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    • 5. 发明授权
    • Information processing apparatus, information processing method, and program
    • 信息处理装置,信息处理方法和程序
    • US09077885B2
    • 2015-07-07
    • US13613935
    • 2012-09-13
    • Masaaki IsozuKazuhiro Watanabe
    • Masaaki IsozuKazuhiro Watanabe
    • G09G5/00H04N5/232G01C21/36
    • H04N5/232G01C21/3647G01C21/367
    • An information processing apparatus may include at least one processor, at least one interface from the at least one processor to at least one sensor configured to detect an orientation of the apparatus, and at least one interface from the at least one processor to at least one display. The at least one processor may be configured to, in response to receiving input from the at least one sensor that indicates a change in the orientation of the apparatus within a time limit from an occurrence of an event, cause the at least one display to display one or more previously created photographs. An information processing method may include detecting an orientation of an apparatus having a display, and in response to detecting a change in the apparatus's orientation within a time limit from an occurrence of an event, displaying one or more previously created photographs on the display.
    • 信息处理设备可以包括至少一个处理器,至少一个从至少一个处理器到至少一个传感器的至少一个接口,该传感器被配置成检测设备的方向,以及至少一个从至少一个处理器到至少一个处理器的接口 显示。 所述至少一个处理器可以被配置为响应于来自所述至少一个传感器的接收指示在发生事件的时间范围内指示所述设备的方向的改变的输入,使得所述至少一个显示器显示 一个或多个先前创建的照片。 信息处理方法可以包括检测具有显示器的装置的方位,并且响应于在事件发生的时间限制内检测到装置的取向的变化,在显示器上显示一个或多个先前创建的照片。
    • 8. 发明授权
    • Semiconductor manufacturing apparatus and control system and control method therefor
    • 半导体制造装置及其控制系统及其控制方法
    • US08577494B2
    • 2013-11-05
    • US13020692
    • 2011-02-03
    • Kazuhiro MiwaKazuhiro WatanabeAkito Mifune
    • Kazuhiro MiwaKazuhiro WatanabeAkito Mifune
    • G06F19/00
    • G05B13/048
    • Disclosed herein is technology for, among other things, a semiconductor manufacturing apparatus, and a control system and a control method therefor, by which a target parameter that is measured from a wafer processed with a plurality of processing parameters that are processing conditions of the semiconductor manufacturing apparatus to process a wafer, a multiple classification analysis is performed with the plurality of processing parameters and the target parameter to calculate a model formula expressing the target parameter in a selected parameter, a predicted value of the target parameter of the wafer being processed by use of the model formula is calculated, while the processing is being performed, the processing parameters of the processing is modified on the basis of the predicted value, and the processing is continuously performed.
    • 本文公开了一种技术,其中包括半导体制造装置,以及控制系统及其控制方法,通过该半导体制造装置,从用作为半导体的处理条件的多个处理参数处理的晶片测量的目标参数 用于处理晶片的制造装置,利用多个处理参数和目标参数进行多重分类分析,以计算表示所选参数中的目标参数的模型公式,所述晶片的目标参数的预测值由 在进行处理的同时,计算出模型公式的使用,根据该预测值对处理的处理参数进行修正,继续进行处理。
    • 9. 发明授权
    • Tracing apparatus and tracing system
    • 跟踪装置和追踪系统
    • US08464089B2
    • 2013-06-11
    • US13057023
    • 2010-06-03
    • Kazuhiro WatanabeTakashi Hashimoto
    • Kazuhiro WatanabeTakashi Hashimoto
    • G06F1/00G06F1/04G06F1/12G06F17/50G06F15/00G06F11/00G06F9/44G01R23/10G01R25/00G01F1/00
    • G06F11/3636
    • A tracing apparatus for tracing operational information that is output from a plurality of processing units in relation to data processing operations, the tracing apparatus comprising for each of the processing units: a counting unit configured to obtain and output a counter value for the corresponding processing unit, the counter value obtained by counting clock signals that are input to the processing unit at an operating frequency thereof; a counter value conversion unit configured to obtain and output a converted counter value for the corresponding processing unit, the converted counter value obtained by converting the counter value based on the assumption that the processing unit has a given reference operating frequency; and an adding unit configured to acquire an operational information set from the corresponding processing unit, and to add the converted counter value to the operational information set.
    • 一种跟踪装置,用于跟踪与数据处理操作相关的多个处理单元输出的操作信息,所述跟踪装置包括用于每个处理单元的计数单元,被配置为获得并输出相应处理单元的计数器值 通过计算以其工作频率输入到处理单元的时钟信号而获得的计数器值; 计算器值转换单元,被配置为获得并输出对应的处理单元的转换计数器值,所述转换计数器值是通过基于所述处理单元具有给定参考操作频率的假设转换所述计数器值而获得的; 以及添加单元,被配置为从相应的处理单元获取操作信息集,并将转换的计数器值添加到操作信息集合。