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1. 发明授权

US08785849B2 Ultra high precision measurement tool 有权
标题翻译：超高精度测量工具
公开(公告)号：US08785849B2
公开(公告)日：2014-07-22
申请号：US12133298
申请日：2008-06-04
申请人： Juergen Frosien , Dieter Winkler , Udo Weigel , Stefan Grimm
发明人： Juergen Frosien , Dieter Winkler , Udo Weigel , Stefan Grimm
IPC分类号： G21K5/04
CPC分类号： H01J37/08 , H01J27/26 , H01J37/28 , H01J2237/004 , H01J2237/061 , H01J2237/0807 , H01J2237/244 , H01J2237/24514 , H01J2237/24535 , H01J2237/24564 , H01J2237/24578 , H01J2237/2594 , H01J2237/2623 , H01J2237/2816 , H01J2237/2817
摘要： A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission center of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.
摘要翻译：描述了一种聚焦离子束装置，其包括气体离子源，其具有用于分析和分类样品结构的分析器，用于根据分析仪的分析来控制和/或改变样品的结构的控制器，发射器尖端发射极尖端具有包括第一材料和超高压头的基座尖端，所述第一材料和第一材料包括不同于所述第一材料的材料，其中所述超高压是单个原子尖端，并且所述基座尖端是单晶基底尖端。此外，聚焦离子束装置具有探针电流控制和样品充电控制。提供了一种操作聚焦离子束装置的方法，包括在超高压的单个发射中心和电极之间施加电压，向发射极尖端供应气体，分析和分类样品的结构，以及控制样品的结构。

2. 发明申请

US20100006447A1 METHOD OF PREPARING AN ULTRA SHARP TIP, APPARATUS FOR PREPARING AN ULTRA SHARP TIP, AND USE OF AN APPARATUS 审中-公开
标题翻译：制备超快速提拉的方法，用于制备超声波提示的装置以及装置的使用
公开(公告)号：US20100006447A1
公开(公告)日：2010-01-14
申请号：US12169041
申请日：2008-07-08
申请人： Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
发明人： Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
IPC分类号： C25D5/34 , B05D3/00 , B05D1/32 , C23C16/06 , C23C14/56 , B05D3/06 , B05D3/14
CPC分类号： C25D5/48 , B81C1/00111 , B82Y15/00 , C25D7/00 , H01J1/3044 , H01J9/025 , H01J27/26 , H01J37/073 , H01J37/08 , H01J2201/30411 , H01J2201/30415 , H01J2209/0226 , H01J2237/06341 , H01J2237/0807
摘要： A method of preparing an ultra sharp tip, in particular a single atom tip, is provided, comprising providing a tip having a shank, an apex, and a coating covering the shank and the apex; locally removing the coating from the apex by field evaporation; and partially or fully restoring the coating at the apex.
摘要翻译：提供了制备超尖尖，特别是单个原子尖端的方法，其包括提供具有柄，尖端和覆盖柄和顶点的涂层的尖端; 通过场蒸发从顶点局部去除涂层; 并且部分地或完全地恢复顶点处的涂层。

3. 发明申请

US20090289185A1 ULTRA HIGH PRECISION MEASUREMENT TOOL 有权
标题翻译：超高精度测量工具
公开(公告)号：US20090289185A1
公开(公告)日：2009-11-26
申请号：US12133298
申请日：2008-06-04
申请人： Juergen FROSIEN , Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
发明人： Juergen FROSIEN , Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
IPC分类号： G01N23/00
CPC分类号： H01J37/08 , H01J27/26 , H01J37/28 , H01J2237/004 , H01J2237/061 , H01J2237/0807 , H01J2237/244 , H01J2237/24514 , H01J2237/24535 , H01J2237/24564 , H01J2237/24578 , H01J2237/2594 , H01J2237/2623 , H01J2237/2816 , H01J2237/2817
摘要： A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission centre of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.
摘要翻译：描述了一种聚焦离子束装置，其包括气体离子源，其具有用于分析和分类样品结构的分析器，用于根据分析仪的分析来控制和/或改变样品的结构的控制器，发射器尖端发射极尖端具有包括第一材料和超高压头的基座尖端，所述第一材料和第一材料包括不同于所述第一材料的材料，其中所述超高压是单个原子尖端，并且所述基座尖端是单晶基底尖端。此外，聚焦离子束装置具有探针电流控制和样品充电控制。提供了一种操作聚焦离子束装置的方法，包括在超高压的单个发射中心和电极之间施加电压，向发射极尖端供应气体，分析和分类样品的结构，以及控制样品的结构。

4. 发明申请

US20090121160A1 CHARGED PARTICLE SOURCE WITH AUTOMATED TIP FORMATION 有权
标题翻译：充电颗粒源自动提示形成
公开(公告)号：US20090121160A1
公开(公告)日：2009-05-14
申请号：US12253042
申请日：2008-10-16
申请人： Dieter Winkler , Udo Weigel , Stefan Grimm
发明人： Dieter Winkler , Udo Weigel , Stefan Grimm
IPC分类号： G01J1/00
CPC分类号： H01J37/073 , H01J27/26 , H01J37/08 , H01J37/265 , H01J37/304 , H01J2237/06341 , H01J2237/0805 , H01J2237/0807 , H01J2237/30466 , H01J2237/30477 , H01J2237/31749
摘要： A charged particle beam device is described. The device includes an emitter unit including an emitter tip; a voltage supply unit adapted for providing a stable voltage to generate a stable extraction field at the emitter tip; a pulsed voltage supply member adapted for providing a pulsed voltage to generate a pulsed extraction field on top of the stable extraction field; a measuring unit for measuring an emitter characteristic; and a control unit adapted for receiving a signal from the measuring unit and for control of the pulsed voltage supply member.
摘要翻译：描述带电粒子束装置。该装置包括发射器单元，其包括发射极尖端; 电压供应单元，适于提供稳定的电压以在发射极尖端处产生稳定的提取场; 脉冲电压供应构件，其适于提供脉冲电压以在所述稳定提取场的顶部产生脉冲提取场; 用于测量发射极特性的测量单元; 以及控制单元，适于接收来自测量单元的信号并用于控制脉冲电压供应构件。

5. 发明授权

US08330130B2 Charged particle source with automated tip formation 有权
标题翻译：具有自动尖端形成的带电粒子源
公开(公告)号：US08330130B2
公开(公告)日：2012-12-11
申请号：US12253042
申请日：2008-10-16
申请人： Dieter Winkler , Udo Weigel , Stefan Grimm
发明人： Dieter Winkler , Udo Weigel , Stefan Grimm
IPC分类号： G01J1/00
CPC分类号： H01J37/073 , H01J27/26 , H01J37/08 , H01J37/265 , H01J37/304 , H01J2237/06341 , H01J2237/0805 , H01J2237/0807 , H01J2237/30466 , H01J2237/30477 , H01J2237/31749
摘要： A charged particle beam device is described. The device includes an emitter unit including an emitter tip; a voltage supply unit adapted for providing a stable voltage to generate a stable extraction field at the emitter tip; a pulsed voltage supply member adapted for providing a pulsed voltage to generate a pulsed extraction field on top of the stable extraction field; a measuring unit for measuring an emitter characteristic; and a control unit adapted for receiving a signal from the measuring unit and for control of the pulsed voltage supply member.
摘要翻译：描述带电粒子束装置。该装置包括发射器单元，其包括发射极尖端; 电压供应单元，适于提供稳定的电压以在发射极尖端处产生稳定的提取场; 脉冲电压供应构件，其适于提供脉冲电压以在所述稳定提取场的顶部产生脉冲提取场; 用于测量发射极特性的测量单元; 以及控制单元，适于接收来自测量单元的信号并用于控制脉冲电压供应构件。

6. 发明授权

US08143589B2 Stable emission gas ion source and method for operation thereof 有权
标题翻译：稳定的排放气体离子源及其操作方法
公开(公告)号：US08143589B2
公开(公告)日：2012-03-27
申请号：US12420384
申请日：2009-04-08
申请人： Dieter Winkler , Udo Weigel , Stefan Grimm
发明人： Dieter Winkler , Udo Weigel , Stefan Grimm
IPC分类号： H01J37/08
CPC分类号： H01J37/08 , H01J27/26 , H01J2237/006 , H01J2237/022 , H01J2237/0807 , H01J2237/28
摘要： A method of operating a focused ion beam device for emitting during operation a focused ion beam including ions of a gas generated at a first partial pressure, comprising cleaning an emitter tip positioned in an emitter tip region of the focused ion beam device, the cleaning comprises introducing the gas into the emitter tip region such that the gas has a second partial pressure of at least two times the first pressure. Further, a focused ion beam device is provided, comprising a gas field emitter tip (13) in an emitter tip region emitting an ion beam including ions of a gas, a gas inlet for supplying a gas with different pressures (110), a gas outlet (120), a pressure measurement device for measuring the pressure in the emitter tip region and a control unit (130) for controlling switching between an operation mode and a cleaning mode, further controlling the pressures in the emitter tip region and being connected to the pressure measurement device.
摘要翻译：一种操作聚焦离子束装置的方法，用于在操作期间发射包括以第一分压产生的气体的离子的聚焦离子束，包括清洁位于聚焦离子束装置的发射极尖端区域中的发射极尖端，所述清洁包括将气体引入发射极尖端区域，使得气体具有至少两倍于第一压力的第二分压。此外，提供聚焦离子束装置，其包括发射极尖端区域中的气体发射极尖端（13），其发射包括气体离子的离子束，用于供应不同压力的气体的气体入口（110），气体出口（120），用于测量发射极尖端区域中的压力的压力测量装置和用于控制操作模式和清洁模式之间的切换的控制单元（130），进一步控制发射极尖端区域中的压力并连接到压力测量装置。

7. 发明申请

US20090260112A1 Stable Emission Gas Ion Source and Method for Operation Thereof 有权
标题翻译：稳定排放气体离子源及其操作方法
公开(公告)号：US20090260112A1
公开(公告)日：2009-10-15
申请号：US12420384
申请日：2009-04-08
申请人： Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
发明人： Dieter WINKLER , Udo WEIGEL , Stefan GRIMM
IPC分类号： G01N13/10
CPC分类号： H01J37/08 , H01J27/26 , H01J2237/006 , H01J2237/022 , H01J2237/0807 , H01J2237/28
摘要： A method of operating a focused ion beam device for emitting during operation a focused ion beam including ions of a gas generated at a first partial pressure, comprising cleaning an emitter tip positioned in an emitter tip region of the focused ion beam device, the cleaning comprises introducing the gas into the emitter tip region such that the gas has a second partial pressure of at least two times the first pressure. Further, a focused ion beam device is provided, comprising a gas field emitter tip (13) in an emitter tip region emitting an ion beam including ions of a gas, a gas inlet for supplying a gas with different pressures (110), a gas outlet (120), a pressure measurement device for measuring the pressure in the emitter tip region and a control unit (130) for controlling switching between an operation mode and a cleaning mode, further controlling the pressures in the emitter tip region and being connected to the pressure measurement device.
摘要翻译：一种操作聚焦离子束装置的方法，用于在操作期间发射包括以第一分压产生的气体的离子的聚焦离子束，包括清洁位于聚焦离子束装置的发射极尖端区域中的发射极尖端，所述清洁包括将气体引入发射极尖端区域，使得气体具有至少两倍于第一压力的第二分压。此外，提供聚焦离子束装置，其包括发射极尖端区域中的气体发射极尖端（13），其发射包括气体离子的离子束，用于供应不同压力的气体的气体入口（110），气体出口（120），用于测量发射极尖端区域中的压力的压力测量装置和用于控制操作模式和清洁模式之间的切换的控制单元（130），进一步控制发射极尖端区域中的压力并连接到压力测量装置。

8. 发明申请

US20090020708A1 MODULAR GAS ION SOURCE 有权
标题翻译：模块化气体源
公开(公告)号：US20090020708A1
公开(公告)日：2009-01-22
申请号：US12167734
申请日：2008-07-03
申请人： Dieter Winkler , Thomas Jasinski , Udo Weigel
发明人： Dieter Winkler , Thomas Jasinski , Udo Weigel
IPC分类号： H01J27/02
CPC分类号： H01J37/08 , H01J27/26 , H01J2237/006 , H01J2237/03 , H01J2237/0807
摘要： A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.
摘要翻译：描述了气体场离子源。气体离子源包括发射器模块。发射器模块包括发射器支架，发射器结构，发射器模块的可拆卸连接的电连接组件以及发射器模块的可拆卸地连接的气体供应连接组件。所述气体离子源还包括供电模块，其中所述供应模块包括用于提供电压和/或电流的电导体，气体供应导管，热导体，所述供应模块的可拆卸地连接的电连接组件，供电模块的可连接气体供应连接组件。发射器模块和供电模块可通过发射器模块的可拆卸连接的连接组件和供应模块的可拆卸连接的连接组件可拆卸地连接。

9. 发明授权

US08101922B2 Modular gas ion source 有权
标题翻译：模块化气体离子源
公开(公告)号：US08101922B2
公开(公告)日：2012-01-24
申请号：US12167734
申请日：2008-07-03
申请人： Dieter Winkler , Thomas Jasinski , Udo Weigel
发明人： Dieter Winkler , Thomas Jasinski , Udo Weigel
IPC分类号： H01T23/00
CPC分类号： H01J37/08 , H01J27/26 , H01J2237/006 , H01J2237/03 , H01J2237/0807
摘要： A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.
摘要翻译：描述了气体场离子源。气体离子源包括发射器模块。发射器模块包括发射器支架，发射器结构，发射器模块的可拆卸连接的电连接组件以及发射器模块的可拆卸地连接的气体供应连接组件。所述气体离子源还包括供电模块，其中所述供应模块包括用于提供电压和/或电流的电导体，气体供应导管，热导体，所述供应模块的可拆卸地连接的电连接组件，供电模块的可连接气体供应连接组件。发射器模块和供电模块可通过发射器模块的可拆卸连接的连接组件和供应模块的可拆卸连接的连接组件可拆卸地连接。

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