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    • 2. 发明授权
    • Ferroelectric vapor deposition targets
    • 铁电气相沉积靶
    • US06746619B2
    • 2004-06-08
    • US10422112
    • 2003-04-23
    • Jianxing LiTim ScottTamara White
    • Jianxing LiTim ScottTamara White
    • C04B35001
    • C23C14/3414C04B35/462C23C14/08Y10S977/775Y10S977/777Y10S977/838Y10S977/891
    • The invention includes a ferroelectric physical vapor deposition target having a predominate grain size of less than or equal to 1.0 micron, and a density of at least 95% of maximum theoretical density. A method of making the target includes hot pressing a prereacted ferroelectric powder predominately including individual prereacted ferroelectric particles having a maximum straight linear dimension of less than or equal to 100 nanometers to form a physical vapor deposition target of desired shape. In one implementation, the prereacted ferroelectric powder is hot pressed at a maximum pressing temperature which is at least 200° C. lower than would be required to produce at least 85% of maximum theoretical density in hot pressing the same powder but having a predominate particle size maximum straight linear dimension of at least 1.0 micron at the same pressure and for the same amount of time.
    • 本发明包括具有小于或等于1.0微米的主要晶粒尺寸和最大理论密度的至少95%的密度的铁电物理气相沉积靶。 制造目标的方法包括热压预先反应的铁电粉末,主要包括具有小于或等于100纳米的最大直线尺寸的单个预反应铁电粒子,以形成所需形状的物理气相沉积靶。 在一个实施方案中,将预反应的铁电粉末以最大压制温度进行热压,所述最高压制温度比在相同粉末热挤压但具有主要颗粒的产生至少85%的最大理论密度所需的最低压力温度 尺寸最大直线尺寸在相同的压力下和相同的时间量为至少1.0微米。