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    • 1. 发明授权
    • Contact electrode material for vacuum interrupter and method of
manufacturing the same
    • 真空灭弧室接触极材料及其制造方法
    • US4686338A
    • 1987-08-11
    • US698865
    • 1985-02-06
    • Yoshiyuki KashiwagiYasushi NodaKaoru Kitakizaki
    • Yoshiyuki KashiwagiYasushi NodaKaoru Kitakizaki
    • C22C32/00H01H1/02B22F3/26C22C29/06H01H33/66
    • H01H1/0206C22C32/0052
    • A novel contact electrode material for vacuum interrupters is disclosed, by which the chopping current value inherent in contact material can be reduced so that it is possible to stably interrupt small lagging current due to inductive loads without generating surge voltages. The material is equivalent or superior to the conventional Cu-0.5Bi material in large current interrupting capability and dielectric strength. The material consists essentially of copper, chromium, iron or molybdenum and chromium carbide or molybdenum carbide. The metallographical microstructure is such that copper is infiltrated into a porous matrix formed by mutually bonding chromium powder, iron or molybdenum powder and metal carbide powder in diffusion state. In its manufacturing process, firstly copper is placed onto a powder mixture of chromium, iron or molybdenum, and chromium carbide or molybdenum carbide, and then the copper and the powder mixture is heated within a nonoxidizing atmosphere at a first temperature lower than the copper melting point and thereafter again at a second temperature higher than the copper melting point.
    • 公开了一种用于真空断路器的新型接触电极材料,通过该接触电极材料可以减小接触材料固有的斩波电流值,从而可以稳定地中断由于感性负载而导致的滞后电流,而不产生浪涌电压。 该材料相当于或优于传统的Cu-0.5Bi材料,具有大的电流中断能力和介电强度。 该材料基本上由铜,铬,铁或钼和碳化铬或碳化钼组成。 金相显微结构是铜渗透到通过相互键合铬粉末,铁或钼粉末和扩散状态的金属碳化物粉末形成的多孔基体中。 在其制造过程中,首先将铜放置在铬,铁或钼的粉末混合物和碳化铬或碳化钼上,然后铜和粉末混合物在非氧化气氛中在低于铜熔融的第一温度下加热 然后再次高于铜熔点的第二温度。
    • 2. 发明授权
    • Vacuum interrupter
    • 真空灭弧室
    • US4584445A
    • 1986-04-22
    • US589295
    • 1984-03-14
    • Yoshiyuki KashiwagiYasushi NodaKaoru Kitakizaki
    • Yoshiyuki KashiwagiYasushi NodaKaoru Kitakizaki
    • H01H1/02H01H11/04H01H33/664H01H33/66
    • H01H33/6644H01H1/0203H01H11/04Y10T29/49206
    • A vacuum interrupter of more improved large current interrupting capability and dielectric strength is disclosed. The interrupter has a pair of separable contact-electrodes (13, 24), a vacuum envelope (4) generally electrically insulating and enclosing the pair therewithin, a contact-making portion (19) of 20 to 60% IACS electrical conductivity being a part of one contact-electrode (13) of the pair and being into and out of engagement with the other contact-electrode (24) of the pair, an arc-diffusing portion (20) of 2 to 30% IACS electrical conductivity being the other part of the one contact-electrode (13) and being electrically and mechanically connected to the contact-making portion (19) so as to be spaced from the other contact-electrode (24) when the contact-electrodes (13, 24) are into engagement, and means (14, 15) for applying an axial magnetic field in parallel to an arc established between the contact-electrodes (13, 24) when separated.
    • 公开了一种具有更大改善的大电流中断能力和介电强度的真空断路器。 断路器具有一对可分离的接触电极(13,24),一个通常电绝缘并在其内包围的真空外壳(4),具有20至60%IACS导电性的接触部分(19)是部分 的一对接触电极(13),与该对的另一个接触电极(24)进入和离开接合,2〜30%的IACS电导率的电弧扩散部分(20)是另一个 所述一个接触电极(13)的一部分并且当所述接触电极(13,24)是接触电极(13,24)时,与所述接触部分(19)电连接并机械连接以与所述另一个接触电极(24)间隔开 以及用于当分离时施加平行于在接触电极(13,24)之间建立的电弧的轴向磁场的装置(14,15)。
    • 8. 发明授权
    • Electrical contact structure of a vacuum interrupter
    • 真空断路器的电接触结构
    • US4547640A
    • 1985-10-15
    • US428237
    • 1982-09-29
    • Yoshiyuki KashiwagiTakamitsu SanoKaoru Kitakizaki
    • Yoshiyuki KashiwagiTakamitsu SanoKaoru Kitakizaki
    • H01H1/02H01H33/664H01H33/66
    • H01H33/6644H01H1/0203
    • An electrical contact structure of a vacuum interrupter wherein a pair of electrical contacts 2 are provided within a vacuum vessel 1 through a pair of contact rods 14 so that one is in contact with the other or away therefrom. The electrical contact 2 comprises a substantially disk-shaped contact body 2b made of high electric conducting metal portions and metallic pipes having a low electric conductivity, and a plurality of major current flowing sections 22 made of metal having a high electric conductivity, penetrated in the contact body 2b in a manner to be penetrated in the direction of the thickness of the contact body 2b and separated from each other. As an alternative form, the electrical contact 2 may comprise a substantially disk-shaped contact body 2b of ceramic pipes 21 having a low electric conductivity and a plurality of penetrating portions (21a, 21d) wherein each portion (21a, 21d) along the inner and outer periphery of which a chromium oxide film 21b, 21c is formed, is filled with copper to form a plurality of major current flowing portions 22. As a further alternative form, the electrical contact 2 may comprise a substantially disk-shaped contact body 2b of ceramic pipes 21 having a low electric conductivity and a plurality of penetrating portions 21a, 21d and a plurality of major current flowing portions 22a formed by filling copper containing a chromium oxide material of about 0.1% to 0.6% by weight.
    • 真空断路器的电接触结构,其中一对电触头2通过一对接触杆14设置在真空容器1内,使得一个与另一个接触结构或与之相接触。 电接点2包括由高导电金属部分和导电性低的金属管制成的基本盘形的接触体2b,以及多个由电导率高的金属制成的主电流流动部分22, 接触体2b以沿着接触体2b的厚度方向贯穿的方式彼此分离。 作为替代形式,电接触件2可以包括具有低导电性的陶瓷管21的大致圆盘状的接触体2b和多个贯穿部(21a,21d),其中沿着内部的每个部分(21a,21d) 并且其外周形成有氧化铬膜21b,21c,用铜填充以形成多个主电流流动部分22.作为另外的替代形式,电接触件2可以包括基本上盘形的接触体2b 具有低导电性的陶瓷管21和多个贯通部21a,21d以及通过填充含有约0.1重量%至0.6重量%的氧化铬材料的铜而形成的多个主电流流动部分22a。