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1. 发明授权

US07394522B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07394522B2
公开(公告)日：2008-07-01
申请号：US11755380
申请日：2007-05-30
申请人： Noriyasu Hasegawa , Tomofumi Nishikawara , Keita Sakai
发明人： Noriyasu Hasegawa , Tomofumi Nishikawara , Keita Sakai
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03B27/58 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.
摘要翻译：至少一个示例性实施例涉及用于曝光衬底的曝光装置。曝光装置包括可移动基板台，投影光学系统，被配置为投射来自原稿的光并包括最终光学元件，以及设置在最终光学元件周围的喷嘴构件，并且包括与基板相对的相对表面。基板通过投影光学系统的最终表面和基板，投影光学系统和原稿之间的液体曝光。所述相对表面包括供给口，比所述供给口更远离所述最终光学元件的光轴提供的第一回收口以及设置在所述供给口与所述第一回收口之间的第一部分和第二部。第一部分和基底之间的距离比供给口和基底之间的距离长。

2. 发明申请

US20080002169A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080002169A1
公开(公告)日：2008-01-03
申请号：US11755380
申请日：2007-05-30
申请人： Noriyasu Hasegawa , Tomofumi Nishikawara , Keita Sakai
发明人： Noriyasu Hasegawa , Tomofumi Nishikawara , Keita Sakai
IPC分类号： G03B27/42
CPC分类号： G03B27/58 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.
摘要翻译：至少一个示例性实施例涉及用于曝光衬底的曝光装置。曝光装置包括可移动基板台，投影光学系统，被配置为投射来自原稿的光并包括最终光学元件，以及设置在最终光学元件周围的喷嘴构件，并且包括与基板相对的相对表面。基板通过投影光学系统的最终表面和基板，投影光学系统和原稿之间的液体曝光。所述相对表面包括供给口，比所述供给口更远离所述最终光学元件的光轴提供的第一回收口以及设置在所述供给口与所述第一回收口之间的第一部分和第二部。第一部分和基底之间的距离比供给口和基底之间的距离长。

3. 发明授权

US09164395B2 Exposure apparatus, and method of manufacturing a device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US09164395B2
公开(公告)日：2015-10-20
申请号：US13314537
申请日：2011-12-08
申请人： Keita Sakai , Tatsuya Hayashi , Noriyasu Hasegawa
发明人： Keita Sakai , Tatsuya Hayashi , Noriyasu Hasegawa
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041
摘要： An exposure apparatus that includes a projection optical system, and exposes a substrate to light via the projection optical system and a liquid that is supplied between the projection optical system and the substrate. A plurality of recovery ports recover the liquid supplied between the projection optical system and the substrate, and are discretely arranged between vertices on each side of a polygon and at each of the vertices of the polygon. A chamber, connected to the plurality of recovery ports, receives the liquid. A pump attracts the liquid via the plurality of recovery ports and the chamber. A pressure difference between the pump and each of the recovery ports positioned at the vertices, among the plurality of recovery ports, is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices, among the plurality of recovery ports.
摘要翻译：一种曝光装置，其包括投影光学系统，并且经由所述投影光学系统将基板暴露于光，以及供应在所述投影光学系统和所述基板之间的液体。多个回收端口回收在投影光学系统和基板之间供应的液体，并且离散地布置在多边形的每一侧的顶点和多边形的每个顶点之间。连接到多个回收端口的室接收液体。泵通过多个回收口和腔室吸引液体。在多个恢复端口中，定位在顶点处的泵和恢复端口中的每个恢复端口之间的压力差小于泵和定位在顶点之间的每个恢复端口之间的压力差，在多个恢复端口。

4. 发明申请

US20120170007A1 EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING A DEVICE 有权
标题翻译：曝光装置和制造装置的方法
公开(公告)号：US20120170007A1
公开(公告)日：2012-07-05
申请号：US13314537
申请日：2011-12-08
申请人： Keita Sakai , Tatsuya Hayashi , Noriyasu Hasegawa
发明人： Keita Sakai , Tatsuya Hayashi , Noriyasu Hasegawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041
摘要： The present invention provides an exposure apparatus including a projection optical system, and configured to expose a substrate to light via the projection optical system and a liquid, the apparatus including a plurality of recovery ports configured to recover the liquid supplied between the projection optical system and the substrate, a chamber connected to the plurality of recovery ports, and a pump configured to attract the liquid via the plurality of recovery ports and the chamber, wherein the plurality of recovery ports are discretely arranged between vertices on each side of a polygon and at each of vertices of the polygon, and a pressure difference between the pump and each of the recovery ports positioned at the vertices among the plurality of recovery ports is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices among the plurality of recovery ports.
摘要翻译：本发明提供一种曝光装置，包括：投影光学系统，用于经由投影光学系统和液体将基板曝光，所述装置包括多个回收端口，所述多个回收端口被配置为回收在投影光学系统和所述基板，连接到所述多个回收端口的室以及被配置为经由所述多个回收端口和所述室吸引所述液体的泵，其中所述多个回收端口离散地布置在多边形的每一侧的顶点和所述多边形的顶点中的每一个以及位于所述多个恢复端口中的所述顶点处的所述泵与所述每个所述恢复端口之间的压力差小于所述泵与位于所述顶点之间的每个所述恢复端口之间的压力差，多个恢复端口。

5. 发明授权

US07705966B2 Immersion exposure apparatus 失效
标题翻译：浸渍曝光装置
公开(公告)号：US07705966B2
公开(公告)日：2010-04-27
申请号：US11755389
申请日：2007-05-30
申请人： Keita Sakai , Noriyasu Hasegawa
发明人： Keita Sakai , Noriyasu Hasegawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03B27/42 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.
摘要翻译：至少一个示例性实施例涉及被配置为通过包括投影光学和喷嘴单元的液体曝光基板的曝光装置。喷嘴单元具有回收液体的液体回收口和布置在最终透镜和液体回收口之间并供应液体的液体供给口。与液体回收口相比，喷嘴单元表面的外侧第二部分相对于液体的静态接触角比液体回收口的喷嘴单元表面的内侧第一部分的静态接触角大20° 或者更多。第二部分相对于液体的滑动角度为20°或更小。

6. 发明申请

US20070291241A1 IMMERSION EXPOSURE APPARATUS 失效
标题翻译：倾斜曝光装置
公开(公告)号：US20070291241A1
公开(公告)日：2007-12-20
申请号：US11755389
申请日：2007-05-30
申请人： Keita Sakai , Noriyasu Hasegawa
发明人： Keita Sakai , Noriyasu Hasegawa
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.
摘要翻译：至少一个示例性实施例涉及被配置为通过包括投影光学和喷嘴单元的液体曝光基板的曝光装置。喷嘴单元具有回收液体的液体回收口和布置在最终透镜和液体回收口之间并供应液体的液体供给口。与液体回收口相比，喷嘴单元表面的外侧第二部分相对于液体的静态接触角比液体回收口的喷嘴单元表面的内侧第一部分的静态接触角大20° 或者更多。第二部分相对于液体的滑动角度为20°或更小。

7. 发明授权

US06529226B2 Thermal printer and driving device for the same 失效
公开(公告)号：US06529226B2
公开(公告)日：2003-03-04
申请号：US09925609
申请日：2001-08-10
申请人： Keita Sakai , Koji Toyota , Shozou Shiraga , Satoshi Yamaura , Yuji Doi
发明人： Keita Sakai , Koji Toyota , Shozou Shiraga , Satoshi Yamaura , Yuji Doi
IPC分类号： G01D1524
CPC分类号： B41J2/32 , B41J3/36 , B41J3/407 , B41J11/04 , B41J13/106 , B41J15/042
摘要： The present invention relates to a thermal line printer for a small recording terminals such as a terminal for POS (point of sales), a handy terminal, a measuring apparatus or the like, and also relates to a driving device for the thermal line printer. In the structure of a conventional thermal line printer, there is a limitation to the ability to decrease the dimension of depth in a situation where the downsizing of an apparatus is desired. By installing the thermal line printer in an upright state, the dimension of the depth can be decreased. However, in this configuration, the user cannot see the state of the printing because the recording paper falls down toward the user's side, due to the gravity, when the paper is ejected after printing. The present invention solves the above problems by disposing a line type thermal head (5) and a platen roller (2) in such a manner that a tangential line to the platen roller (2) at a pressed point between the line type thermal head (5) and the platen roller (2) intersects the short side of the body of the printer in a plane projecting the body along the axial direction of the platen roller (2), and by ejecting the recording paper from the short side.

8. 发明授权

US07754011B2 Method of manufacturing a calcium fluoride single crystal 失效
标题翻译：氟化钙单晶的制造方法
公开(公告)号：US07754011B2
公开(公告)日：2010-07-13
申请号：US12114223
申请日：2008-05-02
申请人： Keita Sakai
发明人： Keita Sakai
IPC分类号： C30B29/12
CPC分类号： C30B11/00 , C30B29/12 , C30B33/00 , Y10T117/1016
摘要： A method of manufacturing calcium fluoride single crystal includes cooling the calcium fluoride single crystal with variable cooling rates so that throughout a temperature range in the cooling step, maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (τc) of the calcium fluoride single crystal in a direction on a {0 0 1} plane of the calcium fluoride single crystal, and is maintained to be an approximately constant ratio, and adding strontium fluoride when growing the single crystal before the cooling step.
摘要翻译：制造氟化钙单晶的方法包括以可变的冷却速度冷却氟化钙单晶，使得在冷却步骤的整个温度范围内，由热应力引起的氟化钙单晶内部的最大剪切应力近似等于或小于在氟化钙单晶的{0 0 1}面上，在<110°方向上的氟化钙单晶的临界解析剪切应力（τc）保持为近似恒定的比例，并加入氟化锶当在冷却步骤之前生长单晶时。

9. 发明申请

US20080229999A1 Method Of Manufacturing A Calcium Fluoride Single Crystal 失效
标题翻译：氟化钙单晶的制造方法
公开(公告)号：US20080229999A1
公开(公告)日：2008-09-25
申请号：US12114223
申请日：2008-05-02
申请人： Keita Sakai
发明人： Keita Sakai
IPC分类号： C30B15/14
CPC分类号： C30B11/00 , C30B29/12 , C30B33/00 , Y10T117/1016
摘要： A method for manufacturing calcium fluoride single crystal includes the step of cooling the calcium fluoride single crystal so that maximum shear stress inside the calcium fluoride single crystal caused by thermal stress is approximately equal to or smaller than critical resolved shear stress (τc) in a direction of on a {0 0 1} plane of the calcium fluoride single crystal.
摘要翻译：氟化钙单晶的制造方法包括：使氟化钙单晶冷却的步骤，使得由热应力引起的氟化钙单晶内部的最大剪切应力大致等于或小于临界分解剪切应力（τC 在氟化钙单晶的{0 0 1}平面上的<1×10>方向上。

10. 发明授权

US06270270B1 Printing apparatus 有权
公开(公告)号：US06270270B1
公开(公告)日：2001-08-07
申请号：US09746225
申请日：2000-12-26
申请人： Kazumine Koshi , Noriyuki Saito , Tohru Arakawa , Masaru Shimizu , Keita Sakai , Masaaki Matsui , Toshio Tanaka
发明人： Kazumine Koshi , Noriyuki Saito , Tohru Arakawa , Masaru Shimizu , Keita Sakai , Masaaki Matsui , Toshio Tanaka
IPC分类号： B41J1126
摘要： A printing apparatus has a small size that facilitates replacement of rolled paper, removal of jammed paper, etc., and alleviates the likelihood of a paper jam with a considerably simple structure. The printing apparatus comprises a rolled-paper holder (2), which is provided with a first holder (2b) for use in carrying out printing on rolled paper (1), and a second holder (2a) for use in setting the rolled paper (1). The rolled paper (1) is moved from the second holder (2a) to the first holder (2b) as a main body of the apparatus is shifted from a paper setting position to a printing work position, thereby facilitating the setting of the rolled paper (1) and removal of jammed paper, since the rolled paper (1) can be temporarily supported by the second holder (2a) in order to provide sufficient work space when replacing the rolled paper (1) or removing jammed paper.

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