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    • 1. 发明申请
    • SEMICONDUCTOR MEMORY DEVICE
    • 半导体存储器件
    • US20100308341A1
    • 2010-12-09
    • US12745133
    • 2008-09-08
    • Yoshiyuki SudaYutaka Ota
    • Yoshiyuki SudaYutaka Ota
    • H01L29/24
    • H01L27/101G11C13/0002G11C2213/72H01L21/8213H01L27/1021H01L27/1022H01L27/24
    • A switching resistance RAM that is highly integrated as well as reduced in a read-out time is realized. There is formed an NPN type bipolar transistor BT composed of a collector layer made of an N-well 11, a base layer made of a P+ type Si layer 12A formed in a surface of the N-well 11, and an emitter layer made of an N+ type Si layer 15 formed in a surface of the P+ type Si layer 12A. Also, there are formed a word line WL0 electrically connected to the N+ type Si layer 15 and bit lines BL1-BL4 intersecting with the word line WL0. Also, there are formed a plurality of switching layers 14 formed on a surface of the P+ type Si layer 12A, each being electrically connected to corresponding each of the bit lines and switching between an ON state and an OFF state and an electric potential fixing line 19A to fix the P+ type Si layer 12A at a predetermined electric potential.
    • 实现高集成度以及减少读出时间的开关电阻RAM。 形成由N阱11构成的集电极构成的NPN型双极晶体管BT,在N阱11的表面形成的由P +型Si层12A构成的基极层和由N阱11的表面形成的发射极层 形成在P +型Si层12A的表面上的N +型Si层15。 而且,形成与N +型Si层15电连接的字线WL0,与字线WL0相交的位线BL1〜BL4。 此外,形成在P +型Si层12A的表面上形成的多个开关层14,其各自与对应的每个位线电连接,并且在导通状态和断开状态之间切换以及电位固定线 19A以将P +型Si层12A固定在预定电位。
    • 4. 发明授权
    • Semiconductor memory device
    • 半导体存储器件
    • US08476641B2
    • 2013-07-02
    • US12745133
    • 2008-09-08
    • Yoshiyuki SudaYutaka Ota
    • Yoshiyuki SudaYutaka Ota
    • H01L29/24
    • H01L27/101G11C13/0002G11C2213/72H01L21/8213H01L27/1021H01L27/1022H01L27/24
    • A switching resistance RAM that is highly integrated as well as reduced in a read-out time is realized. There is formed an NPN type bipolar transistor BT composed of a collector layer made of an N-well 11, a base layer made of a P+ type Si layer 12A formed in a surface of the N-well 11, and an emitter layer made of an N+ type Si layer 15 formed in a surface of the P+ type Si layer 12A. Also, there are formed a word line WL0 electrically connected to the N+ type Si layer 15 and bit lines BL1-BL4 intersecting with the word line WL0. Also, there are formed a plurality of switching layers 14 formed on a surface of the P+ type Si layer 12A, each being electrically connected to corresponding each of the bit lines and switching between an ON state and an OFF state and an electric potential fixing line 19A to fix the P+ type Si layer 12A at a predetermined electric potential.
    • 实现高集成度以及减少读出时间的开关电阻RAM。 形成由N阱11构成的集电极构成的NPN型双极晶体管BT,在N阱11的表面形成的由P +型Si层12A构成的基极层和由N阱11的表面形成的发射极层 形成在P +型Si层12A的表面上的N +型Si层15。 而且,形成与N +型Si层15电连接的字线WL0,与字线WL0相交的位线BL1〜BL4。 此外,形成在P +型Si层12A的表面上形成的多个开关层14,其各自与对应的每个位线电连接,并且在导通状态和断开状态之间切换以及电位固定线 19A以将P +型Si层12A固定在预定电位。
    • 5. 发明授权
    • Semiconductor memory device
    • 半导体存储器件
    • US08030662B2
    • 2011-10-04
    • US12745146
    • 2008-09-08
    • Yoshiyuki Suda
    • Yoshiyuki Suda
    • H01L29/15H01L31/0312
    • G11C13/0069G11C13/0007G11C13/0097G11C2213/15G11C2213/32G11C2213/33G11C2213/35G11C2213/72H01L27/101H01L27/24Y10S438/931
    • There is offered a switching resistance RAM that is very much reduced in an occupied area and is highly integrated. Memory cells CEL11-CEL14 are formed corresponding to four intersections of word lines WL0 and WL1 and bit lines BL0 and BL1. Each of the memory cells CEL11-CEL14 are composed of a switching layer 13 formed on a surface of an N+ type Si layer 11. The switching layer 13 is electrically connected to the bit line BL0 or BL1 thereabove through an electrode 14. The switching layer 13 is composed of a SiC layer 13A stacked on the surface of the N+ type Si layer 11 and a Si oxide layer 13B stacked on the SiC layer 13A. A top surface of the Si oxide layer 13B, that is the uppermost layer of the switching layer 13, is electrically connected to the corresponding bit line BL0 or BL1.
    • 提供了一个开关电阻RAM,在占用面积上大大减少,并且高度集成。 对应于字线WL0和WL1以及位线BL0和BL1的四个交点形成存储单元CEL11-CEL14。 每个存储单元CEL11-CEL14由形成在N +型Si层11的表面上的开关层13构成。开关层13通过电极14与上述位线BL0或BL1电连接。开关层 13由层叠在N +型Si层11的表面上的SiC层13A和层叠在SiC层13A上的Si氧化物层13B构成。 作为开关层13的最上层的Si氧化物层13B的上表面电连接到对应的位线BL0或BL1。
    • 7. 发明授权
    • Photosensor suited for image sensor
    • 光电传感器适用于图像传感器
    • US4823178A
    • 1989-04-18
    • US780598
    • 1985-09-26
    • Yoshiyuki Suda
    • Yoshiyuki Suda
    • G03G5/00H01L27/146H01L31/10H01L31/108H01L27/14
    • H01L27/14643H01L31/108
    • A photosensor for realizing an image sensor which can meet the requirements of high resolution, high operation speed and high signal-to-noise ratio is disclosed. The photosensor comprises a circuit substrate, a thin film transistor formed on the circuit substrate and an amorphous silicon photodiode formed on the substrate integral with the thin transistor between the drain and gate electrodes thereof. Also formed on the circuit substrate adjacent to the thin film transistor and photodiode are a charging switch element for coupling the photodiode to a DC power source to charge an inter-electrode capacitance of the photodiode, a charge storage capacitor charged by a channel current of the thin film transistor controlled by an inter-electrode capacitance voltage of the photodiode which varies in response to incident light after the inter-electrode capacitance has been charged, and a detecting switch element for coupling the capacitor to an output amplifier. The charging and detecting switch elements are each formed of a thin film transistor.
    • 公开了一种用于实现能够满足高分辨率,高操作速度和高信噪比要求的图像传感器的光传感器。 光电传感器包括电路基板,形成在电路基板上的薄膜晶体管和形成在其与漏极和栅电极之间的薄晶体管集成的基板上的非晶硅光电二极管。 还形成在与薄膜晶体管和光电二极管相邻的电路基板上的是充电开关元件,用于将光电二极管耦合到DC电源,以对光电二极管的电极间电容进行充电;电荷存储电容器由 由电极间电容充电后的入射光而变化的光电二极管的电极间电容电压控制的薄膜晶体管,以及用于将电容器耦合到输出放大器的检测开关元件。 充电和检测开关元件均由薄膜晶体管形成。