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1. 发明授权

US11599028B2 Methods and systems for clamping a substrate 有权
公开(公告)号：US11599028B2
公开(公告)日：2023-03-07
申请号：US16812175
申请日：2020-03-06
申请人： ASML Netherlands B.V.
发明人： Marc Smits
IPC分类号： G03F7/20
摘要： Methods and arrangement for clamping substrates to a support using adhesive material area disclosed.
The method comprises providing a support comprising a first surface defining a plane; applying adhesive material on at least portions of the first surface; and placing the substrate onto the adhesive material, wherein the adhesive material forms a plurality of support locations supporting the substrate. Preferably the adhesive material is cured at least partly during the application of a substantially uniformly distributed force to the substrate in the direction of the support.
The arrangements comprise a support comprising a first surface, for supporting the substrate via adhesive material, whereby the first surface defines a plane. Preferably it also comprises an arrangement for providing electromagnetic radiation, thermal energy, and/or a chemical substance to the adhesive material, and an arrangement for providing a substantially uniformly distributed force to the substrate in the direction of the support.

2. 发明授权

US10632509B2 Method and system for the removal and/or avoidance of contamination in charged particle beam systems 有权
公开(公告)号：US10632509B2
公开(公告)日：2020-04-28
申请号：US15963910
申请日：2018-04-26
申请人： ASML Netherlands B.V.
发明人： Marc Smits , Johan Joost Koning , Chris Franciscus Jessica Lodewijk , Hindrik Willem Mook , Ludovic Lattard
IPC分类号： B08B7/04 , H01J37/02 , H01J37/317 , B08B17/02 , H01J37/147 , H01J37/18
CPC分类号： B08B7/04 , B08B17/02 , H01J37/02 , H01J37/1472 , H01J37/18 , H01J37/3177 , H01J2237/006 , H01J2237/022 , H01J2237/0435 , H01J2237/0453 , H01J2237/0492
摘要： A charged particle beam system is disclosed, comprising:

a charged particle beam generator for generating a beam of charged particles;
a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles;
a source for providing a cleaning agent;
a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;

wherein the charged particle optical element comprises:

a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and
at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,

wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.

Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

3. 发明授权

US11738376B2 Method and system for the removal and/or avoidance of contamination in charged particle beam systems 有权
公开(公告)号：US11738376B2
公开(公告)日：2023-08-29
申请号：US17238124
申请日：2021-04-22
申请人： ASML Netherlands B.V.
发明人： Marc Smits , Johan Joost Koning , Chris Franciscus Jessica Lodewijk , Hindrik Willem Mook , Ludovic Lattard
IPC分类号： B08B7/04 , H01J37/02 , H01J37/317 , B08B17/02 , H01J37/147 , H01J37/18
CPC分类号： B08B7/04 , B08B17/02 , H01J37/02 , H01J37/1472 , H01J37/18 , H01J37/3177 , H01J2237/006 , H01J2237/022 , H01J2237/0435 , H01J2237/0453 , H01J2237/0492
摘要： A charged particle beam system is disclosed, comprising:

a charged particle beam generator for generating a beam of charged particles;
a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles;
a source for providing a cleaning agent;
a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;

wherein the charged particle optical element comprises:

a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and
at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,

wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.
Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

4. 发明授权

US11961698B2 Replaceable module for a charged particle apparatus 有权
公开(公告)号：US11961698B2
公开(公告)日：2024-04-16
申请号：US17344446
申请日：2021-06-10
申请人： ASML Netherlands B.V.
发明人： Christiaan Otten , Peter-Paul Crans , Marc Smits , Laura Del Tin , Christan Teunissen , Yang-Shan Huang , Stijn Wilem Herman Karel Steenbrink , Xuerang Hu , Qingpo Xi , Xinan Luo , Xuedong Liu
IPC分类号： H01J37/15 , H01J37/02 , H01J37/14 , H01J37/147 , H01J37/18 , H01J37/244 , H01J37/28 , H01J37/20 , H01J37/317
CPC分类号： H01J37/15 , H01J37/023 , H01J37/14 , H01J37/1477 , H01J37/18 , H01J37/244 , H01J37/28 , H01J37/20 , H01J37/3177 , H01J2237/2006 , H01J2237/20214 , H01J2237/2817
摘要： Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

5. 发明授权

US10987705B2 Method and system for the removal and/or avoidance of contamination in charged particle beam systems 有权
公开(公告)号：US10987705B2
公开(公告)日：2021-04-27
申请号：US16841547
申请日：2020-04-06
申请人： ASML Netherlands B.V.
发明人： Marc Smits , Johan Joost Koning , Chris Franciscus Jessica Lodewijk , Hindrik Willem Mook , Ludovic Lattard
IPC分类号： B08B7/04 , H01J37/02 , H01J37/317 , B08B17/02 , H01J37/147 , H01J37/18
摘要： A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

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