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1. 发明授权

US07754011B2 Method of manufacturing a calcium fluoride single crystal 失效
标题翻译：氟化钙单晶的制造方法
公开(公告)号：US07754011B2
公开(公告)日：2010-07-13
申请号：US12114223
申请日：2008-05-02
申请人： Keita Sakai
发明人： Keita Sakai
IPC分类号： C30B29/12
CPC分类号： C30B11/00 , C30B29/12 , C30B33/00 , Y10T117/1016
摘要： A method of manufacturing calcium fluoride single crystal includes cooling the calcium fluoride single crystal with variable cooling rates so that throughout a temperature range in the cooling step, maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (τc) of the calcium fluoride single crystal in a direction on a {0 0 1} plane of the calcium fluoride single crystal, and is maintained to be an approximately constant ratio, and adding strontium fluoride when growing the single crystal before the cooling step.
摘要翻译：制造氟化钙单晶的方法包括以可变的冷却速度冷却氟化钙单晶，使得在冷却步骤的整个温度范围内，由热应力引起的氟化钙单晶内部的最大剪切应力近似等于或小于在氟化钙单晶的{0 0 1}面上，在<110°方向上的氟化钙单晶的临界解析剪切应力（τc）保持为近似恒定的比例，并加入氟化锶当在冷却步骤之前生长单晶时。

2. 发明申请

US20080229999A1 Method Of Manufacturing A Calcium Fluoride Single Crystal 失效
标题翻译：氟化钙单晶的制造方法
公开(公告)号：US20080229999A1
公开(公告)日：2008-09-25
申请号：US12114223
申请日：2008-05-02
申请人： Keita Sakai
发明人： Keita Sakai
IPC分类号： C30B15/14
CPC分类号： C30B11/00 , C30B29/12 , C30B33/00 , Y10T117/1016
摘要： A method for manufacturing calcium fluoride single crystal includes the step of cooling the calcium fluoride single crystal so that maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (τc) in a direction of on a {0 0 1} plane of the calcium fluoride single crystal.
摘要翻译：氟化钙单晶的制造方法包括：使氟化钙单晶冷却的步骤，使得由热应力引起的氟化钙单晶内部的最大剪切应力大致等于或小于临界分解剪切应力（τC 在氟化钙单晶的{0 0 1}平面上的<1×10>方向上。

3. 发明授权

US06270270B1 Printing apparatus 有权
公开(公告)号：US06270270B1
公开(公告)日：2001-08-07
申请号：US09746225
申请日：2000-12-26
申请人： Kazumine Koshi , Noriyuki Saito , Tohru Arakawa , Masaru Shimizu , Keita Sakai , Masaaki Matsui , Toshio Tanaka
发明人： Kazumine Koshi , Noriyuki Saito , Tohru Arakawa , Masaru Shimizu , Keita Sakai , Masaaki Matsui , Toshio Tanaka
IPC分类号： B41J1126
摘要： A printing apparatus has a small size that facilitates replacement of rolled paper, removal of jammed paper, etc., and alleviates the likelihood of a paper jam with a considerably simple structure. The printing apparatus comprises a rolled-paper holder (2), which is provided with a first holder (2b) for use in carrying out printing on rolled paper (1), and a second holder (2a) for use in setting the rolled paper (1). The rolled paper (1) is moved from the second holder (2a) to the first holder (2b) as a main body of the apparatus is shifted from a paper setting position to a printing work position, thereby facilitating the setting of the rolled paper (1) and removal of jammed paper, since the rolled paper (1) can be temporarily supported by the second holder (2a) in order to provide sufficient work space when replacing the rolled paper (1) or removing jammed paper.

4. 发明授权

US6087076A Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment 失效
标题翻译：通过在低氧或无氧的受控环境中进行涂覆，加热，曝光和显影来制造半导体器件的方法
公开(公告)号：US6087076A
公开(公告)日：2000-07-11
申请号：US968589
申请日：1997-11-13
申请人： Keita Sakai , Keiko Chiba , Hiroshi Maehara
发明人： Keita Sakai , Keiko Chiba , Hiroshi Maehara
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0048
摘要： A method of manufacturing semiconductor devices includes a coating step for coating a substrate using a resist solution including a base resin and a low-oxygen or oxygen-free solvent in which oxygen is removed by nitrogen bubbling, a heating step for heating the substrate coated with the resist, an exposing step for exposing the substrate with radiation to transfer a pattern, and a developing step for developing the exposed substrate. The coating step, the heating step, the exposing step and the developing step are performed under an environment controlled in a low-oxygen or oxygen-free state.
摘要翻译：一种制造半导体器件的方法包括：涂覆步骤，用于使用包含基础树脂的抗蚀剂溶液和通过氮气鼓泡除去氧的低氧或无氧溶剂的涂覆步骤，用于加热涂覆有抗蚀剂，用于用辐射曝光衬底以转印图案的曝光步骤，以及用于显影曝光的衬底的显影步骤。涂布步骤，加热步骤，曝光步骤和显影步骤在控制在低氧或无氧状态的环境下进行。

5. 发明授权

US6008942A Diffractive optical element and optical instrument having the same 失效
$Diffractive optical element and optical instrument having the same$
标题翻译：衍射光学元件和具有该衍射光学元件的光学仪器
公开(公告)号：US6008942A
公开(公告)日：1999-12-28
申请号：US997704
申请日：1997-12-23
申请人： Makoto Ogusu , Hiroshi Maehara , Keita Sakai
发明人： Makoto Ogusu , Hiroshi Maehara , Keita Sakai
IPC分类号： G02B5/18 , G02B27/44
CPC分类号： G02B5/1866
摘要： A diffractive optical element for diffracting non-collimated light includes a base surface and a periodic structure formed on the base surface and having a plurality of diffractive surfaces and a plurality of boundary surfaces. The boundary surfaces are separated into plural zones, and in each zone, the boundary surface is placed substantially parallel to a main portion of a light beam impinging on that zone.
摘要翻译：用于衍射非准直光的衍射光学元件包括形成在基底表面上并具有多个衍射面和多个边界面的基底表面和周期性结构。边界表面被分成多个区域，并且在每个区域中，边界表面基本上平行于入射到该区域上的光束的主要部分。

6. 发明授权

US5093673A Thermal line printer with external memory means 失效
标题翻译：具有外部存储器的热线打印机
公开(公告)号：US5093673A
公开(公告)日：1992-03-03
申请号：US503683
申请日：1990-04-02
申请人： Keita Sakai , Kazumine Koshi
发明人： Keita Sakai , Kazumine Koshi
IPC分类号： B41J2/36 , B41J2/175 , B41J2/355 , H04N1/23
CPC分类号： B41J2/3555 , B41J2/17593 , B41J2/355
摘要： A thermal line printer is provided in which required printing is carried out by developing a thermal recording paper under heat generated by heat generating elements or by melting a heat-meltable ink under such heat to deposit melted ink on a recording paper sheet. The thermal line printer includes external memory means having a function to store print data for two or more dot lines as corrective print data and capable of asynchronously performing its write and read functions. Furthermore, both print data processing and control of the external memory means are carried out mainly by a hardware arrangement, whereby the thermal line printer is inexpensive, provides high print quality, and has high-speed printing capability.

7. 发明授权

US07705966B2 Immersion exposure apparatus 失效
标题翻译：浸渍曝光装置
公开(公告)号：US07705966B2
公开(公告)日：2010-04-27
申请号：US11755389
申请日：2007-05-30
申请人： Keita Sakai , Noriyasu Hasegawa
发明人： Keita Sakai , Noriyasu Hasegawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03B27/42 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.
摘要翻译：至少一个示例性实施例涉及被配置为通过包括投影光学和喷嘴单元的液体曝光基板的曝光装置。喷嘴单元具有回收液体的液体回收口和布置在最终透镜和液体回收口之间并供应液体的液体供给口。与液体回收口相比，喷嘴单元表面的外侧第二部分相对于液体的静态接触角比液体回收口的喷嘴单元表面的内侧第一部分的静态接触角大20° 或者更多。第二部分相对于液体的滑动角度为20°或更小。

8. 发明申请

US20090273766A1 APPARATUS AND METHOD FOR EXPOSURE AND METHOD OF MANUFACTURING DEVICE 审中-公开
标题翻译：用于曝光的装置和方法以及制造装置的方法
公开(公告)号：US20090273766A1
公开(公告)日：2009-11-05
申请号：US12420734
申请日：2009-04-08
申请人： Keita Sakai , Sunao Mori , Yuichi Iwasaki
发明人： Keita Sakai , Sunao Mori , Yuichi Iwasaki
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus includes a projection optical system that projects light from an original to a substrate, and a supply device that supplies liquid containing a hydrocarbon compound to a gap between the final surface of the projection optical system and the substrate. The exposure apparatus exposes the substrate to light via the liquid filling the gap. The exposure apparatus further includes an adding device that adds water to the liquid to be supplied by the supply device.
摘要翻译：曝光装置包括投影光学系统，其将来自原稿的光投射到基板;以及供给装置，其将包含烃化合物的液体供给到投影光学系统的最终表面与基板之间的间隙。曝光装置通过填充间隙的液体使基板曝光。曝光装置还包括向供给装置供给的液体添加水的添加装置。

9. 发明授权

US07394522B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07394522B2
公开(公告)日：2008-07-01
申请号：US11755380
申请日：2007-05-30
申请人： Noriyasu Hasegawa , Tomofumi Nishikawara , Keita Sakai
发明人： Noriyasu Hasegawa , Tomofumi Nishikawara , Keita Sakai
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03B27/58 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.
摘要翻译：至少一个示例性实施例涉及用于曝光衬底的曝光装置。曝光装置包括可移动基板台，投影光学系统，被配置为投射来自原稿的光并包括最终光学元件，以及设置在最终光学元件周围的喷嘴构件，并且包括与基板相对的相对表面。基板通过投影光学系统的最终表面和基板，投影光学系统和原稿之间的液体曝光。所述相对表面包括供给口，比所述供给口更远离所述最终光学元件的光轴提供的第一回收口以及设置在所述供给口与所述第一回收口之间的第一部分和第二部。第一部分和基底之间的距离比供给口和基底之间的距离长。

10. 发明授权

US06479212B1 Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method 失效
标题翻译：光敏树脂，使用光敏树脂的抗蚀剂组合物，使用抗蚀剂组合物的图案形成方法，通过图案形成方法制造的器件和曝光方法
公开(公告)号：US06479212B1
公开(公告)日：2002-11-12
申请号：US09630187
申请日：2000-08-01
申请人： Minoru Matsuda , Hiroshi Maehara , Keita Sakai
发明人： Minoru Matsuda , Hiroshi Maehara , Keita Sakai
IPC分类号： C03F7004
CPC分类号： C08L81/06 , C08G75/23 , C08G2650/16 , G03F7/0395 , G03F7/0397 , G03F7/095 , Y10S430/106 , Y10S430/111
摘要： There is provided a photosensitive resin having at least three moieties in the backbone chain, two moieties of which moieties are an alicyclic group moiety and a sulfonyl moiety. The photosensitive resin has a superior solubility in solvents and a superior dry-etching resistance, and enables easy fabrication of highly integrated semiconductor devices.
摘要翻译：提供在主链中具有至少三个部分的光敏树脂，其中两个部分是脂环族基团部分和磺酰基部分。感光性树脂在溶剂中的溶解性优异，耐干蚀刻性优异，能够容易地制造高度集成的半导体装置。

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