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1. 发明授权

US4392935A Distributed force indexing system 失效
标题翻译：分布式力量索引系统
公开(公告)号：US4392935A
公开(公告)日：1983-07-12
申请号：US426509
申请日：1982-09-29
申请人： Syed A. Husain
发明人： Syed A. Husain
IPC分类号： C25D17/00
CPC分类号： C25D17/00
摘要： An indexing system adapted to periodically advance a web of metal through a plating line that first advances gently till it engages a hole in the web, then closes clamping members about the web to grasp the web over a distributed region, and only then moves the web at full speed.
摘要翻译：一种分度系统，其适于周期性地推进金属网通过电镀线，所述电镀线首先轻轻前进，直到其与所述幅材中的孔接合，然后闭合所述幅材上的夹紧构件以在分布区域上抓住所述幅材，并且仅使所述幅材移动全速。

2. 发明授权

US5841291A Exchangeable membrane probe testing of circuits 失效
标题翻译：电路可交换膜探针测试
公开(公告)号：US5841291A
公开(公告)日：1998-11-24
申请号：US764511
申请日：1996-12-12
申请人： Ken Kuang-Fu Liu , Byoung-Youl Min , Robert John Moti , Syed A. Husain
发明人： Ken Kuang-Fu Liu , Byoung-Youl Min , Robert John Moti , Syed A. Husain
IPC分类号： G01R1/073 , H01L21/66 , G01R31/02
CPC分类号： G01R1/0735
摘要： First and second bumps electrically connected at first and second positions along a conductive run borne by a flexible substrate are respectively oriented for contact with a pad of a die under test and a pad of a tester structure. Second and third conductive regions are electrically connected respectively to the power and ground terminals of a power source and an electrical device. The second and third regions are spaced from a first conductive region to filter high-frequency noise components from power and ground potentials provided by the power source.
摘要翻译：沿着沿着由柔性基板传导的导电的第一和第二位置电连接的第一和第二凸起分别被定向成与被测试的模具的焊盘和测试器结构的焊盘接触。第二和第三导电区域分别电连接到电源和电气设备的电源和接地端子。第二和第三区域与第一导电区域间隔开，以将高频噪声分量与由电源提供的功率和地电位进行滤波。

3. 发明授权

US5623213A Membrane probing of circuits 失效
标题翻译：电路膜探测
公开(公告)号：US5623213A
公开(公告)日：1997-04-22
申请号：US643740
申请日：1996-05-06
申请人： Ken K. F. Liu , Byoung-Youl Min , Robert J. Moti , Syed A. Husain
发明人： Ken K. F. Liu , Byoung-Youl Min , Robert J. Moti , Syed A. Husain
IPC分类号： G01R1/073 , H01L21/66 , G01R31/02
CPC分类号： G01R1/0735
摘要： First and second bumps electrically connected at first and second positions along a conductive run borne by a flexible substrate are respectively oriented for contact with a pad of a die under test and a pad of a tester structure. Second and third conductive regions are electrically connected respectively to the power and ground terminals of a power source and an electrical device. The second and third regions are spaced from a first conductive region to filter high-frequency noise components from power and ground potentials provided by the power source,
摘要翻译：沿着沿着由柔性基板传导的导电的第一和第二位置电连接的第一和第二凸起分别被定向成与被测试的模具的焊盘和测试器结构的焊盘接触。第二和第三导电区域分别电连接到电源和电气装置的电源和接地端子。第二和第三区域与第一导电区域间隔开以从由电源提供的功率和接地电位滤除高频噪声分量，

4. 发明授权

US5273589A Method for low pressure rinsing and drying in a process chamber 失效
标题翻译：在处理室中低压冲洗和干燥的方法
公开(公告)号：US5273589A
公开(公告)日：1993-12-28
申请号：US911408
申请日：1992-07-10
申请人： Bradley L. Griswold , Syed A. Husain
发明人： Bradley L. Griswold , Syed A. Husain
IPC分类号： B08B3/10 , F26B3/00 , F26B5/04 , H01L21/00 , H01L21/306 , B08B3/00
CPC分类号： H01L21/02043 , B08B3/10 , F26B3/00 , F26B5/04 , H01L21/67028 , Y10S134/902
摘要： An embodiment of the present invention is a system for rinsing and drying items comprising a process chamber for receiving the items; a rinse condenser; a first heater; a vaporizer for vaporizing water and including a second heater; a vacuum system for reducing the pressure within the process chamber; and a valving apparatus for independently coupling the process chamber to the vaporizer and the process chamber to the vacuum system. A controller sequences the first and second heaters and the valving apparatus such that the pressure within the process chamber is substantially reduced below atmospheric pressure, the rinse condenser is turned on, water is introduced to the vaporizer which is turned to water vapor by turning the second heater on, the water vapor is circulated to the process chamber, the water vapor is condensed on the items and the rinse condenser, the condensate water is allowed to rain on the items, the water condensate is returned from the process chamber to the vaporizer, the process chamber is isolated from the vaporizer, the rinse condenser is turned off, the first heater is turned on, the vacuum system operates to remove water vapor from the process chamber, and atmospheric pressure is restored to the process chamber when the items are dry of water.
摘要翻译：本发明的一个实施例是一种用于冲洗和干燥物品的系统，包括用于接收物品的处理室; 冲洗冷凝器; 第一个加热器用于蒸发水并包括第二加热器的蒸发器; 用于减小处理室内的压力的真空系统; 以及用于将处理室独立地连接到蒸发器和处理室到真空系统的阀装置。控制器对第一和第二加热器和阀装置进行排序，使得处理室内的压力基本上降低到大气压以下，冲洗冷凝器打开，水通过转动第二个加热器上，水蒸汽循环到处理室，水蒸汽在物品和冲洗冷凝器上冷凝，冷凝水被允许在物品上下雨，水冷凝物从处理室返回到蒸发器，处理室与蒸发器隔离，冲洗冷凝器关闭，第一加热器打开，真空系统操作以从处理室中除去水蒸汽，当物品干燥时大气压力恢复到处理室的水。

5. 发明授权

US5227041A Dry contact electroplating apparatus 失效
标题翻译：干式电镀设备
公开(公告)号：US5227041A
公开(公告)日：1993-07-13
申请号：US898038
申请日：1992-06-12
申请人： Bruce N. Brogden , Leon P. Brown , Syed A. Husain
发明人： Bruce N. Brogden , Leon P. Brown , Syed A. Husain
IPC分类号： C25D7/12 , H01L21/00 , H01L21/687
CPC分类号： H01L21/67126 , C25D17/001 , C25D7/12 , H01L21/68785
摘要： A dry contact electroplating structure is disclosed. The structure includes a base member for immersion within an electroplating solution. The base member has a central aperture defined by an aperture perimeter formed within the base member. A sealing ring is positioned adjacent to the aperture perimeter. The sealing ring forms a sealing connection with an object to be electroplated. A number of electrical contacts are positioned adjacent to the sealing ring. The electrical contacts form an electrical connection with one side of the object to be electroplated. A lid is positioned on the base member over one side of the central aperture. Thus, the lid protects the electrical contacts and one side of the object to be electroplated, while the other side of the object is exposed to the electroplating solution.
摘要翻译：公开了一种干接触电镀结构。该结构包括用于浸入电镀溶液中的基底构件。基部构件具有由形成在基部构件内的孔周边限定的中心孔。密封环邻近孔周边定位。密封环与要电镀的物体形成密封连接。多个电触点位于密封环附近。电触点与要电镀的物体的一侧形成电连接。盖子位于中心孔的一侧上的基座构件上。因此，盖子保护电触头和要被电镀的物体的一侧，而物体的另一侧暴露于电镀溶液。

6. 发明授权

US4696727A Universal selective plating head 失效
标题翻译：通用选择电镀头
公开(公告)号：US4696727A
公开(公告)日：1987-09-29
申请号：US929721
申请日：1986-11-12
申请人： Saad Mukhtar , Syed A. Husain
发明人： Saad Mukhtar , Syed A. Husain
IPC分类号： C25D5/02 , C25D17/00
CPC分类号： C25D5/022
摘要： A selective plating apparatus having a multipitch centerline feed block for delivering a uniform blade of plating solution to a mask and which provides passageways for the drainage of used electrolyte solution. The delivery of a uniform blade of plating solution to the mask allows the mask to be designed such that it controls both the area of sample to be plated and the pitch of the sample.
摘要翻译：一种选择性电镀装置，其具有用于将均匀的电镀溶液刮板输送到掩模上并具有用于排出所用电解质溶液的通道的多中径线进料块。将均匀的电镀溶液片递送到掩模允许掩模被设计成使得其控制待镀样品的面积和样品的间距。

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