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1. 发明申请

US20130205454A1 SCANNING PROBE MICROSCOPE 有权
标题翻译：扫描探针显微镜
公开(公告)号：US20130205454A1
公开(公告)日：2013-08-08
申请号：US13726764
申请日：2012-12-26
申请人： Shuichi BABA , Masahiro WATANABE , Toshihiko NAKATA , Yukio KEMBO , Toru KURENUMA , Takafumi MORIMOTO , Manabu EDAMURA , Satoshi SEKINO
发明人： Shuichi BABA , Masahiro WATANABE , Toshihiko NAKATA , Yukio KEMBO , Toru KURENUMA , Takafumi MORIMOTO , Manabu EDAMURA , Satoshi SEKINO
IPC分类号： G01Q10/00
CPC分类号： G01Q10/00 , B82Y35/00 , G01Q60/28 , G01Q60/34
摘要： In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.
摘要翻译：在测量具有陡峭侧壁的图案的情况下，当接近图案侧壁时，探针通过作用在探针和侧壁之间的范德华力附着在侧壁上，并且在测量的轮廓中发生错误侧壁部分。当测量具有几乎等于探针直径的槽宽度的图案时，探针粘附到两个侧壁，探针不能到达凹槽底部，并且不能测量凹槽深度。当使用细长的探针测量微观高纵横比图案时探头粘附到图案侧壁上时，通过检测探针与图案侧壁的粘附力使探针到达侧壁底部，并暂时增加探针和样品之间的接触力。此外，通过利用图案的形状数据获得悬臂的扭转量的数据，通过获得的扭转量的数据来校正侧壁部分的粘附的轮廓误差。

2. 发明申请

US20080087820A1 PROBE CONTROL METHOD FOR SCANNING PROBE MICROSCOPE 审中-公开
标题翻译：用于扫描探针显微镜的探测控制方法
公开(公告)号：US20080087820A1
公开(公告)日：2008-04-17
申请号：US11867476
申请日：2007-10-04
申请人： Toru KURENUMA , Hiroaki Yanagimoto , Yukio Kembo , Yuichi Kunitomo , Takafumi Morimoto , Satoshi Sekino
发明人： Toru KURENUMA , Hiroaki Yanagimoto , Yukio Kembo , Yuichi Kunitomo , Takafumi Morimoto , Satoshi Sekino
IPC分类号： G01N23/00
CPC分类号： G01Q10/06 , G01Q30/06
摘要： This probe control method is applied to the scanning probe microscope having a probe section with a probe pointed at a sample, a detection section for detecting physical quantity between the sample and the probe, a measurement section for measuring the surface of the sample to obtain the surface information on the basis of the physical quantity when scanning the sample surface by the probe, and a movement mechanism with at least two degree of freedom. The probe control method has steps of moving the probe in a scanning direction different from the contact direction while making the probe come into contact with the sample surface, detecting the torsional state of the probe during the movement of the probe, and adjusting either or both of the rate in the scanning direction and the force in the contact direction on the basis of the detected value obtained by the detection step.
摘要翻译：将该探针控制方法应用于具有探针指向样品的探针部的扫描探针显微镜，用于检测样品与探针之间的物理量的检测部，测定样品表面的测定部，基于通过探针扫描样品表面时的物理量的表面信息，以及具有至少两个自由度的移动机构。探针控制方法具有使探针沿着与接触方向不同的扫描方向移动的步骤，同时使探针与样品表面接触，检测探针移动期间探针的扭转状态，并且调节任一或两者基于通过检测步骤获得的检测值，扫描方向上的速率和接触方向上的力。

3. 发明授权

US07177020B2 Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process 失效
标题翻译：用于分析半导体制造工艺中的外来颗粒的产生状态的方法和装置
公开(公告)号：US07177020B2
公开(公告)日：2007-02-13
申请号：US11128352
申请日：2005-05-13
申请人： Hiroshi Morioka , Minori Noguchi , Yoshimasa Ohshima , Yukio Kembo , Hidetoshi Nishiyama , Kazuhiko Matsuoka , Yoshiharu Shigyo
发明人： Hiroshi Morioka , Minori Noguchi , Yoshimasa Ohshima , Yukio Kembo , Hidetoshi Nishiyama , Kazuhiko Matsuoka , Yoshiharu Shigyo
IPC分类号： G01J3/00
CPC分类号： H01L21/681 , B82Y15/00 , G01N21/94 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L22/12
摘要： An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction on a surface of a specimen than in a transverse direction, a table unit which mounts the specimen and which is movable, a detection optical unit which detects light from the specimen illuminated by the laser with an image sensor while the table is moving, and a signal processor. The signal processor processes a signal outputted from the image sensor of the detection optical unit and converted to a digital signal and extracts defects of the specimen by comparing the converted digital signal with a reference digital signal. A display unit displays information of defects extracted by the signal processor.
摘要翻译：用于检测试样缺陷的装置和方法包括照射光学单元，其将激光倾斜地突出到在一个方向上在一个方向上比在横向方向上更长的区域，安装样本的台单元，可移动的检测光学单元，检测光学单元，其在桌子移动时利用图像传感器检测由激光照射的样本的光，以及信号处理器。信号处理器处理从检测光学单元的图像传感器输出的信号并转换为数字信号，并通过将转换的数字信号与参考数字信号进行比较来提取样本的缺陷。显示单元显示由信号处理器提取的缺陷的信息。

4. 发明授权

US07037735B2 Apparatus and method for testing defects 失效
公开(公告)号：US07037735B2
公开(公告)日：2006-05-02
申请号：US10170378
申请日：2002-06-14
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： H01L21/66 , G01R31/26
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.

5. 发明授权

US4708484A Projection alignment method and apparatus 失效
标题翻译：投影对准方法及装置
公开(公告)号：US4708484A
公开(公告)日：1987-11-24
申请号：US789778
申请日：1985-10-21
申请人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
发明人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
IPC分类号： G01R31/26 , G03F9/00 , H01L21/30 , G01B11/26
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
摘要翻译：本发明涉及一种投影对准器，其中掩模和晶片彼此靠近地保持，并且其中将掩模上描绘的电路图案转印到晶片上，以检测掩模和晶片的相应位置的方法用于掩模和晶片之间的相对定位。以这样的方式分配显微镜物镜的取出的结束，使得防止用于检测掩模和晶片的显微镜和例如X射线的投射光的目的被干扰，从而实现增加吞吐量并且即使在投影期间也能够检测掩模和晶片的位置，本发明的目的在于，显微镜的目的是相对于掩模的平面垂直于或平面的倾斜晶片是要被检测的平面，以便不干涉诸如X射线的投影光，由此可以在检测掩模和晶片的相对位置的同时传输电路图案。

6. 发明授权

US4447731A Exterior view examination apparatus 失效
标题翻译：外观检查装置
公开(公告)号：US4447731A
公开(公告)日：1984-05-08
申请号：US327191
申请日：1981-12-03
申请人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
发明人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
IPC分类号： G01B11/02 , G01B21/00 , G01Q20/02 , G01Q20/04 , G01Q30/02 , G01Q30/04 , H01J37/20 , H01J37/22 , H01J37/28
CPC分类号： H01J37/226 , H01J37/20
摘要： An exterior view examination apparatus comprising a movable sample stage provided in a sample chamber of a scanning type electron microscope; a sample mounted on the stage; and an optical microscope which can observe the sample from an exterior of the chamber, mounted on the chamber in parallel with the scanning type electron microscope, the position of a surface part of the sample (mounted on the sample stage) to be observed, measured or analyzed being preliminary defined by the optical microscope, and the sample stage being moved by a certain amount thereby to bring the sample at the center of the visual field of the electron microscope.
摘要翻译：一种外观检查装置，包括设置在扫描型电子显微镜的样品室中的可移动样品台; 样品安装在舞台上; 和可以与扫描型电子显微镜平行地安装在室上的室外观察样品的光学显微镜，测量样品表面部分（安装在样品台上）的位置，测量或者通过光学显微镜进行初步定义，并且将样品台移动一定量，从而将样品置于电子显微镜的视野的中心。

7. 发明授权

US07631548B2 Scanning probe microscope 失效
标题翻译：扫描探针显微镜
公开(公告)号：US07631548B2
公开(公告)日：2009-12-15
申请号：US11737779
申请日：2007-04-20
申请人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
发明人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
IPC分类号： G01B5/28
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed. Further, a calibration sample is used in a given environment (given temperature and humidity) to acquire a force curve for at least one point. Information obtained from the force curve is used to correct measurements to display the distribution of the sample property.
摘要翻译：使用扫描探针显微镜，如果使用允许探针进入和退出样本的扫描方案测量多个样品特性，则需要在最小所需测量时间内精确可靠地检测样品性质。此外，探针和样品之间的作用力根据探针的类型和探针尖端的磨损情况而变化。因此，不利的是，使用不同探针获得的特性值不能相互比较，除非消除了测量探针的人为影响。根据本发明，利用扫描探针显微镜，使探针与样品间歇接触，同时驱动装置反复允许探针以可变的幅度从样品接近和退出。因此，以高速度获取样品特性。此外，在给定的环境（给定的温度和湿度）中使用校准样品以获得至少一个点的力曲线。从力曲线获得的信息用于校正测量值以显示样品属性的分布。

8. 发明申请

US20070266780A1 Scanning Probe Microscope 失效
标题翻译：扫描探头显微镜
公开(公告)号：US20070266780A1
公开(公告)日：2007-11-22
申请号：US11737779
申请日：2007-04-20
申请人： SHUICHI BABA , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
发明人： SHUICHI BABA , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
IPC分类号： G01N13/10
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed. Further, a calibration sample is used in a given environment (given temperature and humidity) to acquire a force curve for at least one point. Information obtained from the force curve is used to correct measurements to display the distribution of the sample property.
摘要翻译：使用扫描探针显微镜，如果使用允许探针进入和退出样本的扫描方案测量多个样品特性，则需要在最小所需测量时间内精确可靠地检测样品性质。此外，探针和样品之间的作用力根据探针的类型和探针尖端的磨损情况而变化。因此，不利的是，使用不同探针获得的特性值不能相互比较，除非消除了测量探针的人为影响。根据本发明，利用扫描探针显微镜，使探针与样品间歇接触，同时驱动装置反复允许探针以可变的幅度从样品接近和退出。因此，以高速度获取样品特性。此外，在给定的环境（给定的温度和湿度）中使用校准样品以获得至少一个点的力曲线。从力曲线获得的信息用于校正测量值以显示样品属性的分布。

9. 发明申请

US20070146697A1 APPARATUS AND METHOD FOR TESTING DEFECTS 失效
标题翻译：测试缺陷的装置和方法
公开(公告)号：US20070146697A1
公开(公告)日：2007-06-28
申请号：US11681996
申请日：2007-03-05
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/88
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection apparatus includes an illumination optical unit for obliquely illuminating an object with a slit-like shaped laser, a first detection optical unit for detecting a first image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a first direction substantially normal to a surface of the object, a second detection optical unit for detecting a second image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a second direction inclined to the normal direction to the surface of the object, an image signal processing unit which processes a signal outputted from the first detection optical unit and a signal outputted from the second detection optical unit, and an output unit which outputs information processed by the image signal processing unit.
摘要翻译：缺陷检查装置包括：用狭缝状激光器对物体进行倾斜照明的照明光学单元;第一检测光学单元，用于检测由所述狭缝状激光的照射而从物体反射的光形成的第一图像;以及反射在基本上垂直于物体的表面的第一方向上;第二检测光学单元，用于检测由通过照射狭缝状激光而从物体反射的光形成的第二图像，并以与第二方向倾斜的第二方向反射对象物的表面的正常方向，处理从第一检测光学单元输出的信号的图像信号处理单元和从第二检测光学单元输出的信号，以及输出单元，其输出由图像信号处理单元处理的信息。

10. 发明申请

US20070146696A1 APPARATUS AND METHOD FOR TESTING DEFECTS 失效
标题翻译：测试缺陷的装置和方法
公开(公告)号：US20070146696A1
公开(公告)日：2007-06-28
申请号：US11681981
申请日：2007-03-05
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/88
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method for detecting defects on a specimen includes mounting a specimen on a table with which is movable, obliquely projecting a laser as a line onto a surface of the specimen, detecting with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks scattered light resulting from repetitive patterns formed on the specimen, processing a signal outputted from the image sensor to extract defects of the specimen, and a displaying information of defects extracted by the signal processor.
摘要翻译：一种检测试样缺陷的方法，其特征在于，将试样安装在可移动的台面上，将作为线的激光线倾斜投射到试样的表面上，用图像传感器检测由试样反射的光形成的光的图像通过滤波器，该滤波器阻挡由样本上形成的重复图案产生的散射光，处理从图像传感器输出的信号，提取样本的缺陷，以及由信号处理器提取的缺陷的显示信息。

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