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1. 发明授权

US08922790B2 Optical film thickness measuring device and thin film forming apparatus using the optical film thickness measuring device 有权
标题翻译：光学膜厚度测量装置和使用该光学膜厚度测量装置的薄膜形成装置
公开(公告)号：US08922790B2
公开(公告)日：2014-12-30
申请号：US13823527
申请日：2012-02-15
申请人： Kyokuyo Sai , Yousong Jiang , Kenji Ozawa
发明人： Kyokuyo Sai , Yousong Jiang , Kenji Ozawa
IPC分类号： G01B11/28 , G01B11/06 , C23C14/00 , C23C14/50 , C23C14/54
CPC分类号： G01B11/0691 , C23C14/0078 , C23C14/505 , C23C14/547 , G01B11/0625
摘要： An optical film thickness measuring device, enabling direct measurement of a film thickness of a product in real time accurately without a monitor substrate, includes: a projector, a light receiver, inner beam splitters disposed in a base substrate holder to reflect a measurement beam to a base substrate, an inner optical reflector that totally reflects a measurement beam from the closest inner beam splitter, external beam splitters the measurement beam from the inner beam splitters toward the light receiver, and an outer optical reflector that reflects the measurement beam from the optical reflector toward the light receiver. The measurement beam reflected by the inner beam splitters and the inner optical reflector is passed through the base substrate and then reflected by the external beam splitters and the outer optical reflector to be guided to the light receiver, so that the measurement beam is received by the light receiver.
摘要翻译：一种光学膜厚度测量装置，能够在没有监视器基板的情况下实时精确地直接测量产品的膜厚度，包括：投影仪，光接收器，设置在基板保持器中的内分束器，以将测量光束反射到基底基板，全反射来自最近内分束器的测量光束的内部光学反射器，外部光束将测量光束从内部分束器分离到光接收器，以及外部光学反射器，其将测量光束从光学反射器朝向光接收器。由内分束器和内部光学反射器反射的测量光束通过基底基板，然后被外部分束器和外部光学反射器反射，以被引导到光接收器，使得测量光束被光接收机。

2. 发明申请

US20110151247A1 METHOD FOR DEPOSITING FILM AND OIL-REPELLENT SUBSTRATE 有权
标题翻译：沉积薄膜和油墨基质的方法
公开(公告)号：US20110151247A1
公开(公告)日：2011-06-23
申请号：US13059145
申请日：2009-08-24
申请人： Ichiro Shiono , Ekishu Nagae , Yousong Jiang , Takuya Sugawara
发明人： Ichiro Shiono , Ekishu Nagae , Yousong Jiang , Takuya Sugawara
IPC分类号： B32B5/00 , B05D3/06 , C23C14/46
CPC分类号： C23C16/56 , C03C17/42 , C03C2217/76 , C03C2217/77 , C03C2218/32 , C09D1/00 , C09D5/00 , C23C14/0652 , C23C14/08 , C23C14/12 , C23C14/22 , C23C14/221 , C23C14/24 , C23C14/541 , C23C14/5833 , Y10T428/265
摘要： The method for depositing a film of the present invention comprises the first film deposition step of depositing a first film 103 having hardness higher than hardness of a substrate 101 on a surface of the substrate 101, the first irradiation step of irradiating particles having energy on the first film 103, and the second film deposition step of depositing an oil-repellent film 105 on a surface of the first film 103 subjected to the first irradiation step. According to the present invention, a method for depositing a film enabling production of an oil-repellent substrate comprising an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.
摘要翻译：本发明的膜的沉积方法包括在基板101的表面上沉积具有高于基板101的硬度的硬度的第一膜103的第一膜沉积步骤，在基板101的表面上照射具有能量的颗粒的第一照射步骤第一膜103，以及在经受第一照射步骤的第一膜103的表面上沉积防油膜105的第二膜沉积步骤。根据本发明，可以提供一种用于沉积能够生产防油衬底的膜的方法，该方法包括具有实际足够水平的耐磨性的拒油膜。

3. 发明授权

US10415135B2 Thin film formation method and thin film formation apparatus 有权
公开(公告)号：US10415135B2
公开(公告)日：2019-09-17
申请号：US13704568
申请日：2011-06-13
申请人： Yohei Hinata , Kyokuyo Sai , Yoshiyuki Otaki , Ichiro Shiono , Yousong Jiang
发明人： Yohei Hinata , Kyokuyo Sai , Yoshiyuki Otaki , Ichiro Shiono , Yousong Jiang
IPC分类号： C23C14/54 , C23C14/34 , C23C14/50 , G02B5/28
摘要： A thin film formation method is provided, by which needless film formation due to trial film formation is omitted and film formation efficiency can be improved. This invention is a method for sputtering targets to form a film A having an intended film thickness of T1 as the first thin film on a substrate and monitor substrate held and rotated by a rotation drum and, subsequently, furthermore sputtering the targets used in forming the film A to form a film C having an intended film thickness of T3 as the second thin film, which is another thin film having the same composition as the film A; comprising film thickness monitoring steps S4 and S5, a stopping step S7, an actual time acquisition step S8, an actual rate calculating step S9 and a necessary time calculating step S24.

4. 发明授权

US09422620B2 Translucent hard thin film 有权
标题翻译：半透明硬薄膜
公开(公告)号：US09422620B2
公开(公告)日：2016-08-23
申请号：US13700686
申请日：2012-02-16
申请人： Takuya Sugawara , Hikaru Aoshima , Yousong Jiang , Ichiro Shiono
发明人： Takuya Sugawara , Hikaru Aoshima , Yousong Jiang , Ichiro Shiono
IPC分类号： C03C17/34 , C23C14/06 , C23C14/10 , C23C14/00 , C23C28/00 , C23C28/04
CPC分类号： C23C14/0635 , C03C17/3441 , C03C2217/78 , C23C14/0078 , C23C14/10 , C23C28/04 , C23C28/42 , Y10T428/24975
摘要： A translucent hard thin film having high transmissivity and film strength is provided. The translucent hard thin film can be composed of a laminated film formed on a substrate surface, wherein the laminated film has a superlattice structure obtained by stacking a plurality of SiO2 layer and SiC layers alternately and the entire film thickness is 3000 nm or more. A film thickness per layer is 5 to 30 nm in a SiC layer and 30% to 60% of that of the SiO2 layer in a SiC layer.
摘要翻译：提供透光性和膜强度高的半透明硬质薄膜。半透明硬质薄膜可以由形成在基板表面上的层叠膜构成，其中层叠膜具有通过交替堆叠多个SiO 2层和SiC层而获得的超晶格结构，并且整个膜厚度为3000nm以上。 SiC层中的每层的膜厚度为5〜30nm，SiC层的SiO 2层的膜厚为30〜60％。

5. 发明申请

US20110168544A1 Manufacturing Method of Optical Filter 审中-公开
标题翻译：光滤波器制造方法
公开(公告)号：US20110168544A1
公开(公告)日：2011-07-14
申请号：US13120764
申请日：2009-09-14
申请人： Ichiro Shiono , Toshihiko Sato , Yasuhisa Togashi , Yousong Jiang , Takuya Sugawara
发明人： Ichiro Shiono , Toshihiko Sato , Yasuhisa Togashi , Yousong Jiang , Takuya Sugawara
IPC分类号： C23C14/34 , B05D3/10 , B05D5/06
CPC分类号： C23C14/0078 , C03C17/001 , C03C2218/31 , H01J37/32082
摘要： [Object]To provide a manufacturing method of an optical filter having favorable film quality by removing a foreign substance adhered onto a surface of a substrate by cleaning before a thin film is formed.[Solution] By performing a cleaning step P1 for cleaning a substrate S by means of a solution including water, a pre-treatment step P3 for plasma-treating a surface of the substrate S cleaned in the cleaning step P1 by plasma of an oxygen gas, and a thin film formation step (P4, P5) for forming the thin film on the surface of the substrate S plasma-treated in the pre-treatment step P3, the foreign substance adhered onto the surface of the substrate can be effectively removed. In the pre-treatment step P3, only the oxygen gas is introduced to an area where the plasma is generated, and a flow rate of the oxygen gas to be introduced is greater than a flow rate of the oxygen gas introduced in the thin film formation step. Thus, the foreign substance adhered onto the surface of the substrate S through OH bonds in the cleaning step is effectively eliminated before the thin film formation step (P4, P5), so that generation of a film absent part is prevented.
摘要翻译：通过在形成薄膜之前通过清洗除去附着在基板的表面上的异物，提供具有良好的膜质量的滤光器的制造方法。 [解决方案]通过执行用于通过包括水的溶液清洁基板S的清洁步骤P1，用于等离子体处理在清洁步骤P1中清洁的基板S的表面的预处理步骤P3通过氧气等离子体以及用于在预处理步骤P3中等离子体处理的基板S的表面上形成薄膜的薄膜形成步骤（P4，P5），可以有效地去除附着在基板表面上的异物。在预处理工序P3中，仅将氧气导入到产生等离子体的区域，导入氧气的流量比导入薄膜层的氧气的流量大步。因此，在薄膜形成工序（P4，P5）之前，在清洗工序中通过OH键附着在基板S的表面上的异物被有效地消除，从而防止产生不存在膜的部件。

6. 发明申请

US20110097511A1 DEPOSITION APPARATUS AND MANUFACTURING METHOD OF THIN FILM DEVICE 审中-公开
标题翻译：薄膜装置的沉积装置和制造方法
公开(公告)号：US20110097511A1
公开(公告)日：2011-04-28
申请号：US13001724
申请日：2009-06-16
申请人： Ichiro Shiono , Yousong Jiang , Ekishu Nagae , Hiromitsu Honda , Takanori Murata
发明人： Ichiro Shiono , Yousong Jiang , Ekishu Nagae , Hiromitsu Honda , Takanori Murata
IPC分类号： C23C14/48
CPC分类号： C23C14/30 , C23C14/0031 , C23C14/083 , C23C14/10 , C23C14/22 , G02B5/285
摘要： [Object] To provide a deposition apparatus 1 capable of suppressing a temporal change in film formation conditions.[Solution] In the deposition apparatus 1 including a substrate holder 12 supported in a vacuum chamber 10 grounded on the earth, a substrate 14 held by the substrate holder 12, deposition sources 34, 36 placed distant from the substrate 14 so as to face the substrate, an ion gun 38 for irradiating ions to the substrate 14, and a neutralizer 40 for irradiating electrons to the substrate 14, the vacuum chamber 10 is provided with an inner wall 30 electrically floating, and the neutralizer 40 is arranged on the inner side surface side of the vacuum chamber 10 so as to be distant from the ion gun 38.
摘要翻译：本发明提供一种能够抑制成膜条件的时间变化的沉积装置1。 [解决方案]在包括支撑在接地的真空室10中的衬底保持器12的沉积设备1中，由衬底保持器12保持的衬底14，远离衬底14放置的沉积源34,36以面对基板，用于向基板14照射离子的离子枪38和用于向基板14照射电子的中和器40，真空室10设置有电浮动的内壁30，并且中和器40布置在内侧真空室10的表面侧，以远离离子枪38。

7. 发明授权

US10000844B2 Magnetic field generator, magnetron cathode and spattering apparatus 有权
公开(公告)号：US10000844B2
公开(公告)日：2018-06-19
申请号：US13698884
申请日：2011-08-30
申请人： Wei Kong , Zijing Lin , Ming Li , Bin Xie , Haiqian Wang , Yousong Jiang , Ekishu Nagae
发明人： Wei Kong , Zijing Lin , Ming Li , Bin Xie , Haiqian Wang , Yousong Jiang , Ekishu Nagae
IPC分类号： C23C14/00 , C25B11/00 , C25B13/00 , C23C14/35 , H01J37/34 , H01F7/08 , H01J25/50
CPC分类号： C23C14/351 , C23C14/35 , H01F7/081 , H01J25/50 , H01J37/3405 , H01J37/3452 , H01J37/3461
摘要： A magnetic field generator arranged behind a target and for generating a magnetic field on a front surface of the target based on magnetic force lines can include a ring-shaped outer magnetic body having a pole axis in a parallel direction (X-direction) with respect to the target surface, a center magnetic body arranged on an inner side of the outer magnetic body and having a pole axis in a parallel direction (X-direction) with the direction of the pole axis of the outer magnetic body, a yoke plate for supporting the outer magnetic body and the center magnetic body from behind, and a magnetic permeable plate for changing a magnetic field distribution of the front surface of the target. The magnetic permeable plate is arranged so as to be supported by the yoke plate from behind.

8. 发明授权

US09365920B2 Method for depositing film 有权
标题翻译：沉积膜的方法
公开(公告)号：US09365920B2
公开(公告)日：2016-06-14
申请号：US13061624
申请日：2009-08-24
申请人： Ichiro Shiono , Ekishu Nagae , Yousong Jiang , Takuya Sugawara
发明人： Ichiro Shiono , Ekishu Nagae , Yousong Jiang , Takuya Sugawara
IPC分类号： B05D3/00 , B05D3/06 , C23C14/02 , C03C17/42 , C03C19/00 , C23C14/34 , C23C14/56 , C23C14/00 , C23C14/50 , H01J37/34 , H01J37/32
CPC分类号： C23C14/022 , C03C17/42 , C03C19/00 , C03C2217/77 , C23C14/0078 , C23C14/3464 , C23C14/505 , C23C14/568 , H01J37/321 , H01J37/32422 , H01J37/32513 , H01J37/32633 , H01J37/32761 , H01J37/34
摘要： The method for depositing a film of the present invention comprises the first irradiation step of irradiating particles having energy on a surface of a substrate 101, the first film deposition step of depositing a first film 103 on the surface of the substrate 101 subjected to the first irradiation step by using a dry process, and the second film deposition step of depositing a second film 105 having oil repellency on a surface of the first film 103. According to the present invention, a method for depositing a film enabling production of an oil-repellent substrate comprising an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.
摘要翻译：本发明的膜的沉积方法包括：在基板101的表面上照射具有能量的颗粒的第一照射步骤，第一膜沉积步骤，在经受第一次的基板101的表面上沉积第一膜103 通过使用干法进行照射步骤，以及第二膜沉积步骤，在第一膜103的表面上沉积具有拒油性的第二膜105.根据本发明，一种用于沉积膜的方法，可以提供包括具有实际上足够水平的耐磨性的防油膜的防水衬底。

9. 发明授权

US09315415B2 Method for depositing film and oil-repellent substrate 有权
标题翻译：沉积薄膜和防油衬底的方法
公开(公告)号：US09315415B2
公开(公告)日：2016-04-19
申请号：US13059145
申请日：2009-08-24
申请人： Ichiro Shiono , Ekishu Nagae , Yousong Jiang , Takuya Sugawara
发明人： Ichiro Shiono , Ekishu Nagae , Yousong Jiang , Takuya Sugawara
IPC分类号： C23C14/08 , C23C14/24 , C23C14/58 , B05D5/08 , C03C17/42 , C23C14/22 , C23C14/06 , C23C14/12 , C23C14/54
CPC分类号： C23C16/56 , C03C17/42 , C03C2217/76 , C03C2217/77 , C03C2218/32 , C09D1/00 , C09D5/00 , C23C14/0652 , C23C14/08 , C23C14/12 , C23C14/22 , C23C14/221 , C23C14/24 , C23C14/541 , C23C14/5833 , Y10T428/265
摘要： The method for depositing a film of the present invention comprises the first film deposition step of depositing a first film 103 having hardness higher than hardness of a substrate 101 on a surface of the substrate 101, the first irradiation step of irradiating particles having energy on the first film 103, and the second film deposition step of depositing an oil-repellent film 105 on a surface of the first film 103 subjected to the first irradiation step. According to the present invention, a method for depositing a film enabling production of an oil-repellent substrate comprising an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.
摘要翻译：本发明的膜的沉积方法包括在基板101的表面上沉积具有高于基板101的硬度的硬度的第一膜103的第一膜沉积步骤，在基板101的表面上照射具有能量的颗粒的第一照射步骤第一膜103，以及在经受第一照射步骤的第一膜103的表面上沉积防油膜105的第二膜沉积步骤。根据本发明，可以提供一种用于沉积能够生产防油衬底的膜的方法，该方法包括具有实际足够水平的耐磨性的拒油膜。

10. 发明授权

US08625111B2 Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter 有权
标题翻译：光学薄膜厚度计和薄膜成型设备配有光学薄膜厚度计
公开(公告)号：US08625111B2
公开(公告)日：2014-01-07
申请号：US13381032
申请日：2010-06-29
申请人： Kyokuyo Sai , Yohei Hinata , Yoshiyuki Otaki , Yousong Jiang
发明人： Kyokuyo Sai , Yohei Hinata , Yoshiyuki Otaki , Yousong Jiang
IPC分类号： G01B11/28
CPC分类号： G01B11/06 , C23C14/34 , C23C14/547 , G01B11/0625
摘要： An optical film thickness meter capable of measuring an optical film thickness and spectroscopic characteristics highly accurately, and a thin film forming apparatus with the optical film thickness meter are provided. The optical film thickness meter includes a light projector, a light receiver, a monochromator, and a reflection mirror having a reflection surface substantially perpendicularly to the optical axis of measurement light on the side opposite to an actual substrate. The actual substrate is disposed having a predetermined angle to the optical axis. The measurement light passes through the actual substrate twice, whereby a change in transmissivity can be increased, and control accuracy of thickness measurement is improved. Measurement errors caused by a difference in transmission positions is prevented. Since the measurement light which has not passed through the measurement substrate twice is not detected by the light receiver, the optical film thickness and spectroscopic characteristics is measured highly accurately.
摘要翻译：提供了能够高精度地测量光学膜厚度和光谱特性的光学膜厚计，以及具有该光学膜厚计的薄膜形成装置。光学薄膜厚度计包括光投射器，光接收器，单色仪和具有与实际基板相对的一侧上的大致垂直于测量光的光轴的反射表面的反射镜。实际的基板设置成与光轴成预定的角度。测量光通过实际基板两次，从而可以提高透射率的变化，并提高厚度测量的控制精度。防止由传输位置差异引起的测量误差。由于没有通过测量基板两次的测量光不被光接收器检测到，因此高精度地测量光学膜厚度和光谱特性。

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