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1. 发明授权

US08830480B2 Measurement apparatus 有权
标题翻译：测量装置
公开(公告)号：US08830480B2
公开(公告)日：2014-09-09
申请号：US13289561
申请日：2011-11-04
申请人： Taro Tezuka , Yoshiyuki Kuramoto , Yusuke Koda
发明人： Taro Tezuka , Yoshiyuki Kuramoto , Yusuke Koda
IPC分类号： G01B9/02
CPC分类号： G01B9/02005 , G01B9/02003 , G01B9/02067 , G01B9/0207 , G01B9/02076
摘要： The present invention provides a measurement apparatus which measures a distance between a reference surface and a surface to be measured, including a wavelength reference element configured to include a gas cell in which a plurality of types of gases having absorption lines different from each other are sealed, and a processing unit configured to set a wavelength of light emitted by a light source to a plurality of different wavelengths corresponding to a plurality of different absorption lines by using the wavelength reference element, control a phase detection unit to detect a phase corresponding to an optical path length between the reference surface and the surface to be measured for each of the plurality of different wavelengths, and perform processing of obtaining the distance.
摘要翻译：本发明提供一种测量装置，其测量参考表面和被测量表面之间的距离，包括波长参考元件，该波长参考元件被配置为包括其中具有彼此不同的吸收线的多种类型的气体被密封的气室以及处理单元，其被配置为通过使用所述波长参考元件将由光源发射的光的波长设置为对应于多个不同吸收线的多个不同波长，控制相位检测单元以检测对应于对于多个不同波长中的每一个，参考表面和要测量的表面之间的光程长度，并且执行获得距离的处理。

2. 发明申请

US20120116718A1 MEASUREMENT APPARATUS 有权
标题翻译：测量装置
公开(公告)号：US20120116718A1
公开(公告)日：2012-05-10
申请号：US13289561
申请日：2011-11-04
申请人： Taro TEZUKA , Yoshiyuki KURAMOTO , Yusuke KODA
发明人： Taro TEZUKA , Yoshiyuki KURAMOTO , Yusuke KODA
IPC分类号： G01B11/14 , G06F15/00
CPC分类号： G01B9/02005 , G01B9/02003 , G01B9/02067 , G01B9/0207 , G01B9/02076
摘要： The present invention provides a measurement apparatus which measures a distance between a reference surface and a surface to be measured, including a wavelength reference element configured to include a gas cell in which a plurality of types of gases having absorption lines different from each other are sealed, and a processing unit configured to set a wavelength of light emitted by a light source to a plurality of different wavelengths corresponding to a plurality of different absorption lines by using the wavelength reference element, control a phase detection unit to detect a phase corresponding to an optical path length between the reference surface and the surface to be measured for each of the plurality of different wavelengths, and perform processing of obtaining the distance.
摘要翻译：本发明提供一种测量装置，其测量参考表面和被测量表面之间的距离，包括波长参考元件，该波长参考元件被配置为包括其中具有彼此不同的吸收线的多种类型的气体被密封的气室以及处理单元，其被配置为通过使用所述波长参考元件将由光源发射的光的波长设置为对应于多个不同吸收线的多个不同波长，控制相位检测单元以检测对应于对于多个不同波长中的每一个，参考表面和要测量的表面之间的光程长度，并且执行获得距离的处理。

3. 发明申请

US20120113434A1 MEASUREMENT APPARATUS 有权
标题翻译：测量装置
公开(公告)号：US20120113434A1
公开(公告)日：2012-05-10
申请号：US13292192
申请日：2011-11-09
申请人： Takumi TOKIMITSU , Yoshiyuki KURAMOTO
发明人： Takumi TOKIMITSU , Yoshiyuki KURAMOTO
IPC分类号： G01B11/02
CPC分类号： G01B9/02007 , G01B9/02004 , G01B9/02027 , G01B9/0207 , G01B9/02083 , G01B2290/45
摘要： A measurement apparatus which measures a distance between a reference surface and a test surface, comprises a light source unit including a plurality of light sources each corresponding to one of a plurality of wavelength scanning ranges and each continuously scans a wavelength of generated light in the corresponding wavelength scanning range, an interferometer unit which splits light emitted by each of the plurality of light sources into reference light and test light, and detects, as an interference signal, an interference fringe formed by the reference light and the test light, and a processor which determines a slope of a phase of the interference signal with respect to wave number of the light based on the interference signal detected by the interferometer unit for each of the plurality of wavelength scanning ranges, and determines the distance from the slope of the phase.
摘要翻译：测量参考表面和测试表面之间的距离的测量装置包括光源单元，其包括多个光源，每个光源对应于多个波长扫描范围中的一个，并且每个光源单元连续地扫描相应的波长扫描范围，将由所述多个光源中的每一个发射的光分解为参考光和测试光的干涉仪单元，并且检测由所述参考光和所述测试光形成的干涉条纹作为干涉信号;以及处理器其基于由所述干涉仪单元为所述多个波长扫描范围中的每一个检测的干涉信号，确定相对于所述光的波数的所述干扰信号的相位的斜率，并且确定所述相位的斜率的距离。

4. 发明申请

US20110102805A1 MEASURING APPARATUS 有权
标题翻译：测量装置
公开(公告)号：US20110102805A1
公开(公告)日：2011-05-05
申请号：US12910250
申请日：2010-10-22
申请人： Yoshiyuki Kuramoto
发明人： Yoshiyuki Kuramoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02007 , G01B9/02003 , G01B9/02069 , G01B2290/25 , G01B2290/30 , G01B2290/45 , G01B2290/70
摘要： The present invention provides a measuring apparatus for measuring an absolute distance between a reference surface and a test surface, including a phase detection unit configured to detect an interference signal between light reflected by the reference surface and light reflected by the test surface, and detect, from the interference signal, a phase corresponding to an optical path length between the reference surface and the test surface, and a processing unit configured to perform processing of obtaining the absolute distance by controlling the phase detection unit so as to detect the phase corresponding to the optical path length between the reference surface and the test surface for each of a first reference wavelength and a second reference wavelength while changing the wavelength of light to be emitted by a first light source continuously from the first reference wavelength to the second reference wavelength.
摘要翻译：本发明提供了一种用于测量参考表面和测试表面之间的绝对距离的测量装置，包括：相位检测单元，被配置为检测由参考表面反射的光和由测试表面反射的光之间的干涉信号; 根据所述干扰信号，对应于所述基准面和所述测试面之间的光程长度的相位，以及处理部，其被配置为通过控制所述相位检测部来进行所述绝对距离的取得处理，同时将由第一光源发射的光的波长从第一参考波长连续地改变到第二参考波长，同时在第一参考波长和第二参考波长中的每个参考表面和测试表面之间的光程长度。

5. 发明授权

US07907263B2 Apparatuses and methods using measurement of a flare generated in an optical system 失效
标题翻译：使用在光学系统中产生的耀斑的测量的装置和方法
公开(公告)号：US07907263B2
公开(公告)日：2011-03-15
申请号：US12493229
申请日：2009-06-28
申请人： Michiko Aizawa , Eiji Aoki , Osamu Kakuchi , Yoshiyuki Kuramoto
发明人： Michiko Aizawa , Eiji Aoki , Osamu Kakuchi , Yoshiyuki Kuramoto
IPC分类号： G01B9/00 , G01B9/02 , G01B11/02
CPC分类号： G03F7/7085 , G03F7/705 , G03F7/70525 , G03F7/706 , G03F7/70941
摘要： The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.
摘要翻译：本发明提供了一种方法，包括测量测量表面上要测量的光学系统的波前像差，测量基于波前像差和光瞳透射率分布来确定光学系统的光瞳功能的光学系统的光瞳透射率分布并且使用光瞳函数进行成像计算，以获得形成在光学系统的像面上的光强度分布，以及根据光强度分布计算在光学系统中产生的耀斑。

6. 发明申请

US20100265515A1 MEASUREMENT METHOD, MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD 失效
标题翻译：测量方法，测量装置，曝光装置和装置制造方法
公开(公告)号：US20100265515A1
公开(公告)日：2010-10-21
申请号：US12830213
申请日：2010-07-02
申请人： Osamu Kakuchi , Yoshiyuki Kuramoto
发明人： Osamu Kakuchi , Yoshiyuki Kuramoto
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G03F7/70566
摘要： A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.
摘要翻译：一种测量被测光学系统的波前像差的测量方法，包括：测量相对于沿着至少三个不同方位角的线偏振光束的待测光学系统的波前的第一测量步骤;第一计算步骤，基于在第一测量步骤中测量的待测量的光学系统的波前，计算相对于非偏振光测量的光学系统的波前和待测量的光学系统的双折射特性，以及第二计算步骤，基于在第一计算步骤中计算出的要测量的光学系统的波前和双折射特性来计算相对于任意偏振光测量的光学系统的波前。

7. 发明申请

US20100233636A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE 有权
标题翻译：测量装置，曝光装置和制造装置的方法
公开(公告)号：US20100233636A1
公开(公告)日：2010-09-16
申请号：US12716730
申请日：2010-03-03
申请人： Yoshiyuki Kuramoto
发明人： Yoshiyuki Kuramoto
IPC分类号： G03F7/20 , G01B9/02 , G03B27/42 , G03B27/54
CPC分类号： G01B11/2441 , G01B9/02039 , G01B9/02057 , G01B9/0209 , G01M11/0257 , G01M11/0271 , G03F7/706
摘要： A measurement apparatus comprises: a light source; a first optical system configured to reflect a certain component of a light beam emitted by the light source by a final surface thereof and transmit a remaining component of the light beam; a reflecting surface configured to reflect the remaining component; an optical member configured to generate a first shearing interference fringe formed by the certain component, and a second shearing interference fringe formed by the remaining component; an image sensing unit configured to simultaneously sense the first and second shearing interference fringes generated by the optical member; and an arithmetic unit configured to calculate, a wavefront aberration of the first optical system and a wavefront aberration of the first optical system and an optical system to be measured, using data on the first and second shearing interference fringes, thereby calculating a wavefront aberration of the optical system to be measured.
摘要翻译：测量装置包括：光源; 第一光学系统，被配置为将由光源发射的光束的某一分量反射到其最终表面，并传输光束的剩余分量; 被配置为反射剩余部件的反射面; 光学部件，被配置为产生由所述特定部件形成的第一剪切干涉条纹和由所述剩余部件形成的第二剪切干涉条纹; 图像感测单元，被配置为同时感测由所述光学构件产生的所述第一和第二剪切干涉条纹; 以及算术单元，被配置为使用第一和第二剪切干涉条纹上的数据来计算第一光学系统的波前像差和第一光学系统的波前像差以及待测量的光学系统，由此计算波前像差要测量的光学系统。

8. 发明申请

US20100068634A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：测量装置，曝光装置和装置制造方法
公开(公告)号：US20100068634A1
公开(公告)日：2010-03-18
申请号：US12560024
申请日：2009-09-15
申请人： Takeshi Suzuki , Yoshiyuki Kuramoto
发明人： Takeshi Suzuki , Yoshiyuki Kuramoto
IPC分类号： G03F7/20 , G01B9/02 , G03B27/54
CPC分类号： G01M11/0257 , G03B27/54 , G03F7/70591
摘要： A measurement apparatus comprises a mirror configured to reflect test light which passes through an optical system, an interferometer unit which includes an image sensor and is configured to form an interference fringe on an image sensing plane of the image sensor by reference light and the test light reflected by the mirror, and a controller configured to control the interferometer unit, and to compute a numerical aperture of the optical system based on the interference fringe captured by the image sensor, wherein the controller is configured to compute a numerical aperture NA of the optical system by multiplying a quotient ΔNA/ΔR, describing a change ΔNA in numerical aperture NA of the optical system with respect to a change ΔR in pupil radius R of the optical system in the image sensing plane, by the pupil radius R of the optical system in the image sensing plane.
摘要翻译：测量装置包括：反射镜，被配置为反射通过光学系统的测试光;干涉仪单元，其包括图像传感器，并且被配置为通过参考光和测试光在图像传感器的图像感测平面上形成干涉条纹由反射镜反射，以及控制器，被配置为控制干涉仪单元，并且基于由图像传感器捕获的干涉条纹计算光学系统的数值孔径，其中控制器被配置为计算光学系统的数值孔径NA 系统通过乘以商＆Dgr; NA /＆Dgr; R，描述光学系统相对于图像感测平面中的光学系统的光瞳半径R中的变化＆Dgr; R的数值孔径NA中的变化＆Dgr; NA，由光学系统的光瞳半径R在图像感测平面中。

9. 发明授权

US07532019B2 Measuring apparatus and measuring method 失效
标题翻译：测量装置和测量方法
公开(公告)号：US07532019B2
公开(公告)日：2009-05-12
申请号：US11345220
申请日：2006-02-02
申请人： Naoto Hayashi , Yoshiyuki Kuramoto
发明人： Naoto Hayashi , Yoshiyuki Kuramoto
IPC分类号： G01R31/308
CPC分类号： G01J4/04 , G01J9/02
摘要： A measuring apparatus includes an interferometer for measuring a wavefront of light transmitted through a test object by interference between light under test passed through the test object and reference light, and measures a polarization characteristic of the test object. The measuring apparatus has a measuring unit for measuring a polarization characteristic matrix in a pupil plane of the test object while the reference light is blocked or a fringe scan is performed.
摘要翻译：一种测量装置，包括：干涉仪，用于通过测试对象的光与参考光之间的干涉测量透过测试对象的光的波前，并测量测试对象的极化特性。测量装置具有测量单元，用于在参考光被阻挡或进行边缘扫描时测量被测物体的光瞳平面中的偏振特性矩阵。

10. 发明授权

US09175953B2 Measurement apparatus to calculate wavefront aberration of optical system using shearing interference fringes, exposure apparatus, and method of manufacturing device 有权
标题翻译：使用剪切干涉条纹计算光学系统的波前像差的测量装置，曝光装置和制造装置的方法
公开(公告)号：US09175953B2
公开(公告)日：2015-11-03
申请号：US12716730
申请日：2010-03-03
申请人： Yoshiyuki Kuramoto
发明人： Yoshiyuki Kuramoto
IPC分类号： G03B27/72 , G01B11/24 , G01M11/02 , G03F7/20 , G01B9/02
CPC分类号： G01B11/2441 , G01B9/02039 , G01B9/02057 , G01B9/0209 , G01M11/0257 , G01M11/0271 , G03F7/706
摘要： A measurement apparatus comprises: a light source; a first optical system configured to reflect a certain component of a light beam emitted by the light source by a final surface thereof and transmit a remaining component of the light beam; a reflecting surface configured to reflect the remaining component; an optical member configured to generate a first shearing interference fringe formed by the certain component, and a second shearing interference fringe formed by the remaining component; an image sensing unit configured to simultaneously sense the first and second shearing interference fringes generated by the optical member; and an arithmetic unit configured to calculate, a wavefront aberration of the first optical system and a wavefront aberration of the first optical system and an optical system to be measured, using data on the first and second shearing interference fringes, thereby calculating a wavefront aberration of the optical system to be measured.
摘要翻译：测量装置包括：光源; 第一光学系统，被配置为将由光源发射的光束的某一分量反射到其最终表面，并传输光束的剩余分量; 被配置为反射剩余部件的反射面; 光学部件，被配置为产生由所述特定部件形成的第一剪切干涉条纹和由所述剩余部件形成的第二剪切干涉条纹; 图像感测单元，被配置为同时感测由所述光学构件产生的所述第一和第二剪切干涉条纹; 以及算术单元，被配置为使用第一和第二剪切干涉条纹上的数据来计算第一光学系统的波前像差和第一光学系统的波前像差以及待测量的光学系统，由此计算波前像差要测量的光学系统。

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