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1. 发明授权

US08710472B2 Target output device and extreme ultraviolet light source apparatus 有权
标题翻译：目标输出装置和极紫外光源装置
公开(公告)号：US08710472B2
公开(公告)日：2014-04-29
申请号：US13192857
申请日：2011-07-28
申请人： Takanobu Ishihara , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
发明人： Takanobu Ishihara , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
摘要翻译：目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。

2. 发明授权

US08507883B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08507883B2
公开(公告)日：2013-08-13
申请号：US12559977
申请日：2009-09-15
申请人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译：一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场目标材料和收集镜的轨迹。

3. 发明申请

US20120267553A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发光装置
公开(公告)号：US20120267553A1
公开(公告)日：2012-10-25
申请号：US13540314
申请日：2012-07-02
申请人： Shinji NAGAI , Tamotsu ABE , Takanobu ISHIHARA , Osamu WAKABAYASHI
发明人： Shinji NAGAI , Tamotsu ABE , Takanobu ISHIHARA , Osamu WAKABAYASHI
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G01J3/10 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.
摘要翻译：一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

4. 发明申请

US20110284774A1 TARGET OUTPUT DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：目标输出装置和极端超紫外光源装置
公开(公告)号：US20110284774A1
公开(公告)日：2011-11-24
申请号：US13192857
申请日：2011-07-28
申请人： Takanobu ISHIHARA , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
发明人： Takanobu ISHIHARA , Youichi Sasaki , Kouji Kakizaki , Masahiro Inoue , Takayuki Yabu , Hideo Hoshino
IPC分类号： G21K5/00 , H05H1/24
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
摘要翻译：目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。

5. 发明申请

US20110204249A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发光装置
公开(公告)号：US20110204249A1
公开(公告)日：2011-08-25
申请号：US13032172
申请日：2011-02-22
申请人： Shinji NAGAI , Tamotsu Abe , Takanobu Ishihara , Osamu Wakabayashi
发明人： Shinji NAGAI , Tamotsu Abe , Takanobu Ishihara , Osamu Wakabayashi
IPC分类号： G01J1/42 , G01J3/10 , H01J1/50
CPC分类号： H05G2/003 , G01J3/10 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.
摘要翻译：一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

6. 发明申请

US20100140513A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100140513A1
公开(公告)日：2010-06-10
申请号：US12605113
申请日：2009-10-23
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
摘要翻译：极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部检索对等离子体的产生无贡献的残留目标。

7. 发明申请

US20080198891A1 Excimer laser device operable at high repetition rate and having high band-narrowing efficiency 有权
标题翻译：准分子激光装置可以高重复率操作并且具有高带窄效率
公开(公告)号：US20080198891A1
公开(公告)日：2008-08-21
申请号：US12071048
申请日：2008-02-14
申请人： Tsukasa Hori , Takanobu Ishihara , Kouji Kakizaki
发明人： Tsukasa Hori , Takanobu Ishihara , Kouji Kakizaki
IPC分类号： H01S3/03
CPC分类号： H01S3/225 , H01S3/0057 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/073 , H01S3/08036 , H01S3/0805 , H01S3/2251 , H01S3/2316 , H01S3/2325
摘要： A narrow-band discharge excited laser device including a laser chamber having a laser gas sealed therein, a pair of electrodes provided within the laser chamber to face each other with a predetermined distance therebetween, a band-narrowing module having a magnifying prism and a grating and receiving laser light passing through a slit, and a cross-flow fan circulating the laser gas passing between the electrodes, in which a pulsed voltage is applied from a high-voltage power supply to the pair of electrodes to generate electric discharge between the electrodes, and the pair of electrodes have a width of 1 to 2 mm, a ratio between the electrode width and the inter-electrode distance (electrode with inter-electrode distance) being 0.25 to 0.125.
摘要翻译：一种窄带放电激发激光装置，包括：激光腔，其内部密封有激光气体;一对电极，设置在激光腔内，以相互间隔预定距离彼此面对;具有放大棱镜和光栅的带窄模块并且接收通过狭缝的激光，并且横流风扇循环通过电极之间的激光气体，其中从高压电源向该对电极施加脉冲电压，以在电极之间产生放电，一对电极的宽度为1〜2mm，电极宽度与电极间距离（电极间距离的电极）的比例为0.25〜0.125。

8. 发明授权

US06628693B1 Discharge electrode for laser device 有权
标题翻译：激光器放电电极
公开(公告)号：US06628693B1
公开(公告)日：2003-09-30
申请号：US09663940
申请日：2000-09-18
申请人： Takanobu Ishihara , Hirotoshi Inoue , Tsukasa Hori
发明人： Takanobu Ishihara , Hirotoshi Inoue , Tsukasa Hori
IPC分类号： H01S3097
CPC分类号： H01S3/038 , H01S3/0385 , H01S3/225
摘要： A discharge electrode for a laser device which can cause stable main discharge to occur is provided. To this end, the discharge electrode includes a cathode base (8) made of an insulating material for sealing up a chamber opening (7) provided in a laser chamber (2) for containing laser gases, a cathode (5) attached to the cathode base (8) with a bottom surface (5A) of the cathode (5) in contact therewith, and a plurality of high-voltage feeder rods (12) disposed in a longitudinal direction, penetrating through the cathode base (8) from an outside of the laser chamber (2) which supplies a high-voltage current to the cathode (5), in which an O-ring groove (22) for sealing in the laser gases is formed on the bottom surface of the cathode (5) to surround a plurality of holes (24) for fixing the high-voltage feeder rods (12) disposed on the bottom surface of the cathode (5).
摘要翻译：提供一种用于能够引起稳定的主放电的激光装置的放电电极。为此，放电电极包括由绝缘材料制成的用于密封设置在用于容纳激光气体的激光室（2）中的室开口（7）的阴极基体（8），附着到阴极的阴极（5）基底（8）与阴极（5）的底面（5A）接触，以及沿纵向方向设置的多个高压馈电棒（12），从外部穿透阴极基座（8）向阴极（5）供给高压电流的激光室（2），其中在阴极（5）的底面上形成用于密封激光气体的O形环槽（22）至围绕多个用于固定设置在阴极（5）的底表面上的高压馈电棒（12）的孔（24）。

9. 发明授权

US6130904A Gas supplementation method of excimer laser apparatus 失效
标题翻译：准分子激光装置的气体补充方法
公开(公告)号：US6130904A
公开(公告)日：2000-10-10
申请号：US669332
申请日：1996-06-20
申请人： Takanobu Ishihara , Junichi Fujimoto , Hakaru Mizoguchi
发明人： Takanobu Ishihara , Junichi Fujimoto , Hakaru Mizoguchi
IPC分类号： H01S3/036 , H01S3/104 , H01S3/134 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036 , H01S3/225 , H01S3/104 , H01S3/134
摘要： In an excimer laser apparatus in which halogen gas, rare gas and buffer gas are fed into the laser chamber, before laser oscillation, the oscillation stop time is calculated, and, if the calculated oscillation stop time exceeds a prescribed time, the calculated oscillation stop time is used to calculate a feeding amount of mixed gas comprising rare gas or buffer gas, and the mixed gas is fed, prior to laser oscillation, in the calculated feeding amount; stable laser output is thereby obtained from the initial period of laser oscillation.
摘要翻译： PCT No.PCT / JP94 / 02187 Sec。 371日期：1996年6月20日 102（e）日期1996年6月20日PCT 1994年12月22日PCT PCT。公开号WO95 / 18477 日期：1995年6月7日在激光振荡前将卤素气体，稀有气体和缓冲气体供给到激光室的准分子激光装置中，计算振荡停止时间，如果计算出的振荡停止时间超过规定时间使用计算出的振荡停止时间来计算包含稀有气体或缓冲气体的混合气体的进料量，并且在激光振荡之前将所述混合气体以计算的进料量进料; 从激光振荡的初始阶段得到稳定的激光输出。

10. 发明授权

US08698112B2 Extreme ultraviolet light generation apparatus 有权
标题翻译：极紫外光发生装置
公开(公告)号：US08698112B2
公开(公告)日：2014-04-15
申请号：US13396289
申请日：2012-02-14
申请人： Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
发明人： Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
IPC分类号： H01J35/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/008
摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
摘要翻译：一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为位于等离子体产生区域和至少电绝缘体之间。目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。

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