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    • 2. 发明申请
    • EMBEDDED PHOTON EMISSION CALIBRATION (EPEC)
    • 嵌入式光电子发射校准(EPEC)
    • US20130211749A1
    • 2013-08-15
    • US13396775
    • 2012-02-15
    • Albert M. ChuRonald A. PiroDaryl M. SeitzerRohit ShettyThomas W. Wyckoff
    • Albert M. ChuRonald A. PiroDaryl M. SeitzerRohit ShettyThomas W. Wyckoff
    • G01R31/308G06F19/00
    • G01R31/311
    • A semiconductor device structure is embedded within a semiconductor chip that calibrates a photon-emission luminosity scale by running multiple known currents through the device. The method comprises embedding at least one photon emission device in an integrated circuit having at least one functional device. A control current is applied to the at least one photon emission device. The photon emission intensity produced by the at least one photon emission device is captured. The current density of the at least one photon emission device is calculated. A test current is applied to the at least one functional device. The photon emission intensity produced by the at least one functional device is captured. The current density of the at least one functional device is estimated based on a comparison with the calculated current density of the at least one photon emission device.
    • 半导体器件结构嵌入半导体芯片内,通过运行多个已知电流通过器件来校准光子发射光度标度。 该方法包括将至少一个光子发射装置嵌入到具有至少一个功能装置的集成电路中。 控制电流被施加到至少一个光子发射装置。 捕获由至少一个光子发射装置产生的光子发射强度。 计算出至少一个光子发射装置的电流密度。 测试电流被施加到所述至少一个功能装置。 捕获由至少一个功能装置产生的光子发射强度。 基于与计算出的至少一个光子发射装置的电流密度的比较来估计至少一个功能装置的电流密度。
    • 6. 发明授权
    • Embedded photon emission calibration (EPEC)
    • 嵌入式光子发射校准(EPEC)
    • US09052356B2
    • 2015-06-09
    • US13396775
    • 2012-02-15
    • Albert M. ChuRonald A. PiroDaryl M. SeitzerRohit ShettyThomas W. Wyckoff
    • Albert M. ChuRonald A. PiroDaryl M. SeitzerRohit ShettyThomas W. Wyckoff
    • G01R31/00G01R31/311
    • G01R31/311
    • A semiconductor device structure is embedded within a semiconductor chip that calibrates a photon-emission luminosity scale by running multiple known currents through the device. The method comprises embedding at least one photon emission device in an integrated circuit having at least one functional device. A control current is applied to the at least one photon emission device. The photon emission intensity produced by the at least one photon emission device is captured. The current density of the at least one photon emission device is calculated. A test current is applied to the at least one functional device. The photon emission intensity produced by the at least one functional device is captured. The current density of the at least one functional device is estimated based on a comparison with the calculated current density of the at least one photon emission device.
    • 半导体器件结构嵌入半导体芯片内,通过运行多个已知电流通过器件来校准光子发射光度标度。 该方法包括将至少一个光子发射装置嵌入到具有至少一个功能装置的集成电路中。 控制电流被施加到至少一个光子发射装置。 捕获由至少一个光子发射装置产生的光子发射强度。 计算出至少一个光子发射装置的电流密度。 测试电流被施加到所述至少一个功能装置。 捕获由至少一个功能装置产生的光子发射强度。 基于与计算出的至少一个光子发射装置的电流密度的比较来估计至少一个功能装置的电流密度。