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1. 发明申请

US20110310372A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS 有权
标题翻译：照明系统和平面设备
公开(公告)号：US20110310372A1
公开(公告)日：2011-12-22
申请号：US13114652
申请日：2011-05-24
申请人： Bert Jan CLAESSENS , Heine Melle MULDER , Paul VAN DER VEEN , Wilfred Edward ENDENDIJK , Willem Jan BOUMAN , Bert Pieter VAN DRIEËNHUIZEN , Jozef Ferdinand Dymphna VERBEECK , Marc Hendricus Margaretha DASSEN , Thijs Johan Henry HOLLINK
发明人： Bert Jan CLAESSENS , Heine Melle MULDER , Paul VAN DER VEEN , Wilfred Edward ENDENDIJK , Willem Jan BOUMAN , Bert Pieter VAN DRIEËNHUIZEN , Jozef Ferdinand Dymphna VERBEECK , Marc Hendricus Margaretha DASSEN , Thijs Johan Henry HOLLINK
IPC分类号： G03B27/54 , F21V14/00
CPC分类号： G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译：公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力一个或多个元素。

2. 发明授权

US08885144B2 Illumination system and lithographic apparatus 有权
标题翻译：照明系统和光刻设备
公开(公告)号：US08885144B2
公开(公告)日：2014-11-11
申请号：US13114652
申请日：2011-05-24
申请人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
发明人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
IPC分类号： G02B5/08 , G03B27/32 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译：公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力一个或多个元素。

3. 发明授权

US07593094B2 Patterning device 有权
标题翻译：图案装置
公开(公告)号：US07593094B2
公开(公告)日：2009-09-22
申请号：US11474493
申请日：2006-06-26
申请人： Bert Pieter Van Drieënhuizen , Antonius Johannes Maria Montagne , Jeroen-Frank Dekkers , Paul Klatser , Marcus Hagting
发明人： Bert Pieter Van Drieënhuizen , Antonius Johannes Maria Montagne , Jeroen-Frank Dekkers , Paul Klatser , Marcus Hagting
IPC分类号： G03B24/54 , G03B24/42
CPC分类号： G03B27/54 , G03F7/70275 , G03F7/70291
摘要： A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.
摘要翻译：系统和方法允许更有效和高效的图案形成装置结构和控制布置。光刻设备包括照明系统，图案形成装置和投影系统。照明系统被配置为调节辐射束。图案形成装置被配置成对辐射束进行图案化。图案形成装置包括控制系统和独立可控元件阵列。控制系统被配置为将具有各自的第一电压值的模拟信号转换为具有第二较高电压值的相应差分控制信号。独立可控元件阵列中的相应的独立可控元件被配置为基于接收对应的差分控制信号来致动。投影系统被配置为将图案化的光束投影到基板的目标区域上。

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