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1. 发明授权

US06874515B2 Substrate dual-side processing apparatus 失效
标题翻译：基板双面处理装置
公开(公告)号：US06874515B2
公开(公告)日：2005-04-05
申请号：US10131041
申请日：2002-04-25
申请人： Akira Ishihara , Michiaki Matsushita , Yukihiko Sakata
发明人： Akira Ishihara , Michiaki Matsushita , Yukihiko Sakata
IPC分类号： H01L21/677 , B08B1/04 , B08B3/02 , B08B11/02 , H01L21/304 , H01L21/687
CPC分类号： B08B1/04 , B08B3/02 , B08B11/02 , B08B2203/0288 , G02F2001/1316 , H01L21/68707 , Y10S134/902
摘要： A substrate dual-side processing apparatus has a processor to apply a specific process to a front surface and a rear surface of a substrate, a reversing unit to reverse the substrate and a substrate-transfer mechanism to transfer the substrate between the processor and the reversing unit. The reversing unit has a holder for holding the substrate when the substrate is being transferred to and from the substrate-transfer mechanism and a rotating mechanism for rotating the substrate, thus the substrate being reversed while held by the holders. The reversing unit may have a pair of holders for holding the substrate at the front and rear surfaces, a drive mechanism for driving the pair of holders so that the holders become close to or apart from each other and a rotating mechanism for rotating the substrate, thus the substrate being reversed while held by the holders.
摘要翻译：基板双面处理装置具有处理器，用于对基板的前表面和后表面施加特定的处理，反转单元以反转基板和基板传送机构，以在处理器和反转之间传送基板单元。反转单元具有用于当基板被转移到基板传送机构和从基板传送机构传送的基板时用于保持基板的保持器和用于旋转基板的旋转机构，因此基板在由保持器保持的同时被反转。反转单元可以具有用于将基板保持在前表面和后表面的一对保持器，用于驱动一对保持器以使保持器彼此接近或分离的驱动机构和用于旋转基板的旋转机构，因此基板在由保持器保持的同时被反转。

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