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1. 发明申请

US20090033902A1 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20090033902A1
公开(公告)日：2009-02-05
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus, Matheus Baselmans , Adrianus Franciscus, Petrus Engelen , Markus Franciscus, Antonius Eurlings , Hendrikus Robertus, Marie Greevenbroek , Patricius Aloysius, Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus, Matheus Baselmans , Adrianus Franciscus, Petrus Engelen , Markus Franciscus, Antonius Eurlings , Hendrikus Robertus, Marie Greevenbroek , Patricius Aloysius, Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
IPC分类号： G03B27/54 , G03B27/70
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译：装置制造方法包括使用照明系统来调节辐射束。调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。

2. 发明申请

US20110310372A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS 有权
标题翻译：照明系统和平面设备
公开(公告)号：US20110310372A1
公开(公告)日：2011-12-22
申请号：US13114652
申请日：2011-05-24
申请人： Bert Jan CLAESSENS , Heine Melle MULDER , Paul VAN DER VEEN , Wilfred Edward ENDENDIJK , Willem Jan BOUMAN , Bert Pieter VAN DRIEËNHUIZEN , Jozef Ferdinand Dymphna VERBEECK , Marc Hendricus Margaretha DASSEN , Thijs Johan Henry HOLLINK
发明人： Bert Jan CLAESSENS , Heine Melle MULDER , Paul VAN DER VEEN , Wilfred Edward ENDENDIJK , Willem Jan BOUMAN , Bert Pieter VAN DRIEËNHUIZEN , Jozef Ferdinand Dymphna VERBEECK , Marc Hendricus Margaretha DASSEN , Thijs Johan Henry HOLLINK
IPC分类号： G03B27/54 , F21V14/00
CPC分类号： G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译：公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力一个或多个元素。

3. 发明申请

US20090190197A1 Device control method and apparatus 有权
标题翻译：设备控制方法及装置
公开(公告)号：US20090190197A1
公开(公告)日：2009-07-30
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译：一种控制单独可控元件阵列的元件的方法。该方法包括改变驱动元件的驱动电压的频率。

4. 发明授权

US08885144B2 Illumination system and lithographic apparatus 有权
标题翻译：照明系统和光刻设备
公开(公告)号：US08885144B2
公开(公告)日：2014-11-11
申请号：US13114652
申请日：2011-05-24
申请人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
发明人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
IPC分类号： G02B5/08 , G03B27/32 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译：公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力一个或多个元素。

5. 发明授权

US08089672B2 Array element device control method and apparatus 有权
标题翻译：阵列元件装置控制方法及装置
公开(公告)号：US08089672B2
公开(公告)日：2012-01-03
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译：一种控制单独可控元件阵列的元件的方法。该方法包括改变驱动元件的驱动电压的频率。

6. 发明申请

US20080100816A1 Lithographic apparatus and method 审中-公开
标题翻译：平版印刷设备和方法
公开(公告)号：US20080100816A1
公开(公告)日：2008-05-01
申请号：US11589990
申请日：2006-10-31
申请人： Heine Melle Mulder , Wilfred Edward Endendijk , Edwin Eduard Nicolaas Josephus Krijnen
发明人： Heine Melle Mulder , Wilfred Edward Endendijk , Edwin Eduard Nicolaas Josephus Krijnen
IPC分类号： G03B27/80
CPC分类号： G03B27/522 , G03F7/70116 , G03F7/702 , G03F7/70291
摘要： An illuminator for a lithographic apparatus is disclosed, the illuminator including an array of individually controllable reflective elements capable of changing the angular intensity distribution of an incident illumination beam of radiation, wherein the array of individually controllable reflective elements is provided on a curved support structure, or the array of individually controllable reflective elements is arranged to serve as a curved reflective surface.
摘要翻译：公开了一种用于光刻设备的照明器，所述照明器包括能够改变入射照射光束的角度强度分布的独立可控反射元件的阵列，其中所述独立可控反射元件阵列设置在弯曲的支撑结构上，或者可单独控制的反射元件的阵列被布置成用作弯曲的反射表面。

7. 发明授权

US09250536B2 Lithographic apparatus and method 有权
公开(公告)号：US09250536B2
公开(公告)日：2016-02-02
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

8. 发明申请

US20100020300A1 MEASUREMENT APPARATUS AND METHOD 审中-公开
标题翻译：测量装置和方法
公开(公告)号：US20100020300A1
公开(公告)日：2010-01-28
申请号：US12506481
申请日：2009-07-21
申请人： Willem Jan Bouman , Heine Melle Mulder , Wilfred Edward Endendijk , Rob Otte
发明人： Willem Jan Bouman , Heine Melle Mulder , Wilfred Edward Endendijk , Rob Otte
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70075 , G03F7/70091 , G03F7/7085
摘要： According to an aspect of the present invention, a method of controlling a measurement apparatus for determining a property of an individually controllable element of an array of individually controllable elements, the array of individually controllable elements being capable of controlling a distribution of a beam of radiation, is disclosed. The method includes, for a sequence of a plurality of individually controllable elements: directing a measurement beam of radiation at an individually controllable element of the plurality of individually controllable elements; and detecting the measurement beam once it has been re-directed by the individually controllable element, wherein the sequence in which the method is undertaken for the plurality of individually controllable elements is related to the orientation of the plurality of individually controllable elements when the plurality of individually controllable elements are oriented to control a distribution of a beam of radiation.
摘要翻译：根据本发明的一个方面，一种控制测量装置的方法，所述测量装置用于确定独立可控元件阵列的独立可控元件的特性，所述独立可控元件的阵列能够控制辐射束的分布，被披露。该方法包括：对于多个独立可控元件的序列：将测量光束射向多个独立可控元件的独立可控元件; 并且一旦所述测量光束被所述可独立控制的元件重新引导，就检测所述测量光束，其中，所述多个独立可控元件进行所述方法的顺序与所述多个独立可控元件的取向相关，独立可控元件被定向成控制辐射束的分布。

9. 发明授权

US07184123B2 Lithographic optical system 有权
标题翻译：平版光学系统
公开(公告)号：US07184123B2
公开(公告)日：2007-02-27
申请号：US10807408
申请日：2004-03-24
申请人： Johannes Martinus Duisters , Johannes Adrianus Antonius Theodorus Dams , Wilfred Edward Endendijk
发明人： Johannes Martinus Duisters , Johannes Adrianus Antonius Theodorus Dams , Wilfred Edward Endendijk
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70933 , G02B27/0043 , G03F7/70825 , G03F7/70983
摘要： A lithographic optical system is presented herein. The optical system comprises a housing with two optically transparent windows and at least one moveable lens therein, as well as at least one other optical element outside said housing. By providing at least one optical element outside the housing, possible deleterious influences thereof on the optical quality of the moveable lens may be diminished. The housing with the moveable lens may be purged, and may be provided with a linear motor and a gas bearing for contactless moving of the lens.
摘要翻译：本文介绍了光刻光学系统。光学系统包括具有两个光学透明窗口的壳体和其中的至少一个可移动透镜，以及在所述壳体外部的至少一个其它光学元件。通过在壳体外部设置至少一个光学元件，可能会对可移动透镜的光学质量产生有害的影响。具有可移动透镜的壳体可以被清洗，并且可以设置有线性电动机和用于透镜的无接触移动的气体轴承。

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