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1. 发明申请

US20060192930A1 EXPOSURE APPARATUS 审中-公开
标题翻译：曝光装置
公开(公告)号：US20060192930A1
公开(公告)日：2006-08-31
申请号：US11276382
申请日：2006-02-27
申请人： AKIKO IIMURA , Sunao Mori , Noriyasu Hasegawa
发明人： AKIKO IIMURA , Sunao Mori , Noriyasu Hasegawa
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto an object to be exposed, via a liquid that is filled in a space between a final optical element in the projection optical system and the object, and a liquid-holding member provided around the object and having a surface that is as high as a surface of the object, the liquid-holding member provided for retaining the liquid, wherein the surface of the liquid-holding member is processed so that a first contact angle between the liquid and the surface of the object is equal to or smaller than a second contact angle between the liquid and the surface of the liquid-holding member.
摘要翻译：曝光装置包括：投影光学系统，用于通过填充在投影光学系统中的最终光学元件与物体之间的空间的液体，将掩模版的图案投射到待曝光的物体上;液体保持构件设置在物体周围并且具有与物体的表面一样高的表面，用于保持液体的液体保持构件，其中液体保持构件的表面被加工成使得第一接触角液体和物体的表面等于或小于液体和液体保持构件的表面之间的第二接触角。

2. 发明申请

US20080198346A1 EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE 审中-公开
标题翻译：曝光装置和制造装置的方法
公开(公告)号：US20080198346A1
公开(公告)日：2008-08-21
申请号：US12026628
申请日：2008-02-06
申请人： Akiko Iimura , Noriyasu Hasegawa
发明人： Akiko Iimura , Noriyasu Hasegawa
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： An exposure apparatus, exposing a substrate via liquid, includes a projection optical system that projects a pattern of an original onto the substrate and a substrate stage that holds and moves the substrate. The substrate stage includes a chuck that holds the substrate, a top plate that surrounds the substrate held by the chuck, and a draining mechanism that drains liquid on the top plate. The top plate has a first area and a second area on the surface of the top plate. At least part of the first area is formed between the substrate held by the chuck and the second area. The contact angle of the first area with the liquid is smaller than the contact angle of the second area with the liquid. The draining mechanism drains liquid on the first area.
摘要翻译：曝光装置，通过液体曝光基板，包括将原稿图案投影到基板上的投影光学系统和保持和移动基板的基板台。衬底台包括夹持衬底的卡盘，围绕由卡盘保持的衬底的顶板以及排出顶板上的液体的排出机构。顶板在顶板的表面上具有第一区域和第二区域。第一区域的至少一部分形成在由卡盘保持的基板和第二区域之间。第一区域与液体的接触角小于第二区域与液体的接触角。排水机构在第一区域排出液体。

3. 发明授权

US08678808B2 Imprint apparatus and article manufacturing method 有权
标题翻译：印刷装置及制品制造方法
公开(公告)号：US08678808B2
公开(公告)日：2014-03-25
申请号：US13268351
申请日：2011-10-07
申请人： Setsuo Yoshida , Noriyasu Hasegawa , Yoshihiro Shiode , Tatsuya Hayashi
发明人： Setsuo Yoshida , Noriyasu Hasegawa , Yoshihiro Shiode , Tatsuya Hayashi
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.
摘要翻译：本发明的压印装置使用模具将压印材料模制在基板上，并固化压印材料以在基板上形成图案。该装置包括：支架，其构造成吸引模具以保持模具; 以及减压装置，其构造成减小由所述保持器保持的模具的背压，其中所述装置构造成与所述压模材料的模具释放平行地减小所述减压装置的背压。

4. 发明申请

US20080002169A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080002169A1
公开(公告)日：2008-01-03
申请号：US11755380
申请日：2007-05-30
申请人： Noriyasu Hasegawa , Tomofumi Nishikawara , Keita Sakai
发明人： Noriyasu Hasegawa , Tomofumi Nishikawara , Keita Sakai
IPC分类号： G03B27/42
CPC分类号： G03B27/58 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.
摘要翻译：至少一个示例性实施例涉及用于曝光衬底的曝光装置。曝光装置包括可移动基板台，投影光学系统，被配置为投射来自原稿的光并包括最终光学元件，以及设置在最终光学元件周围的喷嘴构件，并且包括与基板相对的相对表面。基板通过投影光学系统的最终表面和基板，投影光学系统和原稿之间的液体曝光。所述相对表面包括供给口，比所述供给口更远离所述最终光学元件的光轴提供的第一回收口以及设置在所述供给口与所述第一回收口之间的第一部分和第二部。第一部分和基底之间的距离比供给口和基底之间的距离长。

5. 发明申请

US20070291241A1 IMMERSION EXPOSURE APPARATUS 失效
标题翻译：倾斜曝光装置
公开(公告)号：US20070291241A1
公开(公告)日：2007-12-20
申请号：US11755389
申请日：2007-05-30
申请人： Keita Sakai , Noriyasu Hasegawa
发明人： Keita Sakai , Noriyasu Hasegawa
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.
摘要翻译：至少一个示例性实施例涉及被配置为通过包括投影光学和喷嘴单元的液体曝光基板的曝光装置。喷嘴单元具有回收液体的液体回收口和布置在最终透镜和液体回收口之间并供应液体的液体供给口。与液体回收口相比，喷嘴单元表面的外侧第二部分相对于液体的静态接触角比液体回收口的喷嘴单元表面的内侧第一部分的静态接触角大20° 或者更多。第二部分相对于液体的滑动角度为20°或更小。

6. 发明申请

US20070188721A1 Exposure Apparatus 失效
标题翻译：曝光装置
公开(公告)号：US20070188721A1
公开(公告)日：2007-08-16
申请号：US11736502
申请日：2007-04-17
申请人： Noriyasu Hasegawa
发明人： Noriyasu Hasegawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70808 , G03F7/70841 , G03F7/70916
摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto an object using a light with wavelength of 20 nm or less from a light source, and first and second accommodating parts for accommodating the projection optical system and the mask or the object, said first and second accommodating part has different pressures, wherein said a Ps/Po≧100 and Ps≦10−3 Pa are met, where Po is the pressure of the first accommodating part, and Ps is the pressure of the second accommodating part.
摘要翻译：曝光装置包括投影光学系统，用于使用来自光源的波长为20nm以下的光将掩模的图案投射到物体上，以及用于容纳投影光学系统和掩模的第一和第二容纳部分所述第一和第二容纳部分具有不同的压力，其中满足Ps / Po> = 100和Ps <= 10 -3 -3 Pa，其中Po是第一容纳部分的压力， Ps是第二容纳部的压力。

7. 发明申请

US20060001958A1 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US20060001958A1
公开(公告)日：2006-01-05
申请号：US11173417
申请日：2005-07-01
申请人： Noriyasu Hasegawa
发明人： Noriyasu Hasegawa
IPC分类号： G03B21/56
CPC分类号： G03F7/70808 , G03F7/70841 , G03F7/70916
摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto an object using a light with wavelength of 20 nm or less from a light source, and first and second accommodating parts for accommodating the projection optical system and the mask or the object, said first and second accommodating part has different pressures, wherein said a Ps/Po≧100 and Ps≦10−3 Pa are met, where Po is the pressure of the first accommodating part, and Ps is the pressure of the second accommodating part.
摘要翻译：曝光装置包括投影光学系统，用于使用来自光源的波长为20nm以下的光将掩模的图案投射到物体上，以及用于容纳投影光学系统和掩模的第一和第二容纳部分所述第一和第二容纳部分具有不同的压力，其中满足Ps / Po> = 100和Ps <= 10 -3 -3 Pa，其中Po是第一容纳部分的压力， Ps是第二容纳部的压力。

8. 发明授权

US06954255B2 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US06954255B2
公开(公告)日：2005-10-11
申请号：US10170590
申请日：2002-06-14
申请人： Noriyasu Hasegawa , Shigeru Terashima
发明人： Noriyasu Hasegawa , Shigeru Terashima
IPC分类号： G03F7/20 , G03B27/52 , G03B27/42
CPC分类号： G03F7/70933 , G03F7/70358 , G03F7/70866
摘要： An exposure apparatus which projects a pattern formed on a mask onto a substrate by using exposure light. The apparatus includes a shielding member which surrounds a light path space through which exposure light passes and has a passage which makes the light path space communicate with an ambient space, and a gas supply system which supplies inert gas to the light path space surrounded by the shielding member. A direction of the passage coincides with a flow direction of an ambient atmosphere which flows through the ambient space, and the passage includes a first passage and a second passage. The first passage is located at a position upstream, with respect to the flow direction, relative to the second passage, and the first passage is smaller in section than the second passage.
摘要翻译：曝光装置，其通过使用曝光光将形成在掩模上的图案投影到基板上。该装置包括遮蔽构件，该屏蔽构件围绕曝光光通过的光路空间，并具有使光路空间与周围空间连通的通道;以及气体供给系统，其向由所述光路空间包围的光路空间供给惰性气体屏蔽构件。通道的方向与流过环境空间的环境气氛的流动方向一致，并且通道包括第一通道和第二通道。第一通道位于相对于第二通道相对于流动方向的上游位置，并且第一通道的截面小于第二通道。

9. 发明授权

US06204911B1 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US06204911B1
公开(公告)日：2001-03-20
申请号：US08705089
申请日：1996-08-29
申请人： Hiroshi Kurosawa , Kunitaka Ozawa , Noriyasu Hasegawa , Keiji Yoshimura
发明人： Hiroshi Kurosawa , Kunitaka Ozawa , Noriyasu Hasegawa , Keiji Yoshimura
IPC分类号： G03B2742
CPC分类号： G03F7/70558 , G03F7/70358
摘要： An exposure apparatus includes a light source for providing pulse light, a mask scanner for scanning a mask having a pattern, a wafer scanner for projecting a wafer onto which the pattern is to be projected and a light emission period determining device. The mask scanner and the wafer scanner scan the mask and the wafer in a timed relation so that the mask is illuminated while superposing portions of an illumination region defined by the pulse light and being narrower than the pattern such that the pattern is lithographically transferred onto the wafer. The light emission period determining device determines a period of emission of the pulse light, prior to an actual exposure process, wherein the emission period can be changed in accordance with a required precision of an integrated exposure amount.
摘要翻译：曝光装置包括用于提供脉冲光的光源，用于扫描具有图案的掩模的掩模扫描器，用于投影其上将要投射图案的晶片的晶片扫描器和发光周期确定装置。掩模扫描器和晶片扫描器以定时关系扫描掩模和晶片，使得掩模被照亮，同时叠加由脉冲光限定的照明区域的部分并且比图案窄，使得图案被光刻转印到晶圆。发光周期确定装置在实际曝光处理之前确定脉冲光的发射周期，其中发光周期可以根据所需的综合曝光量的精度而改变。

10. 发明授权

US07705966B2 Immersion exposure apparatus 失效
标题翻译：浸渍曝光装置
公开(公告)号：US07705966B2
公开(公告)日：2010-04-27
申请号：US11755389
申请日：2007-05-30
申请人： Keita Sakai , Noriyasu Hasegawa
发明人： Keita Sakai , Noriyasu Hasegawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03B27/42 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.
摘要翻译：至少一个示例性实施例涉及被配置为通过包括投影光学和喷嘴单元的液体曝光基板的曝光装置。喷嘴单元具有回收液体的液体回收口和布置在最终透镜和液体回收口之间并供应液体的液体供给口。与液体回收口相比，喷嘴单元表面的外侧第二部分相对于液体的静态接触角比液体回收口的喷嘴单元表面的内侧第一部分的静态接触角大20° 或者更多。第二部分相对于液体的滑动角度为20°或更小。

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