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    • 1. 发明申请
    • SOLID STATE IMAGING DEVICE AND FABRICATION METHOD OF SOLID STATE IMAGING DEVICE
    • 实体状态成像装置和固态成像装置的制造方法
    • US20080246107A1
    • 2008-10-09
    • US12059151
    • 2008-03-31
    • Yoshiki MAEHARA
    • Yoshiki MAEHARA
    • H01L31/0232H01L31/18
    • H01L27/1462H01L27/14621H01L27/14623H01L27/14627H01L27/14632H01L27/14645H01L27/14687
    • A solid state imaging device comprises: photoelectric conversion portions on or above a substrate; and color filters on or above the respective photoelectric conversion portions. Each of the photoelectric conversion portions comprises: a lower electrode on or above the substrate; a photoelectric conversion film on or above the lower electrode; and an upper electrode on or above the photoelectric conversion film. The device further comprises: a first inorganic material film that protects each of the photoelectric conversion portions, is formed by a first method and is above the upper electrode and below the color filters; a second inorganic material film that prevents characteristic deterioration of the photoelectric conversion portion caused by the first method, is formed by a second method and is between the upper electrode and the first inorganic material film; and a polymeric material film that enhances a function of the first inorganic material film and is on or above the first inorganic material film.
    • 固态成像装置包括:在基板上或上方的光电转换部分; 以及各个光电转换部分上或上方的滤色器。 每个光电转换部分包括:在基板上或上方的下电极; 在下电极上或上方的光电转换膜; 以及在光电转换膜上或上方的上电极。 该装置还包括:通过第一种方法形成保护每个光电转换部分的第一无机材料膜,并且在上电极之上和滤色器下方形成; 通过第二种方法形成防止由第一种方法引起的光电转换部分的特性劣化的第二种无机材料膜,并且位于上电极和第一无机材料膜之间; 以及增强第一无机材料膜的功能并且在第一无机材料膜上或上方的聚合物材料膜。
    • 4. 发明授权
    • Solid state imaging device and fabrication method of solid state imaging device
    • 固态成像装置及固态成像装置的制造方法
    • US07897426B2
    • 2011-03-01
    • US12059151
    • 2008-03-31
    • Yoshiki Maehara
    • Yoshiki Maehara
    • H01L21/00
    • H01L27/1462H01L27/14621H01L27/14623H01L27/14627H01L27/14632H01L27/14645H01L27/14687
    • A solid state imaging device comprises: photoelectric conversion portions on or above a substrate; and color filters on or above the respective photoelectric conversion portions. Each of the photoelectric conversion portions comprises: a lower electrode on or above the substrate; a photoelectric conversion film on or above the lower electrode; and an upper electrode on or above the photoelectric conversion film. The device further comprises: a first inorganic material film that protects each of the photoelectric conversion portions, is formed by a first method and is above the upper electrode and below the color filters; a second inorganic material film that prevents characteristic deterioration of the photoelectric conversion portion caused by the first method, is formed by a second method and is between the upper electrode and the first inorganic material film; and a polymeric material film that enhances a function of the first inorganic material film and is on or above the first inorganic material film.
    • 固态成像装置包括:在基板上或上方的光电转换部分; 以及各个光电转换部分上或上方的滤色器。 每个光电转换部分包括:在基板上或上方的下电极; 在下电极上或上方的光电转换膜; 以及在光电转换膜上或上方的上电极。 该装置还包括:通过第一种方法形成保护每个光电转换部分的第一无机材料膜,并且在上电极之上和滤色器下方形成; 通过第二种方法形成防止由第一种方法引起的光电转换部分的特性劣化的第二种无机材料膜,并且位于上电极和第一无机材料膜之间; 以及增强第一无机材料膜的功能并且在第一无机材料膜上或上方的聚合物材料膜。
    • 5. 发明申请
    • Photoelectric conversion device and solid-state imaging device
    • 光电转换装置和固态成像装置
    • US20070215204A1
    • 2007-09-20
    • US11723110
    • 2007-03-16
    • Yoshiki Maehara
    • Yoshiki Maehara
    • H01L31/00
    • H01L27/14647H01L31/0216
    • A photoelectric conversion device including: a first electrode; a photoelectric conversion layer; and a second electrode, in this order, wherein the photoelectric conversion device further includes: a deterioration factor adsorptive and/or reactive layer which covers the first electrode, the photoelectric conversion layer and the second electrode and which has at least one of adsorptivity of adsorbing a deterioration factor and reactivity of reacting with the deterioration factor; and a passivation layer which covers the deterioration factor adsorptive and/or reactive layer to protect the first electrode, the photoelectric conversion layer and the second electrode.
    • 一种光电转换装置,包括:第一电极; 光电转换层; 和第二电极,其中所述光电转换装置还包括:覆盖所述第一电极,所述光电转换层和所述第二电极的劣化因子吸附和/或反应层,并且具有吸附的吸附性中的至少一种 劣化因子和与劣化因子反应的反应性; 以及钝化层,其覆盖所述劣化因子吸附和/或反应层以保护所述第一电极,所述光电转换层和所述第二电极。
    • 7. 发明授权
    • Process of making a solid state imaging device
    • 制作固态成像装置的过程
    • US08704281B2
    • 2014-04-22
    • US13392587
    • 2010-08-27
    • Yoshiki MaeharaTakashi GotoHideyuki Suzuki
    • Yoshiki MaeharaTakashi GotoHideyuki Suzuki
    • H01L31/113
    • H01L27/307B82Y10/00H01L51/001H01L51/0047H01L51/0059H01L51/4253
    • A solid-state imaging device includes a substrate, a dielectric layer on the substrate, and an array of pixels, each of the pixels includes: a pixel electrode, an organic layer, a counter electrode, a sealing layer, a color filter, a readout circuit and a light-collecting unit as defined herein, the photoelectric layer contains an organic p-type semiconductor and an organic n-type semiconductor, the organic layer further includes a charge blocking layer as defined herein, an ionization potential of the charge blocking layer and an electron affinity of the organic n-type semiconductor present in the photoelectric layer have a difference of at least 1 eV, and a surface of the pixel electrodes on a side of the photoelectric layer and a surface of the dielectric layer on a side of the photoelectric layer are substantially coplanar.
    • 一种固态成像装置,包括基板,基板上的电介质层和像素阵列,每个像素包括:像素电极,有机层,对电极,密封层,滤色器, 读出电路和如本文所定义的光收集单元,光电层包含有机p型半导体和有机n型半导体,有机层还包括如本文所定义的电荷阻挡层,电荷阻挡的电离电位 层和存在于光电层中的有机n型半导体的电子亲和力具有至少1eV的差异,以及光电层一侧的像素电极的表面和侧面上的电介质层的表面 的光电层基本上共面。