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1. 发明授权

US08196067B2 Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same 有权
标题翻译：用于多列电子束曝光的掩模，以及使用其的电子束曝光装置和曝光方法
公开(公告)号：US08196067B2
公开(公告)日：2012-06-05
申请号：US12583319
申请日：2009-08-18
申请人： Akio Yamada , Takayuki Yabe , Hitoshi Tanaka
发明人： Akio Yamada , Takayuki Yabe , Hitoshi Tanaka
IPC分类号： G06F17/50
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F1/20 , H01J37/09 , H01J2237/31776 , H01J2237/31794
摘要： A mask for exposure, which is used in a multi-column electron beam exposure apparatus having multiple column cells, includes a stencil pattern group constituted by multiple stencil patterns for each of the multiple column cells. The stencil pattern groups are arranged at intervals corresponding to arrangement intervals of the multiple column cells, and all of the stencil pattern groups are formed on a single mask substrate. The stencil pattern groups include: a first stencil pattern group formed within a deflectable range of an electron beam of each of the multiple column cells; and a second stencil pattern group having two or more of the first stencil patterns.
摘要翻译：用于具有多个列单元的多列电子束曝光装置中的用于曝光的掩模包括由多个列单元中的每一个的多个模板图案构成的模板图案组。模板图案组以对应于多列单元格的排列间隔的间隔排列，并且所有模板图案组形成在单个掩模基板上。模板图案组包括：形成在多个柱单元中的每一个的电子束的可偏转范围内的第一模板图案组; 以及具有两个或更多个第一模板图案的第二模板图案组。

2. 发明申请

US20110204224A1 Multi-column electron beam lithography apparatus and electron beam trajectory adjustment method for the same 审中-公开
标题翻译：多列电子束光刻设备和电子束轨迹调整方法相同
公开(公告)号：US20110204224A1
公开(公告)日：2011-08-25
申请号：US13066932
申请日：2011-04-28
申请人： Akio Yamada , Takayuki Yabe
发明人： Akio Yamada , Takayuki Yabe
IPC分类号： H01J3/26 , H01J37/29
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3023 , H01J37/3177 , H01J2237/15 , H01J2237/30461 , H01J2237/30472
摘要： A multi-column electron beam lithography apparatus includes multiple columns, each including a mask having several aperture patterns; a selective deflector to deflect an electron beam to select an aperture pattern; a bending back deflector to bend the beam passed through the pattern back to the column optical axis; and an electron beam trajectory adjustment unit to adjust deflection efficiencies of the deflectors without the mask installed to allow the beam deflected toward any positions in a deflection region to be bent back and applied to the same position on a sample, and to adjust the deflection efficiency of the selective deflector with the mask installed to allow the beam to be deflected toward any pattern of the mask, while maintaining a relationship between the deflection efficiencies.
摘要翻译：多列电子束光刻设备包括多个列，每个列包括具有若干孔径图案的掩模; 用于偏转电子束以选择孔径图案的选择性偏转器; 弯曲的反向偏转器，用于将通过图案的光束弯曲回列光轴; 以及电子束轨迹调整单元，用于调节偏转器的偏转效率，而不设置掩模，以允许偏转到偏转区域中的任何位置的光束被弯曲并施加到样本上的相同位置，并且调整偏转效率的选择性偏转器，其中安装有掩模以允许光束朝向掩模的任何图案偏转，同时保持偏转效率之间的关系。

3. 发明授权

US06989059B2 Process for producing single crystal of compound semiconductor and crystal growing apparatus 有权
标题翻译：制备化合物半导体的单晶和晶体生长装置的方法
公开(公告)号：US06989059B2
公开(公告)日：2006-01-24
申请号：US10497916
申请日：2003-10-03
申请人： Toshiaki Asahi , Kenji Sato , Takayuki Yabe , Atsutoshi Arakawa
发明人： Toshiaki Asahi , Kenji Sato , Takayuki Yabe , Atsutoshi Arakawa
IPC分类号： C30B15/02 , C30B15/12
CPC分类号： C30B27/02 , C30B15/12 , C30B29/48 , Y10T117/1068 , Y10T117/1072 , Y10T117/1088
摘要： In a production method for producing a compound semiconductor single crystal by LEC method using a crystal growth apparatus with a double crucible structure, it was made to grow up a crystal by covering the second crucible with a plate-like member having a pass-through slot for being capable of introducing a crystal pulling-up shaft having a seed crystal holding part at a tip into the second crucible and creating a state where an atmosphere within the second crucible scarcely changes (a semi-sealed structure).
摘要翻译：在使用具有双坩埚结构的晶体生长装置的LEC方法制造化合物半导体单晶的制造方法中，通过用具有贯通槽的板状构件覆盖第二坩埚而使晶体长大，能够将具有尖端的晶种保持部的晶体提升轴引入到第二坩埚中，形成第二坩埚内的气氛几乎不变化（半密封结构）的状态。

4. 发明授权

US06903355B2 Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method 有权
标题翻译：电子束曝光装置，电子束法，半导体器件制造方法，掩模和掩模制造方法
公开(公告)号：US06903355B2
公开(公告)日：2005-06-07
申请号：US10424888
申请日：2003-04-28
申请人： Hiroshi Yasuda , Akio Yamada , Takayuki Yabe
发明人： Hiroshi Yasuda , Akio Yamada , Takayuki Yabe
IPC分类号： G03F7/20 , H01J37/317 , G21G5/00 , A61N5/00 , G21K5/10
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3174 , H01J2237/31764 , H01J2237/31776 , H01J2237/31794
摘要： An electron beam exposure apparatus for exposing a pattern accurately even if the current of the electron beam is high. The electron beam exposure apparatus 100 includes a mask 30 with a first and second block patterns for shaping the electron beam. Magnification of the first block pattern to a first exposure pattern which is to be exposed by the electron beam having a first current shaped by the first block pattern is different with magnification of the second block pattern to a second exposure pattern which is to be exposed by the electron beam having a second current shaped by the second block pattern.
摘要翻译：即使电子束的电流高的电子束曝光装置也能够精确地曝光图案。电子束曝光装置100包括具有用于成形电子束的第一和第二块图案的掩模30。将第一块图案放大到由具有由第一块图案形成的第一电流的电子束曝光的第一曝光图案与第二块图案的放大倍数相对于将被第二块图案曝光的第二曝光图案电子束具有由第二块图案形成的第二电流。

5. 发明授权

US5323872A Automotive vehicle equipped with air bag system 失效
标题翻译：汽车配备气囊系统
公开(公告)号：US5323872A
公开(公告)日：1994-06-28
申请号：US790440
申请日：1991-11-12
申请人： Takayuki Yabe
发明人： Takayuki Yabe
IPC分类号： E05F15/20 , B60H1/24 , B60J1/00 , B60J7/00 , B60R21/01 , B60R21/16 , F01N1/16 , B60R21/32
CPC分类号： B60R21/01 , B60R21/164
摘要： An automotive vehicle equipped with an air bag system includes an interior gas discharge device for communicating a vehicle interior to the outside upon detection of a vehicular collision and a forced ventilation device provided for operation upon detection of the vehicular collision.
摘要翻译：配备有气囊系统的机动车辆包括内部气体排出装置，用于在检测到车辆碰撞时将车辆内部连通到外部，以及用于在检测到车辆碰撞时用于操作的强制通风装置。

6. 发明申请

US20120206213A1 Input/Output Coupling Structure for Dielectric Waveguide 有权
标题翻译：介质波导的输入/输出耦合结构
公开(公告)号：US20120206213A1
公开(公告)日：2012-08-16
申请号：US13350562
申请日：2012-01-13
申请人： Hiroshi KOJIMA , Takayuki YABE , Kazuhiro ITO
发明人： Hiroshi KOJIMA , Takayuki YABE , Kazuhiro ITO
IPC分类号： H01P5/107
CPC分类号： H01P5/087 , H01P1/2088 , H01P5/107
摘要： Dielectric waveguide comprising a circular input/output electrode on its bottom surface and surrounded by an exposed dielectric portion thereof around which a conductor film is disposed. A short stub crosses through the exposed dielectric portion to couple the electrode and film together. The printed circuit board has a front surface formed with a generally-circular island-shaped electrode surrounded by a front surface-side ground pattern in a spaced-apart relation thereto, and a back surface formed with a strip line surrounded by a back surface-side ground pattern in spaced-apart relation thereto. An approximate center of the island-shaped electrode and one end of the strip line are coupled together, and the front surface-side ground pattern and the back surface-side pattern are coupled together. The input/output electrode of the dielectric waveguide and the island-shaped electrode of the printed circuit board are coupled together.
摘要翻译：介质波导在其底表面上包括一个圆形的输入/输出电极，并被暴露的电介质部分所围绕，导体膜布置在该绝缘介质部分周围。短短的短截线穿过暴露的电介质部分，以将电极和膜耦合在一起。印刷电路板具有形成有由与其间隔开的前表面侧接地图案包围的大致圆形的岛状电极的前表面，以及形成有由背面侧接地线包围的带状线的背面，侧接地图案与其间隔开的关系。岛状电极的大致中心和带状线的一端被耦合在一起，并且前表面侧接地图案和背面侧图案被耦合在一起。介质波导的输入/输出电极和印刷电路板的岛状电极耦合在一起。

7. 发明授权

US07278333B2 Ball screw device 有权
标题翻译：滚珠丝杠装置
公开(公告)号：US07278333B2
公开(公告)日：2007-10-09
申请号：US11109709
申请日：2005-04-20
申请人： Masato Kato , Takayuki Yabe , Junji Minakuchi
发明人： Masato Kato , Takayuki Yabe , Junji Minakuchi
IPC分类号： F16H3/06
CPC分类号： F16H25/2204 , F16H25/2418 , F16H57/0497 , Y10T74/18712 , Y10T74/18744
摘要： A ball screw device has a screw shaft which has a shaft rolling groove in a spiral shape formed on an outer surface of the screw shaft, a nut which has a nut rolling groove formed on an inner surface of the nut and opposed to the shaft rolling groove, wherein the screw shaft is to be screwed in the nut so that the shaft rolling groove and the nut rolling groove are faced through a plurality of rolling balls, and a lubrication ring which is made of a lubricant-including material, comes in slide contact with the screw shaft, and is arranged in an end portion of the nut, wherein a non-contact portion, which does not come in slide contact with the screw shaft, is formed on the slide contact surface of the lubrication ring.
摘要翻译：滚珠丝杠装置具有螺杆轴，螺杆轴具有形成在螺杆轴的外表面上的螺旋状的轴滚动槽，螺母具有形成在螺母的内表面上并与轴滚动相对的螺母滚动槽槽，其中螺杆轴被拧入螺母中，使得轴滚动槽和螺母滚动槽面对多个滚珠，并且由含润滑剂的材料制成的润滑环滑入与螺杆轴接触，并且设置在螺母的端部，其中在润滑环的滑动接触表面上形成不与螺纹轴滑动接触的非接触部分。

8. 发明申请

US20060191367A1 Rolling screw device 审中-公开
标题翻译：滚动螺丝装置
公开(公告)号：US20060191367A1
公开(公告)日：2006-08-31
申请号：US10548798
申请日：2004-03-12
申请人： Junji Minakuchi , Takayuki Yabe
发明人： Junji Minakuchi , Takayuki Yabe
IPC分类号： F16H25/22
CPC分类号： F16H25/2219 , Y10T74/19772
摘要： A rolling screw device capable of suppressing the rather early occurrence of damage such as cracking on the tongue of an end deflector, wherein the tip part (20a) of the tongue (20) hit by a ball (13) as a rolling element is chamfered in arc shape to increase the contact area of the tip part (20a) of the tongue (20) with the ball (13).
摘要翻译： 1.一种滚动丝杠装置，其能够抑制由于作为滚动元件的滚珠（13）撞击的舌部（20）的前端部（20a）在端部偏转器的舌部上的破损现象的发生，以弧形倒角，以增加舌头（20）的尖端部分（20）与球（13）的接触面积。

9. 发明授权

US07089819B2 Linear guide apparatus 有权
标题翻译：直线导轨装置
公开(公告)号：US07089819B2
公开(公告)日：2006-08-15
申请号：US10443877
申请日：2003-05-23
申请人： Takayuki Yabe , Masato Katou
发明人： Takayuki Yabe , Masato Katou
IPC分类号： F16H27/02
CPC分类号： F16C29/08 , F16C29/06 , F16H25/2204 , F16H25/2418 , Y10T74/18712 , Y10T74/18744
摘要： A ball screw has a screw shaft including a screw groove formed in an outer peripheral surface thereof; a nut including a screw groove formed in an inner peripheral surface thereof and screwed together with the screw shaft through a large number of balls rollably disposed in a spiral-shaped ball rolling passage formed by the two screw grooves; and, two seals respectively disposed on the two end portions of the nut for sealing the opening of a clearance between the screw shaft and the nut, wherein two annular grooves are respectively formed in the inner peripheral surfaces of the two end portions of the nut, each of the seals is formed in a substantially annular-ring shape having an outside diameter larger than the inside diameter of the nut and the seals are mounted into the nut by fitting the outer edge portions of the seals into the annular grooves.
摘要翻译：滚珠丝杠具有螺杆轴，该螺杆轴在其外周面形成有螺纹槽，螺母，其包括形成在其内周面中的螺纹槽，并且通过大量滚珠旋转地设置在由两个螺纹槽形成的螺旋形滚珠滚动通道中的滚珠与螺杆轴螺纹连接; 以及分别设置在螺母的两个端部上的两个密封件，用于密封螺杆轴和螺母之间的间隙的开口，其中两个环形槽分别形成在螺母的两个端部的内周表面中，每个密封件形成为具有比螺母的内径大的外径的大致环形形状，并且通过将密封件的外边缘部分装配到环形槽中将密封件安装到螺母中。

10. 发明授权

US06911661B2 Electron beam exposure apparatus 失效
标题翻译：电子束曝光装置
公开(公告)号：US06911661B2
公开(公告)日：2005-06-28
申请号：US10409542
申请日：2003-04-08
申请人： Takayuki Yabe , Akio Yamada
发明人： Takayuki Yabe , Akio Yamada
IPC分类号： G03F7/20 , H01J37/305 , H01J37/317 , H01L21/027 , H01J37/09
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： An electron beam exposure apparatus, which exposes patterns on a wafer by an electron beam, includes an electron beam producing unit which produces the electron beam and an electron beam shaping member having a plurality of openings which shape the electron beam. The 1st ratio, which is a ratio between opening width of the 1st opening among the plurality of the openings in the 1st direction, which is substantially perpendicular to irradiation direction of the electron beam, and pattern width of the pattern, which should be exposed on the wafer by the electron beam shaped by the 1st opening, in the direction corresponding to the 1st direction, and the 2nd ratio, which is a ratio between opening width of the 2nd opening among the plurality of the openings, in the 1st direction, and pattern width of the pattern, which should be exposed on the wafer by the electron beam shaped by the 2nd opening, in the direction corresponding to the 1st direction, are different.
摘要翻译：通过电子束曝光晶片上的图案的电子束曝光装置包括产生电子束的电子束产生单元和具有形成电子束的多个开口的电子束整形元件。第一比率，其是第一方向上的第一开口的开口宽度与第一方向的大致垂直于电子束的照射方向的比率，以及应该暴露在图案上的图案的图案宽度通过第一开口形成的电子束在与第一方向对应的方向上形成的晶片，以及作为第一方向上的第二开口的开口宽度的比率的第二比率，以及通过第二开口形成的电子束在与第一方向对应的方向上在晶片上曝光的图案的图案宽度不同。

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