H01L21/68707 , Y10S134/902
摘要： A substrate dual-side processing apparatus has a processor to apply a specific process to a front surface and a rear surface of a substrate, a reversing unit to reverse the substrate and a substrate-transfer mechanism to transfer the substrate between the processor and the reversing unit. The reversing unit has a holder for holding the substrate when the substrate is being transferred to and from the substrate-transfer mechanism and a rotating mechanism for rotating the substrate, thus the substrate being reversed while held by the holders. The reversing unit may have a pair of holders for holding the substrate at the front and rear surfaces, a drive mechanism for driving the pair of holders so that the holders become close to or apart from each other and a rotating mechanism for rotating the substrate, thus the substrate being reversed while held by the holders.
摘要翻译：基板双面处理装置具有处理器，用于对基板的前表面和后表面施加特定的处理，反转单元以反转基板和基板传送机构，以在处理器和反转之间传送基板单元。反转单元具有用于当基板被转移到基板传送机构和从基板传送机构传送的基板时用于保持基板的保持器和用于旋转基板的旋转机构，因此基板在由保持器保持的同时被反转。反转单元可以具有用于将基板保持在前表面和后表面的一对保持器，用于驱动一对保持器以使保持器彼此接近或分离的驱动机构和用于旋转基板的旋转机构，因此基板在由保持器保持的同时被反转。

2. 发明申请

US20090003825A1 SUBSTRATE PROCESSING SYSTEM 有权
标题翻译：基板加工系统
公开(公告)号：US20090003825A1
公开(公告)日：2009-01-01
申请号：US12137076
申请日：2008-06-11
申请人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
发明人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
IPC分类号： G03D3/08
CPC分类号： H01L21/67769 , Y10S414/139
摘要： A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette.
摘要翻译：盒式等待块连接到涂覆和显影处理系统的转移输入/输出块，并且在盒式等待块中，盒式磁带传送入/出单元，盒式磁带等待单元，盒传送单元和基板处理提供单位。在盒式磁带等待块中，用于在磁带盒输入/输出单元，磁带盒等待单元和磁带盒传送单元之间传送磁带的盒式磁带传送单元，以及用于在盒式磁带等待单元中的盒之间传送基板的传送单元并提供基板处理单元。每个盒式待机单元具有用于打开盒的端口的打开机构。

3. 发明授权

US5421056A Spin chuck and treatment apparatus using same 失效
标题翻译：旋转卡盘和处理设备使用相同
公开(公告)号：US5421056A
公开(公告)日：1995-06-06
申请号：US229675
申请日：1994-04-19
申请人： Kiyohisa Tateyama , Michiaki Matsushita
发明人： Kiyohisa Tateyama , Michiaki Matsushita
IPC分类号： B05C11/08 , B08B11/02 , G03F7/16 , G03F7/30 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/304 , H01L21/306 , H01L21/683
CPC分类号： H01L21/67028 , B08B11/02 , Y10S134/902 , Y10T279/18
摘要： A cleaning apparatus for cleaning a semiconductor wafer comprises a spin chuck having a turn table. A gas supplying passage is formed in a shaft for supporting the turn table to supply a protecting gas to the rear surface of the wafer. A conical movable member, arranged to cover an end off the shaft, is movable upward and downward in accordance with the flow off the protecting gas supplied thereto. Inner ends of three reciprocating arms, supported by the turn table and extending in radial directions, abut against an outer surface of the movable member and biased by springs. Fixed pins are arranged on the turn table at positions which divide the circumference of the turn table into three equal parts, along the edge of the wafer. Three swingable levers are arranged such that one is provided between two adjacent fixed pins. One end of each swingable lever is connected to the outer end of each reciprocating arm and the other end of the lever has a pin brought into contact with the edge of the wafer. When the protecting gas is supplied, the movable member is moved upward to a working position, and the reciprocating arms are pressed by the movable member and moved outward. As a result, the swingable levers are moved so as to bring their pins into contact with the edge of the wafer, thereby clamping the wafer among the pins.
摘要翻译：用于清洁半导体晶片的清洁装置包括具有转台的旋转卡盘。气体供给通道形成在用于支撑转台的轴中，以将保护气体供应到晶片的后表面。根据从其供应的保护气体的流动，可将上述端部从该轴上覆盖的圆锥形可移动部件向上和向下移动。由转台支撑并在径向方向上延伸的三个往复臂的内端部抵靠可动件的外表面并被弹簧偏压。固定销布置在转台上，沿着晶圆的边缘将转台的圆周分成三个相等的部分。三个可摆动的杆被布置成使得一个设置在两个相邻的固定销之间。每个可摆动杆的一端连接到每个往复臂的外端，并且杆的另一端具有与晶片的边缘接触的销。当提供保护气体时，可动件向上移动到工作位置，并且往复臂由可动件按压并向外移动。结果，摆动杆被移动以使它们的销与晶片的边缘接触，从而将晶片夹在销中。

4. 发明授权

US06814809B2 Coating and developing apparatus and pattern forming method 有权
标题翻译：涂装和显影装置及图案形成方法
公开(公告)号：US06814809B2
公开(公告)日：2004-11-09
申请号：US10004892
申请日：2001-12-07
申请人： Michiaki Matsushita , Masataka Matsunaga , Seiji Kozawa
发明人： Michiaki Matsushita , Masataka Matsunaga , Seiji Kozawa
IPC分类号： B05C1102
CPC分类号： H01L21/67178 , G03F7/70875 , G03F7/70991 , H01L21/67109 , H01L21/6715 , H01L21/67225 , H01L21/67778
摘要： A coating and developing apparatus has an interface section equipped with a temperature adjuster (a cooling unit). A temperature-raised substrate due to exposure on periphery of the substrate outside a circuit-forming area thereon is adjusted to a predetermined temperature by the temperature adjuster and then transferred to an exposing apparatus. The temperature adjustments before exposure provide almost the same temperature over many substrates to be transferred to the exposing apparatus for less thermal effects to exposing processing, thus achieving high yields. The interface section is further provided with first and second transfer mechanisms, the first serving to transfer substrates between the processor and the exposing apparatus and the second serving to transfer substrates to each unit of a shelf section, for high transfer performance, thus achieving high throughput.
摘要翻译：涂料和显影装置具有装配有温度调节器（冷却单元）的界面部分。由于在其上的电路形成区域外部的衬底的周围曝光引起的升温衬底通过温度调节器调节到预定温度，然后转移到曝光装置。曝光之前的温度调节提供了几乎相同的温度在许多衬底上转移到曝光设备，以减少曝光处理的热效应，从而实现高产量。接口部分还设置有第一和第二传送机构，第一传送机构和第二传送机构第一传送机构用于在处理器和曝光设备之间传送基板，第二传送机构用于将基板传送到搁板部分的每个单元，以实现高传输性能，从而实现高吞吐量。

5. 发明授权

US5964954A Double-sided substrate cleaning apparatus and cleaning method using the same 失效
标题翻译：双面基板清洗装置及使用其的清洗方法
公开(公告)号：US5964954A
公开(公告)日：1999-10-12
申请号：US890996
申请日：1997-07-10
申请人： Hiroyuki Matsukawa , Akira Yonemizu , Michiaki Matsushita , Akihiro Fujimoto , Takashi Takekuma , Hidetami Yaegashi , Takahide Fukuda
发明人： Hiroyuki Matsukawa , Akira Yonemizu , Michiaki Matsushita , Akihiro Fujimoto , Takashi Takekuma , Hidetami Yaegashi , Takahide Fukuda
IPC分类号： H01L21/304 , B08B1/04 , B08B3/04 , B08B3/12 , H01L21/00 , H01L21/311 , H01L21/677 , B08B7/00 , B08B7/04
CPC分类号： H01L21/67173 , B08B1/007 , B08B1/04 , B08B3/04 , B08B3/12 , H01L21/31116 , H01L21/67028 , H01L21/67046 , H01L21/67051 , H01L21/6715 , H01L21/67178 , B08B2203/0288 , Y10S134/902 , Y10S414/136 , Y10S414/141
摘要： There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.
摘要翻译：提供了一种双面基板清洁装置，包括用于装载/卸载其中存储有待处理物体的载体的承载站，用于传送从载体台取出的物体的传送机构，至少一个清洁机构，沿着传送机构传送物体的传送路径，用于清洁物体，以及沿着传送路径布置的用于反转物体的物体反转机构。

6. 发明授权

US08206076B2 Substrate processing system 有权
标题翻译：基板加工系统
公开(公告)号：US08206076B2
公开(公告)日：2012-06-26
申请号：US12137076
申请日：2008-06-11
申请人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
发明人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
IPC分类号： H01L21/677
CPC分类号： H01L21/67769 , Y10S414/139
摘要： A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette.
摘要翻译：盒式等待块连接到涂覆和显影处理系统的转移输入/输出块，并且在盒式等待块中，盒式磁带传送入/出单元，盒式磁带等待单元，盒传送单元和基板处理提供单位。在盒式磁带等待块中，用于在磁带盒输入/输出单元，磁带盒等待单元和磁带盒传送单元之间传送磁带的盒式磁带传送单元，以及用于在盒式磁带等待单元中的盒之间传送基板的传送单元并提供基板处理单元。每个盒式待机单元具有用于打开盒的端口的打开机构。

7. 发明授权

US5518542A Double-sided substrate cleaning apparatus 失效
标题翻译：双面基板清洗装置
公开(公告)号：US5518542A
公开(公告)日：1996-05-21
申请号：US336213
申请日：1994-11-04
申请人： Hiroyuki Matsukawa , Akira Yonemizu , Michiaki Matsushita , Akihiro Fujimoto , Takashi Takekuma , Hidetami Yaegashi , Takahide Fukuda
发明人： Hiroyuki Matsukawa , Akira Yonemizu , Michiaki Matsushita , Akihiro Fujimoto , Takashi Takekuma , Hidetami Yaegashi , Takahide Fukuda
IPC分类号： H01L21/304 , B08B1/04 , B08B3/04 , B08B3/12 , H01L21/00 , H01L21/311 , H01L21/677 , B05C1/00
CPC分类号： H01L21/67173 , B08B1/007 , B08B1/04 , B08B3/04 , B08B3/12 , H01L21/31116 , H01L21/67028 , H01L21/67046 , H01L21/67051 , H01L21/6715 , H01L21/67178 , B08B2203/0288 , Y10S134/902 , Y10S414/136 , Y10S414/141
摘要： There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.
摘要翻译：提供了一种双面基板清洁装置，包括用于装载/卸载其中存储有待处理物体的载体的承载站，用于传送从承载站取出的物体的传送机构，至少一个清洁机构，布置沿着传送机构传送物体的传送路径，用于清洁物体，以及沿着传送路径布置的用于反转物体的物体反转机构。

8. 发明授权

US5498294A Apparatus and method for washing substrates 失效
标题翻译：洗涤基材的设备和方法
公开(公告)号：US5498294A
公开(公告)日：1996-03-12
申请号：US154964
申请日：1993-11-19
申请人： Michiaki Matsushita , Yutaka Yamahira
发明人： Michiaki Matsushita , Yutaka Yamahira
IPC分类号： H01L21/304 , H01L21/00 , H01L21/677 , H02P8/12 , B08B7/04 , B08B11/00
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A substrates-cleaning apparatus including a first unit provided with a scrubber for scrubbing a single side of a substrate, a second unit provided with a turning mechanism for turning the substrate upside down or vice versa, and a carrier robot for carrying the substrate between the first and the second unit.
摘要翻译：一种基板清洁装置，包括：第一单元，设置有用于洗涤基板的单侧的洗涤器;第二单元，设置有用于将基板上下颠倒的反转的转动机构;以及用于将基板承载在基板之间的载体机器人第一和第二单位。

9. 发明授权

US5375291A Device having brush for scrubbing substrate 失效
标题翻译：具有擦洗基板的刷子的装置
公开(公告)号：US5375291A
公开(公告)日：1994-12-27
申请号：US62536
申请日：1993-05-18
申请人： Kiyohisa Tateyama , Michiaki Matsushita
发明人： Kiyohisa Tateyama , Michiaki Matsushita
IPC分类号： B08B1/04 , B08B11/02 , H01L21/00 , B08B3/02
CPC分类号： H01L21/67173 , B08B1/007 , B08B1/04 , B08B11/02 , H01L21/67046 , Y10S134/902
摘要： A substrate cleaning device comprising a motor for rotating a wafer together with a spin plate, claws for holding the wafer so as to form a space between the spin plate and the wafer, a jet nozzle through which cleaning solution is jetted onto an upper surface of the wafer, a rotating brush for brush-cleaning the upper surface of the wafer, a mechanism for blowing nitrogen gas or pure water onto the lower surface of the wafer, and a mechanism for exhausting the space between the spin plate and the wafer, wherein a solution passage for the solution blowing mechanism and an exhaust passage for the exhaust mechanism are formed in a drive shaft of the motor and communicated with the space.
摘要翻译：一种基板清洗装置，其特征在于，包括用于与旋转板一起旋转晶片的马达，用于保持所述晶片的爪，以在所述旋转板和所述晶片之间形成空间，喷嘴，将清洗液喷射到所述旋转板的上表面晶片，用于刷洗晶片的上表面的旋转刷，用于将氮气或纯水吹入晶片的下表面的机构，以及用于排出旋转板和晶片之间的空间的机构，其中用于溶液吹送机构的溶液通道和用于排气机构的排气通道形成在马达的驱动轴中并与空间连通。

10. 发明授权

US08528889B2 Device and method for supporting a substrate 有权
标题翻译：用于支撑衬底的装置和方法
公开(公告)号：US08528889B2
公开(公告)日：2013-09-10
申请号：US12748652
申请日：2010-03-29
申请人： Seiji Nakano , Michiaki Matsushita , Naruaki Iida , Suguru Enokida , Katsuhiro Morikawa
发明人： Seiji Nakano , Michiaki Matsushita , Naruaki Iida , Suguru Enokida , Katsuhiro Morikawa
IPC分类号： B23Q3/00 , B25B1/00
CPC分类号： H01L21/67742 , H01L21/68707
摘要： A substrate support device including a support member having a lower-surface support section to support a lower surface of a substrate; and a position restriction section provided on the lower-surface support section, the position restriction section being formed to surround a periphery of the substrate supported on the lower-surface support section and restrict a position of the substrate. At least one of the lower-surface support section and the position restriction section includes a base material and a protective film formed to cover the base material and prevent at least one of wear and chemical erosion to which the base material will be subject. The substrate support device further includes, for example, a base that supports the support member, and a driving structure that moves the support member in a relative fashion with respect to the base, and is constructed as a substrate transport device.
摘要翻译：一种基板支撑装置，包括：支撑构件，具有用于支撑基板的下表面的下表面支撑部分; 以及设置在所述下表面支撑部上的位置限制部，所述位置限制部形成为围绕支撑在所述下表面支撑部上的所述基板的周围，并限制所述基板的位置。下表面支撑部和位置限制部中的至少一个包括基材和保护膜，所述基材和保护膜形成为覆盖基材并防止基材将受到的磨损和化学侵蚀中的至少一种。基板支撑装置还包括例如支撑支撑构件的基座和相对于基座相对移动支撑构件的驱动结构，并且被构造为基板输送装置。

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