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1. 发明授权

US08437004B2 Detection apparatus 失效
标题翻译：检测装置
公开(公告)号：US08437004B2
公开(公告)日：2013-05-07
申请号：US12908405
申请日：2010-10-20
申请人： Yuhei Sumiyoshi , Takumi Tokimitsu , Hiroyuki Yuuki
发明人： Yuhei Sumiyoshi , Takumi Tokimitsu , Hiroyuki Yuuki
IPC分类号： G01N21/55 , G01N21/88
CPC分类号： G01N21/645 , G01N21/4738 , G01N21/55 , G01N2201/0631 , G02B27/0927 , G02B27/0994
摘要： A detection apparatus which illuminates a sample and detects light reflected by the sample, comprises a light source, a columnar reflecting member having a columnar reflecting surface which reflects light having entered a first end of the columnar reflecting member by a plurality of number of times, and emits the light from a second end of the columnar reflecting member, a mirror which reflects light radiated by the light source so as to guide to the first end and a detector, wherein the sample is illuminated with the light emitted from the second end, and the detector is configured to detect the light which has been reflected by the sample and has passed through the columnar reflecting member, and a reflecting surface of the mirror is a concave surface, and a shape of a reflecting surface of the mirror on a section perpendicular to an axis of the columnar reflecting member is concave.
摘要翻译：照射样品并检测由样品反射的光的检测装置包括光源，柱状反射部件，具有将已经进入柱状反射部件的第一端的光反射多次的柱状反射面，并从柱状反射构件的第二端发射光，反射由光源辐射的光以引导到第一端的反射镜和检测器，其中样品被从第二端发射的光照射，并且所述检测器被配置为检测已经被所述样品反射并且已经通过所述柱状反射部件的光，并且所述反射镜的反射表面是凹面，并且所述反射镜的反射面的形状在所述部分垂直于柱状反射构件的轴线是凹的。

2. 发明申请

US20060092392A1 Projection optical system, exposure apparatus and method using the same 失效
公开(公告)号：US20060092392A1
公开(公告)日：2006-05-04
申请号：US11302155
申请日：2005-12-14
申请人： Yuhei Sumiyoshi , Masayuki Suzuki
发明人： Yuhei Sumiyoshi , Masayuki Suzuki
IPC分类号： G03B27/52
CPC分类号： G03B27/54 , G03F7/706 , G03F7/70891
摘要： A projection optical system includes an optical element that includes and locally uses a reflective or refractive area that is substantially axially symmetrical around an optical axis, the optical element being rotatable around the optical axis.

3. 发明申请

US20110109908A1 DETECTION APPARATUS 失效
标题翻译：检测装置
公开(公告)号：US20110109908A1
公开(公告)日：2011-05-12
申请号：US12908405
申请日：2010-10-20
申请人： Yuhei Sumiyoshi , Takumi Tokimitsu , Hiroyuki Yuuki
发明人： Yuhei Sumiyoshi , Takumi Tokimitsu , Hiroyuki Yuuki
IPC分类号： G01N21/55
CPC分类号： G01N21/645 , G01N21/4738 , G01N21/55 , G01N2201/0631 , G02B27/0927 , G02B27/0994
摘要： A detection apparatus which illuminates a sample and detects light reflected by the sample, comprises a light source, a columnar reflecting member having a columnar reflecting surface which reflects light having entered a first end of the columnar reflecting member by a plurality of number of times, and emits the light from a second end of the columnar reflecting member, a mirror which reflects light radiated by the light source so as to guide to the first end and a detector, wherein the sample is illuminated with the light emitted from the second end, and the detector is configured to detect the light which has been reflected by the sample and has passed through the columnar reflecting member, and a reflecting surface of the mirror is a concave surface, and a shape of a reflecting surface of the mirror on a section perpendicular to an axis of the columnar reflecting member is concave.
摘要翻译：照射样品并检测由样品反射的光的检测装置包括光源，柱状反射部件，具有将已经进入柱状反射部件的第一端的光反射多次的柱状反射面，并从柱状反射构件的第二端发射光，反射由光源辐射的光以引导到第一端的反射镜和检测器，其中样品被从第二端发射的光照射，并且所述检测器被配置为检测已经被所述样品反射并且已经通过所述柱状反射部件的光，并且所述反射镜的反射表面是凹面，并且所述反射镜的反射面的形状在所述部分垂直于柱状反射构件的轴线是凹的。

4. 发明授权

US07403262B2 Projection optical system and exposure apparatus having the same 失效
标题翻译：投影光学系统和具有相同的曝光装置
公开(公告)号：US07403262B2
公开(公告)日：2008-07-22
申请号：US11282418
申请日：2005-11-17
申请人： Yuhei Sumiyoshi
发明人： Yuhei Sumiyoshi
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70341
摘要： A projection optical system used for an exposure apparatus to projecting a reduced size of an image of an object onto an image plane includes plural refractive elements that dispense with a reflective element having a substantial optical power, wherein the projection optical system forms an intermediate image.
摘要翻译：用于曝光装置的投影光学系统将物体的图像的尺寸减小到图像平面上包括多个折射元件，其分配具有实质光功率的反射元件，其中投影光学系统形成中间图像。

5. 发明申请

US20060126048A1 Projection optical system and exposure apparatus having the same 失效
标题翻译：投影光学系统和具有相同的曝光装置
公开(公告)号：US20060126048A1
公开(公告)日：2006-06-15
申请号：US11282418
申请日：2005-11-17
申请人： Yuhei Sumiyoshi
发明人： Yuhei Sumiyoshi
IPC分类号： G03B27/54
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70341
摘要： A projection optical system used for an exposure apparatus to projecting a reduced size of an image of an object onto an image plane includes plural refractive elements that dispense with a reflective element having a substantial optical power, wherein the projection optical system forms an intermediate image.
摘要翻译：用于曝光装置的投影光学系统将物体的图像的尺寸缩小到图像平面上，包括多个折射元件，其分配具有实质光功率的反射元件，其中投影光学系统形成中间图像。

6. 发明授权

US07006194B2 Projection optical system, exposure apparatus and method using the same 失效
公开(公告)号：US07006194B2
公开(公告)日：2006-02-28
申请号：US10407721
申请日：2003-04-04
申请人： Yuhei Sumiyoshi , Masayuki Suzuki
发明人： Yuhei Sumiyoshi , Masayuki Suzuki
IPC分类号： G03B27/52 , G03B27/54 , G03B27/42 , G03B27/68
CPC分类号： G03B27/54 , G03F7/706 , G03F7/70891
摘要： A projection optical system includes an optical element that includes and locally uses a reflective or refractive area that is substantially axially symmetrical around an optical axis, the optical element being rotatable around the optical axis.

7. 发明授权

US06256086B1 Projection exposure apparatus, and device manufacturing method 有权
标题翻译：投影曝光装置和装置制造方法
公开(公告)号：US06256086B1
公开(公告)日：2001-07-03
申请号：US09411392
申请日：1999-10-04
申请人： Yuhei Sumiyoshi
发明人： Yuhei Sumiyoshi
IPC分类号： G03B2752
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70258
摘要： A projection exposure apparatus having a function for adjusting a projection magnification, a symmetric distortion aberration and another optical characteristic of a projection optical system is disclosed, wherein, when the projection magnification and the symmetric distortion aberration are adjusted, the other optical characteristic of the projection optical system is adjusted so that a change thereof is reduced very small or zero, such that good optical performance of the projection optical system is retained.
摘要翻译：公开了具有调整投影光学系统的投影倍率，对称畸变像差和另一光学特性的投影曝光装置，其中，当投影倍率和对称畸变像差被调整时，投影的另一个光学特性调整光学系统使其变化非常小或为零，从而保持投影光学系统良好的光学性能。

8. 发明授权

US08760618B2 Projection optical system, exposure apparatus and device manufacturing method 有权
标题翻译：投影光学系统，曝光装置和装置制造方法
公开(公告)号：US08760618B2
公开(公告)日：2014-06-24
申请号：US12687997
申请日：2010-01-15
申请人： Yuhei Sumiyoshi
发明人： Yuhei Sumiyoshi
IPC分类号： G03B27/68
CPC分类号： G03B27/68 , G02B27/0025 , G03F7/70308
摘要： A projection optical system of the present invention includes an optical element group that includes optical elements, and a controller that drives at least one of the first optical elements. The optical element group includes aspheric surfaces having a complementary relationship with each other and are arranged so that the aspheric surfaces face each other. The controller changes a relative position between the optical elements in a first direction and a second direction orthogonal to the first direction to control optical performances of the projection optical system corresponding to each of the first direction and the second direction.
摘要翻译：本发明的投影光学系统包括：包括光学元件的光学元件组;以及驱动所述第一光学元件中的至少一个的控制器。光学元件组包括彼此具有互补关系的非球面表面，并且被布置成使得非球面彼此面对。控制器在与第一方向正交的第一方向和第二方向上改变光学元件之间的相对位置，以控制对应于第一方向和第二方向中的每一个的投影光学系统的光学性能。

9. 发明授权

US08477286B2 Projection optical system, exposure apparatus, and device manufacturing method 有权
标题翻译：投影光学系统，曝光装置和装置制造方法
公开(公告)号：US08477286B2
公开(公告)日：2013-07-02
申请号：US12720080
申请日：2010-03-09
申请人： Yuhei Sumiyoshi
发明人： Yuhei Sumiyoshi
IPC分类号： G03B27/68 , G03B27/32
CPC分类号： G03F7/70308 , G02B13/143 , G02B13/18 , G02B27/0068 , G03B27/52
摘要： A projection optical system is configured to project an image of an object plane onto an image plane, and includes a first optical element having an aspheric shape that is rotationally asymmetric with respect to an optical axis, a moving unit configured to move the first optical element in a direction perpendicular to the optical axis, and a second optical element fixed on the optical axis, and configured to reduce an optical path length difference caused by an aspheric surface of the first optical element, the second optical element having no aspheric shape complement to the aspheric shape of the first optical element.
摘要翻译：投影光学系统被配置为将物平面的图像投影到像平面上，并且包括具有相对于光轴旋转非对称的非球面形状的第一光学元件，被配置为使第一光学元件在与所述光轴垂直的方向上固定的第二光学元件和固定在所述光轴上的第二光学元件，被配置为减小由所述第一光学元件的非球面引起的光路长度差，所述第二光学元件不具有非球面形状，第一光学元件的非球面形状。

10. 发明授权

US07408620B2 Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：US07408620B2
公开(公告)日：2008-08-05
申请号：US11687386
申请日：2007-03-16
申请人： Yuhei Sumiyoshi
发明人： Yuhei Sumiyoshi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70233 , G03F7/70341 , G03F7/70983
摘要： An exposure apparatus includes a illumination optical system for illuminating a reticle with light from a light source, and a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object, wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.
摘要翻译：曝光装置包括用于利用来自光源的光照射掩模版的照明光学系统和用于将掩模版的图案投射到物体上的投影光学系统，所述投影光学系统包括最靠近物体的透镜，其中表面在透镜的物体侧上的距离小于透镜的掩模版面上的表面的有效面积，并且其中所述曝光装置经由填充在透镜和物体之间的空间中的液体曝光物体。

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