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1. 发明授权

US5861066A Method and apparatus for cleaning edges of contaminated substrates 失效
标题翻译：清洁受污染基材边缘的方法和设备
公开(公告)号：US5861066A
公开(公告)日：1999-01-19
申请号：US640459
申请日：1996-05-01
申请人： Mansour Moinpour , Hoang T. Nguyen , Mohsen Salek , Young C. Park , Tom Bramblett , John M. deLarios , Lynn S. Ryle , Donald E. Anderson , Wilbur C. Krusell
发明人： Mansour Moinpour , Hoang T. Nguyen , Mohsen Salek , Young C. Park , Tom Bramblett , John M. deLarios , Lynn S. Ryle , Donald E. Anderson , Wilbur C. Krusell
IPC分类号： B08B1/04 , G11B23/50 , H01L21/00 , B08B7/00
CPC分类号： H01L21/67046 , B08B1/04 , H01L21/67028 , G11B23/505 , Y10S134/902
摘要： A method and apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
摘要翻译：描述了用于清洁基板边缘的方法和装置。本发明提供了一种清洁机构，其基于晶片和清洁机构之间的接触点处的摩擦和/或切向速度差来清除晶片边缘的颗粒。

2. 发明授权

US5725414A Apparatus for cleaning the side-edge and top-edge of a semiconductor wafer 失效
标题翻译：用于清洁半导体晶片的侧边缘和顶边缘的装置
公开(公告)号：US5725414A
公开(公告)日：1998-03-10
申请号：US777519
申请日：1996-12-30
申请人： Monsour Moinpour , Ilan Berman , Young C. Park
发明人： Monsour Moinpour , Ilan Berman , Young C. Park
IPC分类号： B08B1/04 , B24B37/04 , H01L21/00 , B24B1/00
CPC分类号： H01L21/67028 , B08B1/04 , B24B37/04
摘要： An apparatus for cleaning the side-edge and top-edge of a semiconductor wafer. The present invention provides an edge cleaning mechanism that cleans both the side-edge and top-edge of a wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
摘要翻译：一种用于清洁半导体晶片的侧边缘和顶边缘的装置。本发明提供一种边缘清洁机构，其基于晶片和清洁机构之间的接触点处的摩擦和/或切向速度差来清洁晶片的侧边缘和顶边缘。

3. 发明授权

US5186366A Ground coffee dispenser utilizing a metering trap chamber 失效
标题翻译：研磨咖啡机利用计量收集室
公开(公告)号：US5186366A
公开(公告)日：1993-02-16
申请号：US743948
申请日：1991-08-12
申请人： Edward H. Meisner , Young C. Park
发明人： Edward H. Meisner , Young C. Park
IPC分类号： A47G19/34 , B65D83/06 , G01F11/24 , G01F11/26
CPC分类号： A47G19/34 , B65D83/06 , G01F11/24 , G01F11/261
摘要： Apparatus for dispensing a metered amount of ground coffee. The apparatus comprises a housing and a rotatable metering assembly. The housing has a storage chamber for the coffee and an isolated passageway terminating in a spout. The storage chamber has an outlet at its bottom. The metering assembly includes plural metering chambers located below the outlet of the storage chambers and which, when the assembly is rotated, brings a number of them under the outlet, whereupon the particulate material flows therein. The housing also has a wiper disposed at the outlet to wipe extra particulate material from the filled metering chambers as the metering assembly is rotated so that they do not overflow. The rotation of the metering assembly to selected rotational positions brings a selected number, i.e., one or more, of the filled receiving chambers into communication with the passageway, whereupon the user of the apparatus may invert it so that the coffee from the one or more receiving chambers flows into the passageway at one time to exit at the spout. The housing also includes a pair of covers, pivotally connected to each other, for closing off the cavity and the pouring spout.
摘要翻译：用于分配计量的研磨咖啡的装置。该装置包括壳体和可旋转计量组件。壳体具有用于咖啡的储存室和终止于出口的隔离通道。储存室的底部有出口。计量组件包括位于储存室的出口下方的多个计量室，并且当组件旋转时，它们将多个计量室带到出口下方，于是颗粒材料流入其中。壳体还具有布置在出口处的擦拭器，以在计量组件旋转时从填充的计量室擦拭额外的颗粒材料，使得它们不会溢出。计量组件旋转到所选择的旋转位置使选定数量，即，一个或多个填充的接收室与通道连通，由此该装置的使用者可以将其反转，使得来自一个或多个接收室一次流入通道，以在出口处离开。外壳还包括一对盖，它们彼此枢转地连接，用于封闭空腔和倾倒口。

4. 发明授权

US5901399A Flexible-leaf substrate edge cleaning apparatus 失效
公开(公告)号：US5901399A
公开(公告)日：1999-05-11
申请号：US777521
申请日：1996-12-30
申请人： Monsour Moinpour , Ilan Berman , Young C. Park
发明人： Monsour Moinpour , Ilan Berman , Young C. Park
IPC分类号： A62C13/00 , B08B1/04 , B24B9/06 , B24D13/04 , H01L21/00 , B08B11/02 , A46B13/04
CPC分类号： H01L21/67046 , A62C13/003 , B08B1/04 , B24B9/065 , B24D13/04
摘要： An apparatus for cleaning edges and/or bevel areas of substrates is described. In one embodiment, the present invention includes a core having a plurality of flexible leaves spaced along an external surface of the core. A motor is coupled to the core for rotating the core about an axis of rotation. The rotation of the core causes the flexible leaves to rotate such that the leaves extend outward to intermittently strike points along the edge and/or bevel areas of the wafer.

5. 发明授权

US06475293B1 Rotating belt wafer edge cleaning apparatus 失效
标题翻译：旋转带晶圆边缘清洗装置
公开(公告)号：US06475293B1
公开(公告)日：2002-11-05
申请号：US09715320
申请日：2000-11-16
申请人： Monsour Moinpour , Ilan Berman , Young C. Park
发明人： Monsour Moinpour , Ilan Berman , Young C. Park
IPC分类号： B08B700
CPC分类号： H01L21/67028 , B08B1/008 , B24B9/065 , B24B21/00 , B24B37/04 , Y10S134/902
摘要： An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.
摘要翻译：一种用于清洁基板的边缘和/或斜面区域的装置。在一个实施例中，本发明提供了一种清洁机构，其基于在晶片和旋转带之间的接触点处的摩擦，将颗粒从晶片的边缘清除。

6. 发明授权

US5868857A Rotating belt wafer edge cleaning apparatus 失效
公开(公告)号：US5868857A
公开(公告)日：1999-02-09
申请号：US777518
申请日：1996-12-30
申请人： Monsour Moinpour , Ilan Berman , Young C. Park
发明人： Monsour Moinpour , Ilan Berman , Young C. Park
IPC分类号： B08B1/00 , B24B9/06 , B24B21/00 , B24B37/04 , H01L21/00 , B08B7/00 , A47L1/02
CPC分类号： H01L21/67028 , B08B1/008 , B24B21/00 , B24B37/04 , B24B9/065 , Y10S134/902
摘要： An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.

7. 发明授权

US06357071B2 Rotating belt wafer edge cleaning apparatus 失效
公开(公告)号：US06357071B2
公开(公告)日：2002-03-19
申请号：US09128343
申请日：1998-08-03
申请人： Monsour Moinpour , Ilan Berman , Young C. Park
发明人： Monsour Moinpour , Ilan Berman , Young C. Park
IPC分类号： B08B700
CPC分类号： H01L21/67028 , B08B1/008 , B24B9/065 , B24B21/00 , B24B37/04 , Y10S134/902
摘要： An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.

8. 发明授权

US06334229B1 Apparatus for cleaning edges of contaminated substrates 有权
标题翻译：用于清洁受污染基材边缘的设备
公开(公告)号：US06334229B1
公开(公告)日：2002-01-01
申请号：US09227272
申请日：1999-01-07
申请人： Mansour Moinpour , Hoang T. Nguyen , Mohsen Salek , Young C. Park , Tom Bramblett , John M. deLarios , Lynn S. Ryle , Donald E. Anderson , Wilbur C. Krusell
发明人： Mansour Moinpour , Hoang T. Nguyen , Mohsen Salek , Young C. Park , Tom Bramblett , John M. deLarios , Lynn S. Ryle , Donald E. Anderson , Wilbur C. Krusell
IPC分类号： B01B1102
CPC分类号： H01L21/67046 , B08B1/04 , G11B23/505 , H01L21/67028 , Y10S134/902
摘要： An apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
摘要翻译：描述了一种用于清洁基板边缘的装置。本发明提供了一种清洁机构，其基于晶片和清洁机构之间的接触点处的摩擦和/或切向速度差来清除晶片边缘的颗粒。

9. 发明授权

US6092253A Flexible-leaf substrate edge cleaning apparatus 有权
标题翻译：柔性叶片基板边缘清洁装置
公开(公告)号：US6092253A
公开(公告)日：2000-07-25
申请号：US203313
申请日：1998-12-01
申请人： Monsour Moinpour , Ilan Berman , Young C. Park
发明人： Monsour Moinpour , Ilan Berman , Young C. Park
IPC分类号： A62C13/00 , B08B1/04 , B24B9/06 , B24D13/04 , H01L21/00 , B08B11/02 , A46B13/04
CPC分类号： H01L21/67046 , A62C13/003 , B08B1/04 , B24B9/065 , B24D13/04
摘要： An apparatus for cleaning edges and/or bevel areas of substrates is described. In one embodiment, the present invention includes a core having a plurality of flexible leaves spaced along an external surface of the core. A motor is coupled to the core for rotating the core about an axis of rotation. The rotation of the core causes the flexible leaves to rotate such that the leaves extend outward to intermittently strike points along the edge and/or bevel areas of the wafer.
摘要翻译：描述了用于清洁基板的边缘和/或斜面区域的设备。在一个实施例中，本发明包括具有沿着芯的外表面间隔开的多个柔性叶片的芯。电动机联接到芯部，用于围绕旋转轴线旋转芯部。芯的旋转导致柔性叶片旋转，使得叶片向外延伸以沿着晶片的边缘和/或斜面区域间歇地击打点。

10. 发明授权

US5527493A Air treating device 失效
公开(公告)号：US5527493A
公开(公告)日：1996-06-18
申请号：US494474
申请日：1995-06-26
申请人： Mark W. McElfresh , Jim F. Warner , Young C. Park , Charles A. Curtiss , Martin Bogenstaerter
发明人： Mark W. McElfresh , Jim F. Warner , Young C. Park , Charles A. Curtiss , Martin Bogenstaerter
IPC分类号： A61L9/12 , B60H3/00 , B01F3/04
CPC分类号： A61L9/122 , B60H3/0007 , Y10S261/65
摘要： An air-treating article for dispensing a volatilizable material, such as air freshener fragrance, into the atmosphere of an enclosed area, such as an automobile interior. The device includes a housing and a reservoir of the volatilizable material therein, and also includes a dual-configured, articulating attachment clip which enables attachment of the device at a high-air-flow station, such as the forced air vent grille of the automobile, or at a low-air-flow station, such as the sun visor of the vehicle. The device enables use of the consistent delivery rates of a low-density polyethylene membranes while at the same producing a higher delivery rate than normally achieved with such membranes.

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