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    • 5. 发明授权
    • Process of making a solid state imaging device
    • 制作固态成像装置的过程
    • US08704281B2
    • 2014-04-22
    • US13392587
    • 2010-08-27
    • Yoshiki MaeharaTakashi GotoHideyuki Suzuki
    • Yoshiki MaeharaTakashi GotoHideyuki Suzuki
    • H01L31/113
    • H01L27/307B82Y10/00H01L51/001H01L51/0047H01L51/0059H01L51/4253
    • A solid-state imaging device includes a substrate, a dielectric layer on the substrate, and an array of pixels, each of the pixels includes: a pixel electrode, an organic layer, a counter electrode, a sealing layer, a color filter, a readout circuit and a light-collecting unit as defined herein, the photoelectric layer contains an organic p-type semiconductor and an organic n-type semiconductor, the organic layer further includes a charge blocking layer as defined herein, an ionization potential of the charge blocking layer and an electron affinity of the organic n-type semiconductor present in the photoelectric layer have a difference of at least 1 eV, and a surface of the pixel electrodes on a side of the photoelectric layer and a surface of the dielectric layer on a side of the photoelectric layer are substantially coplanar.
    • 一种固态成像装置,包括基板,基板上的电介质层和像素阵列,每个像素包括:像素电极,有机层,对电极,密封层,滤色器, 读出电路和如本文所定义的光收集单元,光电层包含有机p型半导体和有机n型半导体,有机层还包括如本文所定义的电荷阻挡层,电荷阻挡的电离电位 层和存在于光电层中的有机n型半导体的电子亲和力具有至少1eV的差异,以及光电层一侧的像素电极的表面和侧面上的电介质层的表面 的光电层基本上共面。
    • 10. 发明授权
    • Photoelectric conversion device and solid-state imaging device
    • 光电转换装置和固态成像装置
    • US07659499B2
    • 2010-02-09
    • US11723110
    • 2007-03-16
    • Yoshiki Maehara
    • Yoshiki Maehara
    • H01L27/14
    • H01L27/14647H01L31/0216
    • A photoelectric conversion device including: a first electrode; a photoelectric conversion layer; and a second electrode, in this order, wherein the photoelectric conversion device further includes: a deterioration factor adsorptive and/or reactive layer which covers the first electrode, the photoelectric conversion layer and the second electrode and which has at least one of adsorptivity of adsorbing a deterioration factor and reactivity of reacting with the deterioration factor; and a passivation layer which covers the deterioration factor adsorptive and/or reactive layer to protect the first electrode, the photoelectric conversion layer and the second electrode.
    • 一种光电转换装置,包括:第一电极; 光电转换层; 和第二电极,其中所述光电转换装置还包括:覆盖所述第一电极,所述光电转换层和所述第二电极的劣化因子吸附和/或反应层,并且具有吸附的吸附性中的至少一种 劣化因子和与劣化因子反应的反应性; 以及钝化层,其覆盖所述劣化因子吸附和/或反应层以保护所述第一电极,所述光电转换层和所述第二电极。