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1. 发明授权

US06299690B1 Die wall lubrication method and apparatus 有权
标题翻译：模墙润滑方法及装置
公开(公告)号：US06299690B1
公开(公告)日：2001-10-09
申请号：US09442411
申请日：1999-11-18
申请人： Paul-Emile Mongeon , Sylvain Pelletier , Abdelouahab Ziani
发明人： Paul-Emile Mongeon , Sylvain Pelletier , Abdelouahab Ziani
IPC分类号： B05B512
CPC分类号： B30B15/0011 , B22F3/03 , B22F2999/00 , B30B15/0017 , B22F2003/026 , B22F2202/06
摘要： A method of lubricating the wall surfaces of a die cavity used in powder metallurgy involves spraying the wall surfaces with tribocharged particles of a lubricant material. The method is carried out by means of an apparatus centered about a plug member which has a three-dimensional shape conforming generally to that of the article to be formed. The plug member is slightly smaller than the article so that when the plug member is inserted into the die cavity there is a small, but uniform, gap created between the outer wall surfaces of the plug member and the walls of the die cavity. The plug member is secured to a closing plate which can be inserted into the die cavity so as to be sealed therewith. The closing plate is provided with vent holes and the plug member has a plurality of spaced apart tubes extending therethrough, which tubes exit at one or more of the wall surfaces of the plug member. The lubricant material is fed using an inert gas under pressure through tubing which tribocharged the lubricant particles and the tribocharged particles are sprayed from the tubes in the plug member into the gap so that they are electrostatically attracted to the walls of the die cavity and adhere thereto. Any excess gas and lubricant exits the gap through the vent holes in the closing plate. A uniform thin coating of lubricant is created on the walls of the die cavity. The green density of the article formed in the die is greater, and the ejection force required to remove the formed article from the die cavity is less, than with existing methods and apparatus.
摘要翻译：用于粉末冶金中使用的模腔的壁表面润滑的方法包括用滑动摩擦的润滑剂材料的颗粒喷洒壁表面。该方法通过围绕具有与要形成的制品的立体形状一致的三维形状的塞子构件的装置进行。插头构件比制品稍小，使得当插头构件插入模腔中时，在插塞构件的外壁表面和模腔的壁之间产生小而均匀的间隙。插头构件被固定到可以插入模腔中以与其密封的封闭板。封闭板设置有通气孔，并且插塞构件具有延伸穿过其中的多个间隔开的管，该管在插塞构件的一个或多个壁表面处离开。润滑剂材料在加压下通过管道将惰性气体进料，该管道摩擦了润滑剂颗粒，并且将摩擦电荷的颗粒从插塞构件中的管道喷射到间隙中，使得它们被静电吸引到模腔的壁并粘附到其上。任何多余的气体和润滑剂通过封闭板上的通气孔离开间隙。在模腔的壁上产生均匀的薄涂层润滑剂。在模具中形成的制品的生坯密度更大，与现有的方法和装置相比，从模腔移出成形制品所需的喷射力较小。

2. 发明授权

US5976456A Method for producing aluminum alloy powder compacts 失效
标题翻译：铝合金粉末压块的制造方法
公开(公告)号：US5976456A
公开(公告)日：1999-11-02
申请号：US264689
申请日：1999-03-09
申请人： Abdelouahab Ziani , Sylvain Pelletier
发明人： Abdelouahab Ziani , Sylvain Pelletier
IPC分类号： B22F1/00 , B22F3/12
CPC分类号： B22F1/0085 , B22F2003/026 , B22F2998/10 , B22F2999/00
摘要： This invention relates to a method for producing sintered parts of aluminum or aluminum alloy with improved mechanical properties using batch degassing, die compaction and liquid phase sintering. The batch degassing consists of holding a prealloyed aluminum powder at a temperature of about 350.degree. to about 450.degree. C. in a stainless steel autoclave in which the pressure is reduced to less than 5.times.10.sup.-6 torr. Once the desired pressure is reached the powder is cooled down within the autoclave while still under vacuum. The resulting powder is then compacted at a pressure of 20 to 50 tsi at between room temperature and about 250.degree. C., but preferably at a warm temperature of about 65.degree. C. The final densification is completed by liquid phase sintering in argon atmosphere at 625.degree. C. This method allows the production of sintered compacts characterized by a density close to 97% of theoretical, which makes it possible to eliminate the need for a hot working step.
摘要翻译：本发明涉及使用间歇脱气，压模和液相烧结来改善机械性能的铝或铝合金烧结体的制造方法。间歇脱气包括在约350至约450℃的温度下保持在不锈钢高压釜中的预合金铝粉末，其中压力降低至小于5×10 -6乇。一旦达到所需的压力，粉末在仍然在真空下在高压釜内冷却。然后将所得粉末在室温至约250℃之间的压力下压制成20至50tsi，但优选在约65℃的温度下进行压实。最终致密化通过在氩气气氛中液相烧结来完成 625℃。该方法允许生产密度接近理论值的97％的烧结体，这使得可以消除对热加工步骤的需要。

3. 发明授权

US08342229B1 Method of making a CIG target by die casting 有权
标题翻译：通过压铸制造CIG靶的方法
公开(公告)号：US08342229B1
公开(公告)日：2013-01-01
申请号：US12588579
申请日：2009-10-20
申请人： Abdelouahab Ziani , Daniel R. Juliano
发明人： Abdelouahab Ziani , Daniel R. Juliano
IPC分类号： B22D17/08 , B22D19/04
CPC分类号： B22D17/08 , B22D19/04 , B22D21/025 , C23C14/0623 , C23C14/3407 , C23C14/3414 , H01L31/0322 , Y02E10/541 , Y02P70/521
摘要： A method of making a sputtering target includes providing a backing structure, and forming a die cast copper indium gallium sputtering target material on the backing structure.
摘要翻译：制造溅射靶的方法包括提供背衬结构，以及在背衬结构上形成压铸铜铟镓溅射靶材料。

4. 发明授权

US07935558B1 Sodium salt containing CIG targets, methods of making and methods of use thereof 有权
标题翻译：含有CIG靶的钠盐，制备方法及其使用方法
公开(公告)号：US07935558B1
公开(公告)日：2011-05-03
申请号：US12907595
申请日：2010-10-19
申请人： Daniel R. Juliano , Robert Tas , Neil Mackie , Abdelouahab Ziani
发明人： Daniel R. Juliano , Robert Tas , Neil Mackie , Abdelouahab Ziani
IPC分类号： H01L31/032
CPC分类号： H01L31/0322 , C23C14/0057 , C23C14/0623 , C23C14/562 , H01L21/02568 , H01L21/02579 , H01L21/02631 , H01L31/0749 , Y02E10/541 , Y02P70/521
摘要： A sputtering target includes at least one metal selected from copper, indium and gallium and a sodium containing compound.
摘要翻译：溅射靶包括至少一种选自铜，铟和镓的金属和含钠化合物。

5. 发明申请

US20070017803A1 Enhanced sputter target manufacturing method 审中-公开
公开(公告)号：US20070017803A1
公开(公告)日：2007-01-25
申请号：US11284911
申请日：2005-11-23
申请人： Abdelouahab Ziani , Bernd Kunkel
发明人： Abdelouahab Ziani , Bernd Kunkel
IPC分类号： C23C14/00
CPC分类号： C23C14/3414 , C22C19/07
摘要： A method of manufacturing a sputter target the method including the step of preparing a plurality of raw materials into a composition corresponding to alloy system, the plurality of raw materials comprising pure elements or master alloys. The method also includes the step of heating the plurality of raw materials under vacuum or under a partial pressure of argon (Ar) to a fully liquid state to form a molten alloy corresponding to the alloy system, solidifying the molten alloy to form an ingot, and reheating the ingot to a fully liquid state to form a diffuse molten alloy. The method further includes the steps of rapidly solidifying the diffuse molten alloy into a homogeneous pre-alloyed powder material, admixing pure elemental powders to the homogeneous pre-alloyed powder material, consolidating the homogeneous pre-alloyed powder material into a fully dense homogeneous material, hot rolling the fully dense homogeneous material. Moreover, the method includes the steps of cold rolling the fully dense homogeneous material, and machining the fully dense homogenous material to form a sputter target.

6. 发明申请

US20060078457A1 Low oxygen content alloy compositions 审中-公开
标题翻译：低含氧量合金组成
公开(公告)号：US20060078457A1
公开(公告)日：2006-04-13
申请号：US10961215
申请日：2004-10-12
申请人： Abdelouahab Ziani , Jon Apprill , David Furgason
发明人： Abdelouahab Ziani , Jon Apprill , David Furgason
IPC分类号： C22C5/04 , C22C18/00 , C22C28/00 , C22C22/00 , C22C38/00 , C22C19/03 , C22C19/07
CPC分类号： C22C5/04 , C22C18/00 , C22C19/005 , C22C19/07 , C22C22/00 , C22C28/00 , C22C30/00 , C22C38/00 , C23C14/3414
摘要： Alloy compositions include Mn alloys that combine Mn with one element selected from Ga, In, Ni and Zn. Also included are Fe alloys and Co alloys in which Fe or Co are combined with either Pt or Pd. The alloy compositions form ordered compounds having L10 or L12 type crystalline structures within specified compositional ranges. In addition, the alloy compositions have low levels of impurities, such as oxygen and sulfur, which provide better performance in magnetic memory applications. The alloy compositions preferably are formed into sputtering targets used for thin film applications.
摘要翻译：合金组合物包括将Mn与选自Ga，In，Ni和Zn中的一种元素组合的Mn合金。还包括Fe合金和Co合金，其中Fe或Co与Pt或Pd组合。该合金组合物在特定的组成范围内形成具有L1> 0或L1 / 2>型结晶结构的有序化合物。此外，合金组合物具有低水平的杂质，例如氧和硫，其在磁存储器应用中提供更好的性能。合金组合物优选形成用于薄膜应用的溅射靶。

7. 发明申请

US20080050263A1 Enhanced sputter target manufacturing method 审中-公开
公开(公告)号：US20080050263A1
公开(公告)日：2008-02-28
申请号：US11882502
申请日：2007-08-02
申请人： Abdelouahab Ziani , Bernd Kunkel
发明人： Abdelouahab Ziani , Bernd Kunkel
IPC分类号： B22F3/00 , B22F1/00 , B22F9/04
CPC分类号： C23C14/3414 , C22C19/07
摘要： A method of manufacturing a sputter target the method including the step of preparing a plurality of raw materials into a composition corresponding to alloy system, the plurality of raw materials comprising pure elements or master alloys. The method also includes the step of heating the plurality of raw materials under vacuum or under a partial pressure of argon (Ar) to a fully liquid state to form a molten alloy corresponding to the alloy system, solidifying the molten alloy to form an ingot, and reheating the ingot to a fully liquid state to form a diffuse molten alloy. The method further includes the steps of rapidly solidifying the diffuse molten alloy into a homogeneous pre-alloyed powder material, admixing pure elemental powders to the homogeneous pre-alloyed powder material, consolidating the homogeneous pre-alloyed powder material into a fully dense homogeneous material, hot rolling the fully dense homogeneous material. Moreover, the method includes the steps of cold rolling the fully dense homogeneous material, and machining the fully dense homogenous material to form a sputter target.

8. 发明申请

US20060233658A1 Enhanced formulation of cobalt alloy matrix compositions 失效
标题翻译：钴合金基体组合物的增强配方
公开(公告)号：US20060233658A1
公开(公告)日：2006-10-19
申请号：US11237938
申请日：2005-09-29
申请人： Abdelouahab Ziani
发明人： Abdelouahab Ziani
IPC分类号： C22C29/12
CPC分类号： C22C32/0026 , B22F2998/10 , B22F2999/00 , C22C19/07 , C22F1/10 , C23C14/3414 , C22C1/05 , B22F9/04 , B22F3/1216 , B22F3/15 , B22F2201/20
摘要： A method for manufacturing a single-element matrix cobalt-based granular media alloy composition formulated as Cof1-(MuOv)f2, M representing a base metal selected from the group consisting of magnesium (Mg), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), nickel (Ni), copper (Cu), zinc (Zn), aluminum (Al), silicon (Si), yttrium (Y), zirconium (Zr), niobium (Nb), molybdenum (Mo), ruthenium (Ru), indium (In), lanthanum (La), hafnium (Hf), tantalum (Ta), and tungsten (W), u and v representing the number of atoms of base metal M and oxygen (O) per oxide formula, respectively, and f1 and f2 being mole fractions represented by the equation f1+(u+v)f2=1. The method includes the steps of blending a Co-M master alloy powder and a Cou′Ov′ powder into a corresponding (CoaM1−a)f1′-(Cou′Ov′)f2′ formula, and densifying the blended powders.
摘要翻译：一种制备单组分基体钴基颗粒介质合金组合物的方法，该组合物被配制成如下的单元素基质钴基颗粒状介质合金组合物：（M 1， M代表选自镁（ⅰ）的贱金属（Ⅴ）（Ti），钒（V），铬（Cr），锰（Mn），铁（Fe），镍（Ni），铜（Cu），锌（Zn），铝（Al） Si），钇（Y），锆（Zr），铌（Nb），钼（Mo），钌（Ru），铟（In），镧（La），铪（Hf）（W），u和v分别代表贱金属M的原子数和每个氧化物式的氧（O），f 1和f 2 2是摩尔分数由等式f 1 +（u + v）f 2 2 = 1表示。该方法包括以下步骤：将Co-M母合金粉末和CoM O> v>粉末混合到相应的（Co>>>>>>>>> - - - - （ - ） - （ - ） - （ - ） - ' v v> and and and and and and and and and and and and and and and and and and and and and and and and and and and and and and and and and and and and and 致密化混合粉末。

9. 发明申请

US20050274221A1 Enhanced sputter target alloy compositions 审中-公开
标题翻译：增强的溅射靶合金组成
公开(公告)号：US20050274221A1
公开(公告)日：2005-12-15
申请号：US11183968
申请日：2005-07-19
申请人： Abdelouahab Ziani , Yuanda Cheng , Bernd Kunkel , Michael Bartholomeusz
发明人： Abdelouahab Ziani , Yuanda Cheng , Bernd Kunkel , Michael Bartholomeusz
IPC分类号： C23C14/00 , C23C14/14 , C23C14/34 , G11B5/64 , G11B5/65 , G11B5/851
CPC分类号： C23C14/3414 , C23C14/14 , G11B5/656 , G11B5/851
摘要： A sputter target, where the sputter target is comprised of cobalt (Co), greater than 0 and as much as 24 atomic percent chromium (Cr), greater than 0 and as much as 20 atomic percent platinum (Pt), greater than 0 and as much as 20 atomic percent boron (B), and greater than 0 and as much as 10 atomic percent gold (Au). The sputter target is further comprised of X1, where X1 is selected from the group consisting of tungsten (W), yttrium (Y), manganese (Mn), and molybdenum (Mo). The sputter target is further comprised of 0 to 7 atomic percent X2, wherein X2 is an element selected from the group consisting of titanium (Ti), vanadium (V), zirconium (Zr), niobium (Nb), ruthenium (Ru), rhodium (Rh), palladium (Pd), hafnium (Hf), tantalum (Ta), and iridium (Ir).
摘要翻译：溅射靶，其中溅射靶由钴（Co）组成，大于0且高达24原子％的铬（Cr），大于0且高达20原子％的铂（Pt）大于0，以及多达20原子百分比的硼（B），大于0和高达10原子％的金（Au）。溅射靶还包括X 1，其中X 1选自钨（W），钇（Y），锰（Mn）和钼（Mo）。溅射靶还包含0至7原子％的X 2 O 2，其中X 2是选自钛（Ti），钒（V），锆（Zr），铌（Nb），钌（Ru），铑（Rh），钯（Pd），铪（Hf），钽（Ta）和铱（Ir）。

10. 发明授权

US07494617B2 Enhanced formulation of cobalt alloy matrix compositions 失效
标题翻译：钴合金基体组合物的增强配方
公开(公告)号：US07494617B2
公开(公告)日：2009-02-24
申请号：US11237938
申请日：2005-09-29
申请人： Abdelouahab Ziani
发明人： Abdelouahab Ziani
IPC分类号： C22C32/00
CPC分类号： C22C32/0026 , B22F2998/10 , B22F2999/00 , C22C19/07 , C22F1/10 , C23C14/3414 , C22C1/05 , B22F9/04 , B22F3/1216 , B22F3/15 , B22F2201/20
摘要： A method for manufacturing a single-element matrix cobalt-based granular media alloy composition formulated as Cof1-(MuOv)f2, M representing a base metal selected from the group consisting of magnesium (Mg), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), nickel (Ni), copper (Cu), zinc (Zn), aluminum (Al), silicon (Si), yttrium (Y), zirconium (Zr), niobium (Nb), molybdenum (Mo), ruthenium (Ru), indium (In), lanthanum (La), hafnium (Hf), tantalum (Ta), and tungsten (W), u and v representing the number of atoms of base metal M and oxygen (O) per oxide formula, respectively, and f1 and f2 being mole fractions represented by the equation f1+(u+v)f2=1. The method includes the steps of blending a Co-M master alloy powder and a Cou′Ov′ powder into a corresponding (CoaM1−a)f1′-(Cou′Ov′)f2′ formula, and densifying the blended powders.
摘要翻译：一种配制为Cof 2 O 2 - （MuO v）f 2 N 2的单元素基体钴基粒状介质合金组合物的方法，M代表选自下组的基础金属由镁（Mg），钛（Ti），钒（V），铬（Cr），锰（Mn），铁（Fe），镍（Ni），铜（Cu），锌（Zn）），硅（Si），钇（Y），锆（Zr），铌（Nb），钼（Mo），钌（Ru），铟（In），镧（La），铪（Hf））和钨（W），u和v分别表示贱金属M的原子数和每个氧化物式的氧（O），f1和f2分别表示为等式f1 +（u + v）f2 = 1。该方法包括以下步骤：将Co-M母合金粉末和Cou'Ov'粉末混合到相应的（CoaM1-a）f2' - （Cou'Ov'）f 2的配方，并使混合的粉末致密化。

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