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    • 4. 发明申请
    • Nitride semiconductor substrate and method of making same
    • 氮化物半导体衬底及其制造方法
    • US20080157282A1
    • 2008-07-03
    • US11977704
    • 2007-10-25
    • Takayuki SUZUKITakeshi MEGURO
    • Takayuki SUZUKITakeshi MEGURO
    • H01L21/8252H01L29/20
    • C30B33/00C30B25/02C30B29/403C30B29/406H01L21/02389H01L21/0242H01L21/02458H01L21/0254H01L21/02614
    • A method of making a nitride semiconductor substrate having the steps of providing a free-standing substrate that is of a nitride semiconductor and has one of a penetrating pit and a penetrating crack that penetrate from a top surface to a back surface of the free-standing substrate, attaching a metal to the penetrating pit or the penetrating crack, the metal being adapted to be nitrided, and nitriding the metal to form a nitride that seals the penetrating pit or the penetrating crack. A nitride semiconductor substrate has a free-standing substrate that is formed of a nitride semiconductor and has one of a penetrating pit and a penetrating crack that penetrate from a top surface to a back surface of the free-standing substrate, and a metal nitride that seals the penetrating pit or the penetrating crack. The metal nitride is formed of GaN, InN and AlN.
    • 一种制造氮化物半导体衬底的方法,其具有以下步骤:提供具有氮化物半导体的自立式衬底,并且具有从自立式的顶表面到后表面穿透的穿透坑和穿透裂纹中的一种 基板,将金属附着到穿透坑或穿透裂缝,金属适于被氮化,并且氮化金属以形成密封穿透坑或穿透裂纹的氮化物。 氮化物半导体衬底具有由氮化物半导体形成的自立式衬底,并且具有从自立式衬底的顶表面到后表面穿透的穿透坑和穿透裂纹中的一种;以及金属氮化物 密封穿透坑或穿透裂缝。 金属氮化物由GaN,InN和AlN形成。
    • 8. 发明授权
    • Dielectric filter
    • 介质过滤器
    • US4450421A
    • 1984-05-22
    • US393534
    • 1982-06-30
    • Takeshi MeguroYukio Ito
    • Takeshi MeguroYukio Ito
    • H01P1/205H01P7/00
    • H01P1/2056
    • A comb-line type dielectric filter in which a plurality of resonator holes are made in a dielectric block at predetermined intervals and coupling adjustment holes are made between the resonator holes, the interior surfaces of the resonator holes and the surface of the dielectric block being entirely or partly covered with a conductor film. The coupling adjustment holes are disposed apart from the line joining the centers of the resonator holes, and a coupling adjusting member made of metal or dielectric material is inserted into each coupling adjustment hole.
    • 梳状线路型介质滤波器,其中在介质块中以预定间隔形成多个谐振器孔,并且在谐振器孔之间形成耦合调整孔,谐振器孔的内表面和介质块的表面完全 或部分覆盖有导体膜。 耦合调节孔与连接谐振器孔的中心的线分开设置,并且由金属或介电材料制成的耦合调节构件插入到每个耦合调节孔中。