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1. 发明授权

US06635887B2 Positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的定位系统
公开(公告)号：US06635887B2
公开(公告)日：2003-10-21
申请号：US09725299
申请日：2000-11-29
申请人： Yim Bun P. Kwan , Serge F. C. L. Wetzels , Gerjan P. Veldhuis
发明人： Yim Bun P. Kwan , Serge F. C. L. Wetzels , Gerjan P. Veldhuis
IPC分类号： G01N2300
CPC分类号： G03F7/70716
摘要： A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
摘要翻译：诸如可以用于将可移动物体表定位在三个自由度中的定位系统。更具体地说，本发明涉及定位系统在包括用于提供投影射束的照明系统的光刻投影设备中的用途，用于保持掩模的第一物体台，用于保持衬底的第二可移动物体台，以及用于将掩模的照射部分成像到基板的目标部分上的投影系统。

2. 发明授权

US06852989B2 Positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的定位系统
公开(公告)号：US06852989B2
公开(公告)日：2005-02-08
申请号：US10648270
申请日：2003-08-27
申请人： Yim Bun P. Kwan , Serge F. C. L. Wetzels , Gerjan P. Veldhuis
发明人： Yim Bun P. Kwan , Serge F. C. L. Wetzels , Gerjan P. Veldhuis
IPC分类号： G12B5/00 , G03F7/20 , G03F7/22 , G03F9/00 , H01L21/027 , H01L21/68 , G01N23/00 , A61N5/00 , B23Q1/25 , G03B27/42
CPC分类号： G03F7/70716
摘要： A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
摘要翻译：诸如可以用于将可移动物体表定位在三个自由度中的定位系统。更具体地说，本发明涉及定位系统在包括用于提供投影射束的照明系统的光刻投影设备中的用途，用于保持掩模的第一物体台，用于保持衬底的第二可移动物体台，以及用于将掩模的照射部分成像到基板的目标部分上的投影系统。

3. 发明授权

US06671036B2 Balanced positioning system for use in lithographic apparatus 有权
公开(公告)号：US06671036B2
公开(公告)日：2003-12-30
申请号：US10209926
申请日：2002-08-02
申请人： Yim Bun P. Kwan
发明人： Yim Bun P. Kwan
IPC分类号： G03B2758
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.

4. 发明授权

US06509951B2 Lithographic projection apparatus having a temperature controlled heat shield 有权
标题翻译：具有温度控制的热屏蔽的平版印刷设备
公开(公告)号：US06509951B2
公开(公告)日：2003-01-21
申请号：US09777697
申请日：2001-02-07
申请人： Erik R. Loopstra , Yim Bun P. Kwan , Marcel J. E. H. Muitjens , Sonja T. De Vrieze-Voorn
发明人： Erik R. Loopstra , Yim Bun P. Kwan , Marcel J. E. H. Muitjens , Sonja T. De Vrieze-Voorn
IPC分类号： G03B2752
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70858 , G03F7/70875 , G03F7/70891 , H02K3/24 , H02K9/22 , H02K41/0356
摘要： In a lithographic projection apparatus a first part is shielded from a second part by a heat shield. The first part is required to have a temperature of a predetermined value and the second part has a characteristic that may influence the temperature of the first part. The characteristic may be a temperature deviating from the predetermined value, or a supply of radiation that may deviate the temperature of the first part from the predetermined value when incident on the first part. Heat shield temperature controlling means are provided to control a temperature of the heat shield to the predetermined value.
摘要翻译：在光刻投影装置中，第一部分通过隔热罩与第二部分屏蔽。第一部分需要具有预定值的温度，并且第二部分具有可能影响第一部分的温度的特性。特征可以是偏离预定值的温度，或者当入射在第一部分上时可能使第一部分的温度偏离预定值的辐射供应。提供隔热板温度控制装置以将隔热板的温度控制到预定值。

5. 发明授权

US07202937B2 Balanced positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的平衡定位系统
公开(公告)号：US07202937B2
公开(公告)日：2007-04-10
申请号：US11363275
申请日：2006-02-28
申请人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
发明人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
IPC分类号： G03B27/42 , G03B27/58 , H01L21/27
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction force are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.
摘要翻译：平衡定位装置包括平衡块，该平衡块被支撑成可在三个自由度中移动，例如围绕Z轴的X和Y平移和旋转。这些自由度的驱动力直接作用在定位体和平衡块之间。由定位运动引起的反作用力导致平衡质量的相应运动，并且所有反作用力都保持在平衡定位系统内。平衡块可以是具有形成安装在相对侧的H驱动器的立柱的两个线性电动机的定子的矩形平衡框架。 H型驱动器的横梁跨过框架，并且定位的对象位于框架的中心开口内。

6. 发明授权

US06542220B1 Purge gas systems for use in lithographic projection apparatus 有权
标题翻译：吹扫用于光刻投影仪的气体系统
公开(公告)号：US06542220B1
公开(公告)日：2003-04-01
申请号：US09704828
申请日：2000-11-03
申请人： Raymond L. J. Schrijver , Tjarko A. R. van Empel , Marcel K. M. Baggen , Bernardus A. J. Luttikhuis , Yim Bun P. Kwan , Erik R. Loopstra
发明人： Raymond L. J. Schrijver , Tjarko A. R. van Empel , Marcel K. M. Baggen , Bernardus A. J. Luttikhuis , Yim Bun P. Kwan , Erik R. Loopstra
IPC分类号： G03B2742
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70858 , G03F7/70866 , G03F7/70983
摘要： A lithographic apparatus has at least one compartment closely surrounding at least one of the mask and substrate holders but not either of the illumination or projection systems so as to reduce the volume that must be purged with gas transparent to the projection radiation. In a scanner, the compartment surrounding the mask holder preferably moves with the mask table and may be formed by a combination of a frame-shaped mask table driven in the scanning operation and stationary plates fixed relative to the projection and illumination systems.
摘要翻译：光刻设备具有至少一个隔间，其紧密地围绕掩模和衬底保持器中的至少一个，而不是照明或投影系统中的任一个，以便减少必须用对透射投影辐射透明的气体吹扫的体积。在扫描仪中，围绕保护罩的隔间优选地与掩模台一起移动，并且可以通过扫描操作中驱动的框架形掩模台和相对于投影和照明系统固定的固定板的组合来形成。

7. 发明授权

US07057313B2 Cooling of voice coil motors 有权
标题翻译：音圈电机冷却
公开(公告)号：US07057313B2
公开(公告)日：2006-06-06
申请号：US10958402
申请日：2004-10-06
申请人： Edwin J. Buis , Noud J. Gilissen , Yim Bun P. Kwan , Paulus H. C. M. Schapendonk
发明人： Edwin J. Buis , Noud J. Gilissen , Yim Bun P. Kwan , Paulus H. C. M. Schapendonk
IPC分类号： H02K41/00
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70858 , G03F7/70875 , G03F7/70891 , H02K3/24 , H02K9/22 , H02K41/0356
摘要： A voice coil motor used, for example, in a positioning device associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil, for use, for example, in a lithographic projection apparatus including a radiation system for supplying a projection beam of radiation, a first object table for holding a mask, a second object table for holding a substrate, a projection system for imaging irradiated portions of the mask onto target portions of the substrate. The cooling jacket may be formed of a ceramic material and may be of a monolithic construction.
摘要翻译：一种音圈电机，例如在与第一物体台或第二物镜台相关联的定位装置中使用，其中线圈用与线圈热接触的冷却套冷却，冷却套包括至少一个通道为了循环冷却流体，该通道或每个通道被布置成基本上位于与线圈相邻的冷却套管的一部分中，以用于例如光刻投影设备，该光刻投影设备包括用于提供投影的辐射系统用于保持掩模的第一物体台，用于保持基板的第二物体台，用于将掩模的照射部分成像到基板的目标部分上的投影系统。冷却套可以由陶瓷材料形成，并且可以是整体结构。

8. 发明授权

US06525803B2 Balanced positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的平衡定位系统
公开(公告)号：US06525803B2
公开(公告)日：2003-02-25
申请号：US09739097
申请日：2000-12-19
申请人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
发明人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
IPC分类号： G03B2742
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction forces are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.
摘要翻译：平衡定位装置包括平衡块，该平衡块被支撑成能够在三个自由度中移动，例如X和Y平移以及围绕Z轴的旋转。这些自由度的驱动力直接作用在定位体和平衡块之间。由定位运动产生的反作用力导致平衡质量的相应运动，并且所有反作用力都保持在平衡定位系统内。平衡块可以是具有形成安装在相对侧的H驱动器的立柱的两个线性电动机的定子的矩形平衡框架。 H型驱动器的横梁跨过框架，并且定位的对象位于框架的中心开口内。

9. 发明授权

US07034920B2 Balanced positioning system for use in lithographic apparatus 有权
公开(公告)号：US07034920B2
公开(公告)日：2006-04-25
申请号：US10322800
申请日：2002-12-19
申请人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
发明人： Yim Bun P. Kwan , Wilhelmus J. T. P. van de Wiel
IPC分类号： G03B27/42 , G03B27/58 , H01L21/27
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction force are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.

10. 发明授权

US06924882B2 Balanced positioning system for use in lithographic apparatus 有权
标题翻译：用于光刻设备的平衡定位系统
公开(公告)号：US06924882B2
公开(公告)日：2005-08-02
申请号：US10649608
申请日：2003-08-28
申请人： Yim Bun P. Kwan
发明人： Yim Bun P. Kwan
IPC分类号： G03F7/22 , F16F15/02 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68 , H05K3/00 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/709
摘要： A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.
摘要翻译：一种用于光刻设备的平衡定位系统，具有一对平衡块，该平衡块被支撑以能够在至少一个自由度（例如Y平移）中移动。在这种自由度下的相对定向的驱动力直接作用在被驱动体和平衡块之间，以使被驱动体围绕垂直于该一个方向的轴旋转。由定位运动产生的反作用力导致平衡块的直线运动，并且所有反作用力都保持在平衡的定位系统内。

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