专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09096962B2 Sewing machine, embroidery unit, and non-transitory computer-readable medium storing sewing machine control program 有权
标题翻译：缝纫机，绣花机和非暂时性计算机可读介质存储缝纫机控制程序
公开(公告)号：US09096962B2
公开(公告)日：2015-08-04
申请号：US13788893
申请日：2013-03-07
申请人： Akie Shimizu , Satoru Makino , Yuki Ihira , Daisuke Abe , Yoshinori Nakamura , Satoru Ichiyanagi , Yutaka Nomura
发明人： Akie Shimizu , Satoru Makino , Yuki Ihira , Daisuke Abe , Yoshinori Nakamura , Satoru Ichiyanagi , Yutaka Nomura
IPC分类号： D05B19/12 , D05C5/02
CPC分类号： D05B19/12 , D05C5/02
摘要： A sewing machine includes at least one detecting portion, a processor, and a memory. The at least one detecting portion is configured to detect an ultrasonic wave that has been transmitted from a transmission source. The memory is configured to store computer-readable instructions that instruct the sewing machine to execute steps including identifying a position of the transmission source of the ultrasonic wave based on information pertaining to the ultrasonic wave that has been detected by the at least one detecting portion, and controlling sewing based on the position of the transmission source that has been identified.
摘要翻译：缝纫机包括至少一个检测部分，处理器和存储器。所述至少一个检测部被配置为检测从发送源发送的超声波。存储器被配置为存储指示缝纫机执行包括基于由至少一个检测部分检测到的超声波的信息来识别超声波的发送源的位置的计算机可读指令，并且基于已识别的发送源的位置来控制缝制。

2. 发明授权

US08904947B2 Sewing machine 有权
标题翻译：缝纫机
公开(公告)号：US08904947B2
公开(公告)日：2014-12-09
申请号：US13788903
申请日：2013-03-07
申请人： Yoshio Nishimura , Satoru Ichiyanagi , Yutaka Nomura , Yoshinori Nakamura , Yuki Ihira , Daisuke Abe , Akie Shimizu
发明人： Yoshio Nishimura , Satoru Ichiyanagi , Yutaka Nomura , Yoshinori Nakamura , Yuki Ihira , Daisuke Abe , Akie Shimizu
IPC分类号： D05B21/00 , D05B19/12 , D05C5/02
CPC分类号： D05B19/12
摘要： A sewing machine includes a sewing portion, a detector, a processor, and a memory. The sewing portion includes a needle bar and a transport portion. The needle bar is configured to have a sewing needle on a lower end. The transport portion is configured to move a work cloth. The detector is configured to detect ultrasonic waves. The memory stores computer-readable instructions that instruct the processor to perform specifying a position of a transmission source of the ultrasonic waves based on the ultrasonic waves that are detected by the detector, specifying sewing information based on the specified position of the transmission source, the sewing information being information that pertains to sewing, and controlling the sewing portion based on the specified sewing information.
摘要翻译：缝纫机包括缝制部分，检测器，处理器和存储器。缝制部包括针杆和输送部。针杆配置为在下端具有缝合针。运输部分构造成移动工作布。检测器被配置为检测超声波。存储器存储指示处理器基于由检测器检测到的超声波来指定超声波的发送源的位置的指定的计算机可读指令，基于发送源的指定位置来指定缝制信息，作为缝制的信息的缝制信息，以及基于指定的缝制信息来控制缝制部。

3. 发明授权

US08791019B2 Metal polishing slurry and method of polishing a film to be polished 有权
标题翻译：金属抛光浆料及抛光方法
公开(公告)号：US08791019B2
公开(公告)日：2014-07-29
申请号：US12159419
申请日：2006-12-27
申请人： Yutaka Nomura , Hiroshi Nakagawa , Sou Anzai , Ayako Tobita , Takafumi Sakurada , Katsumi Mabuchi
发明人： Yutaka Nomura , Hiroshi Nakagawa , Sou Anzai , Ayako Tobita , Takafumi Sakurada , Katsumi Mabuchi
IPC分类号： H01L21/306 , C11D11/00 , H01L21/321 , C09G1/02
CPC分类号： C11D11/0047 , C09G1/02 , C09K3/1463 , H01L21/3212
摘要： The present invention provides a metal polishing liquid capable of CMP at a high Cu polishing rate and solving the problems: (a) generation of scratches attributable to solid particles, (b) generation of deteriorations in flatness such as dishing and erosion, (c) complexity in a washing process for removing abrasive particles remaining on the surface of a substrate after polishing, and (d) higher costs attributable to the cost of a solid abrasive itself and to waste liquid treatment, as well as a method of polishing a film to be polished by using the same. Disclosed are a metal polishing liquid which comprises a metal oxidizer, a metal oxide solubilizer, a metal anticorrosive, and a water-soluble polymer having an anionic functional group with a weight-average molecular weight of 8,000 or more and has pH 1 or more to 3 or less, and a method of polishing a film to be polished, which comprises supplying the above metal polishing liquid onto a polishing cloth of a polishing platen and simultaneously relatively moving the polishing platen and a substrate having a metallic film to be polished while the substrate is pressed against the polishing cloth.
摘要翻译：本发明提供一种能够以高Cu抛光速率进行CMP处理的金属抛光液，并且解决了以下问题：（a）产生由固体颗粒引起的划痕，（b）产生诸如凹陷和腐蚀的平坦度的劣化，（c）用于去除抛光后残留在基材表面上的磨料颗粒的洗涤过程中的复杂性，以及（d）由于固体磨料本身的成本和废液处理造成的更高成本，以及抛光膜的方法通过使用它来抛光。公开了一种金属抛光液，其包含金属氧化剂，金属氧化物增溶剂，金属防腐蚀剂和具有重均分子量为8000以上的阴离子官能团的水溶性聚合物，其pH为1以上至 3以下，以及抛光被研磨膜的方法，该方法包括将上述金属抛光液供给到研磨台板的研磨布上，同时相对移动研磨台板和具有待研磨金属膜的基板，同时基板被压在抛光布上。

4. 发明申请

US20140051250A1 CMP POLISHING FLUID, METHOD FOR MANUFACTURING SAME, METHOD FOR MANUFACTURING COMPOSITE PARTICLE, AND METHOD FOR POLISHING BASE MATERIAL 有权
标题翻译： CMP抛光液，其制造方法，制造复合颗粒的方法和用于抛光基材的方法
公开(公告)号：US20140051250A1
公开(公告)日：2014-02-20
申请号：US13981766
申请日：2012-01-20
申请人： Hisataka Minami , Keisuke Inoue , Chisato Kikkawa , Yutaka Nomura , Tomohiro Iwano
发明人： Hisataka Minami , Keisuke Inoue , Chisato Kikkawa , Yutaka Nomura , Tomohiro Iwano
IPC分类号： C09G1/02 , H01L21/306
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1463 , H01L21/30625 , H01L21/31053
摘要： A CMP polishing liquid comprises water and an abrasive particle, wherein the abrasive particle comprises a composite particle having a core including a first particle, and a second particle provided on the core, the first particle contains silica, the second particle contains cerium hydroxide, and the pH of the CMP polishing liquid is equal to or lower than 9.5.
摘要翻译： CMP抛光液体包括水和研磨颗粒，其中所述磨料颗粒包括具有包含第一颗粒的芯的复合颗粒和在所述芯上提供的第二颗粒，所述第一颗粒含有二氧化硅，所述第二颗粒包含氢氧化铈和 CMP抛光液的pH值等于或低于9.5。

5. 发明申请

US20130233217A1 SEWING MACHINE, EMBROIDERY UNIT, AND NON-TRANSITORY COMPUTER-READABLE MEDIUM STORING SEWING MACHINE CONTROL PROGRAM 有权
标题翻译：缝纫机，绣花机和非接线计算机可读介质储存缝纫机控制程序
公开(公告)号：US20130233217A1
公开(公告)日：2013-09-12
申请号：US13788893
申请日：2013-03-07
申请人： Akie SHIMIZU , Satoru MAKINO , Yuki IHIRA , Daisuke ABE , Yoshinori NAKAMURA , Satoru ICHIYANAGI , Yutaka NOMURA
发明人： Akie SHIMIZU , Satoru MAKINO , Yuki IHIRA , Daisuke ABE , Yoshinori NAKAMURA , Satoru ICHIYANAGI , Yutaka NOMURA
IPC分类号： D05B19/12 , D05C5/02
CPC分类号： D05B19/12 , D05C5/02
摘要： A sewing machine includes at least one detecting portion, a processor, and a memory. The at least one detecting portion is configured to detect an ultrasonic wave that has been transmitted from a transmission source. The memory is configured to store computer-readable instructions that instruct the sewing machine to execute steps including identifying a position of the transmission source of the ultrasonic wave based on information pertaining to the ultrasonic wave that has been detected by the at least one detecting portion, and controlling sewing based on the position of the transmission source that has been identified.
摘要翻译：缝纫机包括至少一个检测部分，处理器和存储器。所述至少一个检测部被配置为检测从发送源发送的超声波。存储器被配置为存储指示缝纫机执行包括基于由至少一个检测部分检测到的超声波的信息来识别超声波的发送源的位置的计算机可读指令，并且基于已识别的发送源的位置来控制缝制。

6. 发明授权

US08193899B2 Chip-like electric component and method for manufacturing the same 有权
标题翻译：片状电气元件及其制造方法
公开(公告)号：US08193899B2
公开(公告)日：2012-06-05
申请号：US12995867
申请日：2009-06-01
申请人： Katsumi Takeuchi , Yutaka Nomura , Hiroyuki Kurokawa
发明人： Katsumi Takeuchi , Yutaka Nomura , Hiroyuki Kurokawa
IPC分类号： H01C1/034
CPC分类号： H01C7/003 , H01C1/06 , H01C17/006 , H01C17/06506 , Y10T29/49155
摘要： A chip-like electric component such as a chip resistor is provided, which is easy to manufacture and in which cracks or fractures of an insulating substrate are unlikely to occur. A pair of surface electrodes 21, 23 are formed so that thicknesses of the pair of surface electrodes increase from a resistor layer 13 toward end portions 30 of an insulating substrate 29 in a direction in which the pair of surface electrodes 21, 23 are arranged. A plating reservoir S is formed between one of the surface electrodes 21, 23 and an insulating protective layer 15. When forming at least one plated layer 33, a plated metal pools in the plating reservoir S. The at least one plated layer 33 may work to reduce to some extent a height difference between a soldering electrode portion 21, 23, 27, 33 and the insulating protective layer 15.
摘要翻译：提供了诸如片状电阻器的芯片状电气部件，其易于制造，并且其中不可能发生绝缘基板的裂纹或断裂。形成一对表面电极21,23，使得一对表面电极的厚度从电阻层13朝向绝缘基板29的端部配置在一对表面电极21,23的方向上增加。在一个表面电极21,23和绝缘保护层15之间形成电镀槽S.当形成至少一个镀层33时，电镀金属池在电镀槽S中。至少一个镀层33可以工作以在一定程度上减少焊接电极部分21,23,27,33与绝缘保护层15之间的高度差。

7. 发明授权

US07983782B2 Sewing machine and spool pin stand therefor 有权
标题翻译：缝纫机和卷轴针脚架
公开(公告)号：US07983782B2
公开(公告)日：2011-07-19
申请号：US11729855
申请日：2007-03-30
申请人： Yutaka Nomura , Hiroyuki Suzuki , Chikahisa Noguchi , Masaru Jimbo , Eiichi Ito
发明人： Yutaka Nomura , Hiroyuki Suzuki , Chikahisa Noguchi , Masaru Jimbo , Eiichi Ito
IPC分类号： G06F7/66
CPC分类号： D05B43/00 , B65H49/04 , B65H2551/20 , B65H2701/31 , D05B79/00 , D05D2205/16
摘要： A sewing machine includes a spool pin stand having spool pins to which thread spools are attachable and seats corresponding to the spool pins, respectively, thread passage defining members located on a thread passage, a sewing data storage unit storing sewing data including at least thread color information about colors of the needle threads, thread supply display units which are located on the spool pin stand so as to correspond to the spool pins respectively, the thread supply display units being configured to produce light which transmits through at least ones of the spool pins and the seats and displaying the thread colors in a color-variable manner, respectively, and a thread color information control unit controlling the thread supply display units based on the thread color information so that thread colors corresponding to the spool pins are displayed by the thread supply display units, respectively.
摘要翻译：一种缝纫机包括：卷轴销座，其具有可插入线轴的卷轴销和分别与卷轴销相对应的座位，位于螺纹通道上的线通道限定构件，缝纫数据存储单元，其存储至少包括线颜色的缝纫数据关于针线的颜色的信息，位于卷轴销座上的螺纹供给显示单元分别对应于卷轴销，线供给显示单元被配置为产生透过至少一个卷轴销的光和座位，并分别以颜色变化的方式显示线条颜色;以及线色信息控制单元，其基于线颜色信息来控制线供给显示单元，使得与线轴针对应的线颜色由线显示供应显示单元。

8. 发明申请

US20070227420A1 Sewing machine and sewing machine capable of embroidery sewing 失效
标题翻译：缝纫机缝纫机缝纫机
公开(公告)号：US20070227420A1
公开(公告)日：2007-10-04
申请号：US11727110
申请日：2007-03-23
申请人： Hiroyuki Suzuki , Yutaka Nomura , Masaru Jimbo , Yoshinori Nakamura , Eiichi Ito
发明人： Hiroyuki Suzuki , Yutaka Nomura , Masaru Jimbo , Yoshinori Nakamura , Eiichi Ito
IPC分类号： D05B23/00
CPC分类号： D05B19/08
摘要： A sewing machine including a needle-swing mechanism that swings a needle bar; a cloth-feed mechanism that feeds a workpiece cloth by a feed dog; an imaging unit that captures an image of a baseline drawn on a surface of the workpiece cloth; a baseline-color detection portion that detects a baseline color of the baseline based on an image data of the baseline captured by the imaging unit; a first storage portion storing a mapping of a plurality of baseline colors to stitch data of a plurality of normal patterns; and a control portion that forms normal pattern stitches along the baseline by reading stitch data corresponding to the baseline color detected by the baseline-color detection portion from the first storage portion and controlling the needle-swing mechanism and the cloth-feed mechanism based on the stitch data read.
摘要翻译：一种缝纫机，包括摆动针杆的针摆机构; 布料供给机构，其由进给狗进给工件布; 成像单元，其捕获在工件布的表面上绘制的基线的图像; 基线颜色检测部分，其基于由所述成像单元捕获的所述基线的图像数据来检测所述基线的基线颜色; 第一存储部分，存储多个基线颜色的映射以针对多个正常图案的针迹数据; 以及控制部，其通过从所述第一存储部读出与所述基准色检测部检测出的所述基准色相对应的针迹数据，沿着所述基线形成正常的花样针迹，并且基于所述第一存储部控制所述针摆机构和所述送布机构针迹数据读取。

9. 发明申请

US20070196975A1 Metal-Polishing Liquid And Polishing Method Using The Same 审中-公开
标题翻译：金属抛光液和抛光方法
公开(公告)号：US20070196975A1
公开(公告)日：2007-08-23
申请号：US11578181
申请日：2005-04-12
申请人： Yutaka Nomura , Hiroki Terazaki , Hiroshi Ono , Yasuo Kamigata
发明人： Yutaka Nomura , Hiroki Terazaki , Hiroshi Ono , Yasuo Kamigata
IPC分类号： H01L21/8238
CPC分类号： H01L21/3212 , C09G1/02
摘要： The present invention provides a metal-polishing liquid, comprising polishing particles and a chemical component, wherein the polishing particles have charges of surface potential of the same polarity as the charges of surface potential on the reaction layer, adsorption layer or the mixed layer thereof formed by the chemical component on a metal to be polished with the metal-polishing liquid, and a polishing method using the same, that enable to give highly flattened surface at high Cu-polishing speed and enable reduction of the number of the polishing particles remaining on the polished face after polishing.
摘要翻译：本发明提供了一种金属抛光液，其包括抛光颗粒和化学成分，其中抛光颗粒具有与反应层，吸附层或其混合层上的表面电位的电荷相同极性的电荷电荷通过金属抛光液体抛光的金属上的化学成分和使用该金属抛光液的抛光方法，能够在高Cu抛光速度下赋予高度平坦的表面，并且能够减少残留在其上的抛光颗粒的数量抛光后的抛光面。

10. 发明申请

US20050017950A1 Input pointer and input device 失效
标题翻译：输入指针和输入设备
公开(公告)号：US20050017950A1
公开(公告)日：2005-01-27
申请号：US10874689
申请日：2004-06-24
申请人： Yutaka Nomura
发明人： Yutaka Nomura
IPC分类号： G06F3/033 , G09G5/08
CPC分类号： G06F3/03543
摘要： An input pointer includes two top-surface switches and a rotary switch on the top surface of the main body, a protrusion on an imaginary center line on the bottom surface of the main body, and two bottom-surface switches at the sides of the protrusion. The two top-surface switches and the rotary switch are turned ON when pressed by a user's finger, whereas the bottom-surface switches are turned ON when the main body is tilted about the protrusion.
摘要翻译：输入指针包括两个顶表面开关和主体顶表面上的旋转开关，在主体底表面上的假想中心线上的突起，以及突出部分两侧的两个底面开关。当用户的手指按压时，两个顶表面开关和旋转开关被打开，而当主体围绕突起倾斜时，底面开关被接通。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式