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1. 发明授权

US08852386B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US08852386B2
公开(公告)日：2014-10-07
申请号：US12883761
申请日：2010-09-16
申请人： Hachishiro Iizuka , Yuki Mochizuki , Jun Abe
发明人： Hachishiro Iizuka , Yuki Mochizuki , Jun Abe
IPC分类号： H01L21/3065 , H01J37/32
CPC分类号： H01J37/32834 , H01J37/32091
摘要： A plasma processing apparatus includes a shower head that supplies a gas toward a substrate in a shower pattern through a plurality of gas discharge holes provided in a facing surface of the shower head facing a mounting table; a multiple number of gas exhaust holes provided in the facing surface of the shower head; a vertically movable ring-shaped member that is installed along a circumference of the mounting table and is configured to form, at a raised position, a processing space surrounded by the mounting table, the shower head and the ring-shaped member; a multiplicity of gas supply holes opened in an inner wall of the ring-shaped member to supply a gas into the processing space; and a plurality of gas exhaust holes opened in an inner wall of the ring-shaped member to evacuate the processing space.
摘要翻译：一种等离子体处理装置，包括：喷淋头，其通过设置在面对安装台的淋浴头的面对面上的多个气体排出孔向喷射模式的基板供给气体; 多个排气孔设置在淋浴喷头的相对面上; 沿着所述安装台的圆周安装的可垂直移动的环形构件，并且构造成在升高位置形成由所述安装台，所述淋浴头和所述环形构件包围的处理空间; 多个气体供给孔，其在所述环状部件的内壁上开口，向所述处理空间供给气体; 以及在所述环状构件的内壁中开口的多个排气孔，以对所述处理空间进行抽真空。

2. 发明申请

US20110067815A1 PLASMA PROCESSING APPARATUS AND SHOWER HEAD 有权
标题翻译：等离子体加工设备和淋浴头
公开(公告)号：US20110067815A1
公开(公告)日：2011-03-24
申请号：US12888664
申请日：2010-09-23
申请人： Hachishiro Iizuka , Jun Abe , Yuki Mochizuki
发明人： Hachishiro Iizuka , Jun Abe , Yuki Mochizuki
IPC分类号： H01L21/3065
CPC分类号： H01J37/3244 , H01J37/3266
摘要： A plasma processing apparatus includes a shower head that is installed within a processing chamber for processing a substrate therein so as to face a mounting table for mounting the substrate thereon and supplies a gas toward the substrate in a shower pattern through a plurality of gas discharge holes provided in a facing surface of the shower head facing the mounting table; a plurality of gas exhaust holes formed through the shower head to be extended from the facing surface of the shower head to an opposite surface from the facing surface; a multiple number of rod-shaped magnet pillars standing upright in a gas exhaust space communicating with the gas exhaust holes on the side of the opposite surface; and a driving unit that varies a distance between the magnet pillars and the gas exhaust holes by moving at least a part of the magnet pillars.
摘要翻译：一种等离子体处理装置，包括安装在用于处理基板的处理室内的淋浴喷头，面对用于将基板安装在其上的安装台，并通过多个气体排出孔向喷射基板喷射气体设置在所述淋浴喷头的面向所述安装台的面对面上; 多个排气孔，其形成为穿过所述淋浴喷头，从所述喷淋头的相对表面延伸到与所述相对表面相反的表面; 多个杆状磁体柱直立放置在与相对表面侧的排气孔连通的排气空间中; 以及驱动单元，其通过移动至少一部分磁体柱来改变磁体柱和排气孔之间的距离。

3. 发明申请

US20110061813A1 PLASMA PROCESSING APPARATUS 有权
标题翻译：等离子体加工设备
公开(公告)号：US20110061813A1
公开(公告)日：2011-03-17
申请号：US12883761
申请日：2010-09-16
申请人： Hachishiro Iizuka , Yuki Mochizuki , Jun Abe
发明人： Hachishiro Iizuka , Yuki Mochizuki , Jun Abe
IPC分类号： H01L21/465
CPC分类号： H01J37/32834 , H01J37/32091
摘要： A plasma processing apparatus includes a shower head that supplies a gas toward a substrate in a shower pattern through a plurality of gas discharge holes provided in a facing surface of the shower head facing a mounting table; a multiple number of gas exhaust holes provided in the facing surface of the shower head; a vertically movable ring-shaped member that is installed along a circumference of the mounting table and is configured to form, at a raised position, a processing space surrounded by the mounting table, the shower head and the ring-shaped member; a multiplicity of gas supply holes opened in an inner wall of the ring-shaped member to supply a gas into the processing space; and a plurality of gas exhaust holes opened in an inner wall of the ring-shaped member to evacuate the processing space.
摘要翻译：一种等离子体处理装置，包括：喷淋头，其通过设置在面对安装台的淋浴头的面对面上的多个气体排出孔向喷射模式的基板供给气体; 多个排气孔设置在淋浴喷头的相对面上; 沿着所述安装台的圆周安装的可垂直移动的环形构件，所述可垂直移动的环形构件被构造成在升高位置形成由所述安装台，所述淋浴喷头和所述环形构件包围的处理空间; 多个气体供给孔，其在所述环状部件的内壁上开口，向所述处理空间供给气体; 以及在所述环状构件的内壁中开口的多个排气孔，以对所述处理空间进行抽真空。

4. 发明授权

US08747609B2 Plasma processing apparatus and shower head 有权
标题翻译：等离子处理装置和淋浴头
公开(公告)号：US08747609B2
公开(公告)日：2014-06-10
申请号：US12888664
申请日：2010-09-23
申请人： Hachishiro Iizuka , Jun Abe , Yuki Mochizuki
发明人： Hachishiro Iizuka , Jun Abe , Yuki Mochizuki
IPC分类号： H01L21/3065 , C23F1/00 , C23C16/00
CPC分类号： H01J37/3244 , H01J37/3266
摘要： A plasma processing apparatus includes a shower head that is installed within a processing chamber for processing a substrate therein so as to face a mounting table for mounting the substrate thereon and supplies a gas toward the substrate in a shower pattern through a plurality of gas discharge holes provided in a facing surface of the shower head facing the mounting table; a plurality of gas exhaust holes formed through the shower head to be extended from the facing surface of the shower head to an opposite surface from the facing surface; a multiple number of rod-shaped magnet pillars standing upright in a gas exhaust space communicating with the gas exhaust holes on the side of the opposite surface; and a driving unit that varies a distance between the magnet pillars and the gas exhaust holes by moving at least a part of the magnet pillars.
摘要翻译：一种等离子体处理装置，包括安装在用于处理基板的处理室内的淋浴喷头，面对用于将基板安装在其上的安装台，并通过多个气体排出孔向喷射基板喷射气体设置在所述淋浴喷头的面向所述安装台的面对面上; 多个排气孔，其形成为穿过所述淋浴喷头，从所述喷淋头的相对表面延伸到与所述相对表面相反的表面; 多个杆状磁体柱直立放置在与相对表面侧的排气孔连通的排气空间中; 以及驱动单元，其通过移动至少一部分磁体柱来改变磁体柱和排气孔之间的距离。

5. 发明申请

US20100307686A1 SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：基板加工设备
公开(公告)号：US20100307686A1
公开(公告)日：2010-12-09
申请号：US12793859
申请日：2010-06-04
申请人： Hachishiro Iizuka , Yuki Mochizuki
发明人： Hachishiro Iizuka , Yuki Mochizuki
IPC分类号： C23F1/08 , C23C16/44
CPC分类号： H01L21/67115 , H01L21/67103
摘要： Provided is a substrate processing apparatus capable of effectively heating each component without generating an abnormal electric discharge. The substrate processing apparatus 10 includes: a depressurizable processing chamber 11; a susceptor 12 provided within the processing chamber 11; a shower head 27 provided at a ceiling portion of the processing chamber 11 so as to face the susceptor 12; a focus ring 24 provided at an outer peripheral portion of a top surface of the susceptor 12; and a ring-shaped infrared radiant heater 26 provided in a vicinity of the focus ring 24. The heater 26 includes an infrared radiator 26a and a quartz ring 26b for sealing the infrared radiator 26a therein.
摘要翻译：提供一种能够有效地加热各部件而不产生异常放电的基板处理装置。基板处理装置10包括：可减压处理室11; 设置在处理室11内的基座12; 设置在处理室11的顶部以便与基座12相对的淋浴头27; 设置在基座12的上表面的外周部的聚焦环24; 以及设置在聚焦环24附近的环状红外辐射加热器26.加热器26包括用于将红外辐射体26a密封在其中的红外辐射体26a和石英环26b。

6. 发明申请

US20050222247A1 Chroman derivatives 审中-公开
标题翻译：色原衍生物
公开(公告)号：US20050222247A1
公开(公告)日：2005-10-06
申请号：US10996230
申请日：2004-11-23
申请人： Stephen Boyer , Kentaro Hashimoto , Thomas Rolle , Peter Sandner , Beatrix Stelte-Ludwig , Hanna Tinel , Kerstin Henninger , Arnel Concepcion , Osamu Sakurai , Kanako Hirai , Tadashi Inoue , Yuki Mochizuki , Noriko Nunami , Masaomi Tajimi , Noriyuki Yamamoto , Yasuhiro Tsukimi
发明人： Stephen Boyer , Kentaro Hashimoto , Thomas Rolle , Peter Sandner , Beatrix Stelte-Ludwig , Hanna Tinel , Kerstin Henninger , Arnel Concepcion , Osamu Sakurai , Kanako Hirai , Tadashi Inoue , Yuki Mochizuki , Noriko Nunami , Masaomi Tajimi , Noriyuki Yamamoto , Yasuhiro Tsukimi
IPC分类号： A61K31/353 , A61K31/403 , A61K31/4192 , C07D311/58 , C07D405/12 , C07D311/74
CPC分类号： C07D311/58 , C07D405/12
摘要： This invention relates to chroman derivatives and salts thereof which are useful as active ingredients of pharmaceutical preparations. The chroman derivatives of the present invention have an excellent activity as BETA 3 antagonists and are useful for the prophylaxis and treatment of diseases associated with BETA 3 activity, in particular for the treatment of urological disorder or disease, such as detrusor overactivity (overactive bladder), urinary incontinence, neurogenic detrusor oeractivity (detrusor hyperflexia), idiopathic detrusor overactivity (detrusor instability), benign prostatic hyperplasia, and lower urinary tract symptoms; and inflammatory disorders, such as asthma and COPD.
摘要翻译：本发明涉及可用作药物制剂的活性成分的苯并二氢吡喃衍生物及其盐。本发明的苯并二氢吡喃衍生物作为BETA 3拮抗剂具有优异的活性，可用于预防和治疗与BETA 3活性相关的疾病，特别是用于治疗泌尿系统疾病或疾病，如逼尿肌过度活动（膀胱过度活动症），尿失禁，神经源性逼尿肌反应性（逼尿肌hyperflexia），特发性逼尿肌过度活动（逼尿肌不稳定），良性前列腺增生和下尿路症状; 和炎症性疾病，如哮喘和COPD。

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