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1. 发明申请

US20160048079A1 METHOD, PHOTOLITHOGRAPHY METHOD, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING A PELLICLE FILM 有权
标题翻译：方法，光刻方法和使用薄膜形成半导体器件的方法
公开(公告)号：US20160048079A1
公开(公告)日：2016-02-18
申请号：US14706980
申请日：2015-05-08
申请人： Su-Young LEE , Tae-Geun KIM , Jong-Gul DOH
发明人： Su-Young LEE , Tae-Geun KIM , Jong-Gul DOH
IPC分类号： G03F7/20 , H01L21/78
CPC分类号： G03F7/2004 , G03F1/62
摘要： A pellicle for an EUV lithography may include a pellicle film, a supporting structure and a handling block. The pellicle film may have a first surface for orienting opposite to a mask, and a second surface opposite to the first surface and for orienting toward the mask. The pellicle film may allow the EUV, which may pass through the mask, to penetrate the pellicle film. The supporting structure may be arranged on the second surface of the pellicle film to support the pellicle film. The handling block may be arranged on the first surface of the pellicle film. The handling block may have an opening configured to expose the pellicle film. Thus, the pellicle may be handled using the thick handling block, not the thin pellicle film, so that the thin pellicle film may not be damaged. The pellicle may protect the mask from byproducts generated in the EUV lithography process so that the mask may not be contaminated.
摘要翻译：用于EUV光刻的防护薄膜组件可以包括防护薄膜，支撑结构和处理块。防护薄膜可以具有用于与掩模相对定向的第一表面和与第一表面相对的用于朝向掩模定向的第二表面。防护薄膜可以允许穿过掩模的EUV穿透防护薄膜。支撑结构可以布置在防护薄膜的第二表面上以支撑防护薄膜。处理块可以布置在防护薄膜的第一表面上。处理块可以具有用于暴露防护薄膜的开口。因此，可以使用厚的处理块而不是薄的防护薄膜来处理防护薄膜，使得薄的防护薄膜不会被损坏。防护薄膜组件可以保护面罩免于在EUV光刻工艺中产生的副产物，使得面罩不被污染。

2. 发明授权

US09239516B2 Method of manufacturing reflective extreme ultraviolet mask 有权
标题翻译：制造反射性极紫外线掩膜的方法
公开(公告)号：US09239516B2
公开(公告)日：2016-01-19
申请号：US14630825
申请日：2015-02-25
申请人： Tae-Geun Kim , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
发明人： Tae-Geun Kim , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
IPC分类号： G03F1/24 , G03F1/38 , G03F1/80
CPC分类号： G03F1/24 , G03F1/38 , G03F1/80
摘要： A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in light communication with the first opening.
摘要翻译：反射性极紫外线掩模包括具有曝光区域和周边区域的掩模基板，所述掩模基板在所述周边区域中包括光散射部分，所述掩模基板的上表面上的反射层，所述反射层具有第一打开曝光光散射部分和在反射层上的吸收层图案，吸收层图案具有与第一开口光连通的第二开口。

3. 发明授权

US08968969B2 Reflective extreme ultraviolet mask and method of manufacturing the same 有权
标题翻译：反射极紫外线掩膜及其制造方法
公开(公告)号：US08968969B2
公开(公告)日：2015-03-03
申请号：US13302143
申请日：2011-11-22
申请人： Tae-Geun Kim , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
发明人： Tae-Geun Kim , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
IPC分类号： G03F1/24 , G03F1/38
CPC分类号： G03F1/24 , G03F1/38 , G03F1/80
摘要： A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in light communication with the first opening.
摘要翻译：反射性极紫外线掩模包括具有曝光区域和周边区域的掩模基板，所述掩模基板在所述周边区域中包括光散射部分，所述掩模基板的上表面上的反射层，所述反射层具有第一打开曝光光散射部分和在反射层上的吸收层图案，吸收层图案具有与第一开口光连通的第二开口。

4. 发明授权

US08674594B2 Flip-chip type light-emitting device with curved reflective layer 有权
标题翻译：倒装式发光装置，具有弯曲反射层
公开(公告)号：US08674594B2
公开(公告)日：2014-03-18
申请号：US13326697
申请日：2011-12-15
申请人： Tae-Geun Kim , Wan-Ho Lee
发明人： Tae-Geun Kim , Wan-Ho Lee
IPC分类号： F21V7/00 , H01J1/62 , H01L33/00
CPC分类号： H01L33/405 , H01L33/42
摘要： A light-emitting device comprises a substrate; a light-emitting layer formed on the substrate; a transparent electrode layer formed on the light-emitting layer, the transparent electrode layer having a curved surface; and a reflective layer formed on and along the curved surface of the transparent electrode layer such that the curved surface of the transparent electrode layer is transferred so as to reflect the light generated from the light-emitting layer toward the light-emitting layer.
摘要翻译：发光装置包括基板; 形成在所述基板上的发光层; 形成在所述发光层上的透明电极层，所述透明电极层具有弯曲表面; 以及在透明电极层的曲面上形成的反射层，使得透明电极层的曲面被转印，以将从发光层产生的光朝向发光层反射。

5. 发明授权

US08292575B2 Fan for air conditioner 有权
标题翻译：风机风机
公开(公告)号：US08292575B2
公开(公告)日：2012-10-23
申请号：US11547858
申请日：2004-08-19
申请人： In Gyu Kim , Byung Il Park , Ja Hyung Koo , Yang Ho Kim , Kyeong Wook Heo , Si Kyong Sung , Dong Hyuk Lee , Young Hwan Ko , Jun Hyeon Hwang , Ho Jin Song , Jin Seong Hwang , Young Ho Hong , Hwan Jong Choi , Geun Bae Hwang , Chun Su Kang , Tae Geun Kim
发明人： In Gyu Kim , Byung Il Park , Ja Hyung Koo , Yang Ho Kim , Kyeong Wook Heo , Si Kyong Sung , Dong Hyuk Lee , Young Hwan Ko , Jun Hyeon Hwang , Ho Jin Song , Jin Seong Hwang , Young Ho Hong , Hwan Jong Choi , Geun Bae Hwang , Chun Su Kang , Tae Geun Kim
IPC分类号： F04D29/44
CPC分类号： H02K7/14 , F04D25/064 , F04D25/0646 , F04D29/668 , F24F1/0007 , F24F1/0018 , F24F1/0022 , H02K3/522
摘要： A fan apparatus and an air conditioner employing such a fan apparatus are provided to reduce noise and enhance efficiency. The fan apparatus may be driven by a BLDC motor that stably drives the fan and increases an air flow rate. Heat exchange efficiency of an outdoor unit of a front suction/discharge type air conditioner may be improved by such a fan apparatus driven by such a BLDC motor.
摘要翻译：提供采用这种风扇装置的风扇装置和空调器以减少噪音并提高效率。风扇装置可以由稳定地驱动风扇并增加空气流量的BLDC电动机驱动。通过这样的BLDC电动机驱动的风扇装置，能够提高前排/抽吸式空调的室外机的热交换效率。

6. 发明申请

US20120135339A1 REFLECTIVE EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：反射极限超紫外线掩模及其制造方法
公开(公告)号：US20120135339A1
公开(公告)日：2012-05-31
申请号：US13302143
申请日：2011-11-22
申请人： Tae-Geun KIM , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
发明人： Tae-Geun KIM , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
IPC分类号： G03F1/24
CPC分类号： G03F1/24 , G03F1/38 , G03F1/80
摘要： A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in fluid communication with the first opening.
摘要翻译：反射性极紫外线掩模包括具有曝光区域和周边区域的掩模基板，所述掩模基板在所述周边区域中包括光散射部分，所述掩模基板的上表面上的反射层，所述反射层具有第一打开曝光所述光散射部分，以及在所述反射层上具有吸收层图案，所述吸收层图案具有与所述第一开口流体连通的第二开口。

7. 发明授权

US07191616B2 Front suction/discharge type outdoor unit for air-conditioner and outdoor unit installation system using it 有权
标题翻译：用于空调和户外机安装系统的前排/抽风式室外机
公开(公告)号：US07191616B2
公开(公告)日：2007-03-20
申请号：US10473071
申请日：2003-06-09
申请人： In-Gyu Kim , Young-Ju Bae , Ja-Hyung Koo , Byung-Il Park , Kyeong-Ho Kim , Yang-Ho Kim , Young-Ho Hong , Kyeong-Wook Heo , Kang-Wook Cha , Si-Kyong Sung , Dong-Hyuk Lee , Seong-Min Kang , Tae-Geun Kim
发明人： In-Gyu Kim , Young-Ju Bae , Ja-Hyung Koo , Byung-Il Park , Kyeong-Ho Kim , Yang-Ho Kim , Young-Ho Hong , Kyeong-Wook Heo , Kang-Wook Cha , Si-Kyong Sung , Dong-Hyuk Lee , Seong-Min Kang , Tae-Geun Kim
IPC分类号： F25B39/04
CPC分类号： F24F1/62 , F24F1/46 , F24F1/52 , F24F13/20 , F24F2013/205
摘要： The present invention discloses a front suction/discharge type outdoor unit for an air conditioner including: an outdoor unit casing being formed in a rectangular parallelepiped shape, having its one surface externally opened and its other surfaces closed, and being divided into a suction unit and a discharge unit; a compressor installed in the outdoor unit casing, for compressing a refrigerant gas supplied from an indoor unit through pipe lines; an air-cooled condenser positioned in the outdoor unit casing, for condensing the refrigerant gas from the compressor; and a sirocco cooling fan installed in the outdoor unit casing, for forming a diffuser opposite side part of a curvature unit of a housing as a plane unit, forming the fan housing to separate a diffuser opposite side member from a diffuser side member, supplying external air to the air-cooled condenser, and discharging heat exchanged air. A discharge direction of air from the sirocco cooling fan becomes more distant from the most adjacent outdoor unit.
摘要翻译：本发明公开了一种空调机的前排吸式室外机，其特征在于，包括：室外单元壳体，其形成为长方体形状，其一面从外部开口，另一面封闭，分为吸引单元和排放单元; 安装在室外机壳体中的压缩机，用于压缩从室内机通过管路供给的制冷剂气体; 位于所述室外机壳体中的用于冷凝来自所述压缩机的制冷剂气体的风冷式冷凝器; 以及安装在室外单元壳体中的西洛克冷却风扇，用于形成作为平面单元的壳体的曲率单元的相对侧部的扩散器，形成风扇壳体，以使扩散器相对侧构件与扩散器侧构件分离，空气冷却至冷风冷凝器，排出换热空气。来自西罗克冷却风扇的空气的排放方向变得远离最邻近的室外单元。

8. 发明授权

US07174740B2 Built-in type outdoor unit for air conditioner 有权
标题翻译：内置式空调室外机
公开(公告)号：US07174740B2
公开(公告)日：2007-02-13
申请号：US11110913
申请日：2005-04-21
申请人： Kang-Wook Cha , Si-Kyong Sung , Dong-Hyuk Lee , Seong-Min Kang , Tae-Geun Kim , In-Gyu Kim , Young-Ju Bae , Jae-Hyung Koo , Byung-Il Park , Kyeong-Ho Kim , Yang-Ho Kim , Young-Ho Hong , Kyeong-Wook Heo
发明人： Kang-Wook Cha , Si-Kyong Sung , Dong-Hyuk Lee , Seong-Min Kang , Tae-Geun Kim , In-Gyu Kim , Young-Ju Bae , Jae-Hyung Koo , Byung-Il Park , Kyeong-Ho Kim , Yang-Ho Kim , Young-Ho Hong , Kyeong-Wook Heo
IPC分类号： F25D19/00
CPC分类号： F24F1/52 , F24F1/56 , F24F1/60
摘要： A built-in type compressor/condenser unit for an air conditioner with an efficient installation structure for installing an increased capacity outdoor unit is provided. The built-in type compressor/condenser unit includes a louver frame installed on a rectangular shaped space formed on an outer wall of a building. The louver frame is divided into a suction area and a discharge area, each with a plurality of louver blades. The compressor/condenser unit casing is positioned proximate the louver frame, with the surface of the casing which faces the suction area and the discharge area of the louver frame open, and the remaining surfaces of the casing closed. A compressor, an air-cooled condenser, and a cooling fan are installed in the compressor/condenser unit casing.
摘要翻译：提供了一种用于空调的内置式压缩机/冷凝器单元，其具有用于安装增加容量的室外单元的高效安装结构。内置式压缩机/冷凝器单元包括安装在建筑物外壁上形成的矩形空间的百叶窗框架。百叶窗框架分为吸入区域和排放区域，每个具有多个百叶窗叶片。压缩机/冷凝器单元壳体位于百叶窗框架附近，壳体的表面面向吸入区域，百叶窗框架的排放区域打开，并且壳体的其余表面关闭。压缩机，风冷冷凝器和冷却风扇安装在压缩机/冷凝器单元壳体中。

9. 发明申请

US20150171262A1 LIGHT EMITTING DEVICE HAVING TRANSPARENT ELECTRODE AND METHOD OF MANUFACTURING LIGHT EMITTING DEVICE 有权
标题翻译：具有透明电极的发光装置及制造发光装置的方法
公开(公告)号：US20150171262A1
公开(公告)日：2015-06-18
申请号：US14413911
申请日：2012-09-10
申请人： Tae Geun Kim , Hee-Dong Kim
发明人： Tae Geun Kim , Hee-Dong Kim
IPC分类号： H01L33/00 , H01L33/42 , H01L33/32 , H01L33/40 , H01L33/06 , H01L33/14
CPC分类号： H01L33/0075 , H01L33/0025 , H01L33/0079 , H01L33/06 , H01L33/14 , H01L33/32 , H01L33/405 , H01L33/42 , H01L33/62 , H01L2933/0016 , H01L2933/0066
摘要： Provided are a light emitting device including a transparent electrode having high transmittance with respect to light in a UV wavelength range as well as in a visible wavelength range and good ohmic contact characteristic with respect to a semiconductor layer and and a method of manufacturing the light emitting device. A transparent electrode of a light emitting device is formed by using a resistance change material which has high transmittance with respect to light in a UV wavelength range and of which resistance state is to be changed from a high resistance state into a low resistance state due to conducting filaments, which current can flow through, formed in the material if a voltage exceeding a threshold voltage inherent in a material applied to the material, so that it is possible to obtain high transmittance with respect to light in a UV wavelength range.
摘要翻译：提供一种发光器件，其包括相对于UV波长范围以及可见光波长范围内的光具有高透射率的透明电极和相对于半导体层的良好的欧姆接触特性的发光器件，以及制造发光设备。通过使用相对于UV波长范围内的光具有高透射率的电阻变化材料形成发光器件的透明电极，并且由于电阻状态由于高电阻状态而被改变为低电阻状态如果电压超过施加到材料上的材料中固有的阈值电压，则可以在材料中形成电流可以流过的导线，使得可以获得相对于UV波长范围内的光的高透射率。

10. 发明申请

US20110275013A1 Reflective Extreme Ultraviolet Mask 有权
标题翻译：反光极紫外线面膜
公开(公告)号：US20110275013A1
公开(公告)日：2011-11-10
申请号：US13069758
申请日：2011-03-23
申请人： Dong-Gun Lee , Seong-Sue Kim , Tae-Geun Kim
发明人： Dong-Gun Lee , Seong-Sue Kim , Tae-Geun Kim
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00
摘要： According to example embodiments, a reflective EUV mask may include a mask substrate, a patterned structure and a non-patterned structure on the mask substrate. At least one of the patterned structure and the non-patterned structure may include a thermally treated region configured to reduce a reflectivity of the respective patterned and non-patterned structure.
摘要翻译：根据示例实施例，反射型EUV掩模可以包括掩模基板，图案化结构和掩模基板上的非图案化结构。图案化结构和非图案化结构中的至少一个可以包括被配置为减少相应的图案化和非图案化结构的反射率的热处理区域。

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